• Structural Engineering and Mechanics
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• 제21권2호
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• pp.205-220
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• 2005

This paper presents the possibilities of adapting artificial neural networks (ANNs) to predict the dimensionless parameters related to the maximum contact pressures of an elasticity problem. The plane symmetric double receding contact problem for a rigid stamp and two elastic strips having different elastic constants and heights is considered. The external load is applied to the upper elastic strip by means of a rigid stamp and the lower elastic strip is bonded to a rigid support. The problem is solved under the assumptions that the contact between two elastic strips also between the rigid stamp and the upper elastic strip are frictionless, the effect of gravity force is neglected and only compressive normal tractions can be transmitted through the interfaces. A three layered ANN with backpropagation (BP) algorithm is utilized for prediction of the dimensionless parameters related to the maximum contact pressures. Training and testing patterns are formed by using the theory of elasticity with integral transformation technique. ANN predictions and theoretical solutions are compared and seen that ANN predictions are quite close to the theoretical solutions. It is demonstrated that ANNs is a suitable numerical tool and if properly used, can reduce time consumed.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.1224-1226
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• 2003

In this work, we developed a high resolution printing technique based on transferring a pattern from a PDMS stamp to a Pd and Au substrate by microcontact printing Also, we fabricated various 2D metallic and polymeric nano patterns with the feature resolution of sub-micrometer scale by using the method of microcontact printing (${\mu}$CP) based on soft lithography. Silicon masters for the micro molding were made by e-beam lithography. Composite poly(dimethylsiloxane) (PDMS) molds were composed of a thin, hard layer supported by soft PDMS layer. From this work, it is certificated that composite PDMS mold and undercutting technique play an important role in the generation of a clear SAM nanopattern on Pd and Au substrate.

• 한국멀티미디어학회논문지
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• 제15권7호
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• pp.879-884
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• 2012

본 논문에서는 웨어러블 컴퓨터 시스템을 위한 WUSB over WBAN 프로토콜에서 요구되는 에너지 효율적인 시간동기 알고리즘을 제안한다. 이를 위해 전력 소모를 최소화 하면서 정밀한 시간 동기가 이루어지는 알고리즘을 제안한다. 본 논문에서 제안하는 시간 동기 알고리즘은 웨어러블 컴퓨터의 주변 장치를 구성하는 WUSB over WBAN 프로토콜 기반 센서 노드에서, 계층적인 구조를 구성하고 Time Stamp 패킷을 송수신하는 방식으로 빠르게 실행되어 전력소모를 최소화한다.

• 한국정밀공학회지
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• 제23권7호
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• pp.138-145
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• 2006

A nanopatterning technique was proposed and demonstrated for low cost and mass productive process using the scanning probe lithography (SPL) and soft lithography. The nanometer scale structure is fabricated by the localized generation of oxide patterning on the H-passivated (100) silicon wafer, and soft lithography was performed to replicate of nanometer scale structures. Both height and width of the silicon oxidation is linear with the applied voltagein SPL, but the growth of width is more sensitive than that of height. The structure below 100 nm was fabricated using HF treatment. To overcome the structure height limitation, aqueous KOH orientation-dependent etching was performed on the H-passivated (100) silicon wafer. Soft lithography is also performed for the master replication process. Elastomeric stamp is fabricated by the replica molding technique with ultrasonic vibration. We showed that the elastomeric stamp with the depth of 60 nm and the width of 428 nm was acquired using the original master by SPL process.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권5호
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• pp.267-271
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• 2006

A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

• 한국재료학회지
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• 제19권8호
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• pp.437-442
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• 2009

This paper describes an improved strategy for controlling the adhesion force using both the antiadhesion and adhesion layers for a successful large-area transfer process. An MPTMS (3-mercaptopropyltrimethoxysilane) monolayer as an adhesion layer for Au/Pd thin films was deposited on Si substrates by vapor self assembly monolayer (VSAM) method. Contact angle, surface energy, film thickness, friction force, and roughness were considered for finding the optimized conditions. The sputtered Au/Pd ($\sim$17 nm) layer on the PDMS stamp without the anti-adhesion layer showed poor transfer results due to the high adhesion between sputtered Au/Pd and PDMS. In order to reduce the adhesion between Au/Pd and PDMS, an anti-adhesion monolayer was coated on the PDMS stamp using FOTS (perfluorooctyltrichlorosilane) after $O_2$ plasma treatment. The transfer process with the anti-adhesion layer gave good transfer results over a large area (20 mm $\times$ 20 mm) without pattern loss or distortion. To investigate the applied pressure effect, the PDMS stamp was sandwiched after 90$^{\circ}$ rotation on the MPTMS-coated patterned Si substrate with 1-${\mu}m$ depth. The sputtered Au/Pd was transferred onto the contact area, making square metal patterns on the top of the patterned Si structures. Applying low pressure helped to remove voids and to make conformal contact; however, high pressure yielded irregular transfer results due to PDMS stamp deformation. One of key parameters to success of this transfer process is the controllability of the adhesion force between the stamp and the target substrate. This technique offers high reliability during the transfer process, which suggests a potential building method for future functional structures.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.155-156
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• 2006

UV-NIL is a promising technology for the fabrication of sub-100 nm features. Due to non-uniformity of the residual layer thickness (RLT) and a strong possibility of defects, many UV-NIL processes have been developed and some are commercially available at present, most are based on the 'step-and-repeat' nanoimprint technique, which employs a small-area stamp, much smaller than the substrate. This is mainly because, when a large-area stamp is used, it is difficult to obtain acceptable uniform residual layer thickness and/or to avoid defects such as air entrapment. As an attempt to enable UV_NIL with a large-area stamp for high throughput, we propose a new UV-NIL tool that is able to imprint 4 inch wafer in a low vacuum environment at a single step.

• 한국광학회지
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• 제17권4호
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• pp.317-322
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• 2006

본 논문에서는 폴리머 광도파로 열 격자(arrayed waveguide grating: AWG)를 나노임프린트 방법을 이용하여 제안하고 구현하였다. 빔전파방법을 도입하여 소자를 설계하고 해석하였다. 균일한 접착 및 분리 특성을 갖는 임프린트용 PDMS(polydimethylsiloxane) 스탬프(stamp)를 쿼츠 글래스 물질로 만들어진 마스터 몰드를 이용하여 개발하였다. 이 PDMS 스탬프로 폴리머층을 눌러서 소자 패턴을 형성하고 폴리머를 스핀코팅하여 소자를 완성하였다. 이러한 소자는 식각공정 없이 간단한 스핀코팅과 임프린트 공정만으로 만들어지기 때문에 대량 생산에 적합할 것이다. 제작된 폴리머 AWG 소자의 출력 채널 수는 8개, 채널 간격은 0.8nm, 각 채널의 중심파장은 1543.7nm $\sim$ 1548.3nm 였다. 평균적인 채널 누화와 대역폭은 각각 $\sim$10dB와 0.8nm였다.

• 한국항공운항학회지
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• 제28권2호
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• pp.63-70
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• 2020

Many organizations apply reactive safety management to prevent the same or similar types of accidents by through investigation and analysis of the accident cases. Although research on investigation techniques has contributed a lot to the objective results of safety accidents and the preparation of countermeasures, many accident investigation techniques currently in use treat accidents from a linear perspective, revealing limitations in reflecting current systems dominated by complexity and uncertainty. In order to overcome these limitations, this study will review recent studies and concepts from a system safety perspective and predict future research trends through a case analysis of aviation accident. The models used in the analysis are STAMP, HFACS, and FRAM, and the characteristics of each technique are presented so that analysts who perform related tasks in the field can refer to them.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2000년도 추계학술대회논문집A
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• pp.452-457
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• 2000

The object of this study is to develop a reliable FEM simulation technique for the analysis of can making process using PAM-STAMP software. The processes consist of doming and necking in addition to drawing, redrawing. After body making process, this study analyzed the stability for internal pressure by simulating buckling test. Through these technique, we estimated the dome reversal pressure of steel D&I Can for various can profile and process conditions. From this study, we found the cause and mechanism of wrinkling during necking process. This mechanism is largely affected by can wall thickness and the clearance between knock out punch and necking die. The dome reversal pressure improves with increasing dome depth. These results validate the usefulness of the developed simulation technique for the analysis of body making process and optimization of the dome profile.