• Title/Summary/Keyword: Scanning probe

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Distribution Analysis of the Local Critical Temperature and Current Density in YBCO Coated Conductors using Low-temperature Scanning Laser and Hall Probe Microscopy (저온 주사 레이저 및 홀소자 현미경을 이용한 YBCO 초전도 선재의 국소적 임계 온도 및 전류 밀도 분포 분석)

  • Park, S.K.;Cho, B.R.;Park, H.Y.;Ri, H.C.
    • Progress in Superconductivity
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    • v.13 no.1
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    • pp.28-33
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    • 2011
  • Distribution of the local critical temperature and current density in YBCO coated conductors were analyzed using Low-temperature Scanning Laser and Hall Probe Microscopy (LTSLHPM). We prepared YBCO coated conductors of various bridge types to study the spatial distribution of the critical temperature and the current density in single and multi bridges. LTSLHPM system was modified for detailed linescan or two-dimensional scan both scanning laser and scanning Hall probe method simultaneously. We analyzed the local critical temperature of single and multi bridges from series of several linescans of scanning laser microscopy. We also investigated local current density and hysteresis curve of single bridge from experimental results of scanning Hall probe microscopy.

Narrow Resonant Double-Ridged Rectangular Waveguide Probe for Near-Field Scanning Microwave Microscopy

  • Kim, Byung-Mun;Son, Hyeok-Woo;Cho, Young-Ki
    • Journal of Electrical Engineering and Technology
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    • v.13 no.1
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    • pp.406-412
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    • 2018
  • In this paper, we propose a narrow resonant waveguide probe that can improve the measurement sensitivity in near-field scanning microwave microscopy. The probe consists of a metal waveguide incorporating the following two sections: a straight section at the tip of the probe whose cross-section is a double-ridged rectangle, and whose height is much smaller than the waveguide width; and a standard waveguide section. The advantage of the narrow waveguide is the same as that of the quarter-wave transformer section i.e., it achieves impedance-matching between the sample under test (SUT) and the standard waveguide. The design procedure used for the probe is presented in detail and the performance of the designed resonant probe is evaluated theoretically by using an equivalent circuit. The calculated results are compared with those obtained using the finite element method (Ansoft HFSS), and consistency between the results is demonstrated. Furthermore, the performance of the fabricated resonant probe is evaluated experimentally. At X-band frequencies, we have measured the one-dimensional scanning reflection coefficient of the SUT using the probe. The sensitivity of the proposed resonant probe is improved by more than two times as compared to a conventional waveguide cavity type probe.

The Development and Evaluation of OMM(On the Machine Measuring) System Using Scanning Probe (Scanning Probe를 이용한 OMM(On the Machine Measuring) 시스템 개발 및 평가)

  • Kim, S.H.;Kim, I.H.
    • Journal of the Korean Society for Precision Engineering
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    • v.13 no.10
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    • pp.71-77
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    • 1996
  • This paper describes the development of on the machine measuring(OMM) system which can directlry measure the three dimensional machined dimensilnal accuracy using scanning probe in milling machine. Two algolithms, continuous path(CP) measurement using UC program and CAD data assisted point to point(PTP) measurement, were developed regarding specification of scanning probe. The OMM system was contructed to verify the developed system suing the proposed algorithm, and actually measured three kinds of machined TV shadow mask molds. The developed system was evaluated it's repeatability and compared with the current measurement system of CMM(Coording Measuring Machine) in terms of relative accuracy and time reduction and productivity increase.

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Manufacturing of SPL system having a large scanning area (대면적 SPL(Scanning Probe Lithography) 시스템 제작)

  • Yoon, Sang-Joon;Kim, Won-Hyo;Seong, Woo-Kyeong;Park, Young-Geun;Hwang, Kyu-Ho;Chung, Kwan-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.699-702
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    • 2004
  • Next generation lithography technologies, such as EBL(Electron Beam Lithography), X-ray lithography, SPL(Scanning Probe Lithography), have been studied widely for getting over line width limitation of photolithography. Among the next generation lithography technologies, SPL has been highlighted because of its high resolution advantage. But is also has problem which are slow processing time and sample size limitation. The purpose of this study is complement of present SPL system. Brand new SPL system was made. SPL test was performed with the system in ultra thin PMMA(polymethlymethacrylate) film.

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Theoretical and Experimental Investigation on the Probe Design of a Ridge-loaded Slot Type for Near-Field Scanning Microwave Microscope

  • Son, Hyeok-Woo;Kim, Byung-Mun;Hong, Jae-Pyo;Cho, Young-Ki
    • Journal of Electrical Engineering and Technology
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    • v.10 no.5
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    • pp.2120-2125
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    • 2015
  • In this paper, a rectangular waveguide probe with a ridge-loaded straight slot (RLSS) is presented for a near-field scanning microwave microscope (NSMM). The RLSS is located laterally at the end wall of the cavity and is loaded on double ridges in a narrow straight slot to improve the spatial resolution compared with a straight slot. The probe consists of a rectangular cavity with an RLSS and a feed section of a WR-90 rectangular waveguide. When the proposed NSMM is located at distance of 0.1mm in front of a substrate without patches or strips, the simulated full width at half maximum (FWHM) of the probe improve by approximately 31.5 % compared with that of a straight slot without ridges. One dimensional scanning of the E-plane on a sample under test was conducted, and the reflection coefficient of the near-field scanning probe is presented.

High Performance Thermoelectric Scanning Thermal Microscopy Probe Fabrication (고성능 주사탐침열현미경 열전탐침 제작)

  • Kim, Donglip;Kim, Kyeongtae;Kwon, Ohmyoung;Park, Seungho;Choi, Young Ki;Lee, Joon Sik
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.11 s.242
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    • pp.1503-1508
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    • 2005
  • Scanning Thermal Microscope (STU) has been known for its superior resolution for local temperature and thermal property measurement. However, commercially available STU probe which is the key component of SThM does not provide resolution enough to explore nanoscale thermal phenomena. Here, we developed a SThM probe fabrication process that can achieve spatial resolution around 50 m. The batch-fabricated probe has a thermocouple junction located at the end of the tip. The size of the thermocouple junction is around 200 m and the distance of the junction from the very end of the tip is 150 m. The probe is currently being used for nanoscale thermal probing of nano-material and nano device.

The Measurement of Nano-grating by Scanning Probe Microscopy Using Digital PID Control (Digital PID Control을 적용한 Scanning Probe Microscopy의 Nano-grating 측정)

  • Park, Gyeong-Deok;Ji, Won-Su;Kim, Dae-Chan;Jang, Dong-Hun;O, Beom-Hwan;Park, Se-Geun;Lee, Il-Hang;Lee, Seung-Geol
    • Proceedings of the Optical Society of Korea Conference
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    • 2008.07a
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    • pp.185-186
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    • 2008
  • In this paper, the nano-grating was measured by Scanning Probe Microscopy (SPM) system using digital Proportion, Integration and Derivative (PID) control. Through this measurement, we could confirm the improvement of the vertical resolution compared with analog Proportion and Integration (PI) control method.

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Measurement and Analysis of the Flux Profiles of the Coated Conductors using Magneto-optical Image and Scanning Hall Probe (Coated conductor에서 magneto-optical image와 scanning hall probe를 이용한 flux profile의 측정 및 분석)

  • Lee, H.Y.;Kwak, K.S.;Rhyee, J.K.;Yoo, J.;Youm, D.
    • Progress in Superconductivity
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    • v.11 no.2
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    • pp.128-134
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    • 2010
  • The magnetic flux profiles in SmBCO and YBCO coated conductors(CC) in the presence of the external field were comparatively investigated by magneto-optic image and scanning hall probe measurements. The current distributions calculated by using the inversion method from measured field profiles show that the decrease of current densities near the edges of SmBCO CC is more significant than those of YBCO CC. Through the comparison of the numerical analysis based on Kim's critical state model and the Brandt and Indenbom's solution, we found that this feature is related to their different field dependant properties of the critical current densities.

SCANNING PROBE NANOPROCESSING

  • Sugimura, Hiroyuki;Nakagiri, Nobuyuki
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.314-324
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    • 1996
  • Scanning probe microscopes (SPMs) such as the scanning tunneling microscope (STM) and the atomic force microscope (AFM) were used for surface modification tools at the nanometer scale. Material surfaces, i. e., titanium, hydrogen-terminated silicon and trimethylsilyl organosilane monolayer on silicon, were locally oxidized with the best lateral spatial resolution of 20nm. The principle behind this proximal probe oxidation method is scanning probe anodization, that is, the SPM tip-sample junction connected through a water column acting as a minute electrochemical cell. An SPM-nanolithogrphy process was demonstrated using the organosilane monolayer as a resist. Area-selective chemical modifications, i. e., etching, electroless plating with gold, monolayer deposition and immobilization of latex nanoparticles; were achieved in nano-scale resolution. The area-selectivity was based on the differences in chemical properties between the SPM-modified and unmodified regions.

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Fabrication of nanometer scale patterning by a scanning probe lithography (SPL에 의한 나노구조 제조 공정 연구)

  • Ryu J.H.;Kim C.S.;Jeong M.Y.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.330-333
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    • 2005
  • The fabrication of mold fur nano imprint lithography (NIL) is experimentally reported using the scanning probe lithography (SPL) technique, instead of the conventional I-beam lithography technique. The nanometer scale patterning structure is fabricated by the localized generation of oxide patterning on the silicon (100) wafer surface with a thin oxide layer, The fabrication method is based on the contact mode of scanning probe microscope (SPM) in air, The precision cleaning process is also performed to reach the low roughness value of $R_{rms}=0.084 nm$, which is important to increase the reproducibility of patterning. The height and width of the oxide dot are generated to be 15.667 nm and 209.5 nm, respectively, by applying 17 V during 350 ms.

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