• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05a
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• pp.173-176
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• 2004

In this study we investigated post ELA(Excimer Laser Annealing) effect on SMC (Silicide Mediated Crystalization) poly-Si (Polycrystalline Silicon) to improve the characteristics of poly-Si. Combining SMC and XeCl ELA were used to crystallize the a-Si (amorphous Silicon) at various ELA energy density for LTPS (Low Temperature Polycrystalline Silicon). We fabricated the conventional SMC poly-Si with no SPC (Solid Phase Crystallization) phase using UV heating method[1] and irradiated excimer laser on SMC poly-Si, so called SMC-ELA poly-Si. After using post ELA we can get better surface morphology than conventional ELA poly-Si and enhance characteristics of SMC poly-Si. We also observed the threshold energy density regime in SMC-ELA poly-Si like conventional ELA poly-Si.

• Journal of the Korean Vacuum Society
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• v.10 no.1
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• pp.72-80
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• 2001

In this paper, we present a systematic method of extracting the input parameters of poly-Si TFT(Thin-Film Transistor) for Spice simulations. This method has been applied to two different types of poly-Si TFTs such as ELA (Excimer Laser Annealing) and SMC (Silicide Mediated Crystallization) with good fitting results to experimental data. Among the Spice circuit simulators, the PSpice has the GUI(graphic user interface) feature making the composition of complicated circuits easier. We added successfully the poly-Si TFT model of AIM-Spice to the PSpice simulator, and analyzed easily to compare the electrical characteristics of pixels without or with the line RC delay. In the comparative results, the ELA poly-Si TFT is superior to the SMC poly-Si TFT in the charging time and the kickback voltage for the TFT-LCD (Thin Film Transistor-Liquid Crystal Display).

• Proceedings of the IEEK Conference
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• 2001.06b
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• pp.225-228
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• 2001

We simulated and analyzed the flicker phenomena in the poly-Si TFT-LCD using PSpice for the development of wide-area and high-quality LCD display We define the electric quantity of flicker in the TFT-LCD, which is the ratio of half frame frequency (30Hz) to DC (0 Hz) frequency. We compared two different types of TFTs, excimer laser annealed (ELA) poly-Si TFT and silicide mediated crystallization (SMC) poly-Si TFT, and found that the ELA and SMC TFTs show different flicker characteristics because of their mobility and leakage current. In addition, we showed that the gate voltage should be chosen carefully at the minimum flicker because of the larger leakage current of poly-Si Tn as compared with a-Si TFT

• 한국전자현미경학회:학술대회논문집
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• 2003.05a
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• pp.78-79
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• 2003

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.40 no.1
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• pp.20-28
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• 2003

In this paper, we present results of the comparative analysis of the flicker phenomena in the poly-Si TFT-LCD and a-Si:H TFT-LCD arrays for the development and manufacturing of wide-area and high-quality TFT-LCD displays. We used four different types of TFTs; a-Si:H TFT, excimer laser annealed (ELA) poly-Si TFT, silicide mediated crystallization (SMC) poly-Si TFT, and counter-doped lateral body terminal (LBT), poly-Si TFT. We defined the electrical quantity of the flicker so that we could compare the flickers quantitatively for four different 40" UXGA TFT-LCDs. We identify three factors contributing to the flicker, such as charging time, kickback voltage and leakage current, and analyze how much each of three factors give rise to the flincker in the different TFT-LCD arrays. In addition, we suggest and show that, in the case of the poly-Si TFT-LCD arrays, the low-level (minimum) gate voltages should be carefully chosen to minimize the flicker because of their larger leakage currents compared with a-Si TFT-LCD arrays.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.129-129
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• 2003

최근에 능동 영역 액정 표시 소자(Active Matrix Liquid Crystal Display, AMLCD)에서 고해상도와 빠른 응답속도를 요구하게 되면서부터 다결정 실리콘(poly-Si) 박막 트랜지스터(Thin Film Transistor, TFT)가 쓰이게 되었다. 그리고 일반적으로 디스플레이의 기판을 상대적으로 저가의 유리를 사용하기 때문에 저온 공정이 필수적이다. 따라서 새로운 저온 결정화 방법과 부가적으로 최근 디스플레이 개발 동향 중 하나인 대화면에 적용 가능한 공정인 금속유도 결정화 (Silicide Mediated Crystallization, SMC)가 연구되고 있다. 이 소자는 top-gated coplanar구조로 설계되었다. (그림 1)(100) 실리콘 웨이퍼위에 3000$\AA$의 열산화막을 올리고, LPCVD로 55$0^{\circ}C$에서 비정질 실리콘(a-Si:H) 박막을 550$\AA$ 증착 시켰다. 그리고 시편은 SMC 방법으로 결정화 시켜 TEM(Transmission Electron Microscopy)으로 SMC 다결정 실리콘을 분석하였다. 그 위에 TFT의 게이트 산화막을 열산화막 만큼 우수한 TEOS(Tetraethoxysilane)소스로 사용하여 실리콘 산화막을 1000$\AA$ 형성하였고 게이트는 3000$\AA$ 두께로 몰리브덴을 스퍼터링을 통하여 형성하였다. 이 다결정 실리콘은 3$\times$10^15 cm^-2의 보론(B)을 도핑시켰다. 채널, 소스, 드래인을 정의하기 위해 플라즈마 식각이 이루어 졌으며, 실리콘 산화막과 실리콘 질화막으로 passivation하고, 알루미늄으로 전극을 형성하였다 그리고 마지막에 TFT의 출력특성과 전이특성을 측정함으로써 threshold voltage, the subthreshold slope 와 the field effect mobility를 계산하였다.