Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지

Properties of $Sr_{0.7}Bi_{2.3}Nb_2O_9$ Thin film by RF Sputtering Method

RF 스퍼터링법에 의한 $Sr_{0.7}Bi_{2.3}Nb_2O_9$ 박막의 특성

  • Published : 2009.06.18
Download PDF
⟨ Previous Next ⟩

Abstract

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various deposition conditions. Thickness of SBN thin films was about 250[nm] in 70/30 of $Ar/O_2$ ratio. The thickness and deposition rate of SBN thin films were increased with increase of RF power. The capacitance of SBN thin films were increased with the increase of deposition temperature.

Keywords