Browse > Article
http://dx.doi.org/10.5370/JEET.2007.2.4.532

Carbon Nanotube Synthesis using Magnetic Null Discharge Plasma Production Technology  

Sung, Youl-Moon (Department of Electrical Electronic Engineering, Kyungsung University)
Publication Information
Journal of Electrical Engineering and Technology / v.2, no.4, 2007 , pp. 532-536 More about this Journal
Abstract
Carbon nanotube (CNT) properties, produced using a magnetic null discharge (MND) plasma production technology, were investigated. We firstly deposited the Fe layer 200 nm in thickness on Si substrate by the magnetic null discharge sputter method at the substrate temperature of $300도C$, and then prepared CNTs on the catalyst layer by using the magnetic null discharge (MND) based CVD method. CNTs were deposited in a gas mixture of CH4 and N2 at a total pressure of 1 Torr by the MND-CVD method. The substrate temperature and the RF power were $650^{\circ}C$ and 600W, respectively. The characterization data indicated that the proposed source could synthesize CNTs even under relatively severe conditions for the magnetic null discharge formation.
Keywords
Carbon nanotubes; Magnetic null discharge plasma; Plasma enhanced chemical vapor deposition; Single-line plasma process; Sputtering;
Citations & Related Records
연도 인용수 순위
  • Reference
1 A. Thess et al., Science 273 (1996) 483   DOI   ScienceOn
2 Z.F. Ren, Z.P. Huang, J.W. Xu, J.H. Wang, P. Bush, M.P. Siegal, P.N. Provencio, Science 282 (1998) 1105   DOI   ScienceOn
3 T. Uchida, Jpn. J. Appl. Phys. 33 (1994) L43   DOI   ScienceOn
4 Z. Yoshida, T. Uchida, Jpn. J.Appl. Phys. 34 (1995) 4213   DOI
5 T. Sakoda, T. Miyao, K. Uchino, K. Muraoka, Jpn. J. Appl. Phys. 36 (1997) 6981   DOI
6 W. Chen, T. Hayashi, M. Itoh, Y. Morikawa, Jpn. J. Appl. Phys. 38 (1999) 4296   DOI
7 Y. M. Sung, K. Uchino, K. Muraoka, T. Sakoda, J. Vac. Sci. Technol. A18 (2000) 2149
8 Y. M. Sung, Y. Okraku-Yirenkyi, M. Otsubo, C. Honda, K. Uchino, K. Muraoka, IEEE Trans. Plasma Sci. 30 (2002) 142
9 Y. M. Sung, S. Atsuta, J. H. Yang, M. Otsubo, C. Honda, IEEJ Trans. FM, 124 (2004) 565   DOI   ScienceOn
10 T. Sakoda, Y. M. Sung, J. Vac. Sci. Technol. A 20 (2002) 1964   DOI   ScienceOn
11 Y. M. Sung, C. Honda, J. Vac. Sci. Technol. B 20 (200) 1457
12 W. Li, H. Zhang, et al., Appl. Phys. Lett. 70 (1997) 2684   DOI   ScienceOn
13 N. Hamada, S. Sawada and A. Oshiyama, Phys. Rev. Lett. 68 (1992) 1579   DOI   ScienceOn
14 S. Iijima, Nature 354 (1991) 56   DOI
15 S. Iijima and T. Ichihashi, Nature 363 (1993) 603   DOI   ScienceOn
16 D. S. Bethune, C. H. Kiang, M. S. Devries, G. Gorman, R. Savoy, J. Vazquez and R. Beyers, Nature 363 (1993) 605   DOI   ScienceOn
17 W.Z. Li, S.S. Xie, L.X. Qain, B.H. Chang, B.S. Zou, W.Y. Zhou, R.A. Zhao, G. Wang, Science 274 (1996) 1701   DOI   ScienceOn