• 제목/요약/키워드: Reflective index

검색결과 94건 처리시간 0.018초

졸겔법에 의한 알루미나 박막의 제조 및 특성 (III) 저반사 코팅유리의 제조 (Preparation and Characterization of Alumina Thin Film by Sol-Gel Method (III) Preparation of Anti-Reflective Coating Glass)

  • 이재호;최세영
    • 한국세라믹학회지
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    • 제32권1호
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    • pp.57-62
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    • 1995
  • The coating condition of reproducible anti-reflective coating film and the light transmittance characteristics of the prepared anti-reflective coating glass were investigated as a study for the preparation of single-layer anti-reflective coating glasss. In case of coating with the sol in which the solvent was substituted with the ethanol with the addition of 0.1 mol HNO3, the coated glass showed the minimum value of the refractive index of 1.464, light transmittance of 94.2% at 550nm standard wavelength which is 3.2% higher than that of the parent glass, and the reflectance in the entire wave range of visible light. The refractive index represented its minimum at the sol concentration of 1.0 mol per 100mols of water and the higher the sol concentration, the higher the refractive index, resulting in the decrease of the light transmitance. The production condition of the reproducible anti-reflective coating on glass with the maximum transmittance of 94.2% was 4cm/min of withdrawal speed, 40$0^{\circ}C$ and 1 hour of heat treatment temperature and time, resulting in the film thickness of 94nm.

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실리콘 웨이퍼의 이온주입각 변화에 의한 이온반사율에 관한 연구 (A Study on the Ion Reflective Index of Silicon Wafer by Implantation Angle Variation.)

  • 강용철;이우선;박영준
    • 대한전기학회논문지
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    • 제40권6호
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    • pp.590-597
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    • 1991
  • Ion reflective index and sheet resistance in the silicon oblique range smaller than 8 degree and optimization of annealing temperature have been studied. A four point probe was used to obtain the sheet resistance after annealing, while high resolution SIMS was used to determine the Boron and Fluorine atomic profiles before and after annealing. Experimental results and theory of ion reflective index are compared. Ion reflective index was found to decrease according to increasing an ion oblique angle. We introduce a simple analytical model ion reflection, concidering the Rutherford scattering model. This result can not be explained by the conventional Gaussian model.

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Development of a Microspot Spectroscopic Ellipsometer Using Reflective Objectives, and the Ellipsometric Characterization of Monolayer MoS2

  • Kim, Sang Jun;Lee, Min Ho;Kim, Sang Youl
    • Current Optics and Photonics
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    • 제4권4호
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    • pp.353-360
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    • 2020
  • Adopting an elaborately designed reflective objective consisting of four mirrors, we have developed a rotating-polarizer-type microspot spectroscopic ellipsometer (SE) with an ultra-small spot size. The diameter of the focused beam, whether evaluated using a direct-image method or a knife-edge method, is less than 8.4 ㎛. After proper correction for the polarizing effect of the mirrors in the reflective objective, we unambiguously determine the dispersion of the complex refractive index and the thickness of monolayer MoS2 using the measured microspot-spectroellipsometric data. The measured ellipsometric spectra are sensitive enough to identify small variations in thickness of MoS2 flakes, which ranged from 0.48 nm to 0.67 nm.

굴절률에 의한 유전상수와 전자에 의한 분극에 대한 상관성 (Correlation between Dielectric Constant and Electronic Polarization by the Reflective Index)

  • 오데레사
    • 한국진공학회지
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    • 제18권1호
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    • pp.24-29
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    • 2009
  • 층간 절연막으로 사용 가능한 SiOC 박막에 대하여 유전상수가 낮아지는 원인을 이온에 의한 분극과 전자에 의한 분극에 대하여 측정하였다. MIS 구조를 이용하여 전형적인 C-V측적법에 의하여 유전상수를 구하였으며, 굴절률을 측정하여 전자에 의한 분극의 효과에 의한 유전상수를 측정하고 서로 비교하였다. SiOC 박막의 화학적인 특성은 FTIR 분석을 이용하였으며, FTIR 분석에서 디컨벌류션한 데이터는 탄소의 함량에 대한 변화를 구하였다. 탄소의 함량변화는 굴절률의 변화와 비슷한 경향성을 나타내었으나, 유전상수와는 반비례하였다. 전자에 의한 분극의 효과는 유전상수가 떨어지는 것에 큰 영향을 주지는 않았으며, 이온에 의한 분극의 효과가 SiOC 박막의 유전상수를 낮게 하는 효과가 더욱 크게 나타났다.

반사시트의 메커니즘 및 설계에 관한 연구 (A Study on the Mechanism and Design of Reflective Sheet)

  • 이호연;정하규;오영탁;권원태
    • 한국공작기계학회논문집
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    • 제17권1호
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    • pp.65-70
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    • 2008
  • The shape and the material of a reflective sheet affect the amount and the range of retroreflection on incident angle of light, significantly. In this study, the method to determine the shape and the material of the reflective sheet is introduced for the maximum retroreflection. Since the microprism shape with an equilateral triangle base has been used widely, the shape optimization of the microprism shape is carried out. The path of the light within the prism is geometrically calculated to find the relationship between incoming and outgoing light to and from a microprism. The optimal shape of a microprism found by the simulation has almost same figure with the one being used in industry for the maximum retroreflection. It is also found that the refraction index of the reflective sheet is another parameter to control for maximum retroreflection and the range of retroreflection.

Circular Polarizers for Reflective LCDs

  • Yoshimi, Hiroyuki;Yano, Shuji;Fujimura, Yasuo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.905-909
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    • 2002
  • Characteristics of reflective LCDs, which have gained a lot of notice in recent years, rely largely on optical design of circular polarizers and the quarter-wave plates, as a component. Important design includes wavelength dispersion, viewing angle, uniformity of display and matching of refractive index. Our work has contributed to improving performance of reflective LCDs by enhancing the characteristics of polymer film using stretching and optical lamination technologies. To design that offers higher contrast and wider viewing angle, we have discovered that it is necessary to control viewing angle variation of the polarizing axis in order to compensate for the viewing angle of the polarizing film as well as the optical anisotropic properties of liquid crystal. Applying this technology to circular polarizers used for reflective LCDs enables design of wide viewing angle circular polarizers. In order to realize higher contrast for reflective LCDs, it is also necessary to design other optical materials including polarizing films. For design of hybrid optical film, it is particularly necessary to reduce surface reflection and interface reflection. This paper also reports our findings concerning this topic.

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TCP-CVD 장비를 활용한 광도파로용 Core-SiO2 증착 (Deposition of SiO2 Thin Film for the Core of Planar Light-Wave-Guide by Transformer Coupled Plasma Chemical-Vapor-Deposition)

  • 김창조;신백균
    • 한국진공학회지
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    • 제19권3호
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    • pp.230-235
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    • 2010
  • 본 논문에서는 TCP-CVD를 이용하여 실리콘 산화막 형성에서 산화막의 특성에 영향을 미치는 전력, 가스 유량, 기판 바이어스 등의 공정조건에 따른 증착률과 굴절률을 제어하고자 한다. 그 결과 기판온도 300 [$^{\circ}C$], $SiH_4$ : $O_2$=50 : 100 [sccm], TCP power 1 [kW], 기판 바이어스 200 [W]를 인가한 조건에서 매우 우수한 균일도(<1 [%]) 및 증착률(0.28 [${\mu}m$/min])과 굴절률 (1.4610-1.4621)을 나타내는 안정된 $SiO_2$ 산화박막을 제조할 수 있었다.

Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source

  • Choi, Min-Jun;Kwon, O Dae;Choi, Sang Dae;Baek, Ju-Yeoul;An, Kyoung-Joon;Chung, Kwun-Bum
    • Applied Science and Convergence Technology
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    • 제25권4호
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    • pp.73-76
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    • 2016
  • Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

Influence of Deposition Method on Refractive Index of SiO2 and TiO2 Thin Films for Anti-reflective Multilayers

  • Song, Myung-Keun;Yang, Woo-Seok;Kwon, Soon-Woo;Song, Yo-Seung;Cho, Nam-Ihn;Lee, Deuk-Yong
    • 한국세라믹학회지
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    • 제45권9호
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    • pp.524-530
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    • 2008
  • Anti-Reflective (AR) thin film coatings of $SiO_2$ (n= 1.48) and $TiO_2$ (n=2.17) were deposited by ion-beam assisted deposition (IBAD) with End-Hall ion source and conventional electron beam (e-beam) evaporation to investigate the effect of deposition method on the refractive indicies (n) of the fIlms. Green-light generation using a GaAs laser diode was achieved via excitation of the second harmonic. The latter resulted from the transmission of the fundamental guided-mode wave of 1064 nm through periodically poled $LiNbO_3$. Large differences in the refractive indicies of each of the layers in the multilayer coating may improve AR performance. IBAD of $SiO_2$ reduced its refractive index from 1.45 to 1.34 at 1064 nm. Conversely, e-beam evaporation of $TiO_2$ increased its refractive index from 1.80 to 2.11. In addition, no fluctuations in absorption at the wavelength of 1064 nm were found. The results suggest that films prepared by different deposition methods can increase the effectiveness of multilayer AR coatings.

Durable High Performance Single Layer Anti-Reflective Coatings via Wet UV Curing Technology

  • Thies, Jens;Currie, Edwin;Meijers, Guido;Southwell, John;Chawla, Chander
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.98-100
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    • 2004
  • We report a novel manner for preparing single layer anti-reflective coatings with excellent optical properties (<1% reflection) over a broad wavelength regime. The technology is based upon the self-assembly and UV curing of reactive nano-particles, leading to nano-structured coatings with a gradient in refractive index. The single processing step leading to such coatings is fast, robust and cost effective. Furthermore in this paper we will address the mechanical durability of such nano-structured coatings.

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