• Title/Summary/Keyword: Sampling Oscilloscope

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Experimental investigation of Scalability of DDR DRAM packages

  • Crisp, R.
    • Journal of the Microelectronics and Packaging Society
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    • v.17 no.4
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    • pp.73-76
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    • 2010
  • A two-facet approach was used to investigate the parametric performance of functional high-speed DDR3 (Double Data Rate) DRAM (Dynamic Random Access Memory) die placed in different types of BGA (Ball Grid Array) packages: wire-bonded BGA (FBGA, Fine Ball Grid Array), flip-chip (FCBGA) and lead-bonded $microBGA^{(R)}$. In the first section, packaged live DDR3 die were tested using automatic test equipment using high-resolution shmoo plots. It was found that the best timing and voltage margin was obtained using the lead-bonded microBGA, followed by the wire-bonded FBGA with the FCBGA exhibiting the worst performance of the three types tested. In particular the flip-chip packaged devices exhibited reduced operating voltage margin. In the second part of this work a test system was designed and constructed to mimic the electrical environment of the data bus in a PC's CPU-Memory subsystem that used a single DIMM (Dual In Line Memory Module) socket in point-to-point and point-to-two-point configurations. The emulation system was used to examine signal integrity for system-level operation at speeds in excess of 6 Gb/pin/sec in order to assess the frequency extensibility of the signal-carrying path of the microBGA considered for future high-speed DRAM packaging. The analyzed signal path was driven from either end of the data bus by a GaAs laser driver capable of operation beyond 10 GHz. Eye diagrams were measured using a high speed sampling oscilloscope with a pulse generator providing a pseudo-random bit sequence stimulus for the laser drivers. The memory controller was emulated using a circuit implemented on a BGA interposer employing the laser driver while the active DRAM was modeled using the same type of laser driver mounted to the DIMM module. A custom silicon loading die was designed and fabricated and placed into the microBGA packages that were attached to an instrumented DIMM module. It was found that 6.6 Gb/sec/pin operation appears feasible in both point to point and point to two point configurations when the input capacitance is limited to 2pF.

Control of Copper Thin Film Characteristics by using Pulsed DC Power Magnetron Sputter System (Pulsed DC Power Magnetron Sputter System을 사용한 Copper 박막 특성 조절)

  • Kim, Do-Han;Lee, Su-Jeong;Kim, Tae-Hyeong;Lee, Won-O;Yeom, Won-Gyun;Kim, Gyeong-Nam;Yeom, Geun-Yeong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.107-107
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    • 2017
  • 전자제품의 성능이 향상됨에 따라서 전자제품에 사용되는 부품의 고집적화가 필연적으로 요구되고 있으며, 고집적화 된 전자제품의 방열(heat dissipation)에 관한 문제점이 대두되고 있다. 방열은 전자기기의 성능과 수명을 유지하는데 있어서 중요한 문제 중 하나로서 방열 효과를 높이기 위해 다양한 연구 개발이 진행 중이다. 방열에 사용되는 소재로는 Cu가 있으며, 저렴한 가격과 상대적으로 높은 방열 효율을 가지는 장점이 있다. Cu는 전기 도금 증착 방법을 사용하여왔으나, 전기도금 방식으로 증착된 Cu 방열판은 제품에 열이 축적될 경우 Cu와 substrate 사이의 residual stress로 인해 박리나 뒤틀림 현상 등이 발생하여 high power를 사용하는 device의 방열 소재로 사용하기에는 개선해야 할 문제점이 있다. 이러한 문제점을 극복하기 위한 방법으로 magnetron sputter 증착 방법이 있으며, magnetron sputter은 대면적화가 용이하고, 다양한 물질의 증착이 가능한 장점으로 인해 hard coating 또는 thin film 증착과 같은 공정에 사용되고 있다. 특히 증착된 film의 특성을 조절하기 위해서 magnetron sputter에 pulse 또는 ICP (inductively coupled plasma) assisted 등을 적용하여 plasma 특성을 조절하는 방법 등에 관한 연구가 보고되고 있다. 본 연구에서는 pulsed magnetron sputtering 방식을 이용하여 증착된 Cu film 특성 변화를 확인하였다. 다양한 pulsing frequency와 pulsing duty ratio 조건에서, Si substrate 위에 증착된 Cu film과의 residual stress 변화를 측정하였다. Pulse duty ratio가 90% 에서 60%로 감소함에 따라서 Cu film의 residual stress가 감소하였고, pulsing frequency가 증가함에 따라 Cu film의 residual stress가 감소하는 것을 확인하였다. 증착 조건에 따른 plasma의 특성 분석을 위하여 oscilloscope를 이용하여 voltage와 current를 측정하였고, Plasma Sampling Mass spectrometer 를 이용하여 ion energy의 변화를 측정하였다. 이를 통해 plasma 특성 변화가 증착된 Cu film에 미치는 영향과 residual stress의 변화에 대한 연관성에 대하여 확인할 수 있었다.

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3.5 mm Coaxial One Port Vector Network Analysis Using Time Domain Reflectometry (반사 펄스의 주파수 해석을 이용한 광대역 3.5 mm 동축형 단일 포트 벡터 회로망 분석법)

  • Lee, Dong-Joon;Kwon, Jae-Yong;So, Joon-Ho;Kang, No-Weon
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.23 no.8
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    • pp.967-975
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    • 2012
  • This paper presents a method to measure reflection coefficients of microwave devices or antennas based on time domain analysis with sampling oscilloscopes. The reflection coefficients were extracted by the Fourier transformation of echo pulses from devices with respect to the 20 GHz incident pulse signals. The three-error terms, which are commonly used for the correction of a microwave network, were determined using a 3.5 mm calibration kit. In addition, a modified error-correction model associated with a directional coupler for reflection coefficient measurements is introduced. The results were compared with those of measured with a commercial vector network analyzer.

Characteristics of Random Jitter in Analog Fiber-Optic Links Employing a Mach-Zehnder Modulator and an EDFA (마하-젠더 광 변조기와 EDFA를 사용한 아날로그 광통신 링크의 랜덤 지터 특성)

  • Yoon, Young-Min;Lee, Min-Young;Shin, Jong-Dug;Kim, Boo-Gyoun
    • Journal of IKEEE
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    • v.13 no.4
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    • pp.96-102
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    • 2009
  • We investigate the characteristics of RJ (random jitter) in an analog fiber-optic link employing a MZM (Mach-Zehnder modulator) and an EDFA (Erbium-doped fiber amplifier). RJ has been measured using two methods, one of which derived from the noise spectrum of a RF spectrum analyzer and the other from the histogram data of a sampling oscilloscope. If the optical power and/or the RF power input to the MZM increase, RJ decreases due to the output signal power increase. For the optical link without EDFA, the minimum RJ is about 1 ps at an RF power of 10 dBm and an optical power of 8 dBm measured using the noise spectrum method. For the optical link with an EDFA, RJ decreases toward a jitter floor as the EDFA gain increases. If the gain increases further, it has been observed that RJ increases from the minimum. If the EDFA gain is fixed, RJ is smaller for the case of larger optical input power. As the EDFA gain increases, RJ reduction rate becomes greater for the case of lower optical input power.

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