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The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering (RF 스퍼터링으로 증착된 하이드록시아파타이트 박막의 열처리 특성)

  • Jung, Chan-Hoi;Lee, Jun-Hee;Shin, Youn-Hak;Kim, Myung-Han;Choi, Sock-Hwan;Kim, Seung-Eon
    • Korean Journal of Materials Research
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    • v.16 no.4
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    • pp.218-224
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    • 2006
  • RF sputtering process was applied to produce thin hydroxyapatite(HAp) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the hardness between HAp thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the Ti-6Al-4V alloy substrates were heat treated for 1h at $850^{\circ}C\;under\;3.0{\times}10^{-3}torr$, and after deposition, the HAp thin films were heat treated for 1h at $400^{\circ}C,\;600^{\circ}C\;and\;800^{\circ}C$ under the atmosphere, and analyzed FESEM-EDX, FTIR, XRD, nano-indentor, micro-vickers hardness, respectively. Experimental results represented that the surface defects of thin films decreased by relaxation of internal stress and control of substrate structure followed by heat treatment of substrates before the deposition, and the HAp thin films on the heat-treated substrates had higher hardness than none heattreated substrates before the deposition, and the hardness properties of HAp thin films and Ti-6Al-4V alloy substrates appeared independent behavior, and the hardness of HAp thin films decreased by formation of $VTiO_3(OH),\;{\theta}-Al_{0.32}V_2O_5,\;Al_{0.33}V_2O_5$.

RF magnetron sputtering법으로 성장시킨 ZnO 박막의 광특성과 grain size의 영향에 관한 연구

  • 김경국;박성주;정형진;최원국
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.117-117
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    • 1999
  • 최근 광소자와 더불어 발전과 더불어 고효율의 새로운 광소자에 대한 수요가 증가되고 있다. ZnO는 이러한 특성을 가진 재료중에 한가지로서 최근 들어 그 가능성에 대한 연구가 활발히 이루어지고 있다. 특히 상온에서 exciton binding energy가 다른 재료보다 큰 60meV로 고효율의 blue, UV 발광이 가능한 재료로 알려져 있다. 본 연구에서도 광소자로서 ZnO를 활용하기 위해서 RF magnetron sputtering법을 이용하기 위하여 광특성의 향상에 목적을 두고 연구하였다. ZnO 박막은 RF magnetron sputtering법을 이용하여 sapphire (0001) 기판위에 성장시켰다. RF power는 60W에서 120W까지 변화시켰고 박막의 성장온도는 55$0^{\circ}C$$600^{\circ}C$로 변화시켰으며, 박막의 성장시간은 60분, ZnO target과 기판과의 거리는 4.5cm로 하여 성장시켰다. 성장된 ZnO 박막은 XRD $\theta$-rocking scan 측정을 통해서 박막의 C-축 배향성과 RBS channeling를 이용하여 ZnO 박막의 epitaxial 성장 정도를 측정하였다. 박막의 상온 발광 특성은 He-Cd laser를 사용한 photoluminescence spectra로 측정하였다. 또한 표면의 morphology는 atomic force microscope(AFM)를 이용하여 관찰하였으며 transmission electron microscopy(TEM)을 사용하여 ZnO박막의 단면적을 관찰함으로서 grain의 성장과 광특성 및 결정성과의 영향에 대해서 연구하였다. ZnO 박막의 성장온도 55$0^{\circ}C$에서 RF power를 60W에서 120W까지 변화시킬 경우 XRD $\theta$-rocking peak의 반치폭이 0.157$^{\circ}$에서 0.436$^{\circ}$까지 변화하였고 80W에서 최소값을 가졌으며 in-plain에 대한 XRD 측정 결과 ZnO 박막의 성장은 sapphire 기판에 대해서 30$^{\circ}$회전되어 성장된 것으로 알 수 있었으며 이는 ZnO [100]∥ Al2O3[110]의 관계를 갖는다는 것을 나타낸다. 광특성의 측정 결과인 PL peak의 반치폭은 133.67meV에서 89.5meV까지 변화함을 알 수 있었고 80W에서 최대값을 가졌으며 이는 RF power의 변화에 따른 결정성의 변화와는 반대되는 현상임을 알 수 있었다. 그러나 성장온도 $600^{\circ}C$일때에는 XRD $\theta$-rocking peak의 반치폭이 0.129$^{\circ}$로 결정성이 우수한 박막임을 확인할 수 있었고 PL peak의 반치폭 또한 Ar과 O2의 비율에 따라 76.32meV에서 98.77meV로 광특성도 우수한 것으로 나타났다. RBS channeling 결과 55$0^{\circ}C$에서는 $\chi$min값이 50~60%였으나 $600^{\circ}C$일 때에는 $\chi$min값이 4~5%로 박막이 epitaxial 성장을 하였다는 것을 알 수 있었다. 결정성과 광특성과의 연관성을 알아보기 위해 TEM을 이용한 박막의 cross section image를 관찰한 결과 광특성이 우수한 시편일수록 grain의 크기가 큰 것으로 나타났고 결정성이 우수한 시편의 경우에서는 XRD분석 결과에서처럼 C-축배향성이 우수한 것을 확인할 수 있었다. 이상의 결과로부터 RF magnetron sputtering 법으로 광특성이 우수한 양질의 ZnO박막 성장이 가능하였다는 것을 알 수 있었으며 광소자로써의 가능성을 확인 할 수 있었다.

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Study on RF power dependence of BST thin film by the different substrates (기판에 따른 BST 박막의 RF Power 의존성)

  • 최명률;이태일;박인철;김홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.22-25
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    • 2002
  • In this paper, we deposited MgO buffer layer on p-type (100)Si substrate in the condition of substrate temperature 400$^{\circ}C$, working gas ratio Ar:O$_2$=80:20, RF Power 50W, working pressure 10mtorr, and the thickness of the film was about 300${\AA}$. Then we deposited Ba$\sub$0.5/Sr$\sub$0.5/TiO$_3$ thin film using RF Magnetron sputtering method on the MgO/Si substrate in various RF power of 25W, 50W, 75W. The film deposited in 50W showed the best crystalline from the XRD measurement. To know the electrical properties of the film, we manufactured Al/BSTMgO(300${\AA}$)/Si/Al structure capacitor. In the result of I-V measurement, The leakage current density of the capacitor was lower than 10$\^$-7/A/$\textrm{cm}^2$ at the range of ${\pm}$150kV/cm. From C-V characteristics of the capacitor, can calculate the dielectric constant and it was 305. Finally we deposited BST thin film on bare Si substrate and (100)MgO substrate in the same deposition condition. From the comparate of the properties of these samples, we found the properties of BST thin film which deposited on MgO/Si substrate were better than on bare Si substrate and similar to on MgO substrate.

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Polarization Characteristics of SBN Thin Film by RF Magnetron Sputtering (RF 마그네트론 스퍼터링법에 의한 SBN 박막의 분극특성)

  • Kim, Jin-Sa
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.60 no.6
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    • pp.1175-1177
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    • 2011
  • The SBN thin films were deposited on Pt/Ti/$SiO_2$/Si and p-type Si(100) substrate by rf magnetron sputtering method using $Sr_{0.7}Bi_{2.3}Nb_2O_9$ ceramic target. SBN thin films deposited were annealed at 600~800[$^{\circ}C$] by furnace in oxygen atmosphere during 40min. The polarization characteristics have been investigated to confirm the possibility of the SBN thin films for the application to destructive read out ferroelectric random access memory. The maximum remanent polarization and the coercive voltage are 0.6[${\mu}C/cm^2$], 1.2[V] respectively at annealing temperature of 800[$^{\circ}C$]. The leakage current density was the $2.57{\times}10^{-6}[A/cm^2]$ at an applied voltage of 5[V] at annealing temperature of 650[$^{\circ}C$]. Also, the fatigue characteristics of SBN thin films did not change up to $10^8$ switching cycles.

Electrical Properties of SrBi$_2$$Nb_2$>$O_9$ Thin Films deposited by RF Magnetron Sputtering Method (RF 마그네트론 스퍼터링법에 의해 증착된 SrBi$_2$$Nb_2$>$O_9$ 박막의 전기적 특성에 관한 연구)

  • Zhao, Jin-Shi;Choi, Hoon-Sang;Lee, Kwan;Choi, In-Hoon
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.290-293
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    • 2001
  • The SrBi$_2$Nb$_2$O$_{9}$ (SBN) thin films were deposited on p-type(100) Si substrates by rf magnetron sputtering to confirm the Possibility of Pt/SBN/Si structure for the application of nondestructive read out ferroelectric random access memory (NDRO- FRAM). The SBN thin films were deposited by co-sputtering method with Sr$_2$Nb$_2$O$_{7}$ (SNO) and Bi$_2$O$_3$ ceramic targets. The SBN thin films deposited at room temperature were annealed at $700^{\circ}C$ for 1hr in $O_2$ ambient. The structural and electrical properties of SBN with different power ratios of targets were measured by x-ray diffraction(XRD), scanning electron microscopy(SEM), capacitance-voltage(C-V), and current-voltage(I-V). The C-V curves of the SBN films showed hysteresis curves of a clockwise rotation showing ferroelectricity. When the Power ratio of the SNO/Bi$_2$O$_3$ targets was 120 W/100 W, the SBN thin films had excellent electrical properties. The memory window of SBN thin film was 1.8 V-6.3 V at applied voltage of 3 V-9 V and the leakage current density was 1.5 $\times$ 10$^{-7}$ A/$\textrm{cm}^2$ at applied voltage of 5 V The composition of SBN thin films was analysed by electron probe X-ray micro analyzer(EPMA) and the atomic ratio of Sr:Bi:Nb with pawer ratio of 120 W/100 W was 1:3:2.

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Physical and electrical properties of a-C:H deposited by RF-PECVD (RF-PECVD에 의해 증착된 a-C:H 박막의 물리적 및 전기적 특성 분석)

  • 김인준;김용탁;최원석;윤대호;홍병유
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.296-300
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    • 2002
  • Thin films of Hydrogenated amorphous carbon(a-C:H) are generally exhibited by high electrical resistivities from 10$^2$ to 10$\^$16/ Ω$.$cm, resulting in an interesting material for high power, high temperature MIS devices applications. The hydrogenated amorphous carbon(a-C:H) films were deposited on silicon and glass using an rf plasma enhanced CVD method. The resultant film properties were evaluated in the respect of material based on r.f. power variation. The hydrogenated amorphous carbon(a-C:H) films of thickness ranging from 30 to 50 m were deposited at the pressure of 1 ton with the mixture of methane and hydrogen. We have used rf-IR( courier transform IR) and AFM(Atomic force microscopy) for determining physical properties and current-voltage(I-V) measurement for electrical Properties.

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Identification and Changes of Physiologically Active Substances During Chilling Storage of Dehisced Ginseng Seeds (저온저장중 개갑인삼종자내의 생리활성물질 동정 및 변화)

  • Kwon, Woo-Saeng;Baek, Nam-In;Lee, Jung-Myung
    • Journal of Ginseng Research
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    • v.21 no.1
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    • pp.13-18
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    • 1997
  • Identification and changes of physiologically active substances during chilling storage of dehisced ginseng (Panax ginseng C. A. Meyer) seeds were analyzed using various preparatory separation methods and purification columns; Dowex 50W and silica gel columns. Seven components with Rf values of 0.20, 0.40, 0.58, 0.66, and 0.70 In solvent system, $CHCl_3$:MeOH=3:1 (v/v), Rf values of 0. 63 and 0.74 in solvent system, $CHCl_3$:MeOH:$H_2O$:=7:3:1 (v/v) were obtained through Dowex 50W and silica gel column chromatographies. Two components with Rf values of 0.20 and 0.63 in the all chilling treatments were detected in the extract obtained through both chromatographies, and only the former component was gradually increased till 4 weeks of chilling storage and then rapidly decreased from 8 to 16 weeks. UV spectra of Rf values of 0.66 and 0.56 were similar to that of cytokinin, but their physiological activities were not found. Rf values of 0.20 showed activity by radish cotyledon expansion bioassay. The component with Rf value of 0.20 was revealed to have a naphthalene in the proposed chemical structure by various NMR techniques.

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Development of a Wireless Sensor Network Node with Dual Interfaces of UHF Radio and Bluetooth (UHF-RF 및 블루투스 이중 접속 무선 센서 네트워크 노드개발)

  • Kim, Ho-Joon
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.10
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    • pp.1905-1913
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    • 2006
  • The researches about the hardware and the software implementing ubiquitous sensor network have great rush in recent years. This paper deals the development of a sensor node with the dual interface which also has an RF wireless interface while has an Bluetooth interface used widely in present. This sensor node includes a Atmeg32 microcontroller, a Bluetooth module, a RF module. a temperature-humidity sensor. and I also develop the F/Ws controlling each modules with C language using GCC compiler. The sensor node developed can reaches 15m with Bluetooth interface and 60m with RF interface. It works stably with the voltage above 5V and it consumes currents 21mA average in idle mode, 63mA average in active mode.

Study on Miniaturized RF Components for Application to Ship Radio Communication (선박 무선통신 응용을 위한 초소형 RF 소자에 관한 연구)

  • Young Yun
    • Proceedings of the Korean Institute of Navigation and Port Research Conference
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    • 2022.11a
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    • pp.390-391
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    • 2022
  • Recently, SpaceX, private enterprise dealing in space development company, has reported a plan for launching of low earth orbit satellites via Starlink Business, and launched 900 satellites until now. Concretely, it plans tp operate Ku/Ka band satellite, and launch 7,518 of V band satellites for broadband communication. Therefore, wireless communication service for ship will be provided, and various solutions will be offered through the low earth orbit satellites. In this work, we investigated RF characteristics of coplanar waveguide employing periodic 3D coupling structures, and examined its potential for a development of marine radio communication FISoC (fully-integrated system on chip) semiconductor device.

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Structural and Optical Properties of SnS Thin Films Deposited by RF Magnetron Sputtering (RF 마그네트론 스퍼터링법으로 제조한 SnS 박막의 구조적 및 광학적 특성)

  • Hwang, Donghyun
    • Journal of the Korean institute of surface engineering
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    • v.51 no.2
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    • pp.126-132
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    • 2018
  • SnS thin films with different substrate temperatures ($150 {\sim}300^{\circ}C$) as process parameters were grown on soda-lime glass substrates by RF magnetron sputtering. The effects of substrate temperature on the structural and optical properties of SnS thin films were investigated by X-ray diffraction (XRD), Raman spectroscopy (Raman), field-emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDS), and Ultraviolet-visible-near infrared spectrophotometer (UV-Vis-NIR). All of the SnS thin films prepared at various substrate temperatures were polycrystalline orthorhombic structures with (111) planes preferentially oriented. The diffraction intensity of the (111) plane and the crystallite size were improved with increasing substrate temperature. The three major peaks (189, 222, $289cm^{-1}$) identified in Raman were exactly the same as the Raman spectra of monocrystalline SnS. From the XRD and Raman results, it was confirmed that all of the SnS thin films were formed into a single SnS phase without impurity phases such as $SnS_2$ and $Sn_2S_3$. In the optical transmittance spectrum, the critical wavelength of the absorption edge shifted to the long wavelength region as the substrate temperature increased. The optical bandgap was 1.67 eV at the substrate temperature of $150^{\circ}C$, 1.57 eV at $200^{\circ}C$, 1.50 eV at $250^{\circ}C$, and 1.44 eV at $300^{\circ}C$.