Electrical and Optical Properties of the GZO Transparent Conducting Layer Prepared by Magnetron Sputtering Technique
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No, Im-Jun
(인하대학교 전기공학과)
Kim, Sung-Hyun (전자부품연구원) Shin, Paik-Kyun (인하대학교 IT공과대학) Lee, Kyung-Il (전자부품연구원) Kim, Sun-Min (전자부품연구원) Cho, Jin-Woo (전자부품연구원 그린에너지센터) |
1 | Xuhu.Yu., et al., “Thickness dependence of properties of ZnO:Ga films deposited by rf magnetron sputtering”, Appl.Surf.sci, vol. 245, pp. 310-315, 2005. DOI |
2 | R.J.Hong., et al., “Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering”, Appl.Surf.Sci, vol. 207, pp. 341-350, 2003. DOI |
3 | Zhai. Jiwei, Zhang Liangying., “The dielectric properties and optical propagation loss of c-axis oriented ZnO thin films deposited by sol gel process,” Ceramics international, vol. 26, no. 8, pp. 883-885(3), 2000. DOI |
4 | 김영진, 권오준, “고주파 마그네트론 스퍼터링법으로 제조한 ZnO박막의 기판에 따른 효과”,센서학회지, 제 5권, 제 6호, PP. 66-73, 1996. 과학기술학회마을 |
5 | T.Minami., H.Sato., K.Ohashi., T. Tomofuji and S. Takata., “Conduction mechanism of highly conductive and transparent zinc oxide thin films prepared by magnetron sputtering”, J. Crystal. Growth, vol. 117, pp 370-374, 1992. DOI |
6 | Sang-Moo PARK., Tomoaki Ikegami., Kenji Ebihara., Paik-Kyun Shin., “Structure and properties of transparent conductive doped ZnO films by pulsed laser deposition”, applied surface science, vol. 253, pp. 1522-1527, 2006. DOI |
7 | Y.L. Liu., Y.C. Liu., “Structural and optical properties of nanocrystalline ZnO films grown by cathodic electrodeposition on Si substrates”, Applied physics B,vol. 322, no. 1, pp. 31-36(6), 2000. |
8 | 김봉석, 김응권, 김용성, “Al Doped ZnO 박막의 열처리에 따른 태양 전지용 투명전도막 특성”, Journal of the Korean Ceramic Society, 9호, 제 43권, pp. 532-536, 2006. 과학기술학회마을 DOI |
9 | Simon L. King., J.G.E. Gardeniers., “Pulsed-laser deposited ZnO for device applications.”, Applied surface science, vol. 96-98, pp.811-818, 1996. DOI |
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