• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.203-203
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• 2010

본 연구에서는 RF magnetron sputtering을 이용하여 공정압력에 따라 증착된 ITO 박막의 투명 전극 특성을 연구하였다. ITO 박막은 $In_2O_3$ : $SnO_2$ 비율이 9:1로 소결된 3in 직경의 타겟을 사용하여 corning 1737을 유리기판 위에 증착하였다. 증착조건으로 초기압력은 $1.7{\times}10^{-6}torr$로, 가스 유량은 Ar 50 sccm으로, RF power는 25W로 각각 고정하였으며, 증착 공정압력을 $2.0{\times}10^{-2}$, $7.0{\times}10^{-3}$, $2.0{\times}10^{-3}torr$로 변화하면서 200nm 두께의 ITO 박막시편을 제작하였다. 제작된 시편의 AFM 분석결과 박막의 거칠기는 0.33nm 이었으며, 광투과도 및 비저항은 공정압력이 낮은 경우 상대적으로 양호한 결과를 보였다. 높은 공정압력에서 광투과도는 60% 정도로 나타났으나, 낮은 공정압력에서 RF power를 증가시킴에 따라 가시광선의 광투과도는 85% 이상으로, Hall측정을 통한 Mobility는 $37.6\;cm^2V^{-1}s^{-1}$로 각각 증가하였으며, 비저항은 $0.346{\times}10^{-3}{\Omega}cm$이었으며, 이동도는 $4.788{\times}10^{20}cm^{-3}$로써 양호한 투명전극 특성을 보였다.

• 전자공학회논문지
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• 제50권7호
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• pp.115-121
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• 2013

본 연구에서는 TiInZnO(TiIZO)를 채널층으로 하는 thin film transistors(TFTs)를 제작하였다. TiIZO 층은 InZnO(IZO)와 Ti target을 이용하여 RF-magnetron co-sputtering system 방식으로 상온에서 증착하였으며, 어떠한 열처리도 하지 않았다. Ti의 첨가가 어떠한 영항을 주는지 연구하기 위해 X-ray diffraction(XRD), X-ray photoelectron spectroscopy(XPS) 분석을 시행하였으며, 전기적인 특성을 측정하였다. Ti의 첨가는 Ti target의 rf power 변화에 따라 달리하였다. Ti의 첨가가 전류점멸비에 큰 영향을 주는 것을 확인하였고, 이것은 Ti의 산화력이 In과 Zn보다 뛰어나 산소결함자리의 형성을 억제하기 때문이다. Ti의 rf power가 40W일 때 가장 좋은 특성을 나타냈으며, 전류점멸비, 전자이동도, 문턱전압, subthreshold swing이 각각 $10^5$, 2.09 [$cm^2/V{\cdot}s$]. 2.2 [V], 0.492 [V/dec.]로 측정되었다.

• 한국세라믹학회지
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• 제30권6호
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• pp.441-448
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• 1993

The Ba1-xSrxTiO3 thin films deposited on ITO-coated glass substrate at 55$0^{\circ}C$ by rf magnetron sputtering method have individual preferential orientations as a function of composition (X=0, 0.25, 0.5, 0.75, 1) due to the stress relief interactions among the intrinsic compressive stress, thermal tensile stress adn extrinsic compressive stress (compressive stress in case of BaTiO3(Tc=12$0^{\circ}C$) and Ba0.75Sr0.25TiO3(Tc=57$^{\circ}C$)). This behavior also appears on the (BaSr)TiO3 thin films (X=0.5) deposited on ITO-coated glass substrate at deposition temperature between 35$0^{\circ}C$ and 55$0^{\circ}C$. The composition of Ba1-xSrxTiO3 thin films deposited on ITO-coated glass substrate at 55$0^{\circ}C$ is close to stoichiometry (1.009~1.089 in A/B ratio), but the compositional deviation from a stoichiometry is larger as SrTiO3 is added. The morphology of Ba1-xSrxTiO3 thin films is very similar for over all substrate temperatures, and the roughness due to the differences of cluster size is the smallest at X=0.25.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.186-187
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• 2009

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various deposition conditions. Thickness of SBN thin films was about 250[nm] in 70/30 of $Ar/O_2$ ratio. The thickness and deposition rate of SBN thin films were increased with increase of RF power. The capacitance of SBN thin films were increased with the increase of deposition temperature.

• 한국진공학회지
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• 제1권1호
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• pp.162-167
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• 1992

반응성 RF 스파타 증착법으로 스테인레스 스틸 기판 위에 TiC 박막과 TiN 박막을 증착하였다. 스파타기체로 Ar를, 반응기체로 C2H2와 N2 기체를 사용하였다. 박막의 증착율 은 RF 출력증가에 따라 선형적으로 증가하였으며 스파타기체에 대한 반응 기체의 분압비 증가에 따라 급격하게 감소하였다. 박막의 성분은 TiC 박막의 경우 분압비 0.03에서, TiN 박막의 경우 분압비 0.05에서 stoichiometric한 성분이 된다. 이 TiC, TiN 박막의 morphology와 미세구조 및 계면을 AES, SEM 그리고 TEM으로 조사하였다. 또한 N+ 이온 을 주입하여 N+ 이온 주입효과와 열처리 효과도 조사하였다.

• 한국전기전자재료학회논문지
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• 제24권7호
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• pp.574-577
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• 2011

In this study, we use the $2.5cm{\times}7.5cm$ soda lime glass as the substrate. We used the ultrasonicator. Glass was dipped in the acetone, methanol and DI water respectively for 10 minutes. Ar(99.99%)gas was used as the sputtering gas. We varied the RF power between 100~175 W with 25 W steps. Base pressure was kept by turbo molecular pump at $3.0{\times}10^{-6}$ torr. Working pressure was kept by injection of Ar gas. ZnS thin films were deposited with the radio frequency magnetron sputtering technique at various temperatures and sputtering powers. It is also clearly observed that, the intensity of the (111) XRD peak increases with increasing the RF power. Electrical properties were measured by hall effect methods at room temperature. The resistivity, carrier concentration, and hall mobility of ZnS deposited on glass substrate as a function of sputtering power. It can be seen that as the sputtering power increase from 100 to 175 W, the resistivity of the films on glass decreased significantly from $8.1{\times}10^{-2}$ to $1.2{\times}10^{-3}\;{\Omega}{\cdot}cm$. This behavior could be explained by the effect of the sputtering power on the mobility and carrier concentration. When the RF power increases, the carrier concentration increases slightly while the resistivity decreases significantly. These variation originate from improved crystallinity and enhanced substitutional doping as the sputtering power increases.

• 전기학회논문지P
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• 제58권4호
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• pp.538-540
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• 2009

The SBN thin films were deposited at substrate temperature of 300[$^{\circ}C$] on Pt-coated electrode (Pt/Ti/$SiO_2$/Si(100)) using RF sputtering method. The grain and crystallinity of SBN thin films were increased with the increase of annealing temperature. The dielectric constant(150) of SBN thin film was obtained by annealing temperature above 750[$^{\circ}C$]. The voltage dependence of dielectric loss showed a value within 0.01 in voltage ranges of -5~+5[V]. The capacitance characteristics showed a stable value of about 0.7[${\mu}F/cm^2$].

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권10호
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• pp.475-480
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• 2006

Vanadium oxide thin films (VOx) have been deposited by RF magnetron sputtering from $V_2O_5$ target under different oxygen partial pressure ratios(0%, 10%) and substrate temperatures$(27^{\circ}C,\;400^{\circ}C)$. Crystallographic structure and morphology of the films are studied by XRD and SEM. Humidity-sensing properties of resistive sensors having interdigitated electrode structure are characterized through electrical conduction measurements. The films deposited at room temperature are amorphous whereas the ones deposited above foot are polycrystalline. The sensors show good response to humidity over 20%RH to 80%RH. Vanadium oxide thin films deposited with $0%O_2$ partial pressure at $400^{\circ}C$ exhibit greater sensitivity to humidity change than others.

• 한국재료학회지
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• 제28권3호
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• pp.159-165
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• 2018

In order to increase the efficiency of the sputtering method widely used in thin film fabrication, a dc sputtering apparatus which supplies both high frequency and magnetic field from the outside was fabricated, and cobalt thin film was fabricated using this apparatus. The apparatus can independently control the applied voltage, the target-substrate distance, and the target current, which are important parameters in the sputtering method, so that a stable glow discharge is obtained even at a low gas pressure of $10^{-3}$ Torr. The fabrication conditions using the sputtering method were mainly performed in $Ar+O_2$ mixed gas containing about 0.6 % oxygen gas under various Ar gas pressures of 1 to 30 mTorr. The microstructure of Co thin films deposited using this apparatus was examined by electron diffraction pattern and X-ray techniques. The magnetic properties were investigated by measuring the magnetization curves. The microstructure and magnetic properties of Co thin films depend on the discharge gas pressure. The thin film fabricated at high gas pressure showed a columnar structure containing a large amount of the third phase in the boundary region and the thin film formed at low gas pressure showed little or no columnar structure. The coercivity in the plane was slightly larger than that in the latter case.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2003년도 춘계종합학술대회
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• pp.88-92
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• 2003

본 논문에서는 Al 하부전극 상에서 RF magnetron sputtering 기술을 이용한 ZnO 박막 증착 및 공정온도가 ZnO 결정성장에 미치는 영향을 고려하여 제작한 FBAR 소자에 대한 연구를 발표한다. 결과적으로, 20$0^{\circ}C$의 공정온도에서 주상형 결정립(columnar grain)을 가지고 c축 우선 배향된 ZnO 박막을 얻을 수 있었다. 이렇게 얻은 ZnO 박막을 FBAR 소자에 적용하여 제작한 결과, 2.05GHz의 공진 주파수에서 ~19.5dB의 반사손실을 보였다.