• 공업화학
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• 제17권2호
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• pp.201-209
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• 2006

활성탄과 제올라이트 13X를 충진시킨 흡착탑에 흡착질인 벤젠을 포화 흡착시킨 후 여러 가지 탈착 방법에 대한 효율을 살펴보았다. 뜨거운 수증기에 의한 탈착, 세정 기체에 의한 탈착, 진공에 의한 탈착 등을 실험하였고, 그 결과 뜨거운 수증기에 의한 탈착이 가장 좋은 탈착 방법으로 판단되었다. 또한 뜨거운 수증기는 흡착탑 내의 온도를 상승시키면서 탈착을 야기시키고 수증기 탈착 과정 이후에는 건조 공정이 수반되어야만 효율이 높아짐을 알 수 있었다. 건조 공정이 수반되지 않을 경우는 수증기가 추후에 흡착을 방해하는 결과를 초래하였다. 진공에 의한 탈착은 효과가 매우 적은 것으로 나타났는데 이로부터 벤젠의 경우에 압력 변화에 의한 탈착 보다는 온도 변화에 의한 탈착이 더 효과적인 것으로 판단되었다. 세정 기체에 의한 탈착에서는 진공 탈착과 함께 이루어질 때 좋은 탈착 성능이 나타남을 알 수 있었다.

• 한국축산식품학회지
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• 제42권5호
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• pp.816-832
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• 2022

To evaluate the effects of early postmortem vacuum packaging (VP) on meat quality during postmortem chilled storage, hot-boned lamb was vacuum-packaged at 1, 6, 12, 24, and 48 h postmortem and stored around 2℃ until 168 h postmortem, with lamb packaged in plastic wrap as the control (aerobic packaging). Intramuscular pH decline was delayed when lamb was vacuum packaged at 1, 6, and 12 h postmortem (p<0.05). The lamb vacuum-packaged at 1 h postmortem (VP-1h group) had significantly lower shear force values and purge losses accompanied by lower free thiol group values than other treatments during postmortem storage and was also higher in extractable calpain-1 activity by 6 h postmortem (p<0.05). Free thiol group concentrations were significantly higher after VP at 6 and 12 h postmortem (p<0.05). Packaging lamb under vacuum very early postmortem produced the lowest shear force and purge loss, likely by slowing heat loss and muscle temperature decline, implying that lamb quality is improved by VP when applied very early postmortem. This was at the expense of protein oxidation, which was unrelated to other meat quality measurements, most likely because potential contracture during hot boning confounded its impact. Further research is required to understand the implications of the interaction between protein oxidation, VP, and hot boning on the acceptability of lamb.

• 한국대기환경학회지
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• 제9권1호
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• pp.101-106
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• 1993

In order to separate the Freon-12 and air mixture$(CF_2Cl_2/Air=0.1/99.9 vol.%)$ by pressure swing adsorption (PSA), the breakthrough curve was experimentally observed in a fixed bed adsorption column. A single adsorber was packed with various adsorbents such as, the activated carbon(S-AC, W-AC) and the molecular sieve(MS-5A, MS-13X). The order of appearance of breakthrough curve is MS-5A > MS-13X > W-AC > S-AC. The activated carbon was found to be more effective adsorbent for separating Freon-12 from the mixture than the molecular sieve was. From the experimental data obtained by the separation of Freon-12 gas out of the air stream in the steady-state PSA process cycle, whose size is the same one of column used for the breakthrough curve observation, it has been confirmed that Freon-rich gas could be obtained from the purge step of PSA and Freon-free air could be obtained from the adsorption step of PSA cycle.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.234.2-234.2
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• 2014

Organic light emitting diode (OLED) is considered as the next generation flat panel displays due to its advantages of low power consumption, fast response time, broad viewing angle and flexibility. For the flexible application, it is essential to develop thin film encapsulation (TFE) to protect oxidation of organic materials from oxidative species such as oxygen and water vapor [1]. In many TFE research, the inorganic film by atomic layer deposition (ALD) process demonstrated a good barrier property. However, extremely low throughput of ALD process is considered as a major weakness for industrial application. Recently, there has been developed a high throughput ALD, called 'spatial ALD' [2]. In spatial ALD, the precursors and reactant gases are supplied continuously in same chamber, but they are separated physically using a purge gas streams to prevent mixing of the precursors and reactant gases. In this study, the $Al_2O_3$ thin film was deposited by spatial ALD process. We characterized various process variables in the spatial ALD such as temperature, scanning speed, and chemical compositions. Water vapor transmission rate (WVTR) was determined by calcium resistance test and less than $10-^3g/m^2{\cdot}day$ was achieved. The samples were analyzed by x-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscope (FE-SEM).

• 한국진공학회지
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• 제17권6호
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• pp.538-543
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• 2008

나노급 다이아몬드는 최근 폭발법이나 증착법에 의한 신공정으로 100 nm 이하의 분말형태의 제조가 가능하다. 나노급 다이아몬드의 소결을 이용하면 이상적인 연마기기의 제작이 가능하다. 이러한 나노급 다이아몬드의 소결 공정에서 생기는 비이상적인 나노결정의 결정립성장과 다이아몬드 결합장애를 방지하기 위해서 나노급 무기물을 균일하게 코팅하는 공정개발이 필요하다. 본 연구에서는 나노급 다이아몬드의 소결 특성을 향상시키기 위해서 ALD(atomic layer deposition)을 이용하여 진공에서 $20{\sim}30\;nm$ 두께의 ZnO 박막을 코팅해 보았다. 나노급 다이아몬드 분말 전면에 경제적으로 ZnO ALD를 위해서 기존의 기계적 진동효과 또는 전용 fluidized bed reactor를 대치하여 새로이 20 mm 석영튜브 안에 다이아몬드 분말을 넣고 다공성 유리필터로 막은 후 펄스와 퍼지 공정시의 압력에 의한 다이아몬드의 부유를 이용한 변형된 fluidized bed 공정을 채용하였다. 다공성 유리필터로 양쪽이 막힌 석영튜브 안에 전구체 DEZn (diethylzinc : $C_4H_{10}Zn$)와 반응기체 $H_2O$를 사용하여 ZnO 박막을 캐니스터 온도 $10^{\circ}C$에서 원자층증착하였다. 공정 순서 및 반응물질 주입 시간은 DEZn pulse-0.1초, DEZn purge-20초, $H_2O$ pulse-0.1초, $H_2O$ purge-40초와 같이 설정하였으며, 이 네 단계를 1 cycle로 정의하여 100 cycle 반복 실시하였다. 다이아몬드 분말과 ZnO 박막이 증착된 다이아몬드 분말의 미세구조를 확인하기 위하여 투과전자현미경 (transmission electron microscope)을 이용하였다. TEM 측정결과, ALD 증착 전 나노급 다이아몬드 분말의 직경이 약 $70{\sim}120\;nm$이었고 사면체, 육면체 등의 다양한 형태를 보임을 확인하였다. ZnO 박막이 ALD코팅된 다이아몬드 분말의 직경은 약 $90{\sim}150\;nm$이었고, 다이아몬드 분말과 ZnO의 명암차이에 의해 약 $20{\sim}30\;nm$ 두께의 균일한 ZnO 박막이 다각형 형태의 다이아몬드 파우더 표면에 성공적으로 증착되었음을 확인하였다.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2005년도 제25회 추계학술대회논문집
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• pp.353-357
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• 2005

본 연구는 30톤급 엔진 개발에 필요한 실물형 가스 발생기를 개발하는 과정에서 분사기 LOx post에 발생한 손상에 대해 기술하였고 손상에 대한 원인 분석에 대해 논의하였다. 4분사기, 실물형 가스발생기 및 1차 재설계된 분사기에 대한 연소시험 결과를 기술하였고 이에 대한 원인으로 연소 불안정, 종단시 purge, LOx 분무의 낮은 모멘텀, 작은 recess number, 적은 LOx 분사기 유량, 큰 분무 각도 등이 주원인임을 알 수 있었다. 이 분석 결과에 따라 recess number를 증가, 분사기 LOx 및 연료 분무각 증가, LOx post 외벽과 연료막 사이 간격 축소, LOx post 벽 두께 증가의 방향으로 분사기에 대한 재설계가 이루어졌다.

• 한국재료학회지
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• 제26권9호
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• pp.486-492
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• 2016

Tungsten (W) thin film was deposited at $400^{\circ}C$ using pulsed chemical vapor deposition (pulsed CVD); film was then evaluated as a nucleation layer for W-plug deposition at the contact, with an ultrahigh aspect ratio of about 14~15 (top opening diameter: 240~250 nm, bottom diameter: 98~100 nm) for dynamic random access memory. The deposition stage of pulsed CVD has four steps resulting in one deposition cycle: (1) Reaction of $WF_6$ with $SiH_4$. (2) Inert gas purge. (3) $SiH_4$ exposure without $WF_6$ supply. (4) Inert gas purge while conventional CVD consists of the continuous reaction of $WF_6$ and $SiH_4$. The pulsed CVD-W film showed better conformality at contacts compared to that of conventional CVD-W nucleation layer. It was found that resistivities of films deposited by pulsed CVD were closely related with the phases formed and with the microstructure, as characterized by the grain size. A lower contact resistance was obtained by using pulsed CVD-W film as a nucleation layer compared to that of the conventional CVD-W nucleation layer, even though the former has a higher resistivity (${\sim}100{\mu}{\Omega}-cm$) than that of the latter (${\sim}25{\mu}{\Omega}-cm$). The plan-view scanning electron microscopy images after focused ion beam milling showed that the lower contact resistance of the pulsed CVD-W based W-plug fill scheme was mainly due to its better plug filling capability.

• 반도체디스플레이기술학회지
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• 제22권1호
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• pp.23-27
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• 2023

Organic light-emitting diode(OLED) is very thin organic films which are hundreds of nanometers. Unlike bottom-emission OLED(BEOLED), top-emission OLED(TEOLED) emits light out the front, opaque moisture absorbents or metal foils can't be used to prevent moisture and oxygen. And it is difficult to have flexible characteristics with glass encapsulation, so thin film encapsulation which can compensate for those two disadvantages is mainly used. In this study, Al₂O₃ thin films by atomic layer deposition(ALD) were examined by changing the argon gas purge flow rate and we applied this Al₂O₃ thin films to the encapsulation of TEOLED. Ag / ITO / N,N'-Di-[(1-naphthyl)-N,N'-diphenyl]-1,1'-biphenyl-4,4'-diamine / tris-(8-hydroxyquinoline) aluminum/ LiF / Mg:Ag (1:9) were used to fabricate OLED device. The characteristics such as brightness, current density, and power efficiency are compared. And it was confirmed that with a thickness of 40 nm Al₂O₃ thin film encapsulation process did not affect OLED properties. And it was enough to maintain a proper OLED operation for about 9 hours.

• 한국수소및신에너지학회논문집
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• 제17권1호
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• pp.8-20
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• 2006

For large scale separation hydrogen from different mixing ratio(60/40 and 80/20 vol.%) of hydrogen and methane $1Nm^3/hr$ and $4Nm^3/hr$ 2bed-6step pressure swing adsorption(PSA) process was used, respectively. The effects of the feed gas pressure, adsorption time, the feed flow rate and the P/F(purge to feed) ratio on the process performance were evaluated. In the $1Nm^3/hr$ PSA results, 11 atm adsorption pressure and 0.10 P/F ratio might be optimal values to obtain more than 75 % recovery and 99 % purity hydrogen in these processing. The optimum feed flowrate was 22 LPM and 17 LPM in the ratio 60/40 and 80/20, respectively. In the $4Nm^3/hr$ PSA results, 10 atm adsorption pressure might be simulated values to obtain more than 80 % recovery and 99 % purity hydrogen in these processing.

• Nuclear Engineering and Technology
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• 제56권1호
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• pp.106-113
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• 2024

Understanding the tritium release and retention behavior of candidate tritium breeder materials is crucial for breeder blanket design. Recently, a melt spraying process was developed to prepare Li₄SiO₄ pebbles, which were subsequently subjected to the in-pile tritium production and extraction platform in China Mianyang Research Reactor (CMRR) to investigate their in-situ tritium release behavior and irradiation performance. The results demonstrate that HT is the main tritium release form, and adding hydrogen to the purge gas reduces tritium retention while increasing the HT percent in the purge gas. Post-irradiation experiments reveal that the irradiated pebbles darken in color and their grains swell, but the mechanical properties remain largely unchanged. It is concluded that the tritium residence time of Li₄SiO₄ made by melt spraying method at 467 ℃ is approximately 23.34 h. High-density Li₄SiO₄ pebbles exhibit tritium release at relatively low temperatures (<600 ℃) that is mainly controlled by bulk diffusion. The diffusion coefficient at 525 ℃ and 550 ℃ is 1.19 × 10^-11 cm²/s and 5.34 × 10^-11 cm²/s, respectively, with corresponding tritium residence times of 21.3 hours and 4.7 hours.