• Title/Summary/Keyword: RF contact

검색결과 230건 처리시간 0.02초

A Study on Tribology Characteristics of Laser Patterned DLC Thin Films (Laser patterning된 DLC 박막의 Tribology 특성연구)

  • Lee, Ji Seok;Kim, Dong Jun;Shin, Dong Chul;Kim, Tae Gyu
    • Journal of the Korean Society for Heat Treatment
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    • 제33권1호
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    • pp.25-32
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    • 2020
  • In this study, the tribology of laser patterned DLC thin film was studied. DLC thin films were coated by RF-PECVD to improve the durability of tungsten carbide (WC) materials. DLC thin films have high hardness and low friction characteristics. Dot and line patterning was processed on the surface of DLC thin film with femtosecond laser, and the coefficient of friction was improved. As a result of ball on disk abrasion test, the hardness and friction coefficient of DLC thin films were much better than that of WC material. The friction coefficient of DLC thin film with dot patterning and line patterning showed better results. The excellent performance of the laser patterned DLC coating is appeared to reduce the coefficient of friction due to the reduction of surface contact area.

Surface energy modification of SiOxCyHz film using low temperature PECVD by controlling the plasma process for HMDS precursor with hydrogen gas (수소 기체와 HMDS 프리커서의 저온 PECVD공정을 통한 실리콘옥사이드 박막의 표면에너지 개질)

  • Lee, Jun-Seok;Jin, Su-Bong;Choe, Yun-Seok;Choe, In-Sik;Han, Jeon-Geon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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    • pp.165-166
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    • 2012
  • 표면의 젖음성은 어플리케이션의 매우 중요한 점으로, 이것은 표면에너지와 표면의 조도에 의해 결정된다. 표면의 젖음성을 낮추기 위하여 저온 PECVD 공정을 통해 초소수성 박막을 만들었다. $SiO_xC_yH_z$ 필름을 만들기 위하여 RF power을 사용하였고, HMDS (hexamethyl-disilazane) precursor과 함께 수소 기체를 통해 증착하였다. 이 실험에서는 수소와 RF power를 변수로 진행하였고, 이것은 소수성 박막의 표면에너지를 변화시켰다. 필름을 합성한 후 contact angle measurement 및 AFM을 사용해 표면에너지와 표면조도를 관찰하였다. 또한 필름의 화학적 결합을 알기 위해 FT-IR을 이용하였다. 여기에서 표면의 에너지는 표면의 조도와 화학적 결합상태에 의해서 영향을 받았음을 알 수 있었다.

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Optical Properties of Transparent Electrode ZnO Thin Film Grown on Carbon Doped Silicon Oxide Film (탄소주입 실리콘 산화막 위에 성장한 투명전극 ZnO 박막의 광학적 특성)

  • Oh, Teresa
    • Journal of the Semiconductor & Display Technology
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    • 제11권2호
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    • pp.13-16
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    • 2012
  • Zinc oxide (ZnO) films were deposited by an RF magnetron sputtering system with the RF power of 200W and 300W and flow rate of oxygen gases of 20 and 30 sccm, in order to research the growth of ZnO on carbon doped silicon oxide (SiOC) thin film. The reflectance of SiOC film on Si film deposited by the sputtering decreased with increasing the oxygen flow rate in the range of long wavelength. In comparison between ZnO/Si and ZnO/SiOC/Si thin film, the reflectance of ZnO/SiOC/Si film was inversed that of ZnO/Si film in the rage of 200~1000 nm. The transmittance of ZnO film increased with increasing the oxygen gas flow rate because of the transition from conduction band to oxygen interstitial band due to the oxygen interstitial (Oi) sites. The low reflectance and the high transmittance of ZnO film was suitable properties to use for the front electrode in the display or solar cell.

Fabrication and Charactreization of YBCO Multi-layer Thin Films for Josephson device (죠셉슨 소자구현을 위한 YBCO다층 박막 제작 및 특성)

  • Lee, H.S.;Park, J.Y.;Park, S.H.;Lee, D.H.;Park, H.J.;Kim, Y.J.
    • Proceedings of the KIEE Conference
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    • 대한전기학회 2002년도 학술대회 논문집 전문대학교육위원
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    • pp.49-51
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    • 2002
  • In this thesis, Josephson junction using high-Tc superconducting multi-layer thin film has been fabricated by on-axis RF magnetron sputtering method. And, the characterizations were performed by X-ray diffraction, SEM and the measuring system of critical current density. The physical properties of multi-layer superconducting thin films were also analyzed with the measured results. To fabricate the multi-layer superconducting thin films, the optimum partial pressure of Argon and Oxgen and the temperature of substrate were measured. Also, YBaCuO thin film was grown on MgO and $SrTiO_3$ substrates by rf-sputtering and LGO thin film of 30 A was epitaxially grown on the YBaCuO thin film as a josephson junction with the same condition. The schottky barrier at the contact surface between YBaCuO/LGO and YBaCuO/Au and the energy gap of 0.5 ${\sim}$ 0.6 mV in Nb were observed from the dI/dV-V of YBaCuO/LGO/Au/Nb and YBaCuO/Au/Nb.

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Polymerized Organic Thin Films and Comparison on their Physical and Electrochemical Properties

  • Cho, S.H.;You, Y.J.;Kim, J.G.;Boo, J.H.
    • Journal of the Korean institute of surface engineering
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    • 제36권1호
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    • pp.9-13
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    • 2003
  • Plasma polymerized organic thin films were deposited on Si(100), glass and metal substrates at $25∼100 ^{\circ}C$ using thiophene and toluene precursors by PECVD method. In order to compare physical and electrochemical properties of the as-grown thin films, the effects of the RF plasma power in the range of 30∼100 W and deposition temperature on both corrosion protection efficiency and physical properties were studied. We found that the corrosion protection efficiency ($P_{k}$), which is one of the important factors for corrosion protection in the interlayer dielectrics of microelectronic devices application, was increased with increasing RF power. The highest $P_{k}$ value of plasma polymerized toluene film (85.27% at 70 W) was higher than that of the plasma polymerized thiophene film (65.17% at 100 W), indicating inhibition of oxygen reduction. The densely packed and tightly interconnected toluene film could act as an efficient barrier layer to the diffusion of molecular oxygen. The result of contact angle measurement showed that the plasma polymerized toluene films have more hydrophobic surface than those of the plasma polymerized thiophene films.

Corrosion Protection of Plasma-Polymerized Cyclohexane Films Deposited on Copper

  • Park, Z.T.;Lee, J.H.;Choi, Y.S.;Ahn, S.H.;Kim, J.G.;Cho, S.H.;Boo, J.H.
    • Journal of the Korean institute of surface engineering
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    • 제36권1호
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    • pp.74-78
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    • 2003
  • The corrosion failure of electronic devices has been a major reliability concern lately. This failure is an ongoing concern because of miniaturization of integrated circuits (IC) and the increased use of polymers in electronic packaging. Recently, plasma-polymerized cyclohexane films were considered as a possible candidate for a interlayer dielectric for multilever metallization of ultra large scale integrated (ULSI) semiconductor devices. In this paper the protective ability of above films as a function of deposition temperature and RF power in an 3.5 wt.% NaCl solution were examined by polarization measurement. The film was characterized by FTIR spectroscopy and contact angle measurement. The protective efficiency of the film increased with increasing deposition temperature and RF power, which induced the higher degree of cross-linking and hydrophobicity of the films.

Mechanical Properties of High-Hardness TiNX Thin Films Deposited by Pure Nitrogen Plasma Using Magnetron Sputtering Deposition (마그네트론 스퍼터링 증착법을 사용하여 순수한 질소 플라즈마에 의해 성막된 고경도 TiNX 박막의 역학적 특성)

  • Lee, Chang-Hyun;Rhee, Byung-Roh;Bae, Kang;Park, Chang-Hwan;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제30권8호
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    • pp.514-519
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    • 2017
  • TiN (titanium nitride) films were prepared using the RF magnetron sputtering technique. The films were deposited by pure $N_2$ plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and surface wettability, have been investigated. X-ray diffraction (XRD) studies revealed that the orientation of $TiN_X$ films changed towards the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition. The strongest TiN (111) orientation was found when the film was deposited at a working pressure of 1 Pa. This film showed the largest hardness (16 GPa) and smallest friction coefficient (0.17) among the studied samples. Moreover, this film was found to be accompanied by a water-repellent surface with water contact angle more than $100^{\circ}$.

Design of hardware module to process contactless protocol for IC card system (IC카드 시스템을 위한 비접촉 프로토콜 처리모듈 설계)

  • Jeon, Yong-Sung;Park, Ji-Mann;Ju, Hong-Il;Jun, Sung-Ik
    • Proceedings of the KIEE Conference
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    • 대한전기학회 2003년도 학술회의 논문집 정보 및 제어부문 B
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    • pp.713-716
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    • 2003
  • In recent, the contactless IC card is widely used in traffic, access control system and so forth. Contactless smart cards use a technology that enables card readers to provide power for transactions and communications without making physical contact with the cards. Usually electromagnetic signal is used for communication between the card and the reader. Contactless card is highly suitable for large quantity of card access and data transaction. And its use becomes a general tendency more and more because of the development of RF technology and improvement of requirement for user convenience. This paper describes the hardware module to process contactless protocol for implementation contactless IC card. And the hardware module consists of specific digital logic circuits that analyze digital signal from analog circuit and then generate data & status signal for CPU, and that convert the data from CPU into digital signal for analog circuit.

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An Ultra Wideband, Novel and Reliable RF MEMS Switch

  • Jha, Mayuri;Gogna, Rahul;Gaba, Gurjot Singh;Miglani, Rajan
    • Transactions on Electrical and Electronic Materials
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    • 제17권4호
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    • pp.183-188
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    • 2016
  • This paper presents the design and characterization of wide band ohmic microswitch with an actuation voltage as low as 20~25 V, and a restoring force of 14.1 μN. The design of the proposed switch is primarily composed of an electrostatic actuator, bridge membrane, cantilever (beam) and coplanar waveguide, suspended over the substrate. The analysis shows an insertion loss of −0.002 dB at 1GHz and remains as low as −0.35 dB, even at 100 GHz. The isolation loss of the switch is sustained at −21.09 dB at 100GHz, with a peak value of −99.58 dB at 1 GHz and up-state capacitance of 4 fF. To our knowledge, this is the first demonstration of a series contact switch, which works over a wide bandwidth (DC-100 GHz) and with such a high and sustained isolation, even at high frequencies and with an excellent figure of merit (fc=1/2.pi.Ron.Cu= 39.7 THz).

Analysis on the Electrical.optical Properties and fabrication of OLED with AZO Anode Electrode (AZO Anode 전극을 적용한 OLED 소자의 제작과 전기적.광학적 특성 분석)

  • Jin, Eun-Mi;Shin, Eun-Chul;Kim, Tae-Wan;Park, Choon-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제20권4호
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    • pp.357-362
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    • 2007
  • AZO(Aluminum-doped Zinc Oxide) films are attractive materials as transparent conductive electrode because they are inexpensive, nontoxic and abundant element compared with ITO(Indium Tin Oxide). AZO films have been deposited on glass (corning 1737) substrates by RF magnetron sputtering. The AZO film was post-annealed at $600^{\circ}C$ for 2 hr with $N_2$ atmosphere. The AZO films were used as an anode contact to fabricate OLEDs(Organic Light Emitting Diodes). OLEDs with $AZO/TPD/Alq_3/Al$ configuration were fabricated by thermal evaporation. We investigated that the electric, structural and optical properties of AZO thin films, which measured using the methods of XRD, SEM, Hall measurement and Spectrophotometer. The current density-voltage and luminescence-voltage properties of devices were studied and compared with ITO devices fabricated under the same conditions.