• Title/Summary/Keyword: Schottky conduction

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Switching conduction characteristics of PI LB Film in MIM junctions (Polyimide(PI)LB막의 MIM구조 소자내에서의 switching전도특성)

  • ;;Mitsumasa Iwamoto
    • Electrical & Electronic Materials
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    • v.8 no.2
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    • pp.176-183
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    • 1995
  • The present work is concerned with the switching conduction characteristics of PI LB films in metal insulator metal sandwiches. By applying various DC voltage bias to MIM junctions, conduction characteristics of junctions can be changed between the high-voltage low-current(off) condition, the low-voltage high-current (on) condition and the medium(mid) condition. Switching conduction characteristics can be also observed in MIM junctions employing some aromatic compounds as insulators. Switching conduction characteristics is assumed to be owing to the existence of aromatic rings, space charge in films, impurities on metal-insulator interface, and difference in work functions of base and top electrodes metal. To study the conduction process of on, off, and mid conductions, we measured I-V, d$^{2}$V/d I$^{2}$-V characteristics of junctions with several different top electrodes under various temperatures. Small conductance changes of junctions can be measured by observing the second derivative, d$^{2}$V/dI$^{2}$, of I-V curve. A dynamical technique is used to get the second derivatives. That is, a finite modulation of the current is applied to the junctions and the second harmonic of the voltage is detected.

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A Study on Conduction Characteristics of Oriented Polypropylene Film (이축 연신 풀리프로필렌 필름의 전도특성에 관한 연구)

  • 김귀열;윤문수;이준욱
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.39 no.2
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    • pp.175-182
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    • 1990
  • In order to investigate the conduction characteistics of the biaxially oriented polypropylene film, several measurements have been carried out in the range of temperature between 5['c] and 25['c] as well as the field intensity between 10[MV/m] and 300[MV/m]. The whole range of the characteristics observed at 15['c] appears to be divided into five regions` the Ohmic conduction region due to ionic carrier below 40[MV/m], the region from 40[MV/m] to 70[MV/m] in which the conduction mechanism is attributed to Poole-Frenkel effect, the region from 70[MV/m] to 82[MV/m] in which the negative resistance characteristics are observed, then the region from 82[MV/m] which is dominated by Schottky effect and finally, the region from 240[MV/m] up to the point where dielectric breakdown occurs in which the mechanism is based on Flowler-Nordheim theory.

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A Study on the Electrical Properties and Fabrication of Electret Element by Functional Ultra Thin Films -Electrical conduction in LB Ultra Thin Films of TCNQ- (기능성 초박막을 이용한 Electret 소자의 제작과 전기물성에 관한 연구-LB초박막 TCNQ의 전기전도 특성-)

  • 권영수;박만철;이원재;홍언식;강도열
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.40 no.5
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    • pp.489-495
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    • 1991
  • In this paper, we study the electrical conduction mechanism in Langmuir-Blodgett(LB) ultra thin films for which the LB device has a metal/LB films(TCNQ)/metal sandwich structure. Our experiments show that the current at the LB device does not depend on the temperature at below 0 C. This phenomena confirm that the electrical conduction current is a tunnel current inherent to ultra thin films. However, the current depends upon the temperature near the room temperature. This phenomena indicates the electeical conduction current is a Schottky current inherent to ultra thin films.

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The Characteristic Improvement of Photodiode by Schottky Contact (정류성 접합에 의한 광다이오드의 특성 개선)

  • Hur Chang-wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.8 no.7
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    • pp.1448-1452
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    • 2004
  • In this paper, a photodiode capable of obtaining a sufficient photo/ dark current ratio at both a forward bias state and a reverse bias state is proposed. The photodiode includes a glass substrate, an Cr thin film formed as a lower electrode over the glass substrate, Cr silicide thin film(∼l00$\AA$) ) formed as a schottky barrier over the Cr thin film, a hydrogenated amorphous silicon film formed as a photo conduction layer over a portion of the Cr silicide thin film. Transparent conduction film ITO (thickness 100nm) formed as an upper electrode over the hydro-generated amorphous silicon film is then deposited in pure argon at room temperature for the Schottky contact and light window. The high quality Cr silicide thin film using annealing of Cr and a-Si:H is formed and analyzed by experiment. We have obtained the film with a superior characteristics. The dark current of the ITO/a-Si:H Schottky at a reverse bias of -5V is ∼3$\times$IO-12 A/un2, and one of the lowest reported, hitherto. AES(Auger Electron Spectroscophy) measurements indicate that this notable improvement in device characteristics stems from reduced diffusion of oxygen, rather than indium, from the ITO into the a-Si:H layer, thus, preserving the integrity of the Schottky interface. The spectral response of the photodiode for wavelengths in the range from 400nm to 800nm shows the expected behavior whereby the photocurrent is governed by the absorption characteristics of a-Si:H.

Proton Conduction in Nonstoichiometric Σ3 BaZrO3 (210)[001] Tilt Grain Boundary Using Density Functional Theory

  • Kim, Ji-Su;Kim, Yeong-Cheol
    • Journal of the Korean Ceramic Society
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    • v.53 no.3
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    • pp.301-305
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    • 2016
  • We investigate proton conduction in a nonstoichiometric ${\Sigma}3$ $BaZrO_3$ (210)[001] tilt grain boundary using density functional theory (DFT). We employ the space charge layer (SCL) and structural disorder (SD) models with the introduction of protons and oxygen vacancies into the system. The segregation energies of proton and oxygen vacancy are determined as -0.70 and -0.54 eV, respectively. Based on this data, we obtain a Schottky barrier height of 0.52 V and defect concentrations at 600K, in agreement with the reported experimental values. We calculate the energy barrier for proton migration across the grain boundary core as 0.61 eV, from which we derive proton mobility. We also obtain the proton conductivity from the knowledge of proton concentration and mobility. We find that the calculated conductivity of the nonstoichiometric grain boundary is similar to those of the stoichiometric ones in the literature.

The Structural and Electrical Properties of Vanadium Oxide Thin Films as $O_2/(Ar+O_{2})$ ratio ($O_2/(Ar+O_{2})$비에 따른 바나듐 산화막의 구조적, 전기적 특성)

  • 최용남;최복길;최창규;김성진
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.729-732
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    • 2001
  • In this study, the effect of oxygen partial pressure on the electrical properties of vanadium oxide(VO$_{x}$) thin films were investigated. The thin films were prepared by r.f. magnetron sputtering from V$_2$O$_{5}$ target in a gas mixture of argon and oxygen. The oxygen partial pressure ratio is changed from 0% to 8%. I-V characteristics were distinguished between linear and nonlinear region. In the low field region the conduction is due to Schottky emission, while at high fields it changes to Fowler-Nordheim tunneling type conduction. The conductivity measurements have shown an Arrhenius dependence of the conductivity on the temperature.ure.

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The Conduction Characteristics in Oriented Polypropylene Films

  • Oh, Jae-Han;Jung, Il-Hyun;Kim, Sang-Keol;Park, Geon-Ho;Lee, Kyung-Sup
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.1
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    • pp.45-52
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    • 2000
  • The conduction characteristics in Oriented polypropylene (OPP) film were studied over electric field intensities between 10 M/V m and 300 M/V m . The range of the conduction characteristics was divided in to five regions with increasing field intensity. Particularly, in the region from 70 Mb/m to 82 MV/m voltage-controlled negative resistance was displayed. In the negative resistance region current oscillations were also observed the negative resistance characteristics could by explaine by Gibbons theory.

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A study on conduction current and D.C. breakdown characteristics in dielectric liquids (절연유의 도전전류와 직류절연파괴특성에 관한 연구)

  • 서국철
    • 전기의세계
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    • v.30 no.4
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    • pp.231-236
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    • 1981
  • It has been known that D.C. breakdown Voltage is lower than A.C. breakdown Voltage in insulatingoil, but there are still many unvivid points at electric conduction in breakdown or under of high electric field. This study measured the electric current-electric field characteristics (I-E characteristics) and the breakdown Voltage under of D.C. electric field of insulating oil using the system of electrodes that are near the Uniform electric field with a result. I can study, electric conduction in area of high electric field depends upon the Schottky effect. The liquidity of breakdown electric field takes place by the local concentration of electric field. The longer gap is and the more electric current is the more breakdown Voltage decreased. There are not almost the change of electric current-electric field characteristics by materials of electrode.

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The Effect of Surface Plasmon on Internal Photoemission Measured on Ag/$TiO_2$ Nanodiodes

  • Lee, Hyosun;Lee, Young Keun;Park, Jeong Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.662-662
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    • 2013
  • Over the last several decades, innovative light-harvesting devices have evolved to achieve high efficiency in solar energy transfer. Research on the mechanisms for plasmon resonance is very desirable to overcome the conventional efficiency limits of photovoltaics. The influence of localized surface plasmon resonance on hot electron flow at a metal-semiconductor interface was observed with a Schottky diode composed of a thin silver layer on $TiO_2$. The photocurrent is generated by absorption of photons when electrons have enough energy to travel over the Schottky barrier and into the titanium oxide conduction band. The correlation between the hot electrons and the surface plasmon is confirmed by matching the range of peaks between the incident photons to current conversion efficiency (IPCE, flux of collected electrons per flux of incident photons) and UV-Vis spectra. The photocurrent measured on Ag/$TiO_2$ exhibited surface plasmon peaks; whereas, in contrast to the Au/$TiO_2$, a continuous Au thin film doesn't exhibit surface plasmon peaks. We modified the thickness and morphology of a continuous Ag layer by electron beam evaporation deposition and heating under gas conditions and found that the morphological change and thickness of the Ag film are key factors in controlling the peak position of light absorption.

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Electrical Properties of Plasma Polymerized Hexamethyldisiloxane Thin Film (플라즈마 중합법에 의한 헥사메틸디실록산 박막의 전기적 특성)

  • 이상희;이덕출
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.1
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    • pp.43-47
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    • 2001
  • Plasma polymerized hexamethyldisiloxane thin film was fabricated by employing an inter-electrode capacitively coupled type apparatus under the following conditions : carrier gas flow rate of 11 sccm, reaction pressure of 0.1 torr, discharge frequency of 13.56 MHz and discharge power of 30∼90 W. Polymerization rate of thin film fabricated at the discharge power of 90W is 32.5nm/min. Relative dielectric constant and dielectric loss tangent of thin film shows 3.2∼3.8 and 2.6x10$\^$-3/∼4.51x10$\^$-3/ respectively in the frequency range of 1 kHz∼1 MHz. As the annealing temperature is increased, the relative dielectric constant gradually decreases while the dielectric loss tangent increases. The current density increase gradually with increasing annealing temperature and electric field. The electric conduction of the heaxamethyldisiloxane thin film shows Schottky effect.

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