• Title/Summary/Keyword: Reaction barrier

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Effect of Skin Fat Lipid Barrier Formation on Hataedock with Coptis Japonica & Glycyrrhiza Uralensis (황련감초 하태독법의 피부 지방장벽형성 증진효과)

  • Ahn, Sang Hyun;Kim, Ki Bong
    • The Journal of Pediatrics of Korean Medicine
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    • v.31 no.3
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    • pp.14-23
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    • 2017
  • Objectives This study is conducted to evaluate skin fat barrier formation of Hataedock using the Coptis japonica & Glycyrrhiza uralensis extract. Methods The 3-week-old NC/Nga mice were divided into 3 groups: control group (Ctrl), Hataedock-treated group that uses the Coptis japonica & Glycyrrhiza uralensis (CGT) extract, and Hataedock-treated group that uses Bifidobacterium (BBT). After 2 weeks, changes in immunohistochemicals, and skin-lipid-barrier regulators were observed for the effects of Hataedock. Results In CGT group, loricrin-positive reaction has been increased by 231%, along with involucrin-positive reaction by 90%, filaggrin-positive reaction by 143%, and ASM-positive reaction by 341% in the stratum corneum. Conclusions Hataedock, using the extract of Coptis japonica & Glycyrrhiza uralensis, increased the expression of proteins promoting keratinocyte differentiation. This leads into conclusion that Hataedock may increase the keratinocyte formation and function which promotes skin barrier formation.

Reaction Kinetics and Dependence of Energy Efficiency in the Dilute Trichloroethylene Removal by Non-thermal Plasma Process combined with Manganese Dioxide

  • Han, Sang-Bo;Oda, Tetsuji;Park, Jae-Youn;Koh, Hee-Seok;Park, Sang-Hyun;Lee, Hyun-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.552-553
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    • 2005
  • In order to improve energy efficiency in the dilute trichloroethylene removal using the nonthermal plasma process, the barrier discharge treatment combined with manganese dioxide was experimentally studied. Reaction kinetics in this process was studied on the basis of final byproducts distribution. Decomposition efficiency was improved to about 99% at the specific energy 40J/L with passing through manganese dioxide. C=C $\pi$ bond cleavage in TCE gave DCAC (single bond, C-C) through oxidation reaction during the barrier discharge plasma treatment. Those DCAC were broken easily in the subsequent catalytic reaction due to the weak bonding energy about 3 ~ 4 eV compared with the double bonding energy in TCE molecules. Oxidation byproducts of DCAC and TCAA from TCE decomposition are generated from the barrier discharge plasma treatment and catalytic surface chemical reaction, respectively. Complete oxidation of TCE into $CO_X$ is required to about 400J/L.

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Barrier Height from Ⅴ-Ⅰ Characteristics of Semiconductor Contact: Reaction of Absorbed Oxygen with Carbon Monoxide on ZnO (1010)

  • 김혜정;한종수
    • Bulletin of the Korean Chemical Society
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    • v.18 no.2
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    • pp.149-151
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    • 1997
  • Barrier height on the surface was monitored at 77 K by observing the inflection of V-I characteristics of ZnO(1010)-ZnO(1010) contact in the surface reaction of oxygen species with carbon monoxide. The contact showed inflections at 10-20 mV and 10-50 mV for the sample adsorbed oxygen at 298 K and 573 K, respectively. When the sample adsorbed oxygen at 573 K was exposed to carbon monoxide at 298 K and 573 K, inflections were observed at 10-40 mV and 10-30 mV, respectively. The results indicated that the adsorption of oxygen on ZnO increased the surface barrier height, and the reaction of carbon monoxide with the oxygen-preadsorbed (at 573 K) ZnO decreased the surface barrier height.

PROPERTIES OF Mo COMPOUNDS AS A DIFFUSION BARRIER BETWEEN Cu AND Si PREPARED BY CO-SPUTTERING

  • Lee, Yong-Hyuk;Park, Jun-Yong;Bae, Jeong-Woon;Yeom, Geun-Young
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.433-439
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    • 1999
  • In this study, the diffusion barrier properties of $1000\AA$ thick molybdenum compounds (Mox=1-5 Si) were investigated using sheet resistance measurements, X-ray diffractometry (XRD), and Rutherford back scattering spectrometry (RBS). Each barrier material was deposited by the de and rf magnetron co-sputtering of Mo and Si, respectively, and annealed at $500-700^{\circ}C$ for 30 min in vacuum. Each barrier material was failed at low temperatures due to Cu diffusion through grain boundaries and defects of barrier thin films or through the reaction of Cu with Si within Mo-barrier thin films. It was found that Mo rich thin films were less effective than Si rich films to Cu penetration activating Cu reaction with the substrate at a temperature higher than $500^{\circ}C$.

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Study on Reactive Non-thermal Plasma Process combined with Metal Oxide Catalyst for Removal of Dilute Trichloroethylene

  • Han Sang-Bo;Oda Tetsuji;Park Jae-Youn;Park Sang-Hyun;Koh Hee-Seok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.3
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    • pp.292-300
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    • 2006
  • In order to improve energy efficiency in the dilute trichloroethylene removal using the nonthermal plasma process, the barrier discharge treatment combined with manganese dioxide was experimentally studied. Reaction kinetics in this process was studied on the basis of final byproducts distribution. Decomposition efficiency was improved to about $99\;\%$ at the specific energy of 40 J/L with passing through manganese dioxide. C=C ${\pi}$ bond cleavage of TCE substances gave DCAC, which has the single bond of C-C through oxidation reaction during the barrier discharge plasma treatment. Those DCAC were broken easily in the subsequent catalytic reaction due to the weak bonding energy about $3{\sim}4\;eV$ compared with the double bonding energy in TCE molecules. Oxidation byproducts of DCAC and TCAA from TCE decomposition are generated from the barrier discharge plasma treatment and catalytic surface chemical reaction, respectively. Complete oxidation of TCE into COx is required to about 400 J/L, but $CO_2$ selectivity remains about $60\;\%$.

Interfacial Reaction Between Oxide Fillers and $P_2O_5$ Glass Matrix for Barrier Ribs in Plasma Display Panel

  • Chong, Eu-Gene;Jeon, Jae-Sam;Sung, Woo-Kyung;Kim, Nam-Sok;Kim, Hyung-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.935-937
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    • 2006
  • Phosphate glass system is expected to be useful as a lead-free material in many devices in plasma display panels (PDP). The present study is mainly focused on the evaluation of interface reaction between ceramic fillers and phosphate glass matrix for barrier ribs in PDP. The results suggest that properties of barrier rib depend on the crystallization behavior and interface reaction between the fillers and glass matrix.

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Transition-State Structures for Solvolysis of Methanesulfonyl Chloride

  • 양기열;강금덕;구인선;이익준
    • Bulletin of the Korean Chemical Society
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    • v.18 no.11
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    • pp.1186-1191
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    • 1997
  • Solvolyses of methanesulfonyl chloride (CH3SO2Cl) in water and methanol have been studied theoretically using ab initio self-consistent reaction field (SCRF) molecular orbital method. All stationary structures including transition state on the potential energy surface in solution have been found and compared with the gas phase structures. The overall reaction occurs via a concerted SN2 mechanism with a non-cyclic trigonal bipyramidal transition state, and the activation barrier is lowered significantly in solution. The transition state for the hydrolysis reaction is looser than that for the methanolysis reaction, and this is in accord with the experimental findings that an SN2 type mechanism, which is shifted toward an SN1 process or an SAN process in the hydrolysis and alcoholysis reaction, respectively, takes place. The catalytic role of additional solvent molecules appears to be a purely general-base catalysis based on the linear transition structures. Experimental barrier can be estimated by taking into account the desolvation energy of nucleophile in the reaction of methanesulfonyl chloride with bulk solvent cluster as a nucleophile.

Effect of Sabaek-san Extract on Skin Damage Recovery in Atopic Dermatitis-induced Mice (사백산추출물의 아토피피부염 유발 백서에서의 피부장벽 손상 회복 효과)

  • Ahn Sang Hyun;Kim Ki Bong
    • The Journal of Pediatrics of Korean Medicine
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    • v.37 no.4
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    • pp.25-33
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    • 2023
  • Objective This study aimed to confirm the effect of Sabaek-san extract on the recovery of skin damage in atopic dermatitis-induced mice. Methods In this study, we used 4-week-old NC/Nga mice that were assigned to four groups: control (Ctrl), lipid barrier elimination (LBEG), dexamethasone (Dx) administration after lipid barrier elimination (DxAG), and Sabaek-san extract administration after lipid barrier elimination (SBAG). Ten rats were assigned to each treatment group. After drug administration for 3 days following lipid barrier elimination, ceramide kinase, caspase 14, sodium hydrogen antiporter (NHE), cathelicidin, claudin, and Toll-like receptor (TLR2) were observed to confirm restoration of skin moisturizer production, antimicrobial barriers, and tight junctions in the skin barrier. Results Ceramide kinase and caspase 14 positive reactions were significantly higher in the SBAG group than in the LBEG or DxAG groups. NHE and cathelicidin showed a higher positive reaction in the SBAG group than in the LBEG and DxAG groups. Claudins and TLR2 showed a higher positive reaction in the SBAG group than in the LBEG or DxAG groups. Conclusion It was confirmed that Sabaek-san extract may have the potential to restore damaged skin barrier in atopic dermatitis.

MO-COMPOUNDS AS A DIFFUSION BARRIER BETWEEN Cu AND Si

  • Kim, Ji-Hyung;Lee, Yong-Hyuk;Kwon, Yong-Sung;Yeom, Geun-Young;Song, Jong-Han
    • Journal of the Korean institute of surface engineering
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    • v.29 no.6
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    • pp.683-690
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    • 1996
  • In this study, the diffusion barrier properties of $1000 \AA$ thick molybdenum compounds (Mo, Mo-N, $MoSi_2$, Mo-Si-N) were investigated using sheet resistance measurements, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Scanning electron microscopy (SEM), and Rutherford backscattering spectrometry (RBS). Each barrier material was deposited by the dc magnetron sputtering, and annealed at 300-$800^{\circ}C$ for 30min in vacuum. Mo and $MoSi_2$ barrier were failed at low temperature due to Cu diffusion through grain bound-aries and defects of Mo thin film and the reaction of Cu with Si within $MoSi_2$ respectively. A failure temperature could be raised to $650^{\circ}C$-30min in the Mo barrier system and to $700^{\circ}C$-30min in the Mo-silicide system by replacing Mo and $MoSi_2$ with Mo-N and Mo-Si-N, respectively. The crystallization temperature in the Mo-silicide film was raised by the addition of $N_2$. It is considered that not only the N, stuffing effect but also the variation of crystallization temperature affects the reaction of Cu with Si within Mo-silicide. It was found that Mo-Si-N is more effective barrier than Mo, $MoSi_2$, or Mo-N to copper penetration preventing Cu reaction with the substrate for 30min at a temperature higher than $650^{\circ}C$.

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$CH_4$ Gas Sensor Utilizing Pd-SiC Schottky Diode (Pd-SiC 쇼트키 다이오드를 이용한 $CH_4$ 가스센서)

  • 김창교;이주헌;이영환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.163-166
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    • 1998
  • The mechanism of methane sensing by Pd-SiC diode was investigated over the temperature range of 400~$600^{\circ}C$. The effects or methane gas reaction on the parameters such as barrier height, initial rate of methane gas reaction are investigated. The methane gas reaction kinetics on the device are also discussed. The physical and chemical mechanism responsible for methane detection are proposed. Analysis of steady-state reaction kinetics using I-V method confirmed that methane gas reaction processes are responsible for the barrier height change in the diode.

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