1 |
Sugimoto, F. and Okamura, S., 'Adsorption Behavior of Organic Contaminants on a Silicon Wafer Surface,' J. Electrochem. Soc., 146(7), 2725-2729(1999)
DOI
|
2 |
Delfino, M., Salimian, S., Hdul, D., Ellingboe, A. and Tsai, W., 'Plasma Cleaned Si Analyzed in situ by x-ray Photoelectron Spectroscopy, Secondary Ion Mass Spectrometry, and Actinometry,' J. Appl. Phys., 71(2), 1001-1009(1992)
DOI
|
3 |
Louis, D., Nier, M. E., Fery, C., Heitzmann, M., Papon, A. M. and Renard, S., 'Poly-Si Gate Patterning Issues for Ultimate MOSFET,' Microelectron. Eng., 61-62, 859-865(2002)
|
4 |
International Technology Roadmap for Semiconductors, ITRS, (2002)
|
5 |
Bell, F. H., Jouber, O. and Vallier, L., 'Influence of the Nature of the Mask on Polysilicon Gate Patterning in High Density Plasma,' Microelectron. Eng., 30, 333-336(1996)
DOI
ScienceOn
|
6 |
Jung, J. K. and Lee, W. J., 'Dry Etching Characteristics of Pb (Zr,Ti) Films in and Inductively Coupled Plasmas,' Jan. J. Appl. Phys., 40(3), 1408-1419(2001)
DOI
|
7 |
Basit, N. A. and Kim, H. K., 'Crystallixation of Pb(Zr,Ti) Films Prepared by Radio Frequency Magnetron Sputtering With a Stoichiometric Oxide Target,' J. Vac. Sci. Technol. A., 13(4), 2214- 2220(1995)
DOI
ScienceOn
|
8 |
Pang, S. W., Sung, K. T. and Ko, K. K., 'Etching of Photoresist Using Oxygen Plasma Generated by a Multipolar Electron Cyclotron Resonance Source,' J. Vac. Sci. Technol. B., 10(3), 1118-1123 (1992)
DOI
|
9 |
Lin, Y. Y., Liu, Q., Tang, T. A. and Yao, X., 'XPS Analysis of Pb in Film After dry-etching by Plasma,' Applied Surface Science, 165(1), 34-37(2000)
DOI
ScienceOn
|