• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.549-552
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• 2002

$(SrBi_2Nb_2O_9)_{0.5}-(Bi_3TiNbO_9)_{0.5}$ ceramics were fabricated by the mixed-oxide method, and the structural and electrical properties with variation of ball-milling time were investigated. All SBN-BTN specimens showed the typical polycrystalline X-ray diffraction patterns without the presence of the second phase. The SBN-BTN specimen sintered at $1200^{\circ}C$ and ball-milled for 168h showed the average grain size of $16{\mu}m$. The dielectric constant and dielectric loss of the SBN-BTN specimen sintered at $1150^{\circ}C$ and ball-mill for 72h were 225, 0.4% at 1KHz, respectively.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.20 no.2
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• pp.65-68
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• 2010

$Sr_{0.6}Ba_{0.4}Nb_2O_6$ (60SBN) and $Sr_{0.75}Ba_{0.35}Nb_2O_6$ (75SBN) single crystals were grown by Czochralski method. Growing direction was <001>, and as-grown crystals has well-developed (001) plane. Temperature- and frequency dependence of dielectric constant represent relaxor ferroelectrics. 60SBN has wider optical transmittance than 75SBN.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.213-214
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• 2008

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/SiO2/Si) using RF sputtering method at various substrate temperature. The optimum conditions of RF power and Ar/O2 ratio were 60[W] and 70/30, respectively. The crystallinity of SBN thin films were increased with increase of substrate temperature in the temperature range of 100~400[$^{\circ}C$]. The capacitance of SBN thin films were increased with the increase of substrate temperature.

• Journal of the Korean Ceramic Society
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• v.40 no.7
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• pp.615-619
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• 2003

Temperature and frequency dependence of dielectric and electrical properties was investigated in cerium and manganese doped Sr$\_$0.6/Ba$\_$0.4/Nb$_2$O$\_$6/(60SBN) ceramic system. Structural deformation of 60SBN by dopants did not appeared. 1350$^{\circ}C$-10 h sintered specimen had higher densification than 1250$^{\circ}C$-10 h sintered one, to which dielectric properties are related. That the feature of dielectric maxima peaks was typical Diffusive Phase Transition (DPT), it was explained by "random-field Ising model". Even though 60SBN has large dielectric loss at high frequency above 100 ㎑, it is desirable for optical applications because of low dielectric loss at low frequency. From Arrhenius plot of temperature, the activation energy was calculated to 0.45-0.49 eV.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.05a
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• pp.133-135
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• 2006

SBN60 and SBN60/30 thin films were deposited by ion beam sputtering technique. Using the ceramic target of the same composition and Pt(100)/$TiO_2$/$SiO_2$/Si or Pt(111)/Ti/$SiO_2$/Si substrate, crystallization and orientation behavior as well as electric properties of the films were examined, Thickness was controlled to $3000{\AA}$ and the films were heat-treated at $650^{\circ}C{\sim}800^{\circ}C$. The orientation and crystallization behavior were observed which showed the dependence on processing condition($O_2$/Ar ratio, substrate temp, annealing temp...).

• Journal of the Korean Ceramic Society
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• v.43 no.3 s.286
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• pp.173-176
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• 2006

${Sr_{1-x}Ba_xNb_2O_6$(SBN) have been obtained in Pt crucible by melting and cooling in air atmosphere. Some SBNs being at the bottom of the crucible are black and transparent, and the other SBNs colorless. The black SBN became to be colorless by oxidation heat treatment $1,300^{\circ}C$ for 4 h, Curie temperature is changed by colorless change of black SBN. The reason seems to be $Nb^{5+}$ oxidation of some $Nb^{4+}$ ions in SBN or effect of unknown impurities. Diffused Phase Transition (DPT) was appeared during heating and cooling process. Various sintered SBN ceramics specimen showed relaxor characteristics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.186-187
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• 2009

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various deposition conditions. Thickness of SBN thin films was about 250[nm] in 70/30 of $Ar/O_2$ ratio. The thickness and deposition rate of SBN thin films were increased with increase of RF power. The capacitance of SBN thin films were increased with the increase of deposition temperature.

• Korean Journal of Optics and Photonics
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• v.8 no.4
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• pp.315-319
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• 1997

In photorefractive crystals, light deflection is achieved by dynamic photorefractive volume grating, which is induced by the interference of two writing beams. In this paper, we implemented and analyzed the light deflector using Ce-SBN:60 crystals, which is doped with CeO$_2$ and photorefractive effect is induced by low intensity. And we measured maximum coupling coefficient, effective charge density, diffraction efficiency as the intensity ratio and response time.

• Journal of the Semiconductor & Display Technology
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• v.8 no.2
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• pp.11-14
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• 2009

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various $Ar/O_2$ ratio. We investigated the effect of deposition condition(specially $Ar/O_2$ ratio) on the structural properties of SBN thin film. As $Ar/O_2$ ratio was increased, the peaks in the XRD pattern became more sharp. Also, the peaks(008)(115)(220) in 80/20 of $Ar/O_2$ ratio were suddenly appeared. The optimum of the rougness showed about 4.33 nm in 70/30 of $Ar/O_2$ ratio. The crystallinity of SBN thin films were increased with the increase of $Ar/O_2$ ratio. Also, Deposition rate of SBN thin films was about 4.17 nm/min in 70/30 of $Ar/O_2$ ratio. The capacitance of SBN thin films were increased with the increase of $Ar/O_2$ ratio.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.173-174
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• 2009

The SBN thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2/Si$) using RF sputtering method at various deposition conditions. The optimum conditions of RF power and $Ar/O_2$ ratio were 60[W] and 70/30, respectively. Also, The surface rougness showed about 4.33[nm] in RF power 60[W] and $Ar/O_2$ ratio 70/30.