• Journal of the Semiconductor & Display Technology
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• v.15 no.4
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• pp.36-40
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• 2016

The 2 wt.% Al-doped ZnO(AZO) thin films were fabricated on PET substrates with various RF power 20, 35, 50, 65, and 80W by using RF magnetron sputtering in order to investigate the structure, electrical and optical properties of AZO thin films in this study. The XRD measurements showed that AZO films exhibit c-axis orientation. At a RF power of 80W, the AZO films showed the highest (002) diffraction peak with a FWHM of 0.42. At a RF power of 65W, the lowest electrical resistivity was about $1.64{\times}[10]$ ^(-4) ${\Omega}-cm$ and the average transmittance of all films including substrates was over 80% in visible range. Good transparence and conducting properties were obtained due to RF power control. The obtained results indicate that it is acceptable for applications as transparent conductive electrodes.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.05a
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• pp.439-442
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• 2003

In this paper, a system that implementation of Access Control System Using Biometric System. Biometrics is science which deals with verifying or recognizing using physiological or behavioral characteristic Access Control System uses Biometric system to make an access control system. Biometrics goes under the study of bio-recognition or bio-measurement. It is a technology or study that identifies individuals using one's Biometric character. Access control system is a system used to identify one's entrance and exit, personal management, and security. Access control system can be joined with Biometric system to produce easier use and more sufficient effects. Access control system using Wiegand (Data Format) signal output, can replace earlier RF Card systems and make an access control (security) system. It uses RS-232, Rs-422 or TCP/IP type communication with the computer so an embedded system can be controlled using the software.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.8 no.2
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• pp.494-498
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• 2004

In this paper, a system that implementation of Access Control System Using Biometric System. Biometries is science which deals with verifying or recognizing using physiological or behavioral characteristic Access Control System uses Bionietric system to make an access control system. Biometrics goes under the study of bio-recognition or bio-measurement. It is a technology or study that identifies individuals using one's Biometric character. Access control system is a system used to identify one's entrance and exit, personal management, and security. Access control system can be joined with Biometric system to produce easier use and more sufficient effects. Access control system using Weigand (Data format) signal output, can replace earlier RF Card systems and make an access control (security) system. It uses RS-232, Rs-422 or TCP/IP type communication with the computer so an embedded system can be controlled using the software.

• Corrosion Science and Technology
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• v.3 no.4
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• pp.148-153
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• 2004

Magnesium thin flims were prepared on cold-rolled steel substrates by RF magnetron sputtering technique. The influence of argon gas pressure and substrate bias voltage on their crystal orientation and morphology of the coated films were investigated by scanning electron microscopy (SEM) and X-ray diffraction, respectively. And the effect of crystal orientation and morphology of magnesium films on corrosion behaviors was estimated by measuring anodic polarization curves in deaerated 3%NaCl solution. From the experimental results, all the sputtered magnesium films showed obviously good corrosion resistance to compare with 99.99% magnesium target of the sputter-evaporation metal. Finally it was shown that the Corrosion-resistance of magnesium films can be improved greatly by controlling the crystal orientation and morphology with effective use of the plasma sputtering technique.

• Proceedings of the IEEK Conference
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• 2000.06e
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• pp.89-92
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• 2000

A wire communication module for PLC controller was developed. This system consists of RF module interface part, RS232 serial communication control part, LED display part and control S/W with GUI interface. RF communication frequency is controlled by PLL controlling and communication rate is also controlled as 1200 and 4800 bps. Communication and control status are displayed on LED. As a S/W part, graphic user interface on Window 95 O.S. was developed. To show the validity of the developed system, severial communication and control of PLC system were experemented.

• Journal of the Semiconductor & Display Technology
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• v.23 no.2
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• pp.100-106
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• 2024

To generate the plasma required in dry cleaning processes, the plasma chamber must be supplied with a high-quality AC voltage with a voltage of more than 1 kV and a frequency of 400 kHz. In the existing research, many methods to supply high power have been studied, but how to improve the quality of the power for high-quality plasma has been relatively little studied. In this paper, we propose a study to improve the quality of RF power circuit for high-quality plasma generation in dry cleaning method. Existing methods in the environment of full-bridge-based RF power circuits must perform PWM duty control in the light load region. This causes distortions in the waveform, resulting in poor power quality, which directly leads to poor plasma quality. To solve these problems, a half-bridge switching method is proposed and the improvement in waveform quality is verified. To verify the feasibility of the design and control algorithm proposed in this paper, an RF power circuit prototype is fabricated and the proposed design and control method is verified through simulation and actual experiments under dummy load.

• Proceedings of the KAIS Fall Conference
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• 2000.10a
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• pp.99-103
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• 2000

최근 많은 분야에서 사용피고 있는 소형 전광판을 이용하여 원거리에서도 메시지 전달이 가능한 광고용 전광판을 제작하였다. FSK Modem과 RF-Module을 이용하여 실시간으로 광고의 내용을 바꾸는 것을 원칙으로 구현하였다.

• Transactions on Electrical and Electronic Materials
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• v.5 no.3
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• pp.122-125
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• 2004

ITO films were deposited on polyethylene terephthalate substrate by a dc reactive magnetron sputtering using rf bias without substrate heater and post-deposition thermal treatment. The dependency of rf substrate bias on plasma sputter processing was investigated to control energetic particles and improve ITO film properties. The substrate was applied negative rf bias voltage from 0 to -80 V. The composition of indium, tin, and oxygen atoms is strongly depended on the rf substrate bias. Oxygen deficiency is the highest at rf bias of -20 V. The electrical and optical properties of ITO films also are dominated obviously by negative rf bias.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.9 no.2
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• pp.327-332
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• 2008

New RF matcher module has been proposed in this paper for improvement of RF matcher in plasma etcher system using in semiconductor and display panel manufacturing process. New designed warm gear was used instead of bevel gear in new driving module, and control system was re-arranged with one-chip micro-process technique. The matching performance of new match module was improved in various process condition with reduction of backlash and matching time, and flexible motion of motor compared commercial match module. However this new type RF match module will improve the productivity in etching process of the mass production line.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.213-213
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• 2011

DC arc plasmatron is powerful plasma source to apply etching and texturing processing. Even though DC arc plasmatron has many advantages, it is difficult to apply an industry due to the small applied area. To increase an effective processing area, we suggest a DC-RF hybrid plasma system. The DC-RF hybrid plasma system was designed and made. This system consists of a DC arc plasmatron, RF parts, reaction chamber, power feeder, gas control system and vacuum system. To investigate a DC-RF hybrid plasma, we used a Langmuir probe, OES (Optical emission spectroscopy), infrared (IR) light camera. For RF matching, PSIM software was used to simulate a current of an impedance coil. The results of Langmuir probe measurements, we obtain a homogeneous plasma density and electron temperature those are about $1{\times}1010$ #/cm3 and 1~4 eV. The DC-RF hybrid plasma source is applied for plasma etching experimental, and we obtain an etching rate of 10 ${\mu}m$/min. through a 90 mm of reaction chamber diameter.