• Title/Summary/Keyword: S/E Process

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A SCORM-based e-Learning Process Control Model and Its Modeling System

  • Kim, Hyun-Ah;Lee, Eun-Jung;Chun, Jun-Chul;Kim, Kwang-Hoon Pio
    • KSII Transactions on Internet and Information Systems (TIIS)
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    • v.5 no.11
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    • pp.2121-2142
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    • 2011
  • In this paper, we propose an e-Learning process control model that aims to graphically describe and automatically generate the manifest of sequencing prerequisites in packaging SCORM's content aggregation models. In specifying the e-Learning activity sequencing, SCORM provides the concept of sequencing prerequisites to be manifested on each e-Learning activity of the corresponding tree-structured content organization model. However, the course developer is required to completely understand the SCORM's complicated sequencing prerequisites and other extensions. So, it is necessary to achieve an efficient way of packaging for the e-Learning content organization models. The e-Learning process control model proposed in this paper ought to be an impeccable solution for this problem. Consequently, this paper aims to realize a new concept of process-driven e-Learning content aggregating approach supporting the e-Learning process control model and to implement its e-Learning process modeling system graphically describing and automatically generating the SCORM's sequencing prerequisites. Eventually, the proposed model becomes a theoretical basis for implementing a SCORM-based e-Learning process management system satisfying the SCORM's sequencing prerequisite specifications. We strongly believe that the e-Learning process control model and its modeling system achieve convenient packaging in SCORM's content organization models and in implementing an e-Learning management system as well.

THE E-EULER PROCESS FOR NONAUTONOMOUS SYSTEMS

  • Yu, Dong-Won
    • Journal of the Korean Society for Industrial and Applied Mathematics
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    • v.8 no.2
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    • pp.87-93
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    • 2004
  • The E-Euler process has been proposed for autonomous dynamical systems in [7]. In this paper, the E-Euler process is extended to nonautonomous dynamical systems. When a discrete function is bounded or gradually decreases to ${\epsilon}\;<<\;1$ as $n\;{\rightarrow}\;{\infty}$, it is shown that the relative error converges to a constant or decreases.

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A Strategic Alliance for e-Commerce Companies: Guidelines of Alliance Process (전자상거래 기업의 전략적 제휴에 관한 연구: 제휴과정의 가이드라인)

  • 권순범;김서형
    • The Journal of Society for e-Business Studies
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    • v.7 no.1
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    • pp.1-17
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    • 2002
  • Business environment for e-commerce companies have been rapidly changed for the last several yens and they have found out that strategic alliance as one of the important and practical means to cope with the dynamic environment. Despite the increasing number of e-commerce company's strategic alliances during last several years, there have been few studies made on strategic alliance which reflect the e-commerce company's uniqueness: dynamism, time to market, If-based business, etc. In order to reflect this uniqueness, we attempt to derive guidelines of alliance process for e-commerce companies in three aspects: 1) resource system analysis, 2) value chain analysis, and 3) If-based strategic alliance implementation and management. Finally, we propose the integrated process of strategic alliance for e-commerce companies including those proposed guidelines.

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An e-Business Strategy for Small and Medium-sized Enterprises and Case Studies (중소기업 정보화 추진 전략과 적용 사례)

  • 김은홍;서정우;안성만;장성봉
    • Proceedings of the Korean Operations and Management Science Society Conference
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    • 2003.11a
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    • pp.219-222
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    • 2003
  • This paper is to propose e-business strategies for individual SME's(small and medium-sized enterprises). e-business maturity model is used to assess e-business maturity level of a target SME, and then corresponding e-business strategy is proposed based on the current maturity level. We studied two SME's to show how it works. Most SME's are small and do not have enough resources to invest on information systems. As it turns out, e-business strategies of SME should heavily depend on its relationship with customers and suppliers. One of the studied SME's is found to be in higher maturity level, because its manufacturing system is tightly related to its customer. One of major implications of this study is that e-business level of SME's should be upgraded considering how it is doing business with its customers and suppliers.

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Extreme values of a gaussian process

  • Choi, Y.K.;Hwang, K.S.;Kang, S.B.
    • Journal of the Korean Mathematical Society
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    • v.32 no.4
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    • pp.739-751
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    • 1995
  • Let ${X(t) : 0 \leq t < \infty}$ be an almost surely continuous Gaussian process with X(0) = 0, E{X(t)} = 0 and stationary increments $E{X(t) - X(s)}^2 = \sigma^2($\mid$t - s$\mid$)$, where $\sigma(y)$ is a function of $y \geq 0(e.g., if {X(t);0 \leq t < \infty}$ is a standard Wiener process, then $\sigma(t) = \sqrt{t})$. Assume that $\sigma(t), t > 0$, is a nondecreasing continuous, regularly varying function at infinity with exponent $\gamma$ for some $0 < \gamma < 1$.

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A study on MOS Characteristics of 2'nd Silicidation Process (2단계 실리사이드 형성방법에 의한 MOS 공정특성 연구)

  • Eom, Gum-Yong;Han, Gi-Kwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.195-196
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    • 2005
  • In recent years, as the needs of MOS's a high quality is desired to get the superior electrical characteristics and reliability on MOSFET. As an alternative gate dielectric have drawn considerable alternation due to their superior performance and reliability properties over MOSFET, 2'nd silicidation formation process has been proposed as a dielectric growth/annealing process. In this study the author observed process characteristics on MOS structure. In view points of the process characteristics of MOS capacitor, the oxygen & polysilicon was analyzed by SIMS analysis on l'st & 2'nd Ti process, the oxygen and Si2 contents[Count/sec] of 1.5e3 & 3.75e4 on l'st process and l.1e3 & 2.94e4 on 2'nd process, the Ti contents' of 8.2e18 & 6.5e18 on 1'st and 2'nd process. The sheet resistance[$\Omega/sq.$] was 4.5 & 4.0, the film stress[dyne/cm 2] of 1.09e10 & 1.075e10 on l'st and 2'nd process. I could achieved the superior MOS characteristics by 2'nd silicidation process.

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