• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2006.11a
• /
• pp.107-108
• /
• 2006

ZnO is a promising material for UV or blue LEDs p-Type ZnO thin films which are imperative for the p-n junction of LEDs are difficult to achieve because of strong compensation of intrinsic defects such as zinc interstitial and oxygen vacancy. The method of codoping group three elements and group five elements is effective for the realization of p-type ZnO films. In this study, We codoped N and Al m ZnO thin films by RF magnetron sputtering and annealed the films in sputtering chamber. Some films showed p-type conductivity m Seeback effect measurement.

• 한국생물공학회:학술대회논문집
• /
• 2001.11a
• /
• pp.329-332
• /
• 2001

The stability of red pigment isolated from RF101 was determined over a period of storage for the pH, light, temperature and various metal ions. The absorption maximum of red pigment was 510nm. Red pigment was stable from pH 5 to pH 9 and in dark conditions. It was also stable against temperature below $25^{\circ}C$ and in $K^+$, $Ca^{2+}$, $Mg^{2+}$, Antibacterial activity of RF101 showed growth-inhibitory activity against plant pathogens Agrobacterium spp.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.06a
• /
• pp.209-209
• /
• 2007

Passive Device는 RF Circuit을 제작할 때 많은 면적을 차지하고 있으며 이를 감소시키기 위해 여러 연구가 진행되고 있다. 최근 SoP-L 공정을 이용한 많은 연구가 진행되고 있는데 PCB 제작에 이용되는 일반적인 재료와 공정을 그대로 이용함으로써 개발 비용과 시간 면에서 많은 장점을 가지기 때문이다. SoP-L의 또 하나 장점은 다층구조를 만들기가 용이하다는 점이다. 각 층 간에는 Via를 사용하여 연결하게 되는데, RF Circuit은 회로의 구조와 물성에 따라 특성이 결정되며, 그만큼 Via를 썼을 때 그 영향을 생각해야 한다. 본 연구에서는 multi-layer LCP substrate에 다수의 Via를 chain 구조로 형성하여 전기적 특성을 확인하였다. Via가 70um 두께의 substrate를 관통하면서 상층과 하층의 Conductor을 연속적으로 연결하게 된다. 이 구조의 Resistance와 Insertion Loss를 측정하여, Via의 크기 별 수율과 평균적인 Resistance, RF 계측기로 재현성을 확인하였다. 이를 바탕으로 공정에서의 안정성을 확보하고 Via의 크기와 도금방법에 의한 RF Circuit에서의 영향을 파악하여, 앞으로의 RF Device 개발에 도움이 될 것으로 기대한다. 특히 유기물을 이용한 다층구조의 고주파 RF Circuit에 Via를 적용할 때의 영향을 설계에서부터 고려할 수 있는 자료가 될 것이다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2005.11a
• /
• pp.97-98
• /
• 2005

To investigate the ZnO thin films which is interested in the next generation of short wavelength LEDs and Lasers, our ZnO thin films were deposited by RF sputtering system. Phosphorus (P) and arsenic (As) were diffused into about 2.1${\mu}m$ ZnO thin films sputtered by RF magnetron sputtering system mn ampoule tube which was below $5\times10^{-7}$ Torr. The dopant sources of phosphorus and arsenic were $Zn_3P_2$ and $ZnAs_2$. Those diffusion was perform at 500, 600, and 700$^{\circ}C$ during 3hr. We find the condition of p-type ZnO whose diffusion condition is 700$^{\circ}C$, 3hr Our p-type ZnO thin film has not only very high carrier concentration of above $10^{19}/cm^3$ but also low resistivity of $5\times10^{-3}{\Omega}cm$.

• ETRI Journal
• /
• v.27 no.5
• /
• pp.579-584
• /
• 2005

A CMOS direct-conversion mixer with a single transistor-level topology is proposed in this paper. Since the single transistor-level topology needs smaller supply voltage than the conventional Gilbert-cell topology, the proposed mixer structure is suitable for a low power and highly integrated RF system-on-a-chip (SoC). The proposed direct-conversion mixer is designed for the multi-band ultra-wideband (UWB) system covering from 3 to 7 GHz. The conversion gain and input P1dB of the mixer are about 3 dB and -10 dBm, respectively, with multi-band RF signals. The mixer consumes 4.3 mA under a 1.8 V supply voltage.

• Journal of International Academy of Physical Therapy Research
• /
• v.7 no.2
• /
• pp.1037-1040
• /
• 2016

This study aims to investigate the effects of ankle foot orthosis(AFO) on the activities of tibialis anterior(TA), soleus(Sol), rectus femoris(RF) and biceps femoris(BF) during stairs descending. The activities of TA, Sol, RF and BF were initially measured while descending 4 stairs without using AFO. The activities of the same muscles were then measured again while descending 4 stairs while using AFO. Wilcoxon signed-rank tests were used to analyze the results in order to examine the differences between the with using AFO and without using AFO. Although the activities of TA, Sol and RF were relatively lower while using AFO than without using AFO, only the differences in Sol and RF activities were significant(p<0.05). The activity of BF was relatively higher while using AFO compared to the activity of BF observed without using AFO. However, difference was not significant(p>0.05). Conclusion of this study was observed since AFO's ground reaction force absorption during stairs descending reduced the need to use So and RF that is related to shock absorption. BF activity was increased with AFO than without during standing forward to correct the trunk stability.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.06a
• /
• pp.68-69
• /
• 2007

We have prepared p-type ZnO:Al films in pure oxygen ambient on n-type Si (100) and homo buffer layers by RF magnetron sputtering system. Hall effect measurement shows that the film annealed at $600^{\circ}C$ possesses p-type conductivity and the film annealed $800^{\circ}C$ does not. PL spectra show different properties of p- and n-type ZnO film. The corresponding peaks of PL spectra of p- and n-type show at about same positions. The intensities of high photon energy of n-type film on buffer shows decreasing tendency.

• Ceramist
• /
• v.8 no.3
• /
• pp.25-30
• /
• 2005

최근 SOP에 대한 관심이 늘어나고 있으며 그에 따라 새로운 재료에 대한 관심도 증폭되고 있다. 예전의 단순한 신호 전달의 매개체 역할에서 벗어나 많은 수동 소자나 RF소자들을 내장하고 궁극적으로는 능동 소자까지 단일 기판위에 탑재하기 위해서는 기존의 RF 적인 전기적인 요구 특성 위에 많은 부가 특성들이 요구된다. 특히 SI이나 GaAs같은 능동 소자들과의 Assembly과정에서의 신뢰성을 확보하기 위해 낮은 선팽창 계수나 높은 탄성 계수 등의 기계적인 특성들이 요구되고 있으며 또한 점차 복잡한 회로 구조 등을 구현하기 위해 무수축이라는 새로운 공법 또한 요구되어 지고 있다. 그리고 사용주파수가 점차 높아짐에 따라 한편으로는 저유전율과 저손실의 재료가 요구되고 있으며 다른 한편으로는 embedded Capacitance의 요구에 맞춰 고유전율의 기판재료 또한 요구되어 지고 있다. 따라서 궁극적으로는 회로 구현의 목적에 따라 저유전율과 고유전율의 이종 재료의 접합이라는 문제 또한 자연스럽게 대두되고 있다. 이처럼 SoP에 대한 시장의 요구가 증가함에 따라 새로운 재료개발의 요구 또한 늘어나게 될 것으로 예상된다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.19 no.5
• /
• pp.461-466
• /
• 2006

To investigate the ZnO thin films which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF sputtering system. At sputtering process of ZnO thin films, substrate temperature, work pressure respectively is $100^{\circ}C$ and 15 mTorr, and the purity of target is ZnO 5 N. The ZnO thin films were in-situ annealed at $600^{\circ}C$ in $O_2$ atmosphere. The thickness of ZnO thin films has implemented about $1.6{\mu}m$ at SEM analysis after in-situ annealing process. We have investigated the crystal structure of substrates, and so structural properties of ZnO thin films has estimate by using XRD, FWHM, FE-SEM and AFM. XRD and FE-SEM showed that ZnO thin films grown on substrates had a c-axis preferential orientation in the [0001] crystal direction. XPS spectra showed that ZnO thin film was showed a peak positions corresponding to the O1s and the Zn2p. As form above XPS, we showed that the atom ratio of Zn:O related 1:1.1504 on ZnO thin film, so we could obtained useful information for p-type ZnO thin film.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2006.06a
• /
• pp.120-121
• /
• 2006

To investigate the ZnO thin films which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF magnetron sputtering system. Al sputtering process of ZnO thin films substrate temperature, work pressure respectively is $100^{\circ}C$ and 15 mTorr, and the purity of target is ZnO 5N. The ZnO thin films were in-situ annealed at $600^{\circ}C$, $800^{\circ}C$ in $O_2$ atmosphere. Phosphorus (P) and arsenic (As) were diffused into ZnO thin films sputtered by RF magnetron sputtering system in ampoule tube which was below $5{\times}10^{-7}$ Torr. The dopant sources of phosphorus and arsenic were $Zn_3P_2$ and $ZnAS_2$. Those diffusion was perform at $650^{\circ}C$ during 3hr. We confirmed that p-type properties of ZnO thin films were concerned with dopant sources rather than diffusion temperature.