• 한국자기학회지
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• 제6권2호
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• pp.93-97
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• 1996

본 실험에서는 magnetron sputtering 법으로 MnSb 합금에 Pt가 고용된 형태의 MnSbPt 합금박막의 제조하였다. 제조된 박막을 $300^{\circ}C$에서 3, 4, 5시간 각각 대기중과 진공중에서 열처리하여 자기적 성질과 자기광학적 성질의 변화를 조사하였다. 전 조성에 걸쳐 대기중 열처리에 의한 자기적, 자기광학적 성질은 열화되지 않아 대기중에서의 기록과정에 문제가 없음을 관찰하였다. 진공중에서 $300^{\circ}C$ 4시간 열처리한 $Mn_{43}Sb_{46}Pt_{11}$의 경우, 550 nm의 입사파장에서 약 $0.82^{\circ}$의 Kerr 회전각을 보여 고밀도기록의 기능성을 보여 주었다. 그러나 수직자화막은 얻을 수 없었으며 보자력은 약 400 Oe 이하로 실용적 측면에서는 많은 문제점이 남아 있다.

• KIEE International Transactions on Electrophysics and Applications
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• 제5C권4호
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• pp.176-179
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• 2005

The increasing demand for high density packaging technologies and the evolution to mixed digital and analogue devices has been the con-set of increasing research in thin film multi-layer technologies such as the passive components integration technology. In this paper, Cu and TaO thin film with RF sputtering was deposited for spiral inductor and MOM capacitor on the $SiO_2$/Si(100) substrate. MOM capacitor and spiral inductor were fabricated for L-C band pass filter by sputtering and lift-off. We are analyzed and designed thin films L-C passive components for band pass filter at 900 MHz and 1.8 GHz, important devices for mobile communication system. Based on the high-Q values of passive components, MOM capacitor and spiral inductors for L-C band pass filter, a low insertion loss of L-C passive components can be realized with a minimized chip area. The insertion loss was 3 dB for a 1.8 GHz filter, and 5 dB for a 900 MHz filter. This paper also discusses a analysis and practical design to thin-film L-C band pass filter.

• 한국전기전자재료학회논문지
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• 제19권4호
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• pp.373-378
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• 2006

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with Al cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that OLED with Al cathode layer prepared by BCS has much lower leakage current density ($1{\times}10^{-5}\;mA/cm^2$ at -6 V) than that $(1{\times}10^{-2}{\sim}-10^0\;mA/cm^2)$ of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and DC/RF sputtering in fabrication process of organic based optoelectronics.

• Journal of Electrical Engineering and Technology
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• 제2권4호
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• pp.532-536
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• 2007

Carbon nanotube (CNT) properties, produced using a magnetic null discharge (MND) plasma production technology, were investigated. We firstly deposited the Fe layer 200 nm in thickness on Si substrate by the magnetic null discharge sputter method at the substrate temperature of $300도C$, and then prepared CNTs on the catalyst layer by using the magnetic null discharge (MND) based CVD method. CNTs were deposited in a gas mixture of CH4 and N2 at a total pressure of 1 Torr by the MND-CVD method. The substrate temperature and the RF power were $650^{\circ}C$ and 600W, respectively. The characterization data indicated that the proposed source could synthesize CNTs even under relatively severe conditions for the magnetic null discharge formation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.53-54
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• 2005

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin rim transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with top cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that TOLED with ITO or IZO top cathode layer prepared by BCS has much lower leakage current density ($1\times10^{-5}$ mA/cm2 at -6V) than that ($1\times10^{-1}\sim10^{\circ}mA/cm^2$)of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and dc/rf sputtering in fabrication process of organic based optoelectronics.

• 한국자기학회지
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• 제20권6호
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• pp.222-227
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• 2010

RF 마그네트론 스퍼터링법을 이용하여 Pt/Ti/$SiO_2$/Si(100) 기판위에 $BiFeO_3$ 박막을 증착하였고, 스퍼터링 공정에서 산소량이 $BiFeO_3$ 박막에 미치는 영향을 조사하였다. $BiFeO_3$ 박막은 XRD 회절패턴의 결과를 통하여 소량의 불순물상이 존재하는 페로브스카이트 구조로 결정화되었다. $O_2$ 가스의 유량은 박막의 미세구조 및 자기적 특성에 많은 영향을 끼친다. $O_2$ 가스의 유량이 증가함에 따라 박막의 표면 거칠기 및 grain size가 증가하였다. $BiFeO_3$ 박막은 상온에서 약자성적인 거동을 보였으며, PFM 측정을 통하여 박막의 미세구조와 압전계수와의 상관관계를 조사하였다.

• Journal of Magnetics
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• 제6권1호
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• pp.9-12
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• 2001

The dependence of the magnetoimpedance effect (MI) on magnetic properties has been investigated in mumetal thin films prepared by rf magnetron sputtering. Coercivity of thin films prepared at 400 W was about 0.4 Oe, and the magnetic anisotropy field of films deposited under a uniaxial magnetic field decreased with increasing film thickness. The saturation magnetization of mumetal films increased with rising input power and thickness and was smaller than that of permalloy films. Transverse incremental Permeability (TPR) of films of 1$\mu m$ thick increased with increasing effective permeability. The magneto impedance ratio (MIR) was proportional to TPR in films 1$\mu m$ thick but in spite of lower effective permeability at higher thicknesses, MIR increased due to skin effect. The height of the double peaks in the MIR curves decreased with decreasing anisotropy and thickness. The maximum MIR value for a 4$\mu m$ thick 75% at 36.5 MHz.

• 한국기계가공학회지
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• 제11권3호
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• pp.138-145
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• 2012

The material used in this study is dielectric and ferrite. Because of the unique characteristics of the material, it is easily exposed to external shocks and pressure, which cause damage to the product. However, after being processed under high-temperature environment repeatedly, the mechanical strength of the product is greatly increased due to the change of the electrical properties. In this paper, dielectric and bonded ferrite material was tested for the material properties. The equipment for this experiment was produced and tested to allow Cylindrical and Three-dimensional geometry of the product for the vacuum deposition. For Cylindrical shape of the product, in order to obtain the equivalent film thickness, the device is constructed in a vacuum chamber which gives arbitrary revolving and rotating capability. The electrical performance of the product is obtained through this process as well. However, as mentioned above, with repeating processes under high temperature and exposure to external environment, the product is easy to be broken. This experiment has enabled us to find out a stable condition to apply the communication of the RF high frequency to each of the core elements, such as Ferrite and Dielectric which is then used for the mechanical strength of the Raw material, hetero-junction material, Hetero-junction Ag Coating material and hetero-junction Ag Coating SiO2 Coating material respectively.

• E2M - 전기 전자와 첨단 소재
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• 제10권8호
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• pp.813-818
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• 1997

In this study the thin film air core and magnetic core inductors consisting of planar coil and/or CoNbZr amorphous magnetic layers on a Si substrate were fabricated as spiral type by using rf magnetron sputtering and wet etching methods. The etchant solution was achieved by iron chloride solution(17.5 mol%) mixed with HF (20 mol%) during 150 sec which etched Cu films and CoNbZr/Cu/CoNbZr multi-layer films. They were about 10${\mu}{\textrm}{m}$ of thickness and 10$\times$10 mm$^2$of size. The properties of thin film magnetic core inductor were 400 nH of Q value at 10 MHz and the resonance frequency was about 300 MHz.

• 한국자기학회지
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• 제5권5호
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• pp.538-542
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• 1995

The etching characteristics of magnetic thin films of permalloy and Fe-based alloys are investigated. The thin films are fabricated by rf magnetron sputtering and the substrates used are silicon and glass. Etching is done by ion beam technique and the main process parameters investigated are beam voltage, beam current and accelerating voltage. The etch rate of the magnetic films is proportional to the beam current, but it is not directly related to the accelerating voltage and beam voltage. The dependence of etch rate on the process parameters can be explained by ion current density. It is found that the ion beam etching is effective in obtaining well-developed micro-patterns on the permalloy and Fe- based magnetic thin films.