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ITZO 박막의 전자적 및 광학적 특성

  • Lee, Seon-Yeong;Denny, Yus Rama;Gang, Hui-Jae;Heo, Seong;Jeong, Jae-Gwan;Lee, Jae-Cheol;Chae, Hong-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.324-324
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    • 2012
  • 투명전도체(Transparent Conducting Oxides: TCOs)는 일반적으로 면저항이 $103{\Omega}/sq$ 이하로 전기가 잘 통하며, 가시광선영역인 380~780 nm에서의 투과율이 80% 이상이고, 3.2eV 이상의 밴드갭을 가지는 재료로써, 전기전도도와 가시광선영역에서 투과성이 높아 전기적, 광학적 재료로 관심을 받아 다년간 연구대상이 되어오고 있다. 현재 가장 널리 사용되고 있는 투명전도체(Transparent Conducting Oxides: TCOs) 소재로는 Indium Tin Oxide (ITO)가 가장 각광받고 있지만, Indium의 가격상승과 박막의 열처리를 통해 저항이 증가하는 단점을 가지고 있어 이를 대체 할 새로운 소재 개발이 필요한 상황이다. 그러므로 투명전도체 소재 개발에 있어서 가장 중요한 연구과제는 Indium Tin Oxide(ITO)의 단점을 개선시키고 안정된 고농도의 In-Zn-Sn-O(ITZO) 박막을 성장시키는 것이다. 본 연구에서는 RF스퍼터링법에 의하여 Si wafer에 In-Zn-Sn-O(IZTO)를 $350{\AA}$ 만큼 증착시키고, 1시간 동안 $300^{\circ}C$, $350^{\circ}C$, $400^{\circ}C$로 각각 열처리 하였다. 박막의 전자적, 광학적 특성은 XPS(X-ray Photoelectron Spectroscopy), REELS(Reflection Electron Energy Loss Spectroscopy)를 이용하여 연구하였다. XPS측정결과, ITZO박막은 In-O, Sn-O and Zn-O의 결합을 가지고 있고, 박막의 열처리를 통해 $400^{\circ}C$에서 Zn2p의 피크가 가장 크게 나타나는 반면 In3d와 Sn3d는 열처리를 했을 때가 Room Temperature에서 보다 피크가 작아지는 것을 확인하였다. 이는 $400^{\circ}C$에서 Zn가 표면에 편석됨을 나타낸다. 그리고 REELS를 이용해 Ep=1500 eV에서의 밴드갭을 얻어보면, 밴드갭은 $3.25{\pm}0.05eV$로 온도에 크게 변화하지 않았다. 또한 QUEELS -Simulation에 의한 광학적 특성 분석 결과, 가시광선영역인 380nm~780nm에서의 투과율이 83%이상으로 투명전자소자로의 응용이 가능하다는 것을 보여주었다.

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Structural and Electrical Properties of Fluorine-doped Zinc Tin Oxide Thin Films Prepared by Radio-Frequency Magnetron Sputtering

  • Pandey, Rina;Cho, Se Hee;Hwang, Do Kyung;Choi, Won Kook
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.335-335
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    • 2014
  • Over the past several years, transparent conducting oxides have been extensively studied in order to replace indium tin oxide (ITO). Here we report on fluorine doped zinc tin oxide (FZTO) films deposited on glass substrates by radio-frequency (RF) magnetron sputtering using a 30 wt% ZnO with 70 wt% SnO2 ceramic targets. The F-doping was carried out by introducing a mixed gas of pure Ar, CF4, and O2 forming gas into the sputtering chamber while sputtering ZTO target. Annealing temperature affects the structural, electrical and optical properties of FZTO thin films. All the as-deposited FZTO films grown at room temperature are found to be amorphous because of the immiscibility of SnO2 and ZnO. Even after the as-deposited FZTO films were annealed from $300{\sim}500^{\circ}C$, there were no significant changes. However, when the sample is annealed temperature up to $600^{\circ}C$, two distinct diffraction peaks appear in XRD spectra at $2{\Theta}=34.0^{\circ}$ and $52.02^{\circ}$, respectively, which correspond to the (101) and (211) planes of rutile phase SnO2. FZTO thin film annealed at $600^{\circ}C$ resulted in decrease of resistivity $5.47{\times}10^{-3}{\Omega}cm$, carrier concentration ~1019 cm-3, mobility~20 cm2 V-1s-1 and increase of optical band gap from 3.41 to 3.60 eV with increasing the annealing temperatures and well explained by Burstein-Moss effect. Change of work function with the annealing temperature was obtained by ultraviolet photoemission spectroscopy. The increase of annealing temperature leads to increase of work function from ${\phi}=3.80eV$ (as-deposited FZTO) to ${\phi}=4.10eV$ ($600^{\circ}C$ annealed FZTO) which are quite smaller than 4.62 eV for Al-ZnO and 4.74 eV for SnO2. Through X-ray photoelectron spectroscopy, incorporation of F atoms was found at around the binding energy of 684.28 eV in the as-deposited and annealed FZTO up to 400oC, but can't be observed in the annealed FZTO at 500oC. This result indicates that F atoms in FZTO films are loosely bound or probably located in the interstitial sites instead of substitutional sites and thus easily diffused into the vacuum from the films by thermal annealing. The optical transmittance of FZTO films was higher than 80% in all specimens and 2-3% higher than ZTO films. FZTO is a possible potential transparent conducting oxide (TCO) alternative for application in optoelectronics.

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Antioxidative Substances in Mulberry Leaves (뽕잎(桑葉)에 함유된 항산화성 물질)

  • Shin, Doo-Ho
    • Journal of the Korean Applied Science and Technology
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    • v.15 no.3
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    • pp.27-31
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    • 1998
  • Antioxodative substances in Mulberry leaves were examined. Antioxidative substances in Mulberry leaves were extracted by 80% methanol agueous solution. Antioxidative activity of extract was determined by examining hydrogen donating ability on 1,1-diphenyl-2-picrylhydrazyl (DPPH) and the inhibitory effect on the formation of the peroxide from Linoleic acid in the test tube at $50^{\circ}C$. Antioxidative substance were, then, separated and indentified by thin layer chromatography(TLC), UV-Vis spectrum and High performance liquid chromatography(HPLC) methods. Hydrogen donating ability on DPPH and antioxidative ability on linoleic acid of the extracted antioxidative substance were higher than those of 100ppm butylated hydroxy toluene(BHT). The extracted antioxidative substances were separated by TLC using ethylacetate : chloroform : formic acid : water(8 : 1 : 1 : 1 v/v) as a solvent, and a spot at Rf=0.35 was detected. The spot was scraped from the plate, and extrated by methanol. The extract was analyzed by UV-Vis spetra and HPLC, and chlorogenic acid was identified as a antioxidative substance.

Electrical Characteristics of n-GaN Schottky Diode fabricated by using Electrochemical Metallization (Electrochemical Metallization방법을 이용한 GaN Schottky Diode의 제작과 전기적 특성 향상 및 분석)

  • ;Daejun Fu
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.205-208
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    • 2001
  • Schottky barrier diodes are fabricated on a intrinsic GaN(4${\mu}{\textrm}{m}$) epitaxial structure grown by rf plasma molecular beam epitaxy (MBE) on sapphire substrates. First, We make Ohmic electrodes (Ti/Al/Ti/Au) by evaporator. Next, we contact RuO$_2$ by dipping in the solution (RuCl$_3$.HClO$_4$), and then we deposit Ni/Au on the surface of RuO$_2$ by evaporator. We study the electrical characteristics of GaN Schottky barrier diodes made by these methods. Measurements are C-V, I-V, SEM, EDX, and XRD for the characteristics of devices. Thickness of RuO$_2$ layer depends on supplied voltage and dipping time. Device of thinner RuO$_2$ layer have a good Schottky characteristics compare with device of thicker RuO$_2$ layer

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A Study on the Growth of Carbon Nanotube by ICPHFCVD and their I-V Properties (ICPHFCVD법에 의한 탄소나노튜브의 생장 및 I-V 특성에 관한 연구)

  • 김광식;류호진;장건익;장호정
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2002.05a
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    • pp.158-164
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    • 2002
  • 본 연구에서는 탄소나노튜브를 직류 바이어스가 인가된 유도결합형 플라즈마 열선 화학기상증착 장치를 이용하여 58$0^{\circ}C$ 이하의 저온에서 유리기판의 변형 없이 수직 배향 시켰다. 탄소나노튜브의 성장을 위해 강화유리기판 위에 전도층으로 Cr을 증착하였고, 그 위에 촉매 층으로 Ni을 순차적으로 RF magnetron cputtering 장치를 이용하여 증착 시켰다. 성장 시 탄소나노튜브의 저온에서의 좋은 특성을 위해 높은 온도에서의 열분해를 목적으로 텅스텐 필라멘트를 이용하였으며, 수직 배향 시키기 위해서 직류 바이어스를 이용하였다. 성장된 탄소나노튜브는 수직적으로 잘 배향 되었으며, 저온에서 좋은 특성을 보였다. 탄소나노튜브의 특성화에는 SEM, TEM을 관찰하였으며, Raman spectroscopy를 이용하여 흑연화도를 측정하였고, 전계방츨 특성은 전류 전압 특성곡선과 Fowler-Nordheim plots를 이용하였다.

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다중 박막을 이용한 태양전지 제작 및 특성 평가

  • Yu, Jeong-Jae;Min, Gwan-Hong;Yeon, Je-Min;;Kim, Gwang-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.306-306
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    • 2013
  • p-type Si(100)기판위에 Al2O3 박막을 증착하고 Si/SiO2 박막을 연속 증착하여 태양전지를 제작하였다. Si/SiO2 박막을 연속으로 증착하면 양자 구속이 일어나고 이로 인한 유효밴드 갭이 증가하게 되고, tunnel effect와 계면에서의 passivation 효과를 기대할 수 있다. 이런 효과들을 이용하여 고효율 태양전지를 기대 할 수 있다. 본 연구에서는 Remote Plasma Atomic Layer Deposition(RPALD)를 이용하여 Al2O3를 증착하였고 RF-Magnetron Sputter와 e-beam Evaporator 장비를 이용하여 Si/SiO2을 증착하였다. 전극으로는 Ti/Ag와 Al을 이용하였다. Solar simulator 장비를 이용하여 cell의 전기적 특성 평가를 평가하였고(Fig. 1) QE 측정장비를 통해 파장대의 따른 광학적 측정을 하였다(Fig. 2). ellipsometer 장비와 ${\alpha}$-step 장비로 박막과 전극의 두께를 측정하였고 4-point prove 장비를 이용하여 면저항, 저항율을 측정 평가하였다. 또한 I-V, C-V 측정 결과 터널링 현상이 일어나는 것을 확인 하였으며, Si/SiO2 다중 박막을 연속 증착 할수록 cell 효율이 더 좋게 나온다는 것을 확인하였다.

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Fabrications of Pd/poly 3C-SiC schottky diodes for hydrogen gas sensor at high temperatures (고온 가스센서용 Pd-다결정 3C-SiC 쇼트키 다이오드 제작)

  • Ahn, Jeong-Hak;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.78-79
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    • 2008
  • In this paper, poly 3C-SiC thin films were grown on $SiO_2$/Si by atmospheric pressure chemical vapor deposition (APCVD) using HMDS, $H_2$, and Ar gas at $1100^{\circ}C$ for 30 min, respectively. And then, palladium films were deposited on poly 3C-SiC by RF magnetron sputter. Thickness, uniformity, and quality of these samples were performed by SEM. Crystallinity and preferred orientationsof palladium were analyzed by XRD. And Pd/poly 3C-SiC schottky diodes were fabricated and characterized by current-voltage measurements. Its electric current density Js and barrier height voltage were measured as $2\times10^{-3}$ A/$cm^2$, 0.58 eV, respectively. And these devices operated about $350^{\circ}C$. From results, Pd/poly 3C-SiC devices are promising for high temperature hydrogen sensor and applications.

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The Wormicidal Sibstance of Fresh Water Fishes on Clonorchis sinensis(VI) - Struture Identification of Purified Clonorchicidal Sudstance from Epidermal Mucus of Cyprinus carpio nudus (간흡충에 대한 살충성물질에 관한 연구 (VI) - 향어 체표면 점액내 살충성물질의 구조 확인)

  • 이재구;김평길;안병준
    • YAKHAK HOEJI
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    • v.31 no.1
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    • pp.33-39
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    • 1987
  • In order to elucidate the defence mechanism of Cyprinus carpio nudus to Clonorchis sinensis, clonorchicidal substance in the epidermal mucus of this fish was isolated by silica gel column and thin layer chromatography and analyzed for its chemical nature by UV, IR and NMR-spectroscopy. The epidermal mucus of the fish was extracted by ethyl ether and separated into 2 fractions by column chromatography using petroleum ether/chloroform(30/70,v/v) as first solvent and methanol as second solvent. The second fraction with greyish white colour showed clonorchicidal effect. The second was again fractionated into greyish white precipitate and clonorchicidal greenish yellow supernatant fraction, by adding petroleum ether and standing the mixture for 5 days at $5^{\circ}C$. The latter was divided into 7 fractions in column chromatography with acetone/ benzene (10/90, v/v) as carrier. The fraction on equivalent to the spot of Rf. 0.225 value among them disclosed the strongest clonorchicidal effect. By this purification procedure, clonorchicidal substance was purified 154-fold with 0.9% yield from the mucus of the fish, and 10mg of the final fraction killed tne metaceicariae in 22 min. Infra red, nuclear magnetic resonance and ultraviolet spectrometric analysis of the purified substance revealed that the substance is linoleic acid. According to the results of the present studies it seemed that this fish could not be proper intermediate host of Clonorchis sixensis, and that defence mechanism of this fish to the worm seems to be correlated with clonorchicidal substance in epidermal mucus.

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The Etching Mechanism of $(Ba, Sr)TiO_3$Thin Films in $Ar/CF_4$ High Density Plasma ($Ar/CF_4$ 고밀도 플라즈마에서 $(Ba, Sr)TiO_3$ 박막의 식각 메카니즘)

  • Kim, Seung-Beom;Kim, Chang-Il
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.5
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    • pp.265-269
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    • 2000
  • $(Ba, Sr)TiO_3$thin films were etched with a magnetically enhanced inductively coupled plasma (MEICP) at different CF4/Ar gas mixing ratios. Experimental was done by varying the etching parameters such as rf power, dc bias and chamber pressure. The maximum etch rate of the BST films was $1800{AA}/min$ under $CF_4/(CF_4+Ar)$ of 0.1, 600 W/350 V and 5 mTorr. The selectivity of BST to Pt and PR was 0.6, 0.7, respectively. X-ray photoelectron spectroscopy (XPS) results show that surface reaction between Ba, Sr, Ti and C, F radicals occurs during the (Ba, Sr)TiO3 etching. To analyze the composition of surface residue after the etching, films etched with different CF_4/Ar$ gas mixing ratio were investigated using XPS and secondary ion mass spectroscopy (SIMS).

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A study on PZT capacitor on the glass substrate (유리 기판 위에서의 PZT 캐패시터에 관한 연구)

  • Ju, Pil-Yeon;Park, Young;Jeong, Kyu-Won;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.04b
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    • pp.80-83
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    • 2000
  • The post-annealing treatments on rf magnetron sputtered PZT($Pb_{1.05}(Zr_{0.52},\;Ti_{0.48})O_3$) thin films($4000{\AA}$) have been investigated for a structure of PZT/Pt/Ti/Coming glass(1737). Crystallization properties of PZT films were strongly dependent on RTA(Rapid Thermal Annealing) annealing temperature and time. We were able to obtain a perovskite structure of PZT at $650^{\circ}C$ and 10min. P-E curves of Pd/PZT/Pt capacitor demonstrate typical hysteresis loops. The measured values of $P_r$, $E_c$ were $8.1[{\mu}C/cm^2]$, 95[kV/cm] respectively. Polarization value decrease about 25% after $10^9$ cycles.

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