• Title/Summary/Keyword: Removal process

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A Study on the Optimum Operating Conditions and Effects of Wastewater Characteristics in Electrochemical Nitrogen Removal Process (질소 제거를 위한 전기화학적 처리 공정의 최적 운전조건 및 폐수 성상에 따른 영향에 관한 연구)

  • Sim, Joo-Hyun;Kang, Se-Han;Seo, Hyung-Joon;Song, Su-Sung
    • Journal of Korean Society of Environmental Engineers
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    • v.31 no.1
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    • pp.29-34
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    • 2009
  • This study was performed under four operational conditions for nitrogen removal in metal finishing wastewater. The conditions include electrode gap, reducing agent, the recycling of treated wastewater in 1st step and the simultaneous treatment of nitrate and other materials. Result showed that the removal efficiency of $NO_3{^-}-N$ was highest at the electrode gap of 10 mm. As the electrode gap was shorter than 10 mm, the removal efficiency of $NO_3{^-}-N$ decreased due to increasing in concentration polarization on electrode. And, in case that the electrode gap was longer than 10 mm, the removal efficiency of $NO_3{^-}-N$ increased with an increase in energy consumption. Because hydrogen ions are consumed when nitrate is reduced, reducing reaction of nitrate was effected more in acid solution. As 1.2 excess amount of zinc was injected, the removal efficiency of $NO_3{^-}-N$ increased due to increasing in amount of reaction with nitrate. As the effluent from 1st step in the reactor was recycled into the 1st step, the removal efficiency of $NO_3{^-}-N$ increased. Because the zinc were detached from the cathode and concentration-polarization was decreased due to formation of turbulence in the reactor. The presence of $NH_4{^+}-N$ did not affect the removal efficiency of $NO_3{^-}-N$ but the addition of heavy metal decreased the removal efficiency of $NO_3{^-}-N$. As chlorine is enough in wastewater, the simultaneous treatment of nitrate and ammonia nitrogen may be possible. The problem that heavy metal decrease the removal efficiency of $NO_3{^-}-N$ may be solved by increasing current density or using front step of electrochemical process for heavy metal removal.

Nitrogen Removal Characteristics in Two-Sludge System of SBR Type Using Sewage Wastewater of Low C/N Ratio (낮은 C/N 비에서 운영되는 SBR 유형의 Two-Sludge 공정의 질소 제거 특성)

  • Ryu, Hong-Duck;Kim, Hak-In;Lee, Sang-Ill
    • Journal of Korean Society of Environmental Engineers
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    • v.28 no.1
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    • pp.7-14
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    • 2006
  • In this study, nitrogen removal characteristics of SBR3 process, which is two-sludge system of sequencing batch reactor(SBR) type, were investigated, with comparison of those of SBR1 process, which is conventional SBR process, and SBR2 process, which was designed to enhance denitrification efficiency through step-feeding of wastewater, using domestic wastewater. SBR3 process of two-sludge type can perform external nitrification, on which nitrification occurs in separated reactor, and enhanced denitrification using biosorbed organics. In the results with domestic wastewater, T-N removal efficiency of SBR3 process was better than those of SBR1 and SBR2 processes. It was observed that bigger difference of T-N removal efficiency between SBR3 process and SBR1 & SBR2 processes was showed at low C/N ratio than that at high C/N ratio resulting from more efficient use of organics by biosorption mechanism in denitrification of SBR3 process than those of SBR1 and SBR2 processes. In addition, T-N removal efficiency of SBR3 process according to influent T-N loading rate was better than those of SBR1 and SBR2, even though influent T-N loading rate of SBR3 process was higher than that of SBR1 and SBR2 process resulting from operation of SBR3 process in short hydraulic retention time(HRT) by external nitrification.

Enhancement of Transmittance and Adhesion of Flexible Display Adhesion Surface by Bubble Removing Process (기포 제거 공정을 통한 유연한 디스플레이 합착 면의 투과율 및 접착력 향상)

  • Kim, Jungsoo;Jang, Kyungsoo;Phu, Cam;Park, Heejun;Shin, Donggi;Lee, Younjung;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.5
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    • pp.330-334
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    • 2018
  • With the development of the Internet of Things, the use of flexible displays has become widespread. In particular, the use of curved, bendable, and rollable displays is increasing. Flexible display production processes include various important components such as lamination material, flexible substrates, and adhesives. Among them, improvement of the lamination process comprises a large proportion of efforts for further development. In this paper, we attempt to improve the transmittance of the display substrate by performing a bubble removal process after adhesion. The transmittance of the glass substrate with the bubble removal process was 5~12% higher than that of the substrate without the bubble removal process. The fill-strength after the bubble removal process was improved by 21.4%, and the shear-strength was improved by 43.9%.

A Continuous Process of Persulfate Oxidation and Citric acid Washing for the Treatment of Complex-Contaminated Soil Containing Total Recoverable Petroleum Hydrocarbons and Heavy Metals (TRPHs - 중금속 복합오염토양의 동시 처리를 위한 과황산 산화 - 구연산 세척 혼성공정 개발)

  • Yoon, Na Kyeong;Choi, Jiyeon;Shin, Won Sik
    • Journal of Environmental Science International
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    • v.27 no.1
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    • pp.1-10
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    • 2018
  • A continuous process of persulfate oxidation and citric acid washing was investigated for ex-situ remediation of complex contaminated soil containing total recoverable petroleum hydrocarbons (TRPHs) and heavy metals (Cu, Pb, and Zn). The batch experiment results showed that TRPHs could be degraded by $Fe^{2+}$ activated persulfate oxidation and that heavy metals could be removed by washing with citric acid. For efficient remediation of the complex contaminated soil, two-stage and three-stage processes were evaluated. Removal efficiency of the two-stage process (persulfate oxidation - citric acid washing) was 83% for TRPHs and 49%, 53%, 24% for Cu, Zn, and Pb, respectively. To improve the removal efficiency, a three-stage process was also tested; case A) water washing - persulfate oxidation - citirc acid washing and case B) persulfate oxidation - citric acid washing (1) - citric acid washing (2). In case A, 63% of TRPHs, 73% of Cu, 60% of Zn, and 55% of Pb were removed, while the removal efficiencies of TRPHs, Cu, Pb, and Zn were 24%, 68%, 62%, and 59% in case B, respectively. The results indicated that case A was better than case B. The three-stage process was more effective than the two-stage process for the remediation of complex-contaminated soil in therms of overall removal efficiency.

Study on the applicability of the ozone / AOP and activated carbon process for the removal of trace organic contaminants and taste odor causing substances (미량오염물질 및 맛 냄새유발물질의 제거를 위한 오존/AOP 및 활성탄 공정의 적용성에 관한 연구)

  • Ha, Jeongtae;Im, Jiyeol;Gil, Kyungik
    • Journal of Wetlands Research
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    • v.17 no.2
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    • pp.155-162
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    • 2015
  • This study was conducted to assess the removal characteristics of taste and odor causing compounds(2-MIB and geosmin) and micro organic matters. GAC and BAC process consisting of Ozone/AOP and activated carbon was applied. As a result, the influent concentration of 2-MIB 159 ng/L and geosmin 371 ng/L were removed 42% and 86% by ozone 1.0 mg/L, and 58%, 90% by AOP(ozone 1.0 mg/L + $H_2O_2$ 0.5 mg/L). Also it showed less than 2 ng/L effluent in GAC process and 99.8% removal efficiency in BAC process. Therefore, BAC process combining ozone/AOP and GAC is effective for persistent removal of micro organic matters, taste and odor. It is needed for optimization of Ozone/AOP process according to influent concentrations.

The Study of WET Cleaning Effect on Deep Trench Structure for Trench MOSFET Technology (Trench MOSFET Technology의 Deep Trench 구조에서 WET Cleaning 영향에 대한 연구)

  • Kim, Sang-Yong;Jeong, Woo-Yang;Yi, Keun-Man;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.88-89
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    • 2009
  • In this paper, we investigated about wet cleaning effect as deep trench formation methods for Power chip devices. Deep trench structure was classified by two methods, PSU (Poly Stick Up) and Non-PSU structure. In this paper, we could remove residue defect during wet. cleaning after deep trench etch process for non-PSU structure device as to change wet cleaning process condition. V-SEM result showed void image at the trench bottom site due to residue defect and residue component was oxide by EDS analysis. In order to find the reason of happening residue defect, we experimented about various process conditions. So, defect source was that oxide film was re-deposited at trench bottom by changed to hydrophobic property at substrate during hard mask removal process. Therefore, in order to removal residue defect, we added in-situ SCI during hard mask removal process, and defect was removed perfectly. And WLR (Wafer Level Reliability) test result was no difference between normal and optimized process condition.

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Study on Removal of DOC for Effluent from Nitrification and Denitrification Process with Zeolite by Combined Process of Coagulation and UF Membrane (제올라이트를 첨가한 질산화 탈질공정에서 응집과 UF공정을 이용한 처리수내 용존 유기물질 제거 연구)

  • Han, Jang Hyuk;Yoon, Tai Il;Cho, Kyung Chul;Song, Jea Yong
    • Journal of Korean Society of Water and Wastewater
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    • v.19 no.5
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    • pp.537-546
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    • 2005
  • This study was carried out to evaluate EPS and SMP variation of sludge and effluent in nitrification and denitrification process with zeolite addition, a possible reduction of effluent DOC by URC(Ultra Rapid Coagulation) process. As a biological wastewater treatment result, EPS formation of both aeration and anoxic sludges are not affect by SRT variation. However, EPS concentration of sludges is higher in aeration tank than in anoxic tank by 6~8 mg EPS/ g VSS. Linear relationship between SMP to DOC indicates that SMP of bulk solution contributes to most of the biological treatment effluent DOC. DOC and turbidity removal efficiency was more improved with URC process than in a conventional coagulation. For pretreatment of UF filtration DOC removal was advanced by URC process than only UF filtration.

Treatment of Photographic Wastewater by Chemical Oxidation and Biological Treatment process (화학적산화 및 생물학적처리법에 의한 사진폐액의 처리)

  • 정경훈;최형일
    • Journal of Environmental Health Sciences
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    • v.23 no.1
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    • pp.34-42
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    • 1997
  • A laboratory experiments were performed to investigate the treatment of photographic processing wastewater by chemical oxidation and biological treatment system. The effect of reaction conditions such as hydrogen peroxide dosage, ferrous sulfate dosage and pH on the COD removal in Fenton oxidation were investigated. The optimal dosage of hydrogen peroxide was 2.58 M and 3.87 M for the developing and fixing process wastewater, respectively. The Fenton oxidation was most efficient in the pH range of 3-5 and the optimal condition for initial reaction pH was 5 for a developing process wastewater. With iron powder catalyst, the COD for a developing process wastewater was removed in lower pH than with ferrous sulfate catalyst. The removal efficiency of COD for refractory compounds such as Diethyleneglycol, Benzylalcohol, Hydroxylamine Sulfate, Ammonium Thiosulfate, Ammonium Ferric EDTA and Disodium EDTA in the photogaphic wastewater was found than 90% except Potassium Carbonate. When the photographic processing wastewater after pretreatment by Fenton oxidation was treated with batch activated sludge process, the addition of $KH_2PO_4$ as a phosphorous compound improved the removal efficiency of COD. During the continuous biological treatment of developing and fixing process wastewater after pretreatment by Fenton oxidation, the effluent COD concentration less than 100 mg/l was obtained at 0.425 and 0.25 kgCOD/m$^3$.d, respectively.

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Methodological Consideration on the Prediction of Electrochemical Mechanical Polishing Process Parameters by Monitoring of Electrochemical Characteristics of Copper Surface

  • Seo, Yong-Jin
    • Journal of Electrochemical Science and Technology
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    • v.11 no.4
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    • pp.346-351
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    • 2020
  • The removal characteristics of copper (Cu) from electrochemical surface by voltage-activated reaction were reviewed to assess the applicability of electrochemical-mechanical polishing (ECMP) process in three types of electrolytes, such as HNO3, KNO3 and NaNO3. Electrochemical surface conditions such as active, passive, transient and trans-passive states were monitored from its current-voltage (I-V) characteristic curves obtained by linear sweep voltammetry (LSV) method. In addition, the oxidation and reduction process of the Cu surface by repetitive input of positive and negative voltages were evaluated from the I-V curve obtained using the cyclic voltammetry (CV) method. Finally, the X-ray diffraction (XRD) patterns and energy dispersive spectroscopy (EDS) analyses were used to observe the structural surface states of a Cu electrode. The electrochemical analyses proposed in this study will help to accurately control the material removal rate (MRR) from the actual ECMP process because they are a good methodology for predicting optimal electrochemical process parameters such as current density, operating voltage, and operating time before performing the ECMP process.

Effect of Temperature on Removals of Organic Matter, Nitrogen and Phosphorus in MLE and M-Dephanox Processes (온도가 MLE 및 M-Dephanox 공정의 유기물, 질소 및 인 제거 효율에 미치는 영향)

  • Ryu, Hong-Duck;Lee, Sang-Ill
    • Journal of Korean Society on Water Environment
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    • v.22 no.1
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    • pp.7-16
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    • 2006
  • The present study evaluated effect of temperature on removals of organic matter (C), nitrogen (N) and phosphorus (P) in Modified-Dephanox (M-Dephanox) process, which is hybrid system, comparing with those of Modified-Ludzack Ettinger (MLE) under the suspended-growth bacteria, as control. M-Dephanox process was more stable than MLE process in the removal of C, N, P, especially in nitrification, as the temperature was decreased from $25^{\circ}C$ to $16^{\circ}C$. As the temperature was decreased from $25^{\circ}C$ to $16^{\circ}C$, the removal efficiency of $NH_4{^+}-N$ of M-Dephanox process was decreased by 3.8%, but that of MLE process decreased by 25.7%. T-N removal efficiency of M-Dephanox was higher than MLE process by 27.1% and 26.9% at $25^{\circ}C$ and $16^{\circ}C$ of temperature, respectively.