• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.1022-1025
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• 2001

This paper presents the characteristics of TaN thin-film as high-temperature strain gauges, which were deposited on Si substrate by DC reactive magnetron sputtering in an argon-nitrogen atmosphere(Ar-(4∼20%)N$_2$). The electrical and mechanical characteristics of these films investigated with the thickness range 1650∼1870${\AA}$ and room temperature resistivities in the range 178.3 ${\mu}$$\Omega$cm to 3175.7 ${\mu}$$\Omega$cm. The TaN thin-film strain gauge deposited in Ar-(20%)N$_2$atmosphere is obtained a temperature coefficient of resistance(TCR), 0∼-1357 ppm/$^{\circ}C$ in the temperature range 25∼275$^{\circ}C$ and a high temporal stability with a longitudinal gauge factor, 2.92∼3.47. Because of their high resistivity, low TCR and linear gauge factor, these cermet thin-film may allow high-temperature strain gauges miniaturization.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2010년도 춘계학술발표대회
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• pp.27.2-27.2
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• 2010

In recent years, there is a strong requirement of low cost, stable microelectro mechanical systems (MEMS) for resonators, microswitches and sensors. Most of these devices consist of freely suspended microcantilevers, which are usually made by the etching of some sacrificial materials. Herein, we have attempted to use Si nanowires, inherited from the parent Si wafer, as a sacrificial material due to its porosity, low cost and ease of fabrication. Prior to the fabrication of the Si nanowires silver nanoparticles were continuously formed on the surface of Si wafer. Vertically aligned Si nanowires were fabricated from the parent Si wafers by aqueous chemical route at $50^{\circ}C$. Afterwards, the morphological and structural characteristics of the Si nanowires were investigated. The morphology of nanowires was strongly modulated by the resistivity of the parent wafer. The 3-step etching of nanowires in diluted KOH solution was carried out at room temperature in order to control the fast etching. A layer of $Si_3N_4$ (300 nm) was used for the selective fabrication of nanowires. Finally, a freely suspended bridge of zinc oxide (ZnO) was fabricated after the removal of nanowires from the parent wafer. At present, we believe that this technique may provide a platform for the inexpensive fabrication of futuristic MEMS.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.131-131
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• 2003

Surface micromachined uncooled IR detector with the optimized VOx bolometric layer was fabricated based on sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$. In order to improve the detectivity of the IR detector, we optimized a few factors in the viewpoint of bolometric material. Vanadium oxide thin film is a promising material for uncooled microbolometers due to its high temperature coefficient of resistance at room temperature. It is, however, very difficult to deposit vanadium oxide thin films having high temperature coefficient of resistance and low resistance because of process limits in microbolometer fabrication. In order to increase the responsivity and decrease noise, we increase TCR of bolometric material and decrease room temperature resistance based on the sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$ by conventional sputter. By oxygen diffusion through low temperature annealing of V$_2$O$_{5}$V/V$_2$O$_{5}$ in oxygen ambient, various mixed phase vanadium oxide was formed and we obtained TCR in range of-1.2 ~-2.6%/$^{\circ}C$ at room temperature resistance of 5~100k$\Omega$.mega$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.151-151
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• 2009

Recently, there has been increasing interest in amorphous oxide semiconductors to find alternative materials for an amorphous silicon or organic semiconductor layer as a channel in thin film transistors(TFTs) for transparent electronic devices owing to their high mobility and low photo-sensitivity. The fabriction of amorphous oxide-based TFTs at room temperature on plastic substrates is a key technology to realize transparent flexible electronics. Amorphous oxides allows for controllable conductivity, which permits it to be used both as a transparent semiconductor or conductor, and so to be used both as active and source/drain layers in TFTs. One of the materials that is being responsible for this revolution in the electronics is indium-zinc-tin oxide(IZTO). Since this is relatively new material, it is important to study the properties of room-temperature deposited IZTO thin films and exploration in a possible integration of the material in flexible TFT devices. In this research, we deposited IZTO thin films on polyethylene naphthalate substrate at room temperature by using magnetron sputtering system and investigated their properties. Furthermore, we revealed the fabrication and characteristics of top-gate-type transparent TFTs with IZTO layers, seen in Fig. 1. The experimental results show that by varying the oxygen flow rate during deposition, it can be prepared the IZTO thin films of two-types; One a conductive film that exhibits a resistivity of $2\times10^{-4}$ ohm${\cdot}$cm; the other, semiconductor film with a resistivity of 9 ohm${\cdot}$cm. The TFT devices with IZTO layers are optically transparent in visible region and operate in enhancement mode. The threshold voltage, field effect mobility, on-off current ratio, and sub-threshold slope of the TFT are -0.5 V, $7.2\;cm^2/Vs$, $\sim10^7$ and 0.2 V/decade, respectively. These results will contribute to applications of select TFT to transparent flexible electronics.

• 한국산업보건학회지
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• 제25권2호
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• pp.202-210
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• 2015

Objectives: The purpose of this study was to examine clean room(C/R) structure, air conditioning and contamination control systems and to provide basic information for identifying a correlation between the semiconductor work environment and workers' disease. Methods: This study was conducted at 200 mm and 300 mm semiconductor wafer fabrication facilities. The C/R structure and air conditioning method were investigated using basic engineering data from documentation for C/R construction. Furthermore, contamination parameters such as airborne particles, temperature, humidity, acids, ammonia, organic compounds, and vibration in the C/R were based on the International Technology Roadmap for Semiconductors(ITRS). The properties of contamination control systems and the current status of monitoring of various contaminants in the C/R were investigated. Results: 200 mm and 300 mm wafer fabrication facilities were divided into fab(C/R) and sub fab(Plenum), and fab, clean sub fab and facility sub fab, respectively. Fresh air(FA) is supplied in the plenum or clean sub fab by the outdoor air handling unit system which purifies outdoor air. FA supply or contaminated indoor air ventilation rates in the 200 mm and 300 mm wafer fabrication facilities are approximately 10-25%. Furthermore, semiconductor clean rooms strictly controlled airborne particles(${\leq}1,000{\sharp}/ft^3$), temperature($23{\pm}0.5^{\circ}C$), humidity($45{\pm}5%$), air velocity(0.4 m/s), air change(60-80 cycles/hr), vibration(${\leq}1cm/s^2$), and differential pressure(atmospheric pressure$+1.0-2.5mmH_2O$) through air handling and contamination control systems. In addition, acids, alkali and ozone are managed at less than internal criteria by chemical filters. Conclusions: Semiconductor clean rooms can be a pleasant environment for workers as well as semiconductor devices. However, based on the precautionary principle, it may be necessary to continuously improve semiconductor processes and the work environment.

• 한국주조공학회지
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• 제14권5호
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• pp.471-479
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• 1994

Al-2%Si-2%Mg alloy containing SiC particle in 20, $70{\mu}m$ were prepared by mean of squeeze casting with various pressure 50, 100, 150 and 220MPa respectively. The specimens were made by casting into $50{\Phi}{\times}100{\ell}$ mold under various squeeze conditions(pressures, pressurizing temperature, particle sizes). Mechanical properties(hardness, tensile strength, elongation and wear characteristics) were evaluated at room temperature with those various fabrication factors. It became feasible to make favorable Al-SiCp composite free from casting defects by the injection of Ar gas during melting and 100MPa pressure squeeze casting. However, pressure of 50MPa was not sufficient to avoid completely porosity formation as a result of precessing and shrinkage during solidification. As the particle size is smaller and the squeeze pressure is higher, the hardness and tensile strength at room temperature are higher. Cell size became smaller gradually with increase of squeeze pressure. With increase of squeeze pressure(MPa), wear behaviors of those composites were changed from adhesive into abrasive wear, and the tendency of above behavior became outstanding with increasing sliding speed. The chemical reaction(4Al＋3SiC${\rightarrow}$$Al_4C_3+3Si$) is more accelerated at interface between SiCp and matrix with increase of squeeze pressure. Therefore $Al_4C_3$ intercompound and Si peak intensity is increased at interface.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.7-12
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• 2003

When the wind turbine is used in cold regions, the mechanical properties and dimension stability of the blade will be changed. The proposal of this paper is to test the durability of the blade for wind turbine. It is necessary to select the most comfortable materials and fabrication processes for more stable wind turbine blade in cold regions. To select the most comfortable materials and processes, the static strength has to know through the tensile static tests at the severe condition as cold regions. First, the tensile static specimens made by RIM (Resin injection molding) process & vacuum bagging process with reinforcement materials and resin. Tensile static tests were carried out on three laminate lay-ups (carbon prepreg, carbon fiber dry fabric and glass fiber dry fabric) at different test temperature($24^{\circ}$, $-30^{\circ}$), determining properties such as the mechanical strength, stiffness and strain to failure. At different test temperature, in order to test the tensile strengths of these specimens used the low temperature chamber. Next, the results of this test were compared with each other. Finally, the most comfortable materials and fabrication processes can select based on these results. The results show the changes in the static behavior of three laminate lay-ups at different test temperatures. At low temperatures, the static strengths are higher than the ones at room temperature.

• 한국복합재료학회:학술대회논문집
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• 한국복합재료학회 2003년도 춘계학술발표대회 논문집
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• pp.196-201
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• 2003

When the structures are used in cold regions, the mechanical properties and dimension stability of the blade will be changed. The proposal of this study is to test the durability of the structures in cold regions. It is necessary to select the most comfortable materials and fabrication processes for more stable structures in cold regions. To select the most comfortable materials and processes, the static strength has to know through the tensile static tests at the severe condition as cold regions. First, the tensile static specimens made by RIM (Resin injection molding) process & vacuum bagging process with reinforcement materials and resin. Tensile static tests were carried out on three laminate lay-ups (carbon prepreg, carbon fiber dry fabric) at different test temperature($24^{\circ}C$, $-30^{\circ}C$), determining properties such as the mechanical strength, stiffness and strain to failure. At different test temperature, in order to test the tensile strengths of these specimens used the low temperature chamber. Next, the results of this test were compared with each other. Finally, the most comfortable materials and fabrication processes can select based on these results. The results show the changes in the static behavior of three laminate lay-ups at different test temperatures. At low temperatures, the static strengths are higher than the ones at room temperature.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.274-274
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• 2008

This paper describes on the fabrication and characteristics of a 3C-SiC (Silicon Carbide) micro pressure sensor for harsh environment applications. The implemented micro pressure sensor used 3C-SiC thin-films heteroepitaxially grown on SOI (Si-on-insulator) structures. This sensor takes advantages of the good mechanical properties of Si as diaphragms fabricated by D-RIE technology and temperature properties of 3C-SiC piezoresistors. The fabricated pressure sensors were tasted at temperature up to $250^{\circ}C$ and indicated a sensitivity of 0.46 mV/V*bar at room temperature and 0.28 mV/V*bar at $250^{\circ}C$. The fabricated 3C-SiC/SOI pressure sensor presents a high-sensitivity and excellent temperature stability.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2007년도 추계학술대회 논문집
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• pp.108-111
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• 2007

It's important to measure quantitative properties about thermal-nano variation conduct of polymer for producing high quality components using NIL process. NanoScale indents can be used ad cells for molecular electronics and drug deliver, slots for integration into nanodevices, and defects for tailoring the structure and properties. In this study, it's to evaluate mechanical characteristic of polymer such as PMMA and PC at high temperature for manufacture of nano/micro size of polymer using indenter at high temperature. At high temperature mechanical properties of polymer have extreme variation. Because heating the polymer, it becomes softer than room temperature. In this case it is especially important to study for mechanical properties of polymer at high temperature.