• 제목/요약/키워드: Schottky effect

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Graphene Doping Effect of Thin Film and Contact Mechanisms (박막의 그래핀 도핑 효과와 접합 특성)

  • Oh, Teressa
    • Korean Journal of Materials Research
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    • v.24 no.3
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    • pp.140-144
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    • 2014
  • The contact mechanism of devices is usually researched at electrode contacts. However, the contact between a dielectric and channel at the MOS structure is more important. The graphene was used as a channel material, and the thin film transistor with MOS structure was prepared to observe the contact mechanism. The graphene was obtained on Cu foil by the thermal decomposition method with $H_2$ and $CH_4$ mixed gases at an ambient annealing temperature of $1000^{\circ}C$ during the deposition for 30 min, and was then transferred onto a $SiO_2/Si$ substrate. The graphene was doped in a nitrogen acidic solution. The chemical properties of graphene were investigated to research the effect of nitric atoms doping. The sheet resistance of graphene decreased after nitrogen acidic doping, and the sheet resistance decreased with an increase in the doping times because of the increment of negative charge carriers. The nitric-atom-doped graphene showed the Ohmic contact at the curve of the drain current and drain voltage, in spite of the Schottky contact of grapnene without doping.

Room Temperature Hydrogen Sensor

  • Cho, Hyoung Jin;Zhang, Peng;Seal, Sudipta
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.51.3-51.3
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    • 2010
  • Due to the recent public awareness of global warming and sustainable economic growth, there has been a growing interest in alternative clean energy sources. Hydrogen is considered as a clean fuel for the next generation. One of the technical challenges related to the use of hydrogen is safe monitoring of the hydrogen leak during separation, purification and transportation. For detecting various gases, chemiresistor-type gas sensors have been widely studied and used due to their well-established detection scheme and low cost. However, it is known that many of them have the limited sensitivity and slow response time, when used at low temperature conditions. In our work, a sensor based on Schottky barriers at the electrode/sensing material interface showed promising results that can be utilized for developing fast and highly sensitive gas sensors. Our hydrogen sensor was designed and fabricated based on indium oxide (In2O3)-doped tin oxide (SnO2) semiconductor nanoparticles with platinum (Pt) nanoclusters in combination with interdigitated electrodes. The sensor showed the sensitivity as high as $10^7%$ (Rair/Rgas) and the detection limit as low as 30 ppm. The sensor characteristics could be obtained via optimized materials synthesis route and sensor electrode design. Not only the contribution of electrical resistance from the film itself but also the interfacial effect was identified as an important factor that contribute significantly to the overall sensor characteristics. This promises the applicability of the developed sensor for monitoring hydrogen leak at room temperature.

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$\pi$-A Isotherms and Electrical Properties of Polyamic acid Alkylamine salts(PAAS) Langmuir-Blodgett Films

  • Kim, Tae-Wan;Park, Jun-Su;Cho, Jong-Sun;Kang, Dou-Yol
    • Electrical & Electronic Materials
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    • v.11 no.10
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    • pp.60-65
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    • 1998
  • Deposition conditions, surface morphology, and electrical properties of polyamic acid alkylamine salts (PAAS) Langmuir-Blodgett(LB) films have been investigated through a study of surface pressure-area $\pi$-A isotherms, AFM (atomic force microscopy), and current-voltage characteristics. To obtain the optimum conditions of film deposition, the $\pi$-A isotherms were examined by varying temperature, barrier moving speed, dipping speed, spreading amount of solution etc. The Z-type LB films were made at the surface pressure of 5 mN m-1 and 25 mN m-1 for the AFM study; the former surface pressure forms the gas phase and the latter one forms the solid phase. The LB film made in the gas phase show domains with a size of about 200 A diameter and 70 A height. However, the LB films made in the solid phase show a very smooth surface with 2 A surface roughness. In the current-voltage characteristics measured along the perpendicular direction of the films, ohmic conduction has been observed below 105 V cm-1 and the calculated electrical conductivity is about 10-13 S cm-1. Nonohmic conduction has been observed above = 10-11 V cm and the conduction mechanism can be explained by the Schottky effect.

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Electrical Properties of Metal - Insulator- Metal Diode for AM-LCD Driving

  • Kim, Jang-Kwon;Lee, Myung-Jae;Kim, Dong-Sik;Chung, Kwan-Soo
    • Proceedings of the IEEK Conference
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    • 2002.07b
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    • pp.1125-1128
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    • 2002
  • Tantalum pentoxide (Ta$_2$O$\sub$5/) is a candidate for use in metal-insulator-metal diode in switching devices for active-matrix liquid-crystal displays. The MIM diode with very low threshold voltage and perfect symmetry was fabricated. High quality Ta$_2$O$\sub$5/ thin films were obtained by using an anodizing method. Rutherford backscattering spectroscopy, transmission electron microscope observations, auger electron spectroscopy, ellipsometry measurements, and electrical measurements, such as current - voltage(I-V) measurements were performed to investigate Ta$_2$O$\sub$5/ films and their reliability and indicated that the obtained TaOx thin films were reliable Ta$_2$O$\sub$5/ films for the applications. Furthermore, in this paper, we discuss the effects of top-electrode metals and annealing conditions. The conduction mechanism of the leakage current and the symmetry characteristics related to the Schottky emission and Poole-Frankel effect are also discussed using the results of electrical measurements and conduction barrier theory.

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Metal Oxide Nanocolumns for Extremely Sensitive Gas Sensors

  • Song, Young Geun;Shim, Young-Seok;Han, Soo Deok;Lee, Hae Ryong;Ju, Byeong-Kwon;Kang, Chong Yun
    • Journal of Sensor Science and Technology
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    • v.25 no.3
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    • pp.184-188
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    • 2016
  • Highly ordered $SnO_2$ and NiO nanocolumns have been successfully achieved by glancing-angle deposition (GLAD) using an electron beam evaporator. Nanocolumnar $SnO_2$ and NiO sensors exhibited high performance owing to the porous nanostructural effect with the formation of a double Schottky junction and high surface-to-volume ratios. When all gas sensors were exposed to various gases such as $C_2H_5OH$, $C_6H_6$, and $CH_3COCH_3$, the response of the highly ordered $SnO_2$ nanocolumn were over 50 times higher than that of the $SnO_2$ thin film. This work will bring broad interest and create a strong impact in many different fields owing to its particularly simple and reliable fabrication process.

A Study on the Monolayer Film Electronics (단분자막 전자소자에 대한 연구)

  • Lee, Yong-Soo;Shin, Dong-Myung;Kim, Tae-Wan;Choi, Jong-Sun;Kang, Dou-Yol;Sohn, Byoung-Chung
    • Journal of the Korean Applied Science and Technology
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    • v.16 no.3
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    • pp.249-254
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    • 1999
  • The N-docosyl N'-methyl viologen-$(TCNQ)_2$, (DMVT) was synthesized. We investigated the ${\pi}-A$ isotherm of DMVT to find the optimal deposition condition. Temperature-dependent current-voltage characteristics of the DMVT LB films shows that there is an increase in conductivity at 330K or so. The in-plane electrical conductivity at room temperature is in the range of $10^{-7}{\sim}10^{-6}S/cm$. From the plot of logarithmic conductivity as a function of reciprocal temperature, two types of activation energies, 0.04eV and 0.73eV, were obtained depending on the temperature range. The Ohmic behaviour was observed below 0.6V and the Schottky effect was confirmed at $2.5{\sim}6V$, when the I-V characteristics was measured with Al/LB film/Al structure. I-V measurement for Al/LB film/ITO structure showed the asymmetrical I-V relationship, which resulted from the rectification property.

Thermal-annealing behavior of in-core neutron-irradiated epitaxial 4H-SiC

  • Junesic Park ;Byung-Gun Park;Gwang-Min Sun
    • Nuclear Engineering and Technology
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    • v.55 no.1
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    • pp.209-214
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    • 2023
  • The effect of thermal annealing on defect recovery of in-core neutron-irradiated 4H-SiC was investigated. Au/SiC Schottky diodes were manufactured using a 4H-SiC epitaxial wafer that was neutron-irradiated at the HANARO research reactor. The electrical characteristics of their epitaxial layers were analyzed under various conditions, including different neutron fluences (1.3 × 1017 and 2.7 × 1017 neutrons/cm2) and annealing times (up to 2 h at 1700 ℃). Capacity-voltage measurements showed high carrier compensation in the neutron-irradiated samples and a recovery tendency that increased with annealing time. The carrier density could be recovered up to 77% of the bare sample. Deep-level-transient spectroscopy revealed intrinsic defects of 4H-SiC with energy levels 0.47 and 0.68 eV below the conduction-band edge, which were significantly increased by in-core neutron irradiation. A previously unknown defect with a high electron-capture cross-section was discovered at 0.36 eV below the conduction-band edge. All defect concentrations decreased with 1700 ℃ annealing; the decrease was faster when the defect level was shallow.

Asymmetric Metal-Semiconductor-Metal Al0.24Ga0.76N UV Sensors with Surface Passivation Effect Under Local Joule Heating

  • Byeong-Jun Park;Sung-Ho Hahm
    • Journal of Sensor Science and Technology
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    • v.32 no.6
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    • pp.425-431
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    • 2023
  • An asymmetric metal-semiconductor-metal Al0.24Ga0.76N ultraviolet (UV) sensor was fabricated, and the effects of local Joule heating were investigated. After dielectric breakdown, the current density under a reverse bias of 2.0 V was 1.1×10-9 A/cm2, significantly lower than 1.2×10-8 A/cm2 before dielectric breakdown; moreover, the Schottky behavior of the Ti/Al/Ni/Au electrode changed to ohmic behavior under forward bias. The UV-to-visible rejection ratio (UVRR) under a reverse bias of 7.0 V before dielectric breakdown was 87; however, this UVRR significantly increased to 578, in addition to providing highly reliable responsivity. Transmission electron microscopy revealed interdiffusion between adjacent layers, with nitrogen vacancies possibly formed owing to local Joule heating at the AlGaN/Ti/Al/Ni/Au interfaces. X-ray photoelectron microscopy results revealed decreases in the peak intensities of the O 1s binding energies associated with the Ga-O bond and OH-, which act as electron-trapping states on the AlGaN surface. The reduction in dark current owing to the proposed local heating method is expected to increase the sensing performance of UV optoelectronic integrated devices, such as active-pixel UV image sensors.

Development of SiGe Heterostructure Epitaxial Growth and Device Fabrication Technology using Reduced Pressure Chemical Vapor Deposition (저압화학증착을 이용한 실리콘-게르마늄 이종접합구조의 에피성장과 소자제작 기술 개발)

  • Shim, K.H;Kim, S.H;Song, Y.J;Lee, N.E;Lim, J.W;Kang, J.Y
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.4
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    • pp.285-296
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    • 2005
  • Reduced pressure chemical vapor deposition technology has been used to study SiGe heterostructure epitaxy and device issues, including SiGe relaxed buffers, proper control of Ge component and crystalline defects, two dimensional delta doping, and their influence on electrical properties of devices. From experiments, 2D profiles of B and P presented FWHM of 5 nm and 20 nm, respectively, and doses in 5×10/sup 11/ ∼ 3×10/sup 14/ ㎝/sup -2/ range. The results could be employed to fabricate SiGe/Si heterostructure field effect transistors with both Schottky contact and MOS structure for gate electrodes. I-V characteristics of 2D P-doped HFETs revealed normal behavior except the detrimental effect of crystalline defects created at SiGe/Si interfaces due to stress relaxation. On the contrary, sharp B-doping technology resulted in significant improvement in DC performance by 20-30 % in transconductance and short channel effect of SiGe HMOS. High peak concentration and mobility in 2D-doped SiGe heterostructures accompanied by remarkable improvements of electrical property illustrate feasible use for nano-sale FETs and integrated circuits for radio frequency wireless communication in particular.

Electrical conduction phenomena of $C_{22}$--quinolium(TCNQ) langmuir-blodgett films under the high-electric field ($C_{22}$-quinolium(TCNQ) LB막의 고전게 전기전도 현상)

  • 신동명;김태완;홍언식;송일식;유덕선;강도열
    • Electrical & Electronic Materials
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    • v.7 no.2
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    • pp.138-144
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    • 1994
  • Electrical conduction phenomena of $C_{22}$-quinolium(TCNQ) Langmuir- Blodgett(LB) films are reported through a study of current-voltage(I-V) characteristics along a perpendicular direction. The I-V characteristics were investigated by applying a step or a pulse voltage to the specimen as well as changing temperatures in the range of 20-250[.deg. C] It show an ohmic behavior in low-electric field, and a nonohmic behavior in high-electric field. This nonohmic behavior has been interpreted in terms of a conduction mechanism of space-charge limited current and Schottky effect. When the electric field is near the strength of 10$_{6}$ V/cm, there occur anomalous phenomena similar to breakdown. When step or pulse voltage is applied, the breakdown voltage shifts to the higher one as the step or pulse time width becomes shorter. To see the influence of temperature, current was measured as a function of temperature under the several bias voltages, which are lower than that of breakdown. It shows that the current increases to about 103 times near 60-70[.deg. C], and remains constant for a while up to around 150[.deg. C] and then suddenly drops. We have also performed a DSC(differential scanning calorimetry) measurement with $C_{22}$-quinolium(TCNQ) powder in the range of 30-300[.deg. C]. These results imply that the anomalous phenomena occuring in the high electric field are caused by the electrical and internal thermal effect such as a joule heating.ating.

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