• 제목/요약/키워드: RF magnetron sputtering technique

검색결과 92건 처리시간 0.024초

스퍼터링 방법을 이용한 SrTiO$_3$박막의 저항을 특성 (The Resistivity Properties of SrTiO$_3$ Thin Films by Sputtering method.)

  • 이우선;손경춘;서용진;김남오;이경섭;김형곤
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.207-210
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    • 1999
  • The objective of this study Is to deposited the preparation of SrTiO$_3$3 dielectric thin films on Ag/barrier-mater/Si(N-type 100) bottom electrode using a conventional rf-magnetron sputtering technique with a ceramic target under various conditions. It is demonstrated that the leakage current of films are strongly dependent on the atmosphere during deposition and the substrate temperature. The resistivity properties of films deposited on silicon substrates were very high resistivity. Capacitance of the films properties were the highest value(1000pF) and dependent on substrate temperature.

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박막 인덕터 어레이의 Q-Factor 특성에 관한 연구 (A Study on the Q-Factor Characteristics of Integrated Inductors Array)

  • 김인성;민복기;송재성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 C
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    • pp.2105-2107
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    • 2004
  • In this study, Spiral inductors on the $SiO_2$/Si(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of 2 ${\mu}m$ was deposited on the substrate. Also we fabricated square inductors through the wet chemical etching technique. The inductors are completely specified by the turn width and the spacing between spirals. Both the width and spacing between spirals were varied from 10 to 60 ${\mu}m$ and from 20 to 70 ${\mu}m$, respectively. Inductance and Q factor dependent on the RF frequency were investigated to analyze performance of inductor arrays. Also, We recommend that the reasonable Q-factors, spec's turns and thickness of the coil for inductors cab be set to be ideal condition.

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적층구조 $BaTiO_3$ 박막의 전기적 특성 (Electrical properties of layered $BaTiO_3$ thin film)

  • 송만호;윤기현
    • 한국세라믹학회지
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    • 제34권2호
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    • pp.181-187
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    • 1997
  • 다결정 BaTiO3 박막의 높은 유전상수와 비정질 BaTiO3 박막의 우수한 절연특성을 함께 지닌 적층구조 BaTiO3 박막을 제조하여 적층방법에 따른 전기적 특성을 비교, 평가하였다. BaTiO3 박막은 ITO 투명전전막이 입혀진 유리기판위에 rf=magnetron sputtering방법으로 형성하였으며 적층구조 BaTiO3박막의 제조에는 다결정 BaTiO3 박막의 상부에 기판의 자연 냉각과정중에 비정질층이 형성되는 새로운 적층방법을 사용하였다. 이와같이 제조된 적층박막은 다결정 BaTiO3 박막의 상부에 상온에서 비정질층을 형성시키는 일반적인 적층방법으로 제조한 적층박막에 비하여 높은 단위면적당 정전용량과 유전상수, 우수한 절연특성을 나타내었다. 일반적인 적층방법에 의하여 이중층 구조가 형성되는 반면, 새로운 적층방법으로 제조된 적층박막은 AES depth profile과 전기적 특성 분석을 통하여 비정질/microcrystalline/다결정 구조의 다층구조를 지닌 것으로 확인되었다.

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건습환경중 순 Mg박막의 EIS부식 모니터링 특성 관찰 (Properties Investigation of Corrosion Monitoring for Pure Mg Thin Films under Wet-Dry Cyclic Conditions by Using Electrochemical Impedance Spectroscopy Method)

  • 배일용;이경희;김기준;문경만;이명훈
    • 한국마린엔지니어링학회:학술대회논문집
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    • 한국마린엔지니어링학회 2005년도 후기학술대회논문집
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    • pp.192-193
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    • 2005
  • Magnesium thin films were prepared on cold-rolled steel substrates by RF(Radio Frequency) magnetron sputtering technique.$^{1)}$ The crystal orientation and monitoring of the deposited films were investigated by using XRD(X-ray Diffraction) and EIS(Electrochemical Impedance Spectroscopy), respectively. The corrosion rates of Mg thin films deposited with different argon gas pressure and substrate bias voltage were monitored by AC impedance method under a cyclic wet-dry condition, which was conducted by exposure to alternate conditions of 1h immersion in 3%NaCl solution and 5h drying at 60% RH and 25$^{\circ}C$. The result of corrosion rate of Mg thin films deposited at various Ar gas pressures and substrate bias voltage under wet-dry cyclic exposure in chloride-containing solutions was showed the following conclusions. At the region I during the onset of the wet cycle, corrosion rate showed relatively low value. The increase in the Corrosion rate of region II is due to the increase in the chloride concentration. Corrosion rate of region III during the onset of the cycle zero and salt crystals remain on the metal surface.$^{2)}$

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기판 바이어스 DC 전원의 종류와 반응가스 분압비가 3성분계 B-C-N 코팅막의 합성과 마찰 특성에 미치는 영향 (Effects of DC Substrate Bias Power Sources and Reactant Gas Ratio on Synthesis and Tribological Properties of Ternary B-C-N Coatings)

  • 정다운;김두인;김광호
    • 한국표면공학회지
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    • 제44권2호
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    • pp.60-67
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    • 2011
  • Ternary B-C-N coatings were deposited on Si(100) wafer substrate from $B_4C$ target by RF magnetron sputtering technique in $Ar+N_2+CH_4$ gas mixture. In this work, the effect of reactant gas ratio, $CH_4/(N_2+CH_4)$ on the composition, kinds and amounts of bonding states comprising B-C-N coatings were investigated using two different bias power sources of continuous and unipolar DCs. In addition, the tribological properties of coatings were studied with the composition and bonding state of coating. It was found that the substrate bias power had an effect on chemical composition, and all of the obtained coatings were nearly amorphous. Main bonding states of coatings were revealed from FTIR analyses to be h-BN, C-C, C-N, and B-C. The amount of C-C bonging mainly increased with increase of the reactant gas ratio. From our studies, both C-C and h-BN bonding states improved the tribological properties but B-C one was found to be harmful on those. The best coating from tribological points of view was found to be $BC_{1.9}N_{2.3}$ composition.

집적화 인덕터 어레이의 고주파 특성에 관한 연구 (A Study on the RF Frequency of Integrated Inductors Array)

  • 김인성;민복기;송재성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.912-915
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    • 2004
  • Inductors material utilized in the downsizing passive devices and Rf components requires the physical and electrical properties at given area such as inductors thickness reduction, inductance and q-factor increase, low leakage current and thermal stability. In this study, Spiral inductors on the $SiO_2/Si$(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of $2{\mu}m$ was deposited on the substrate. Also we fabricated square inductors through the wet chemical etching technique. The inductors are completely specified by the turn width and the spacing between spirals. Both the width and spacing between spirals were varied from 10 to $60{\mu}m$ and from 20 to $70{\mu}m$, respectively. Inductance and Q factor dependent on the RF frequency were investigated to analyze performance of inductor arrays

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마그네트론 스퍼터링법으로 제작된 GZO 투명전도막의 전기적 및 광학적 특성 (Electrical and Optical Properties of the GZO Transparent Conducting Layer Prepared by Magnetron Sputtering Technique)

  • 노임준;김성현;신백균;이경일;김선민;조진우
    • 조명전기설비학회논문지
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    • 제24권4호
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    • pp.110-115
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    • 2010
  • 본 논문에서는 rf 마그네트론 스퍼터링 기술을 이용하여 코닝 글라스 기판 위에 갈륨이 도핑된 산화아연(GZO)을 투명 전도막으로 제작하여 그 전기적 및 광학적 특성을 조사하였다. GZO 박막의 제작은 Zn : 97[wt%], $Ga_2O_3$ : 3[wt%]의 GZO 세라믹 타겟을 이용하였으며, 기판온도 및 산소압력과 같은 증착조건을 변화시키며 증착하였다. 본 연구에서 제작된 GZO 박막중 기판온도 200[$^{\circ}C$], Ar 50[sccm], $O_2$ 5[sccm], rf power 80[W] 및 증착압력 5[mtorr]의 조건에서 제작된 박막에서 가시광 영역에서 90[%] 이상의 높은 가시광 투과율, $2.536{\times}10^{-4}[{\Omega}{\cdot}cm]$의 비저항, $7.746{\times}10^{20}[cm^{-3}]$의 캐리어 농도 및 31.77[$cm^2V{\cdot}S$]의 캐리어 이동도로 가장 좋은 전기적 특성이 관찰되었다.

HTS Broadband-Array Antenna for Satellite Communication

  • 정동철
    • Progress in Superconductivity
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    • 제3권2호
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    • pp.178-182
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    • 2002
  • Superconducting four-element patch array antenna was designed and fabricated using $high-T_{c}$ superconducting (HTS) thin film. The array antenna has single-feed circularly polarization and a resonance frequency of 11.85 GHz fur satellite communication system. To fabricate this antenna $YBa_2$$Cu_3$$O_{7-x}$(YBCO) superconducting thin films were deposited using rf-magnetron sputtering technique. Sequential rotation technique based on radiation elements($0^{\circ}$ , $90^{\circ}$, 1$80^{\circ}$, $270^{\circ}$ phase delay) was utilized to achieve circularly polarization. Simulated and measured results, the analysis on resonant frequency(fr), return loss, and bandwidth are presented. The results show that 10 dB return loss bandwidth of the array antenna is 11.04 GHz~12.59 GHz (13.15%) and 3dB axial ratio bandwidth is 11.42~12.52 GHz (9.2%).).).

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ETCHING CHARACTERISTICS OF MAGNETIC THIN FILMS BY ION BEAM TECHNIQUE

  • Lee, H.C.;Kim, S.D.;Lim, S.H.;Han, S.H.;Kim, H.J.;Kang, I.K.
    • 한국자기학회지
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    • 제5권5호
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    • pp.538-542
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    • 1995
  • The etching characteristics of magnetic thin films of permalloy and Fe-based alloys are investigated. The thin films are fabricated by rf magnetron sputtering and the substrates used are silicon and glass. Etching is done by ion beam technique and the main process parameters investigated are beam voltage, beam current and accelerating voltage. The etch rate of the magnetic films is proportional to the beam current, but it is not directly related to the accelerating voltage and beam voltage. The dependence of etch rate on the process parameters can be explained by ion current density. It is found that the ion beam etching is effective in obtaining well-developed micro-patterns on the permalloy and Fe- based magnetic thin films.

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Crystallographic Characteristics of ZnO Films Deposited on SiO$_2$/Si Substrate

  • Park, H.D.;Kim, K.S.;Lee, C.S.;Kim, J.W.;Han, B.M.;Kim, S.Y.
    • 한국표면공학회지
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    • 제28권6호
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    • pp.386-392
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    • 1995
  • The RF planar magnetron sputtering technique was used to fabricate uniform ZnO/$SiO_2$/Si thin films at high growth rate. A detailed crystallographic character of these thin films has been carried oct using XRD, XRC, and SEM. These thin films have the configuration of c-axis orientation perpendicular to $SiO_2$/ Si substrate. The dependence of the thickness of ZnO/$SiO_2$/Si films on applied RF power parameters was also investigated. The crystallinity of films was improved as the substrate temperature was high, RF input power increased, and Ar/$O_2$ ratio decreased. Also, most of ZnO films fabricated on $SiO_2$/Si were suitable for SAW filter since a standard deviation of XRC (002) peak was less than $6^{\circ}$. The presence of the $SiO_2$ layer has a beneficial effect on the crystalline quality of the grown ZnO films.

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