• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.2
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• pp.116-119
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• 2005

Al doped ZnO thin films (ZnO:Al) were deposited on poly carbonate (PC) substrate by rf magnetron sputtering. In addition, the electrical, optical properties of the films prepared at various conditions were investigated. As the sputter power increased, the resistivity of ZnO:Al films decreased, regardless of substrate types. However, the resistivity of the films increased with the sputter pressure. The ZnO:Al films were increasingly dark gray colored as the sputter power increased, resulting in the loss of transmittance. High quality films with resistivity as low as 1.43${\times}$10$^{-4}$ Ω-cm and transmittance over 80 % have been obtained by suitably controlling the deposition parameters.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.6
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• pp.493-498
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• 2005

Al doped Zinc Oxide, which is widely used as a transparent conductor in opto-electronic devices. In this paper, we find that the lateral variations of the parameters of the ZnO:Al films prepared by the rf magnetron sputtering can be reduced to acceptable levels by optimising the deposition parameters. The effect of bias voltage on the electrical, optical and morphological properties were investigated experimentally. we investigated sample properties of Bias Voltage change in 0 to 50 V.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.299-300
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• 2005

본 연구에서는 $SiO_2$ 판상체 위에 저굴절 및 고굴절 금속 산화물을 다층 교차 증착하여 Pearl Pigment를 sputtering 공법을 이용하여 증착하였다. Pearl Pigment는 Essential Macleod program 을 이용한 색상과 증착된 pigment의 색상이 파장에 따라 blue, violet, pink, red, orange, yellow, green 등(Wave length : 450$\sim$730 nm)으로 동일하게 나타났고, 기존의 제품에 비해 색상효과가 뛰어나고, 표면 morphology가 우수하였다. 주사전자현미경(SEM)으로 막 두께, 표면 조직 및 입자 크기를 측정하였고, 스펙트로미터를 사용하여 각각의 파장을 분석하였으며 EDS, XRD를 이용하여 정성 및 정량 분석을 하였다.

• Journal of the Korean institute of surface engineering
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• v.38 no.1
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• pp.7-13
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• 2005

Bismuth thin films were prepared on glass substrate with RF magnetron sputtering and effects of substrate temperature on surface morphology and their electrical transport properties were investigated. Grain growth of bismuth after nucleation and the onset of coalescense of grains at 393 K were observed with field emission secondary electron microscopy. Continuous thin films could not be obtained above 473 K because of grain segregation and island formation. Hall effect measurements showed that substrate heating yields the decrease of carrier density and the increase of mobility. Resistivity of bismuth film has its minimum (about 0.7 x 10/sup -3/ Ωcm) in range of 403～433 K. Annealing of bismuth films deposited at room temperature was carried out in a radiation furnace with flowing hydrogen gas. The change of resistivity was not significant due to cancellation of the decrease of carrier density and the increase of mobility. The abrupt change of electrical properties of film annealed above 523 K was found to be caused by partial oxidation of bismuth layer in x-ray diffraction analysis.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.460-463
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• 2002

$MoO_3$ thin films were deposited on electrode and heater screen-printed alumina substrates in $O_2$ atmosphere by RF reactive sputtering using Molybdenum metal target. The deposition was performed at $300^{\circ}C$ with 350W of a forward power in an $Ar-O_2$ atmosphere. The working pressure was maintained at $3{\times}10^{-2}mtorr$ and all deposited films were annealed at $500^{\circ}C$ for 5hours. To investigate gas sensing characteristics of the addition doped $MoO_3$ thin film, Co, Ni and Pt were used as adding dopants. The sensing properties were investigated in tenn of gas concentration under exposure of reducing gases such as $H_2$, $NH_3$ and CO at optimum working temperature. Co-doped $MoO_3$ thin film shows the maximum 46.8% of sensitivity in $NH_3$ and Ni-doped $MoO_3$ thin film exhibits 49.7% of sensitivity in $H_2$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.3
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• pp.204-208
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• 2012

$TiO_2$ ($Ti_{1-x}Nb_xO_2$, x= 0.04~0.06) transparent conducting oxide film was fabricated by RF magnetron sputtering process and their electrical, optical, stability properties were studied. When the Nb 4 at% sputtering target was used with RF power 120 W, pressure 8 mTorr, post-annealing temperature $600^{\circ}C$, the resistivity of TNO film was $4{\times}10^{-4}\;{\Omega}-cm$. The optical transmittance in the visible wavelength was ca. 86%. TNO films require heat treatment during or after the deposition process. When the film was deposited at room temperature and post-annealed at $600^{\circ}C$, the lowest resistivity was obtained. When the TNO film was exposed to high temperature and humidity, the resistivity of the film was rather decreased. The stability to temperature and humidity implies that the TNO film could be a appropriate candidate for In-free, ZnO-free transparent conducting oxide materials.

• JSTS:Journal of Semiconductor Technology and Science
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• v.15 no.4
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• pp.506-517
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• 2015

This paper presents a 1.248 Gb/s - 2.918 Gb/s low-power receiver MIPI-DigRF M-PHY with a fully digital frequency detection loop. MIPI-DigRF M-PHY should be operated in a very short training time which is $0.01{\mu}s$ the for HS-G2B mode. Because of this short SYNC pattern, clock and data recovery (CDR) should have extremely fast locking time. Thus, the quarter rate CDR with a fully digital frequency detection loop is proposed to implement a fast phase tracking loop. Also, a low power CDR architecture, deserializer and voltage controlled oscillator (VCO) are proposed to meet the low power requirement of MIPI-DigRF M-PHY. This chip is fabricated using a $0.11{\mu}m$ CMOS process, and the die area is $600{\mu}m{\times}250{\mu}m$. The power consumption of the receiver is 16 mW from the supply voltage of 1.1 V. The measured lock time of the CDR is less than 20 ns. The measured rms and peak jitter are $35.24ps_{p-p}$ and $4.25ps_{rms}$ respectively for HS-G2 mode.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.162-163
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• 2008

이 논문에서는 Polyimide 기판의 $O_2$ 플라즈마 처리효과에 따른 GZO 박막의 구조적, 전기적, 광학적인 특성을 고찰하였다. ICP-RIE 방법을 이용하여 Polyimide 기판의 $O_2$ 플라즈마 처리의 변수로 RF power와 처리시간을 각 100 ~ 400 W, 120 ~ 600 초까지 조절하였다. RF 스퍼터링 방법으로 $O_2$ 플라즈마 처리효과에 따른 Polyimide 기판을 4인치의 GZO(ZnO : 95 wt%, $Ga_2O_3$ 5 wt%) 타겟을 사용하여 RF power 90 W, 공정압력 5 mTorr, Ar gas 20 sccm, 기판거리 5 cm, 박막두께 500nm, 상온의 조건으로 GZO 박막을 증착 하였다. Polyimide 기판에 $O_2$ 플라즈마 처리를 하지 않고 증착한 GZO 박막의 비저황은 $1.02\times10^{-2}\Omega$-cm 이었고 RF power 100W, 처리시간 120 초로 $O_2$ 플라즈마 처리 후에 증착한 GZO 박막의 비저항이 $1.89\times10^{-3}\Omega$-cm인 최적의 값이 측정되었으며 RF power가 증가할수록 투과도는 감소하였지만 처리시간의 변화에 따라서는 투과도 변화가 거의 없었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.110.2-110.2
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• 2016

4세대 방사광가속기는 0.1nm급 X-선 자유전자레이저(X-ray Free Electron Laser : XFEL) 광원을 빔라인 사용자들에게 제공하기 위하여 2011년 건설을 시작하였고, 2015년부터 장치를 설치하기 시작했으며 현재 건설 완료단계에 이르러 있다. 이 장치에서 진공시스템은 10-11 mbar의 초고진공이 요구되는 전자빔 발생장치인 RF Gun을 포함하는 입사장치구간(Injector)과 전체길이 800 m에 이르는 전자빔을 가속시키는 선형가속기구간(Linac) 그리고 결맞음 방사광을 발생시키는 언듈레이터구간으로 나눌 수 있다. 본 논문에서는 각 구간별 진공시스템에 대한 건설 현황에 대하여 보고하고자 한다.

• Vacuum Magazine
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• v.4 no.1
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• pp.12-15
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• 2017

The Pohang Accelerator Laboratory X-ray Free Electron Laser (PAL-XFEL) is a 0.1 nm hard X-ray FEL which aims at providing photon flux higher than $1{\times}10^{12}$ photons/pulse using a 10-GeV electron linac. The vacuum system of the machine consists of an injector section including an S-band photocathode RF gun, 10-GeV electron linac section based on S-band normal conducting accelerating structures and a 150-m long out-vacuum undulator system. We introduce the present status of PAL-XFEL vacuum systems.