• Electronic Materials Letters
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• v.14 no.6
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• pp.725-732
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• 2018

The thermoelectric and transport properties of Ti-doped FeVSb half-Heusler alloys were studied in this study. $FeV_{1-x}Ti_xSb$ (0.1 < x < 0.5) half-Heusler alloys were synthesized by mechanical alloying process and subsequent vacuum hot pressing. After vacuum hot pressing, a near singe phase with a small fraction of second phase was obtained in this experiment. Investigation of microstructure revealed that both grain and particle sizes were decreased on doping which would influence on thermal conductivity. No foreign elements pick up from the vial was seen during milling process. Thermoelectric properties were investigated as a function of temperature and doping level. The absolute value of Seebeck coefficient showed transition from negative to positive with increasing doping concentrations ($x{\geq}0.3$). Electrical conductivity, Seebeck coefficient and power factor increased with the increasing amount of Ti contents. The lattice thermal conductivity decreased considerably, possibly due to the mass disorder and grain boundary scattering. All of these turned out to increase in power factor significantly. As a result, the thermoelectric figure of merit increased comprehensively with Ti doping for this experiment, resulting in maximum thermoelectric figure of merit for $FeV_{0.7}Ti_{0.3}Sb$ at 658 K.

• Progress in Superconductivity
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• v.4 no.1
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• pp.10-13
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• 2002

We report the effect of Ca doping in $YBa_2Cu_3O_{7-\delta}$ (YBCO) thin films grown on the Rolling- Assisted, Biaxially Textured Substrates (RABiTS) with the architecture of $CeO_2/YSZ/CeO_2/Ni$. Critical currents of bilayer and trilayer structures of $YBCO/Y_{0.7}Ca_{0.3}Ba_2Cu_3O_{7-\delta}$/(YCaBCO) as well as undoped YBCO for comparison have been measured in a wide range of temperatures and fields. For $6-8^{\circ}$ grain boundaries, 30% Ca-doping in bilayer structure enhances $J_c$ as high as 35%. The enhancement is larger at low temperatures and at magnetic fields. On the other hand, 30% Ca-doping in trilayer structure reduces $J_c$ as high as 60%. Combined with slightly lower $T_c$, this indicates that Ca is overdoped in this structure and degrades GBs.

• Corrosion Science and Technology
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• v.22 no.6
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• pp.408-418
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• 2023

In this study, we synthesized and characterized garnet-type Li_7-xAl_xLa₃Zr_2-(5/4)yNbyO₁₂ (LALZN) solid electrolytes for all-solid-state battery applications. Our novel approach focused on enhancing ionic conductivity, which is crucial for battery efficiency. A systematic examination found that co-doping with Al and Nb significantly improved this conductivity. Al³⁺ and Nb⁵⁺ ions were incorporated at Li⁺ and Zr⁴⁺ sites, respectively. This doping resulted in LALZN electrolytes with optimized properties, most notably enhanced ionic conductivity. An optimized mixture with 0.25 mol each of Al and Nb dopants achieved a peak conductivity of 1.32 × 10^-4 S cm^-1. We fabricated symmetric cells using these electrolytes and observed excellent charge-discharge profiles and remarkable cycling longevity, demonstrating the potential for long-term application in battery systems. The garnet-type LALZN solid electrolytes, with their high ionic conductivity and stability, show great potential for enhancing the performance of all-solid-state batteries. This study not only advances the understanding of effective doping strategies but also underscores the practical applicability of the LALZN system in modern energy storage solutions.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.18 no.5
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• pp.1143-1148
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• 2014

This paper has analyzed the change of subthreshold swing for doping distribution function of asymmetric double gate(DG) MOSFET. The basic factors to determine the characteristics of DGMOSFET are dimensions of channel, i.e. channel length and channel thickness, and doping distribution function. The doping distributions are determined by ion implantation used for channel doping, and follow Gaussian distribution function. Gaussian function has been used as carrier distribution in solving the Poisson's equation. Since the Gaussian function is exactly not symmetric for top and bottome gates, the subthreshold swings are greatly changed for channel length and thickness, and the voltages of top and bottom gates for asymmetric double gate MOSFET. The deviation of subthreshold swings has been investigated for parameters of Gaussian distribution function such as projected range and standard projected deviation in this paper. As a result, we know the subthreshold swing is greatly changed for doping profiles and bias voltage.

• Journal of Digital Convergence
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• v.14 no.8
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• pp.527-536
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• 2016

The purpose of this study is to identify the factors influencing the attitudes and dispositions of doping in elite golf players. 136 elite golfers (75 male, 61 female) were participated in this study and responded to Performance Enhancement Attitude Scale, Perfectionism in Sport Scale and Perceived Motivational Climate in Sport Questionnaire-2. Data that were collected analyzed by hierarchical multi regression. In male golfers, unequal recognition (UR) of coach had a positive effect on the attitudes and dispositions of doping, and rivalry (R) had a negative effect on that. In female golfers, Coach's criticism (CC) had a positive effect on the attitudes and dispositions of doping. The effective anti-doping program which reflects the results of this study should be developed and implemented for elite golf players who need the anti-doping education.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2014.05a
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• pp.748-751
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• 2014

This paper has analyzed threshold voltage movement for channel doping concentration of asymmetric double gate(DG) MOSFET. The asymmetric DGMOSFET is generally fabricated with low doping channel and fully depleted under operation. Since impurity scattering is lessened, asymmetric DGMOSFET has the adventage that high speed operation is possible. The threshold voltage movement, one of short channel effects necessarily occurred in fine devices, is investigated for the change of channel doping concentration in asymmetric DGMOSFET. The analytical potential distribution of series form is derived from Possion's equation to obtain threshold voltage. The movement of threshold voltage is investigated for channel doping concentration with parameters of channel length, channel thickness, oxide thickness, and doping profiles. As a result, threshold voltage increases with increase of doping concentration, and that decreases with decrease of channel length. Threshold voltage increases with decrease of channel thickness and bottom gate voltage. Lastly threshold voltage increases with decrease of oxide thickness.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.318-321
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• 2002

This paper presents a proper condition to achieve high conversion efficiency using PC1D simulator on sri-crystalline Si solar cells. Various efficiency influencing parameters such as rear surface recombination velocity and minority carrier diffusion length in the base region, front surface recombination velocity, junction depth and doping concentration in the Emitter layer, BSF thickness and doping concentration were investigated. Optimized cell parameters were given as rear surface recombination of 1000 cm/s, minority carrier diffusion length in the base region 200 $\mu\textrm{m}$, front surface recombination velocity 100 cm/s, sheet resistivity of emitter layer 100 Ω/$\square$, BSF thickness 5 $\mu\textrm{m}$, doping concentration 5${\times}$10$\^$19/ cm$\^$-3/. Among the investigated variables, we learn that a diffusion length of base layer acts as a key factor to achieve conversion efficiency higher than 19 %.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.254-254
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• 2011

현재 AMLCD(Active Matrix Liquid Crystal Display)는 노트북, 컴퓨터, TV등 여러 영상매체에 있어 가장 많이 활용되고 있는 디스플레이로 손꼽힌다. AMLCD에 구동소자로 사용되는 a-Si:H TFT는 낮은 제조비용과 축적된 기술을 바탕으로 가장 많이 쓰이고 있다. 특히 a-Si이 가지는 소형화나 대형화의 편의성은 모바일 기기, projection TV, 광고용 패널 등 적용분야가 점점 넓어지고 있는 추세이다. 하지만 a-Si라는 물질 자체가 가지는 낮은 이동도는 더 많은 application을 위해 해결되어야 할 과제이다. 낮은 이동도는 a-Si 실리콘 원자간 결합의 불규칙성 및 무질서와 dangling bond에 의한 localize state(deep trap, band tail)의 존재 때문에 발생하며 결과적으로 TFT 소자의 특성의 저하를 가져온다. 앞선 연구에서는 carrier이동도의 개선을 위해서 첫 번째로 insulator층과 active층 사이의 계면 상태를 향상시키기 위해 insulator로 쓰이는 a-SiN층 표면에 0~18 sccm의 유량으로 phosphorus를 주입하였다. AFM분석을 해본 결과 phosphorus를 주입함으로써 계면의 roughness가 줄어드는 것을 확인 할 수 있었다. 이러한 계면의 roughness 감소는 표면 산란(surface scattering)및 전자 포획(trap)의 영향을 줄임으로써 이동도의 향상을 가져왔다. 두 번째로 active층으로 쓰이는 a-Si:H 층의 표면에 phosphorus를 0?9sccm의 유량으로 doping하였다. 이로 인해 channel이 형성되는 active 영역에 직접적으로 불순물을 doping됨으로써 전도도를 증가되어 이동도를 향상시켰다. 하지만 지나친 doping은 불순물 산란(impurity scattering)의 증가로 인해 이동도를 저하시키는 결과를 보여 주었다. 본 연구에서는 TFT의 이동도 향상을 위해 두 가지의 technology를 함께 적용시켜 a-SiN/a-Si:H 계면 각각에 phosphorus를 주입 및 doping을 하였다. 모든 박막은 PECVD로 제작하였으며 각 박막의 두께는 a-SiN/a-SiN(phosphorus)/a-Si:H(doped)/a-Si:H/n+ a-Si($2350{\AA}/150{\AA}/150{\AA}/1850{\AA}/150{\AA}$)으로 고정하고 유량을 변화시키면서 특성을 관찰하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.171-174
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• 2002

When boron ions are doped into the poly-Si films, the hydrogen ions doped with boron ions compensate the defect sites and suppress to produce damage density. These samples can be easily activated by hydrogen doping at high acceleration voltage($V_{acc}$).

• Proceeding of EDISON Challenge
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• 2017.03a
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• pp.417-423
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• 2017

Monolayer $MoS_2$의 metastable phase인 T' phase가 stable한 H phase보다 안정해지는 조건을 모색하기 위해 substitutional doping을 했을 때와 strain을 걸어주었을 때의 에너지 차이를 DFT 방법으로 계산하였다. Doping을 했을 때와 strain이 있을 때 T' phase와 H phase의 에너지 차이가 감소함을 확인하였으나 H phase보다 T' phase가 안정해지는 조건을 찾지는 못하였다. 하지만 이 방법을 기존의 alkali adsorption 방법과 병행하여 기존 방법의 단점을 보완할 수 있을 것을 기대해 볼 수 있다. 또한 전자구조 분석 중 얻은 dopant의 주기와 족에 따른 경향성은 다른 TMD 물질의 phase engineering을 design할 때 universal한 design rule로서 응용할 수 있음을 기대해 볼 수 있다.