• Proceedings of the Korean Society of Broadcast Engineers Conference
• /
• 2009.01a
• /
• pp.803-807
• /
• 2009

The bobsleigh is a winter sport which use a sled to slide down an ice-covered course. There is a big expectation for having a training environment and being able to train year round. At present, training is very limited due to the season or course facilities. A variety of VR (Virtual Reality) equipment has been developed in recent years, and it is beginning to spread. We have also made our contribution in bobsleigh simulation. The reactive force applied in our bobsleigh simulation is much smaller than that of a real bobsleigh. This paper proposes a method to enhance reactive force of bobsleigh simulation in real time. The reactive force is magnified instantly in the physically-based simulation. The Laplacian filter is applied to the sequence of reactive force, this technique is often used in the field of image processing. The simulation is comprised of four large scale surround screens and a 6-D.O.F. (Degree Of Freedom) motion system. We also conducted an experiment with several motion patterns to evaluate the effectiveness of enhancement. The experimental results proved useful in some cases.

• Journal of Power Electronics
• /
• v.15 no.1
• /
• pp.235-245
• /
• 2015

This paper proposes a reactive current assignment and control strategy for a doubly-fed induction generator (DFIG) based wind-turbine generation system under generic grid voltage sag or swell conditions. The system's active and reactive power constrains during grid faults are investigated with both the grid- and rotor-side convertors (GSC and RSC) maximum ampere limits considered. To meet the latest grid codes, especially the low- and high-voltage ride-through (LVRT and HVRT) requirements, an adaptive reactive current control scheme is investigated. In addition, a torque-oscillation suppression technique is designed to reduce the mechanism stress on turbine systems caused by intensive voltage variations. Simulation and experiment studies demonstrate the feasibility and effectiveness of the proposed control scheme to enhance the fault ride-through (FRT) capability of DFIG-based wind turbines during violent changes in grid voltage.

• Journal of the Korean Ceramic Society
• /
• v.49 no.4
• /
• pp.308-317
• /
• 2012

Reactive processing, such as reactive hot pressing (RHP) and reactive spark plasma sintering (R-SPS), is effective densification method to prepare $ZrB_2$-based ultra high temperature ceramics (UHTCs). The present paper reviewed some typical reactive processing of $ZrB_2$-based UHTCs. All the reactions from the starting materials in the reactive processing are thermodynamically favorable, which generate enough energy and driving force for the densification of the final products under a relatively low temperature. Besides, compared with non-reactive processing, anisotropic $ZrB_2$ grains, such as $ZrB_2$ platelets, can only be obtained in the reactive processing, resulting in an improvement of the mechanical properties.

• Journal of Adhesion and Interface
• /
• v.22 no.2
• /
• pp.31-38
• /
• 2021

In this study, a nonionic reactive emulsifier with aromatic and acryl group was synthesized by using polyoxyethylene(10) dodecylphenyl ether with 3-butenoic acid. The synthesized nonionic reactive emulsifier was confirmed by ¹H-NMR and FT-IR. In addition, the reactive emulsifier synthesized in the preparation of aqueous acrylic adhesives base emulsion was used and the properties of the solid content, conversion, particle size distribution, peel strength and high temperature holding force were compared to those of nonionic emulsifiers without aromatic group. The particle size was distributed from 370 nm to 698 nm, and the peel strength were measured in the range of 1.507~1.802 kg_f. The high temperature holding force of prepared adhesives base emulsion were measured in the range of 0.50~2.00 mm. Especially, in the result of synthesized nonionic reactive emulsifier with aromatic group, it was confirmed that high temperature holding force results were the most excellent than the case of using other nonionic reactive emulsifiers, and it can be useful for water-based acryl pressure sensitive adhesive.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.18 no.5
• /
• pp.414-422
• /
• 2005

This paper shows the results of atomistic modeling for the Interaction between spherical nano abrasive and substrate In chemical mechanical polishing processes. Atomistic modeling was achieved from 2-dimensional molecular dynamics simulations using the Lennard-jones 12-6 potentials. We proposed and investigated three mechanical models: (1) Constant Force Model; (2) Constant Depth Model, (3) Variable Force Model, and three chemical models, such as (1) Chemically Reactive Surface Model, (2) Chemically Passivating Surface Model, and (3) Chemically Passivating-reactive Surface Model. From the results obtained from classical molecular dynamics simulations for these models, we concluded that atomistic chemical mechanical polishing model based on both Variable Force Model and Chemically Passivating-reactive Surface Model were the most suitable for realistic simulation of chemical mechanical polishing in the atomic scale. The proposed model can be extended to investigate the 3-dimensional chemical mechanical polishing processes in the atomic scale.

• Journal of the Korean Society for Heat Treatment
• /
• v.14 no.3
• /
• pp.151-154
• /
• 2001

$TiO_2$ thin film has wide application because of its high capacitanca, reflection, and good transmissivity in visible range. $TiO_2$ thin film can be made by thermal deposition method, reactive evaporation method, activated reactive evaporation(ARE) method. In the case of thermal deposition, the oxygen deficiency can occur because the melting point of Ti is very high. While in the case of reactive evaporation, high density $TiO_2$ can not be made, because reactive gas($O_2$) and evaporated material(Ti) are not fully combined, activated reactive evaporation, $TiO_2$ is easily deposited at lower gas pressure compared with reactive evaporation because the ionized reactive gas is made by plasma. Therefore, activated reactive evaporation is very useful to deposit the material having the high melting point. In this work, we formed $TiO_2$ thin film by activated reactive evaporation method. The surface of $TiO_2$ thin film was analyzed by X-ray photoelectron spectroscopy. The surface morphology which was analyzed by atomic force microscopy(AFM) shows that feature of the film surface is uniform. The dielectric capacitance, withstanding voltage were $600{\mu}F/cm^2$, 0.4V respectively. In further work, we can increase the withstanding voltage by improving the deposition parameter of substrates.

• Proceedings of the Korea Society for Energy Engineering kosee Conference
• /
• 1996.04a
• /
• pp.111-114
• /
• 1996

Hydrogen generation by dissociation of water is described. The major force for the dissociation comes from the oxidation potential of the reactive metal reacting with water whereas the minor role is played by electrical discharge which helps sustain the reaction. A premixed reactive metal/water system undergoes a fast hydrogen generation upon the ignition by an electrical pulse. In another method the reactive metal can be fed into the discharge. Some characteristics of the methods are discussed.

• Journal of the Semiconductor & Display Technology
• /
• v.10 no.2
• /
• pp.83-89
• /
• 2011

In this study, we investigated the effects of shutter control by Reactive Magnetron Sputtering using Inductively-Coupled Plasma(ICP) for obtaining ZnO thin films with high purity. The surface morphologies and structure of deposited ZnO thin films were characterized using Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and X-ray Diffractometer (XRD). Also, optical and chemical properties of ZnO thin films were analyzed by Spectroscopic Ellipsometer (SE) and X-ray Photoelectron spectroscopy (XPS). As a result, it observed that ZnO thin films grown at reactive sputtering using shutter control and ICP were higher density, lower surface roughness, better crystallinity than other conventional sputtering deposition methods. For obtaining better quality deposition ZnO thin films, we will investigate the effects of substrate temperature and RF power on shutter control by a reactive magnetron sputtering using inductively-coupled plasma.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2014.02a
• /
• pp.160.2-160.2
• /
• 2014

Recently silicon has attracted intense interest as a promising anode material of lithium-ion batteries due to its extremely high capacity of 4200 mA/g (for Li4.2Si) that is much higher than 372 mAh/g (for LiC6) of graphite. However, it seriously suffers from large volume change (even up to 300%) of the electrode upon lithiation, leading to its pulverization or mechanical failure during lithiation/delithiation processes and the rapid capacity fading. To overcome this problem, Si nanowires have been considered. Use of such Si nanowires provides their facile relaxation during lithiation/delithiation without mechanical breaking. To design better Si electrodes, a study to unveil atomic-scale mechanisms involving the volume expansion and the phase transformation upon lithiation is critical. In order to investigate the lithiation mechanism in Si nanowires, we have developed a reactive force field (ReaxFF) for Si-Li systems based on density functional theory calculations. The ReaxFF method provides a highly transferable simulation method for atomistic scale simulation on chemical reactions at the nanosecond and nanometer scale. Molecular dynamics (MD) simulations with the ReaxFF reproduces well experimental anisotropic volume expansion of Si nanowires during lithiation and diffusion behaviors of lithium atoms, indicating that it would be definitely helpful to investigate lithiation mechanism of Si electrodes and then design new Si electrodes.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.325-325
• /
• 2011

Very initial stage of oxidation process of Si (001) surface at room temperature (300 K) and high temperature (1200 K) was investigated using large scale molecular dynamics simulation. Reactive force field potential [1] was used for the simulation owing to its ability to handle charge variation as well as breaking and forming of bonds associated with the oxidation reaction. The results show that oxygen molecules adsorb dissociatively or otherwise leave the silicon surface. Initial position and orientation of oxygen molecule above the surface play important role in determining final state and time needed to dissociate. At 300 K, continuous transformation of ion $Si^+$ (or suboxide Si2O) to $Si2^+$ (SiO), $Si3^+$ (Si2O3) and finally to $Si4^+$ (SiO2) clearly observed. High temperature silicon surface provide heat energy that enable oxygen atom to penetrate into deeper silicon surface. The heat energy also retards adsorption process. As a result, transformation of ion $Si^+$ is impeded at 1200 K.