• 한국연소학회:학술대회논문집
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• 한국연소학회 1999년도 제19회 KOSCO SYMPOSIUM 논문집
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• pp.117-128
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• 1999

The removal of nitrogen oxides(NOx) from $N_{2}/O_{2}$ gas using a pulsed corona discharge was investigated as a function of the reduced electric field(E/N) and the energy density(J/L). A kinetic model was developed to characterize the chemical reactions taking place in a pulsed corona discharge reactor. The model calculates the fractional concentrations of radical species at each pulse-on period and utilizes the radicals to remove NOx for the subsequent pulse-off period. Electron collision reaction data are calculated using ELENDIF program to solve Boltzmann equation for electron energy distribution function, and the subsequent chemical reactions are calculated using CHEMKIN-II program to solve stiff ODE(ordinary differential equation) problems for species concentrations. The corona discharge energy per pulse and the time-space averaged E/N were obtained by fitting the model to experimental data. The model calculation shows good agreement with the experimental data, and predicts the formation of other species such as $NO_{2}$, $O_{3}$ and $N_{2}O$.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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• pp.895-897
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• 1998

The optical spectra of microwave plasma by four kinds of gases($N_2$, $N_2-CH_4$, $H_{2}-CH_{4}$ and Air-$CH_4$) have been measured for investigating 388.4[nm] peak which has the same intensity as $H_{\alpha}$(656.4[nm]) peak. A 388.4[nm] peak by $N_2$ plasma, $N_{2}-CH_{4}$ plasma and Air-$CH_4$ plasma may be CN peak because it is with 337.1, 357.8 and 316.0[nm] peaks by $N_2$. And a 388.4[nm] peak by $H_{2}-CH_{4}$ plasma without by $N_2$ 337.1, 357.8 and 316.0[nm] peaks may be CH peak. In the investigation results for optical spectra by $H_{2}-CH_{4}$ plasma and $H_{2}-CH_{4}-O_{2}$ plasma, the density of hydrogen atom was increased because oxygen decompose hydrogen molecules in $H_{2}-CH_{4}$ plasma with oxygen. These hydrogen atom decompose $CH_4$ and increase CH radical. And the crystalline of deposited diamond was good and the growth rate increased.

• Korean Chemical Engineering Research
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• 제44권5호
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• pp.483-488
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• 2006

유기고분자에 대한 건식 식각공정으로 remote 플라즈마를 이용하여 유리 표면에 도포된 PMMA의 식각공정에 관한 연구로 플라즈마 출력, 반응가스, 플라즈마 발생원과의 거리에 대한 식각특성을 측정하였다. 플라즈마 발생원으로부터 멀어질수록 플라즈마에 의해 발생된 라디칼 밀도로 인해 PMMA 식각속도가 감소하였다. 플라즈마 내에서 발생된 라디칼에 의해 PMMA가 제거되며, 플라즈마 출력이 증가할수록 PMMA 표면과 반응하는 라디칼 증가로 식각속도는 선형적으로 증가하였다. 식각 기체에서 산소의 양이 증가함에 따라 식각속도 증가와 더불어 식각표면의 거칠기도 증가함을 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.354-357
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• 2002

Thermally grown gate oxide on 4H-SiC wafer was investigated. The oxide layers were grown at l150$^{\circ}C$ varying the carrier gas and post activation annealing conditions. Capacitance-Voltage(C-V) characteristic curves were obtained and compared using various gate electrode such as Al, Ni and poly-Si. The interface trap density can be reduced by using post oxidation annealing process in Ar atmosphere. All of the samples which were not performed a post oxidation annealing process show negative oxide effective charge. The negative oxide effective charges may come from oxygen radical. After the post oxidation annealing, the oxygen radicals fixed and the effective oxide charge become positive. The effective oxide charge is negative even in the annealed sample when we use poly silicon gate. Poly silicon layer was dope by POCl$_3$ process. The oxide layer may be affected by P ions in poly silicon layer due to the high temperature of the POCl$_3$ doping process.

• 한국식품영양학회지
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• 제31권4호
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• pp.478-484
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• 2018

This study evaluated the quality characteristics of rice cookies prepared with different amounts (0%, 5%, 10%, and 15%) of hempseed powder. The values of density and pH in the cookies did not significantly differ among the groups. The moisture content ranged from 4.86% to 5.83% and was the highest in control groups. The spread factor increased with increasing hempseed powder concentration. The lightness value decreased with increasing amounts of hempseed powder, while the redness and yellowness values did not differ among groups. The incorporation of hempseed in cookies increased cookie hardness. A consumer acceptance test revealed that cookies with hempseed powder added were more preferable than those of the control groups in terms of overall acceptability. The total polyphenol content of the control groups was 7.15 mg GAE/100 g, while that of the hempseed added groups ranged from 12.36 to 17.17 mg GAE/100 g. The substitution of wheat flour for hempseed powder yielded rice cookies with a higher DPPH (2,2-diphenyl-1-picrylhydrazyl) radical scavenging activity. The above results indicate that the most desirable cookies were those prepared with the addition of 15% hempseed powder.

• 한국환경과학회지
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• 제18권4호
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• pp.445-450
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• 2009

In this study, the fundamental experiments were performed for catalytic oxidation of NO (50 ppm) on $MnO_2$ in the presence of ozone. The experiments were carried out at various catalytic temperatures ($30-120^{\circ}C$) and ozone concentrations (50-150 ppm) to investigate the behavior of NO oxidation. The honeycomb type $MnO_2$ catalyst was rectangular with a cell density of 300 cells per square inch. Due to $O_3$ injection, NO reacted with $O_3$ to form $NO_2$, which was adsorbed at the $MnO_2$ surface. The excessive ozone was decomposed to $O^*$ onto the $MnO_2$ catalyst bed, and then that $O^*$ was reacted with $NO_2$ to form $NO_3^-$. It was found that the optimal $O_3$/NO ratio for catalytic oxidation of NO on $MnO_2$ was 2.0, and the NO removal efficiency on $MnO_2$ was 83% at $30^{\circ}C$. As a result, NO was converted mainly to $NO_3^-$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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• pp.65-65
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• 2009

본 연구에서는 ICP 식각장치 및 $Cl_2$/Ar 플라즈마에 의한 $Ba_2Ti_9O_{20}$(BTO) 박막의 식각 특성을 고찰하였다. XPS 분석 장치를 이용하여 식각 표면 반응을 조사하였으며, 공정 변수 ($Cl_2$/Ar 가스 혼합비, 소스파워, 챔버 압력, 바이어스 파워)에 따라 플라즈마 특성 변화를 Langmuir probe measuring system을 이용하여 추출하였다. $Cl_2$/Ar 가스에서 Ar 가스의 혼합비가 증가함에 따라 BTO 박막의 식각 속도는 감소하였으며, $Cl_2$ 가스만을 사용하는 경우, 31.7 nm/min 으로 가장 높은 식각 속도를 보였다. Ar 가스의 혼합비에 따른 BTO박막의 식각속도 변화는 Langmuir probe 특성과 XPS 분석결과로부터 플라즈마 내에 형성되는 Cl radical density와 밀접한 관련이 있는 것으로 판단할 수 있다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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• pp.57-57
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• 2009

In this work, we carried out the variation of surface characteristics of organic polymer films by O2 plasma. The plasma diagnostics were performed by DLP(Double Langmuir Probe) and OES(Optical Emission Spectroscopy) measurements. Moreover, variation of surface characteristics were measured by AFM(Atomic Force Microscope), XPS(X-ray Photoelectron Spectroscopy), and contact angle goniometer. It was found that the etch rate of organic films was controlled by O radicals flux and dc bias voltage. And O radical density and dc bias voltage increased with increasing bias power. So, it was changed surface energy as a function of surface roughness and O/C ratio in organic films.

• 한국응용과학기술학회지
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• 제37권5호
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• pp.1100-1105
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• 2020

본 연구는 기계화학적 활성화 된 스카치테이프가 금속 이온 수용액에서 유발하는 자발적 금속 나노입자 필름 형성의 구동력과 그 크기를 전기화학적 방법으로 분석했다. 은 필름이 형성된 테이프를 질산에 녹이고, 완충용액과 섞어 전기화학 측정용 샘플을 준비했다. 양극 벗김 전압전류법의 피크 신호를 통해, 은 입자의 자발적 환원에 소모된 전하량을 측정했다. 이를 검정 곡선에 대입하여, 환원된 은의 양을 구했다. 그 결과 은의 양이 선행 연구 대비 10⁶배 많은 점, 수용액에서 전하를 가진 이온들의 짧은 수명을 참고하여, 자발적 반응의 구동력을 라디칼로 결론 냈다.

• Mycobiology
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• 제36권4호
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• pp.260-265
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• 2008

Cyclic voltammetric measurements were performed for Co(II), Ni(II), Cu(II) and Zn(II) complexes of 1 : 1 alternating copolymer, poly(3-nitrobenzylidene-1-naphthylamine-co-succinic anhydride) (L) and Ni(II) and Cu(II) complexes of 1 : 1 alternating copolymer, poly(3-nitrobenzylidene-1-naphthylamine-co-methacrylic acid) ($L^1$). The in vitro biological screening effects of the investigated compounds were tested against the fungal species including Aspergillus niger, Rhizopus stolonifer, Aspergillus flavus, Rhizoctonia bataicola and Candida albicans and bacterial species including Staphylococcus aureus, Escherichia coli, Klebsiella pneumaniae, Proteus vulgaris and Pseudomonas aeruginosa by well diffusion method. A comparative study of inhibition values of the copolymers and their complexes indicates that the complexes exhibit higher antimicrobial activity. Copper ions are proven to be essential for the growth-inhibitor effect. The extent of inhibition appeared to be strongly dependent on the initial cell density and on the growth medium. The nuclease activity of the above metal complexes were assessed by gel electrophoresis assay and the results show that the copper complexes can cleave pUC18 DNA effectively in presence of hydrogen peroxide compared to other metal complexes. The degradation experiments using Rhodamine B dye indicate that the hydroxyl radical species are involved in the DNA cleavage reactions.