• Title/Summary/Keyword: Pumping chamber

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Optimal Design of an Exhaust System of a Vacuum-Compatible Air Bearing (진공용 공기베어링 배기시스템의 최적설계)

  • Khim, Gyung-Ho;Park, Chun-Hong;Lee, Hu-Sang;Kim, Seung-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.6
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    • pp.86-95
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    • 2007
  • This paper presents the optimal design of an exhaust system of a vacuum-compatible air bearing using a genetic algorithm. To use the air bearings in vacuum conditions, the differential exhaust method is adopted to minimize the air leakage, which prevents air from leaking into a vacuum chamber by recovering air through several successive seal stages in advance. Therefore, the design of the differential exhaust system is very important because several design parameters such as the number of seals, diameter and length of an exhaust tube, pumping speed and ultimate pressure of a vacuum pump, seal length and gap(bearing clearance) influence on the air leakage, that is, chamber's degree of vacuum. In this paper, we used a genetic algorithm to optimize the design parameters of the exhaust system of a vacuum-compatible air bearing under the several constraint conditions. The results indicate that chamber's degree of vacuum after optimization improved dramatically compared to the initial design, and that the distribution of the spatial design parameters, such as exhaust tube diameter and seal length, was well achieved, and that technical limit of the pumping speed was well determined.

Novel Fabrication and Testing of a Bubble-Powered Micropump (새로운 기포동력 마이크로펌프 제작 및 실험)

  • Jung, Jung-Yeul;Kwak, Ho-Young
    • Proceedings of the KSME Conference
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    • 2004.11a
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    • pp.1196-1200
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    • 2004
  • Micropump is very useful component in micro/nano fluidics and bioMEMS applications. In this study, a bubble-powered micropump was fabricated and tested. The micropump consists of two-parallel micro line heaters, a pair of nozzle-diffuser flow controller and a 1 mm in diameter, 400 ${\mu}m$ in depth pumping chamber. The two-parallel micro line heaters with 20 ${\mu}m-width$ and 200 ${\mu}m-length$ were fabricated to be embedded in the silicon dioxide layer of a wafer which serves as a base plate for the micropump. The pumping chamber, the pair of nozzle-diffuser unit and microchannels including the liquid inlet and outlet port were fabricated by etching through another silicon wafer. A glass wafer (thickness of $525{\pm}15$ ${\mu}m$) having two holes of inlet and outlet ports of liquid serve as upper plate of the pump. Finally the silicon wafer of the base plate, the silicon wafer of pumping chamber and the glass wafer were aligned and bonded (Si-Si bonding and anodic bonding). A sequential photograph of bubble nucleation, growth and collapse was visualized by CCD camera. Clearly liquid flow through the nozzle during the period of bubble growth and slight back flow of liquid at the end of collapsing period can be seen. The mass flow rate was found to be dependent on the duty ratio and the operation frequency. As duty ratio increases, flow rate decreases gradually when the duty ratio exceeds 60%. Also as the operation frequency increases, the flow rate of the micropump decreases slightly.

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Vacuum Characteristic of a Chamber Made of Mild Steel

  • Park, Chongdo;Ha, Taekyun;Cho, Boklae
    • Applied Science and Convergence Technology
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    • v.24 no.4
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    • pp.84-89
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    • 2015
  • The base pressure and outgassing rate of a mild steel chamber were measured and compared to those of a stainless steel chamber. A combined sputter-ion and non-evaporable getter pump with a nominal pumping speed of 490 l/s generated the base pressure of $2.7{\times}10^{-11}$ mbar in the mild steel chamber and $1.2{\times}10^{-10}$ mbar in the stainless steel chamber. The rate-of-rise measurements show that the mild steel has an extremely low outgassing rate of $2.6{\times}10^{-13}$ mbar $ls^{-1}cm^{-2}$, which is about one-order of magnitude smaller than the outgassing rate of the stainless steels. Vacuum annealing of the mild steel at $850^{\circ}C$ reduced the outgassing rate further to $8.8{\times}10^{-14}$ mbar $ls^{-1}cm^{-2}$, which was comparable to the outgassing rate of a heat treated stainless steel for extreme-high vacuum use.

Design of a Large Magnetron Sputtering System for TFT LCD and Investigation of Sputtered AI Film Properties (TFT LCD 제조용 대면적 Magnetron Sputtering 장치 설계와 Al 성장막 특성 조사)

  • 유운종
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.480-485
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    • 1993
  • Factros considered building the magnetron sputtering system for TFT LCD (thin film transistor liquid crystal display0 metallization were thin film thichnes uniformity, temperature uniformity and the pressure gradient of sputtering gas flow in vacuum chamber, base pressure, and the stability fo the carrier moving . The system was consisted of a deposition chamber, a pre-heating chamber, a RF-precleaning chamber and a load/unload lock chamber. The system was designed to handle a substrate with dimension of 400$\times$400mm. The temperautre uniformity of a heater table developed showed $250 ^{\circ}C\pm$5% accuracyon the substrate glass. A base pressure of 1.8 $\times$10-7 torr was obtained after 24 hours pumping with a cryo pump. After an aluminum target was installed in a sputtering source and the film wa sdeposited on the glass, the uniformity, reflectivity and sheet resistance of the deposited film were measured.

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Design Parameter Analysis for a Planar Type Reactive Ion Etcher (평판형 반응성 이온 식각기의 설계변수 분석)

  • 강봉구;박성호;전영진
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.11
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    • pp.1658-1665
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    • 1989
  • Reactor design considerations over several critical parameters for a planar type reactive ion etcher are given. The etch uniformity is taken as a principal design constraint. The characteristics of economicaly available vacuum pumping system are taken as practical design constraints. A set of theoretical conditions on the chamber geometry and on the gas delivery and vacuum system, that satisfy the design constraints, are derived from basic properties of RF glow discharge and gas dynamics. The theoretical results are applied to decide design parameters of a practical single-wafer-per-chamber planar type reactive ion etching machine.

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A study on Applicability of VacCAD Simulator

  • Kim, Hyung-Taek;Kim, Kang-Won
    • International journal of advanced smart convergence
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    • v.8 no.4
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    • pp.200-206
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    • 2019
  • In this study, we compared the VacCAD and VacSim(Multi), commercial vacuum simulators, to verify the advantages of VacCAD's efficiency. It was emphasized on immediacy and simplicity of simulation modelling, and characteristics of the pump combinations, pumping down curves, and vacuum materials. First, usability of simulation mechanism was estimated through the modeling schematics and obtained simulation results of each employed simulator were compared to evaluate the applicability in practice. Simulation reliability of each simulator was also probed by comparing the pumping characteristics of commercially available high vacuum systems. In addition, the degree of tolerances on VacCAD was also investigated through pumping down analysis considering outgassing effect due to chamber material variations. The higher effectiveness and expediency of VacCAD than VacSim(Multi) has been presented, and it was expected that the utilization of VacCAD in vacuum applications to be increased.

Numerical Analysis of the Flow Characteristics in the Nano Fountain-Pen Using Membrane Pumping (박막펌핑을 이용한 Nano Fountain-Pen의 유동 특성에 관한 수치적 연구)

  • Lee, J.H.;Lee, Y.K.;Lee, S.H.;Kim, Hun-Mo;Kim, Youn-J.
    • The KSFM Journal of Fluid Machinery
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    • v.9 no.2 s.35
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    • pp.19-24
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    • 2006
  • Nano fountain-pen is a novel device to make the constant patterning in micro process using new designed probe. Fountain-pen nanolithography (FPN) is applied for constant supply of liquid in conjunction of patterns and surface variation in the micro process. In this study, nuo fountain-pen is composed with reservoir, micro channels, tip and scondary chamber. Instead of traditional method only using capillary force, liquid can be definitely and exactly injected with membrane pumping by the repulse force of tip. It is dfficult to perform experiments in the micro range so that we carried out a numerical analysis for internal flow, using a commercial code, FlUENT, The velocity, pressure and flow rate are obtained under laminar, unsteady, three-dimensional incompressible flow with no-slip condition, and results are graphically described.

A Study on Effects of Piston Pumping Phase on Vibration and Noises of Tandem Swash Plate Type Axial Piston Pump(1) (피스톤 펌핑 위상이 텐덤형 사판식 액셜 피스톤 펌프의 진동 ${\cdot}$ 소음에 미치는 영향에 관한 연구(1))

  • Park, Sung-Hwan;Lee, Jin-Kul
    • Journal of the Korean Society for Precision Engineering
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    • v.16 no.5 s.98
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    • pp.74-82
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    • 1999
  • To meet the needs of the hydraulic excavator of large capacity, tandem axial type piston pump which is high pressure and high speed have been developed. But inevitably we can not help facing the problem of noise at that time. In order to reduce the noise of this pump, many researchers have been studying the problem of oil distribution manner. But they are not interested in the symmetric structure of tandem type pump. So, focusing on the symmetric structure of tandem type pump, this paper analyzed unbalanced force developed in the pump chamber and verified the effect of the pumping phase of the piston on vibration and noise of the tandem axial type piston pump theoretically.

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A Comparison of Simulation Characteristics of VacCAD and VacTran as Vacuum Simulator

  • Hyung-Taek Kim
    • International journal of advanced smart convergence
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    • v.12 no.4
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    • pp.217-223
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    • 2023
  • In this study, we compared the VacCAD and VacTran, commercial vacuum simulators, to investigate the simulation applicability and efficiency as vacuum simulation software. It was verified on reliability and simplicity of simulation modelling, and characteristics of the pump combinations, pumping down curves, and employed vacuum materials. First, usability of simulation schematics was estimated through the modeling tools and the overall simulation characteristics of each simulator were compared to evaluate the applicability in practice. Simulation reliability of each simulator was also probed by comparing the pumping performance characteristics of commercial high vacuum system models. In addition, the degree of tolerances on both simulators was also evaluated through pumping down analysis considering outgassing effect due to chamber material variations. The higher effectiveness and expediency of VacCAD than VacTran has been presented, and it was also expected that the utilization of VacTan in vacuum applications to be increased due to the higher availability of modelling variations.

Case Study of Repair Works on Surge Suppression Device for Booster Pumping Station (가압펌프장의 수격완화설비에 대한 보수·보강 사례)

  • Kim, Sang-gyun;Lee, Dong-keun;Lee, Gye-bok;Kim, Kyung-yup
    • The KSFM Journal of Fluid Machinery
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    • v.8 no.4 s.31
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    • pp.20-26
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    • 2005
  • When the pumps are started or stopped for the operation or tripped due to the power failure, the hydraulic transients occur as a result of the sudden change in velocity. The field tests on the waterhammer were carried out for Pangyo booster pumping station in which had six booster pumps and two in-line pumps with the motor of output 1,700 kW, respectively. The booster pumping station was equipped with the pump control valve as the main surge suppression device, and the surge relief valve as auxiliary one. But the pump control valve had not early controlled in the planned closing mode, the slamming occurred to the valve of which abruptly closed during the large reverse flow. Because the positive pressure wave caused by the pump failure was superposed on the slam surge, the upsurge increased so extremely that the pump control valve was damaged. After the air chambers were additionally installed in the booster pumping station, it was preyed that the water supply system acquire the safety and reliability on the pressure surge.