• Title/Summary/Keyword: Reflective index

Search Result 94, Processing Time 0.026 seconds

Preparation and Characterization of Alumina Thin Film by Sol-Gel Method (III) Preparation of Anti-Reflective Coating Glass (졸겔법에 의한 알루미나 박막의 제조 및 특성 (III) 저반사 코팅유리의 제조)

  • 이재호;최세영
    • Journal of the Korean Ceramic Society
    • /
    • v.32 no.1
    • /
    • pp.57-62
    • /
    • 1995
  • The coating condition of reproducible anti-reflective coating film and the light transmittance characteristics of the prepared anti-reflective coating glass were investigated as a study for the preparation of single-layer anti-reflective coating glasss. In case of coating with the sol in which the solvent was substituted with the ethanol with the addition of 0.1 mol HNO3, the coated glass showed the minimum value of the refractive index of 1.464, light transmittance of 94.2% at 550nm standard wavelength which is 3.2% higher than that of the parent glass, and the reflectance in the entire wave range of visible light. The refractive index represented its minimum at the sol concentration of 1.0 mol per 100mols of water and the higher the sol concentration, the higher the refractive index, resulting in the decrease of the light transmitance. The production condition of the reproducible anti-reflective coating on glass with the maximum transmittance of 94.2% was 4cm/min of withdrawal speed, 40$0^{\circ}C$ and 1 hour of heat treatment temperature and time, resulting in the film thickness of 94nm.

  • PDF

A Study on the Ion Reflective Index of Silicon Wafer by Implantation Angle Variation. (실리콘 웨이퍼의 이온주입각 변화에 의한 이온반사율에 관한 연구)

  • 강용철;이우선;박영준
    • The Transactions of the Korean Institute of Electrical Engineers
    • /
    • v.40 no.6
    • /
    • pp.590-597
    • /
    • 1991
  • Ion reflective index and sheet resistance in the silicon oblique range smaller than 8 degree and optimization of annealing temperature have been studied. A four point probe was used to obtain the sheet resistance after annealing, while high resolution SIMS was used to determine the Boron and Fluorine atomic profiles before and after annealing. Experimental results and theory of ion reflective index are compared. Ion reflective index was found to decrease according to increasing an ion oblique angle. We introduce a simple analytical model ion reflection, concidering the Rutherford scattering model. This result can not be explained by the conventional Gaussian model.

  • PDF

Development of a Microspot Spectroscopic Ellipsometer Using Reflective Objectives, and the Ellipsometric Characterization of Monolayer MoS2

  • Kim, Sang Jun;Lee, Min Ho;Kim, Sang Youl
    • Current Optics and Photonics
    • /
    • v.4 no.4
    • /
    • pp.353-360
    • /
    • 2020
  • Adopting an elaborately designed reflective objective consisting of four mirrors, we have developed a rotating-polarizer-type microspot spectroscopic ellipsometer (SE) with an ultra-small spot size. The diameter of the focused beam, whether evaluated using a direct-image method or a knife-edge method, is less than 8.4 ㎛. After proper correction for the polarizing effect of the mirrors in the reflective objective, we unambiguously determine the dispersion of the complex refractive index and the thickness of monolayer MoS2 using the measured microspot-spectroellipsometric data. The measured ellipsometric spectra are sensitive enough to identify small variations in thickness of MoS2 flakes, which ranged from 0.48 nm to 0.67 nm.

Correlation between Dielectric Constant and Electronic Polarization by the Reflective Index (굴절률에 의한 유전상수와 전자에 의한 분극에 대한 상관성)

  • Oh, Teresa
    • Journal of the Korean Vacuum Society
    • /
    • v.18 no.1
    • /
    • pp.24-29
    • /
    • 2009
  • The SiOC film as inter layer insulator was researched the reason of the decreasing the dielectric constant by the ionic polarization and electronic polarization, respectively. The dielectric constant was measured using the conventional C-V measurement system, and the reflective index owing to the electronic polarization. Two kinds of dielectric constants were compared and then induced the origin of low-k materials. The chemical properties of the SiOC film were analyzed by the FTIR spectra, and the carbon content was obtained by the deconvoluted data of FTIR spectra. The variation of the carbon content tended to similar to the trend of reflective index, but was in inverse proportion to the dielectric constant. The effect of the electronic polarization did not affect the decreasing the dielectric constant, however the ionic polarization decreased effectively the dielectric constant of the SiOC film.

A Study on the Mechanism and Design of Reflective Sheet (반사시트의 메커니즘 및 설계에 관한 연구)

  • Lee, Ho-Yeon;Jung, Ha-Kyu;Oh, Young-Tak;Kwon, Won-Tae
    • Transactions of the Korean Society of Machine Tool Engineers
    • /
    • v.17 no.1
    • /
    • pp.65-70
    • /
    • 2008
  • The shape and the material of a reflective sheet affect the amount and the range of retroreflection on incident angle of light, significantly. In this study, the method to determine the shape and the material of the reflective sheet is introduced for the maximum retroreflection. Since the microprism shape with an equilateral triangle base has been used widely, the shape optimization of the microprism shape is carried out. The path of the light within the prism is geometrically calculated to find the relationship between incoming and outgoing light to and from a microprism. The optimal shape of a microprism found by the simulation has almost same figure with the one being used in industry for the maximum retroreflection. It is also found that the refraction index of the reflective sheet is another parameter to control for maximum retroreflection and the range of retroreflection.

Circular Polarizers for Reflective LCDs

  • Yoshimi, Hiroyuki;Yano, Shuji;Fujimura, Yasuo
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2002.08a
    • /
    • pp.905-909
    • /
    • 2002
  • Characteristics of reflective LCDs, which have gained a lot of notice in recent years, rely largely on optical design of circular polarizers and the quarter-wave plates, as a component. Important design includes wavelength dispersion, viewing angle, uniformity of display and matching of refractive index. Our work has contributed to improving performance of reflective LCDs by enhancing the characteristics of polymer film using stretching and optical lamination technologies. To design that offers higher contrast and wider viewing angle, we have discovered that it is necessary to control viewing angle variation of the polarizing axis in order to compensate for the viewing angle of the polarizing film as well as the optical anisotropic properties of liquid crystal. Applying this technology to circular polarizers used for reflective LCDs enables design of wide viewing angle circular polarizers. In order to realize higher contrast for reflective LCDs, it is also necessary to design other optical materials including polarizing films. For design of hybrid optical film, it is particularly necessary to reduce surface reflection and interface reflection. This paper also reports our findings concerning this topic.

  • PDF

Deposition of SiO2 Thin Film for the Core of Planar Light-Wave-Guide by Transformer Coupled Plasma Chemical-Vapor-Deposition (TCP-CVD 장비를 활용한 광도파로용 Core-SiO2 증착)

  • Kim, Chang-Jo;Shin, Paik-Kyun
    • Journal of the Korean Vacuum Society
    • /
    • v.19 no.3
    • /
    • pp.230-235
    • /
    • 2010
  • In this paper, we controlled the deposition rate and reflective index with process conditions that are TCP power, gas flow ratio and bias for optical properties of $SiO_2$ thin film using TCP-CVD equipment. We obtained a excellent $SiO_2$ thin film which has a excellent uniformity (<1 [%]), deposition rate (0.28 [${\mu}m$/ min]) and reflective index (1.4610-1.4621) within 4" wafer with process conditions ($SiH_4:O_2$=50 : 100 [sccm], TCP power 1 [kW], bias 200 [W]) at [$300^{\circ}C$].

Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source

  • Choi, Min-Jun;Kwon, O Dae;Choi, Sang Dae;Baek, Ju-Yeoul;An, Kyoung-Joon;Chung, Kwun-Bum
    • Applied Science and Convergence Technology
    • /
    • v.25 no.4
    • /
    • pp.73-76
    • /
    • 2016
  • Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

Influence of Deposition Method on Refractive Index of SiO2 and TiO2 Thin Films for Anti-reflective Multilayers

  • Song, Myung-Keun;Yang, Woo-Seok;Kwon, Soon-Woo;Song, Yo-Seung;Cho, Nam-Ihn;Lee, Deuk-Yong
    • Journal of the Korean Ceramic Society
    • /
    • v.45 no.9
    • /
    • pp.524-530
    • /
    • 2008
  • Anti-Reflective (AR) thin film coatings of $SiO_2$ (n= 1.48) and $TiO_2$ (n=2.17) were deposited by ion-beam assisted deposition (IBAD) with End-Hall ion source and conventional electron beam (e-beam) evaporation to investigate the effect of deposition method on the refractive indicies (n) of the fIlms. Green-light generation using a GaAs laser diode was achieved via excitation of the second harmonic. The latter resulted from the transmission of the fundamental guided-mode wave of 1064 nm through periodically poled $LiNbO_3$. Large differences in the refractive indicies of each of the layers in the multilayer coating may improve AR performance. IBAD of $SiO_2$ reduced its refractive index from 1.45 to 1.34 at 1064 nm. Conversely, e-beam evaporation of $TiO_2$ increased its refractive index from 1.80 to 2.11. In addition, no fluctuations in absorption at the wavelength of 1064 nm were found. The results suggest that films prepared by different deposition methods can increase the effectiveness of multilayer AR coatings.

Durable High Performance Single Layer Anti-Reflective Coatings via Wet UV Curing Technology

  • Thies, Jens;Currie, Edwin;Meijers, Guido;Southwell, John;Chawla, Chander
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2004.08a
    • /
    • pp.98-100
    • /
    • 2004
  • We report a novel manner for preparing single layer anti-reflective coatings with excellent optical properties (<1% reflection) over a broad wavelength regime. The technology is based upon the self-assembly and UV curing of reactive nano-particles, leading to nano-structured coatings with a gradient in refractive index. The single processing step leading to such coatings is fast, robust and cost effective. Furthermore in this paper we will address the mechanical durability of such nano-structured coatings.

  • PDF