• Title/Summary/Keyword: RF 마그네트론 스퍼트링

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The Electrical and Optical Characteristics of ATO Films Prepared by RF Magnetron Sputtering Method (RF 마그네트론 스퍼트링법에 의해 제조된 ATO 박막의 전기적 및 광학적 특성)

  • Kang, Sung Soo;Lee, Sung Ho;Jang, Yoon Seok;Park, Sang Chul
    • Journal of Korean Ophthalmic Optics Society
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    • v.15 no.4
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    • pp.299-305
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    • 2010
  • Purposes: The purposes of this study were to investigate the optical, structural and electrical properties of the antimony doped tin oxide(ATO) thin films according to certain variable deposition conditions, such as RF input power and T-S (target-substrate) distance change, using transparent conducting oxide (TCO). Methods: ATO thin films of Sb concentration ratio with $SnO_2:Sb_2O_5$ = 95:5 wt% were deposited at room temperature by RF magnetron sputtering method. Results: ATO thin films were most sensitive to the RF input power: light transmittance was 78% at RF input power of 30W, and 0.56 nm for the surface roughness and 1007 $\Omega{\cdot}cm^{-2}$ for the sheet resistance as well. Conclusions: It was found that ATO thin films were showed the large change in its characteristics of structural, optical and electrical properties which were affected by T-S distance and RF input power.

Effect of Ar Flow Ratio on the Characteristics of Al-Doped ZnO Grown by RF Magnetron Sputtering (마그네트론 스퍼터를 이용한 Ar 가스 유량 조절에 따른 AZO의 특성 변화)

  • Lee, Seung-Jin;Jeong, Young-Jin;Son, Chang-Sik
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.61.2-61.2
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    • 2011
  • 본 연구에서는 박막 태양전지용 투명전극으로 사용하기 위해서 Gun-type RF 마그네트론 스퍼트링을 이용하였다. 챔퍼안의 타겟은 AZO타겟(Zn: 98[wt.%], Al:2[wt.%]을 장착하였고 공정압력은 고진공을 유지하였다. 온도는 $300^{\circ}C$로 고정하였고 전력은 70W로 고정하였다. $Ar^+$ 가스유량비를 20sccm~100sccm으로 변화를 주어 기판 위에 AZO를 증착하여 AZO의 구조적 및 광학적 특성의 의존성을 알아보았다. 모든 가스변화에서 400에서 700 nm까지의 가시광 영역에서의 AZO 박막의 평균 투과도는 약 85% 이상의 우수한 투과율을 보인다. AZO 박막 내의 결정 구조는 (002)면으로 우선 배향을 하는 wurtzite 구조를 가지며, $Ar^+$변화에 의해 두께가 증가하면서 결정립의 주상 (columnar) 성장이 향상되고 결정립의 크기도 증가한다. 이러한 경향성은 $Ar^+$변화에 의해 결정성이 향상된다는 것을 의미한다. 이와 같은 구조 및 광학 특성을 가지는 유리 기판 위에 증착된 AZO는 박막 태양전지용 투명 전극으로 응용이 가능할 것이다.

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Effects of Substrate Temperature on Properties of (Ga,Ge)-Codoped ZnO Thin Films Prepared by RF Magnetron Sputtering (RF 마그네트론 스퍼트링에 의한 Ga 와 Ge가 도핑된 ZnO 박막 특성의 온도효과)

  • Jung, Il-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.7
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    • pp.584-588
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    • 2011
  • The ZnO thin films doped with Ga and Ge (GZO:Ge) were prepared on glass substrate using RF sputtering system. Structural, morphological and optical properties of the films deposited in different temperatures were studied. Proportion of the element of using target was 97 wt% ZnO, 2.5 wt% Ga and 0.5 wt% Ge with 99.99% highly purity. Structural properties of the samples deposited in different temperatures with 200 w RF power were investigated by field emission scanning electron microscopy, FE-SEM images and x-ray diffraction XRD analysis. Atomic force microscopy, AFM images were able to show the grain scales and surface roughness of each film rather clearly than SEM images. it was showed that increasing temperature have better surface smoothness by FE-SEM and AFM images. Transmittance study using UV-Vis spectrometer showed that all the samples have highly transparent in visible region (300~800 nm). In addition, it can be able to calculate bandgap energy from absorbance data obtained with transmittance. The hall resistivity, mobility, and optical band gap energy are influenced by the temperature.