• 마이크로전자및패키징학회지
• /
• 제1권1호
• /
• pp.41-50
• /
• 1994

RuO2 분말의 비표면적이 후막저항체의 전기적 특성에 미치는 영향을 규명하기 위하 여 비표면적이 서로다른 RuO2 분말을 이용하여 RuO2 함량을 다양하게 후막저항을 형성하 고 그들의 전기적 특성을 저항체 막의 미세조직과 관련하여 고찰하였다. 그 결과 후막저항 체의 전기적 특성은 소성과정에서 RuO2 의 비표면적과 함량에 따라 도전통로를 통하여 발 달하여 소결접촉과 비소결접촉의 수와 그 비에 크게 의존함을 확인하였다.

• 한국전기전자재료학회논문지
• /
• 제15권12호
• /
• pp.1016-1020
• /
• 2002

Ru thin films were etched using CF/$_4$O$_2$ plasma in an ICP (inductively coupled plasma etching) system. The maximum etch rate of Ru thin films was 168 nm/min at a CF$_4$/O$_2$ gas mixing ratio of 10 %. The selectivity of SiO$_2$ over Ru was 1.3. From the OES (optical emission spectroscopy) analysis, the optical emission intensity of the O radical had a maximum value at 10% CF$_4$ gas concentration and drcrease with further addition of CF4 gas, but etch slope was enhanced. From XPS (x-ray photoelectron spectroscopy) analysis, the surface of the etched Ru thin film in CF$_4$/O$_2$ chemistry shows Ru-F bonds by the chemical reaction of Ru and F. RuF$_{x}$ compounds were suggested as a surface passivation layer that reduces the chemical reactions between Ru and O radicals. From a FE-SEM (field emission scanning electron microscope) micrograph, we had an almost perpendicular taper angle of 89$^{\circ}$.>.

• 분석과학
• /
• 제26권1호
• /
• pp.42-50
• /
• 2013

이 논문은 센서 및 연료전지에 사용할 수 있는 $Pt-Ru@TiO_2-H$ 나노구조체촉매의 제조 및 전기화학적 촉매의 특성에 대한 것이다. 이 $Pt-Ru@TiO_2-H$ 나노구조체촉매는 주형제인 폴리스틸렌볼(PSB)을 제조하고, 이 주형제의 표면에 졸-겔 반응을 통해 $TiO_2$를 코팅한 후, $Pt^{4+}$와 $Ru^{3+}$의 환원에 의해 제조하였다. 제조된, $Pt-Ru@TiO_2-H$ 나노구조체촉매는 전자투과현미경(TEM), X-선 회절(XRD)와 원소분석에 의해 특성평가 하였고, $Pt-Ru@TiO_2-H$의 전기화학적 촉매특성은 에탄올, 메탄올, 도파민, 아스크로브 산, 프로말린과 글루코오즈의 산화-환원 능력에 의해 평가 하였다. 이 $Pt-Ru@TiO_2-H$ 나노구조체촉매는 바이오분자에 대해 전기화학적촉매 특성을 나타내어, 연료전지 전극 또는 비효소바이오센서에 사용 될 것으로 기대된다.

• 한국재료학회지
• /
• 제21권8호
• /
• pp.419-424
• /
• 2011

Pt nanoparticle catalysts incorporated on $RuO_2$ nanowire support were successfully synthesized and their electrochemical properties, such as methanol electro-oxidation and electrochemically active surface (EAS) area, were demonstrated for direct methanol fuel cells (DMFCs). After fabricating $RuO_2$ nanowire support via an electrospinning method, two different types of incorporated Pt nanoparticle electrocatalysts were prepared using a precipitation method via the reaction with $NaBH_4$ as a reducing agent. One electrocatalyst was 20 wt% Pt/$RuO_2$, and the other was 40 wt% Pt/$RuO_2$. The structural and electrochemical properties of the Pt nanoparticle electrocatalysts incorporated on electrospun $RuO_2$ nanowire support were investigated using a bright field transmission electron microscopy (bright field TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and cyclic voltammetry. The bright field TEM, XRD, and XPS results indicate that Pt nanoparticle electrocatalysts with sizes of approximately 2-4 nm were well incorporated on the electrospun $RuO_2$ nanowire support with a diameter of approximately 50 nm. The cyclic voltammetry results showed that the Pt nanoparticle catalysts incorporated on the electrospun $RuO_2$ nanowire support give superior catalytic activity in the methanol electro-oxidation and a higher electrochemically active surface (EAS) area when compared with the electrospun Pt nanowire electrocatalysts without the $RuO_2$ nanowire support. Therefore, the Pt nanoparticle catalysts incorporated on the electrospun $RuO_2$ nanowire support could be a promising electrode for direct methanol fuel cells (DMFCs).

• 공업화학
• /
• 제31권1호
• /
• pp.108-114
• /
• 2020

본 연구에서는, Ru[1]/TiO₂ 촉매 제조 시 소성/환원 조건에 따른 NH₃-SCO (selective catalytic oxidation) 효율을 비교하였다. Ru[1]/TiO₂ red는 Ru[1]/TiO₂ cal에 비하여 NH₃ 전환율 및 NH₃의 N₂ 전환율이 우수하였다. Ru[1]/TiO₂ 촉매의 물리·화학적 특성은 BET, XRD, TEM, XPS, H₂-TPR 분석에 의해 확인되었으며, 활성금속의 분산도와 표면 흡착 산소종(O_β)의 비율에 영향을 미치는 것으로 나타났다.

• The Korean Journal of Ceramics
• /
• 제2권1호
• /
• pp.43-47
• /
• 1996

$RuO_2$ thin films deposited directly on Si substrate by RF magnetron sputtering method using $RuO_2$ target have been investigated. Special interest was focused on the effect of process parameter on the surface roughness of $RuO_2$ films. Crystallization behavior and electrical properties of the films deposited at $300^{\circ}C$ were superior to those deposited at room temperature. Metallic Ru phase was formed in pure Ar and this phase had resulted poor adhesion after post annealing process in oxidizing ambient. Microstructural analysis reveals that the size of the $RuO_2$ crystallites gets smaller and the surface becomes smoother as the $O_2$ partial pressure or film thickness decreases. Irrespective of the $O_2/Ar$ ratio, resistivity of $RuO_2$ films ranged in $50~70 {\mu}{\Omega}-cm$. As the film thickness decreases, there is a thickness where the resistivity rises abruptly. Such an onset thickness turned out to be dependent n the $O_2$/Ar ratio.

• 한국세라믹학회지
• /
• 제34권10호
• /
• pp.1021-1026
• /
• 1997

RuO2 thin film has reasonably good conductivity and stiffness and it is thought to substitute for the cantilever beam made up of Pt and Si3N4 double layers in microactuators. Therefore, anisotopic Si etching was performed using RuO2 thin film as a mask layer in 25 wt. % TMAH water solution. In the etching temperature ranging from 6$0^{\circ}C$ to 75$^{\circ}C$, the etch rates of all the crystallographic directions increased linearly as the etching temperature increased. The etch rate ratio(selectivity) of [111]/[100] which varied from 0.08 to 0.14, was not sensitive to temperature. The activation energies for [110] direction, [100] direction and [111] direction were 0.50, 0.66 and 1.04eV, respectively. RuO2 cantilever beam with a clean surface was formed at the etching temperatures of 6$0^{\circ}C$ and $65^{\circ}C$. But the damages due to formation of pin holes on RuO2 surface were observed beyond 7$0^{\circ}C$. The tensile stress of RuO2 thin films caused the cantilever bending upward. As a result, it was demonstrated that the formation of conducting oxide RuO2 cantilever beam which can replace the role of an electrode and supporting layer could be possible by TMAH solution.

• Corrosion Science and Technology
• /
• 제2권5호
• /
• pp.238-242
• /
• 2003

The characteristics of Ru etching using $O_2/Cl_2$ plasmas were investigated by employing inductively coupled plasma (ICP) etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with the gas flow ratio, bias power, total gas flow rate, and source power were scrutinized. A high etching slope (${\sim}86^{\circ}$) and a smooth surface after etching was attained using $O_2/Cl_2$ inductively coupled plasma.

• Nuclear Engineering and Technology
• /
• 제16권2호
• /
• pp.58-63
• /
• 1984

특별히 제작한 영동장치를 써서 8면체 구조의 (Ruc $l_{6}$)$^{3-}$ 를 여과지 전기영동 분리하였다. 자지전해질 용액은 다음과 같다. 0.1M-HCl $O_4$, 0.05M-HCl+0.09M-KCI, 0.1M-HCl, 5$\times$$10^{-3}$M-NTA, 0.01M-HCl, 0.01M-HCl $O_4$, 0.01M-시트르산, 0.01M-K $H_2$P $O_4$+0.01M-$Na_2$HP $O_4$, 0.05M-붕사, 0.025M-$Na_2$C $O_3$+0.025M-NaHC $O_3$, 0.01M-$Na_3$P $O_4$, 0.01M-NaOH, 0.1M-NaOH. (Ruc $l_{6}$)$^{3-}$ 은 2-4피크로 나타내며 다음 화학종으로 확인된다. (RuCl($H_2O$)$_{5}$ )$^{2+}$, cis- 및 trans-(RuC $l_2$($H_2O$)$_4$)$^{1+}$ , (RuC $l_3$($H_2O$)$_3$)$^{0}$ , (RuC $l_4$($H_2O$)$_2$)$^{1-}$, (RuC $l_{5}$ ($H_2O$))$^{2-}$ , (RuC $l_{6}$)$^{3-}$ . 리텐숀 값은 0.025M-$Na_2$C $O_3$+0.025M-NaHC $O_3$ 전해질 용액에서 가장 높다.

• 공업화학
• /
• 제17권1호
• /
• pp.87-92
• /
• 2006

Ru이 첨가된 $Ni/Al_2O_3$ 촉매 상에서의 메탄 수증기 개질 반응을 수행하였다. 반응 전에 $H_2$를 사용한 전처리가 필요한 $Ni/Al_2O_3$ 촉매에 비해, $Ru/Ni/Al_2O_3$ 촉매는 별도의 전처리 과정이 없이도 우수한 반응 활성을 나타내었다. $CH_4-TPR$과 반응 후 촉매에 대한 $H_2-TPR$ 결과, 메탄의 분해반응에 의한 $RuO_x$의 환원이 저온($220^{\circ}C$)에서부터 진행되며, 환원된 Ru이 NiO의 환원을 촉진하게 되어 자발적인 환원이 일어나게 된다는 것을 알 수 있었다. 금속 입자의 분산도를 높이기 위하여 $Ru/Ni/Al_2O_3$ 촉매를 $45^{\circ}C$에서 2 h 동안 $7M\;NH_4OH$ 수용액에 담근 후 소성하여 반응을 수행하였다. $NH_4OH$ 수용액으로 처리한 $Ru/Ni/Al_2O_3$ 촉매는 상대적으로 더 높은 반응 활성을 나타내었으며, $H_2$-화학흡착과 XRD, XPS 분석 결과로부터 입자크기가 감소하고 금속의 분산도가 향상되었음을 확인할 수 있었다. $NH_4OH$ 수용액에 의한 촉매의 고분산을 이용하여 Ru의 함량을 감소시켜 소량의 첨가로 높은 반응 활성을 보이고자 하였다.