• Journal of Satellite, Information and Communications
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• v.10 no.4
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• pp.6-11
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• 2015

The ESD(electrostatic discharge) protection performance of PPS(PMOS pass structure) embedded N-type silicon controlled rectifier(NSCR_PPS) device with different GPNS(Gate to Primary $N^+$ Diffusion Space) structure was discussed for high voltage I/O applications. A conventional NSCR_PPS standard device with FPW(Full P-Well) structure and non-CPS(Counter Pocket Source) implant shows typical SCR-like characteristics with low on-resistance(Ron), low snapback holding voltage(Vh) and low thermal breakdown voltage(Vtb), which may cause latch-up problem during normal operation. However, our proposed NSCR_PPS devices with modified PPW(Partial P-Well) structure and optimal CPS implant demonstrate the improved ESD protection performance as a function of GPNS variation. GPNS was a important parameter, which is satisfied design window of ESD protection device.

• Journal of IKEEE
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• v.20 no.4
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• pp.361-366
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• 2016

This paper presents the ESD protection circuit with improved electrical characteristic and area efficiency. The proposed ESD protection circuit has higher holding voltage and lower trigger voltage characteristics than the 3-Stacking LVTSCR. In addition, it has only two stages and has improved Ron characteristics due to short discharge path of ESD current. We analyzed the electrical characteristics of the proposed ESD protection circuit by TCAD simulator. The proposed ESD protection circuit has a small area of about 35% compared with 3-Stacking LVTSCR, The proposed circuit is designed to have improved latch-up immunity by setting the effective base length of two NPN parasitic bipolar transistors as a variable.