• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.12
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• pp.679-684
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• 2000

Closing switch, key component of pulsed power system, is constructed simply and used frequently due to the easy control and manufacture of one. The kind of one are spark-gap, triggered vacuum switch, pseudo-spark switch and INPIStron. But the electrode of spark gap switch is damaged with the hot spot by Z-pinch and then the life of one become short. INPIStron with inverse pinch effect has long life but it is difficult trigger system to provide uniform discharge between cathode and anode. In this paper, the design and manufacturing of INPIStron with gas puffing trigger method in order to supply uniform discharge inter-electrode and the performance of the developed INPIStron applied to 500[kA]-2[MJ] pulsed power system is presented.

• Journal of Industrial Technology
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• v.18
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• pp.249-258
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• 1998

In this paper, we investigated the post-combustion removal of nitrogen oxide($NO_x$) and sulfur oxide($SO_x$) which is based on the gas to particle conversion process by the pulsed corona discharge. Under normal pressure, the pulsed corona discharge produces the energetic free electrons which dissociate gas molecules to form the active radicals. These radicals cause the chemical reactions that convert $SO_x$ and $NO_x$ into acid mists and these mists react with $NH_3$ to form solid particles. Those particles can be removed from the gas stream by conventional devices such as electrostatic precipitator or bag filter. The reactor geometry was coaxial with an inner wire discharge electrode and an outer ground electrode wrapped on a glass tube. The simulated flue gas with $SO_x$ and $NO_x$ was used in the experiment. The corona discharge reactor was more efficient in removing $SO_x$ and $NO_x$ by adding $NH_3$ and $H_2O$ in the gas stream. We also measured the removal efficiency of $SO_x$ and $NO_x$ in a cylinder type corona discharge reactor and obtained more than 90 % of removal efficiency in these experimental conditions. The effects of process variables such as the inlet concentrations of $SO_x$, $NH_3$ and $H_2O$, residence time, pulse frequencies and applied voltages were investigated.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.10
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• pp.710-715
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• 1999

The purpose of this work is to develop a high-efficiency air cleaning system for air pollutants such as particulate and gaseous state in indoor environments. In order to enhance a removal efficiency of gaseous state pollutants, we suggested that pulsed discharge plasma be combined with $TiO_2$ photocatalyst (photocatalytic plasma air cleaning unit). We investigated experimentally the basic characteristics of photocatalytic plasma air cleaning unit and measured air pollutants removal efficiency. The wavelength of light radiated from pulsed discharge plasma under the atmospheric condition was 310~380nm. Its energy is enough to excite the $TiO_2$ photocatalyst and it makes a photochemical reaction in the surface of $TiO_2$ photocatalyst. The removal quantity of trimethylamine$((CH_3)_3N)\; was\; 130mg/m^34 which is twice quantity of pulsed discharge plasma without $TiO_2$ phtocatalyst unit. From the result of gas analysis using FT-IR, nitric oxide was not detected and trimethylamine was decomposed to $H_2O\; and \;CO_2$. And trimethylamine removal efficiency was 95%. These experimental results indicate that photocatalytic plasma air cleaning unit is a potential method in removing the pollutants.

• Journal of the Korean institute of surface engineering
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• v.36 no.4
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• pp.296-300
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• 2003

Extended cylindrical magnetron sputtering system with rotating 600-mm long and 90-mm diameter graphite cathode and pulsed power supply voltage generator were developed and fabricated. Time-dependent Langmuir probe characteristics as well as carbon films thickness were measured. It was shown that ratio of ions flux to carbon atoms flux for pulsed magnetron discharge mode was equal to $\Phi_{i}$ $\Phi$sub C/ = 0.2. It did not depend on the discharge current in the range of $I_{d}$ / = 10∼60 A since both the plasma density and the film deposition rate were found approximately proportional to the discharge current. In spite of this fact carbon film structure was found to be strongly dependent on the discharge current. Grain size increased from 100 nm at $I_{d}$ = 10∼20 A to 500 nm at $I_{d}$ = 40∼60 A. To deposit fine-grained hard nanocrystalline or amorphous carbon coating current regime with $I_{d}$ = 20 A was chosen. Pulsed negative bias voltage ($\tau$= 40 ${\mu}\textrm{s}$, $U_{b}$ = 0∼10 ㎸) synchronized with magnetron discharge pulses was applied to a substrate and voltage of $U_{b}$ = 3.4 ㎸ was shown to be optimum for a hard carbon film deposition. Lower voltages were not sufficient for amorphization of a growing graphite film, while higher voltages led to excessive ion bombardment and effects of recrystalization and graphitization.

• Journal of Industrial Technology
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• v.21 no.B
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• pp.155-161
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• 2001

In this study, we analyzed the $NO_X$ removal efficiency and particle size distribution by the pulsed corona discharge process and investigated the effect of several process variables. The NO removal efficiencies and the particle characteristics were measured and analyzed as the function of initial concentrations of NO, $H_2O$, and $NH_3$, applied voltage, pulse frequency and residence time. As the frequency of applied voltage increases, or as the applied voltage increases or as the residence time increases, the NO removal efficiency increases. The change of initial $NH_3$ and $H_2O$ concentrations do not affect the NO removal efficiency significantly. The particle concentration and size increases with the increases of initial NO concentration, residence time and applied voltage.

• Food Science and Biotechnology
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• v.15 no.6
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• pp.959-966
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• 2006

The electron-capture detector (ECD) of gas chromatographs (GC) has been used widely in pesticide analysis. However, as ECD relies on radioactive material, it is troublesome to purchase and maintain. Therefore, potent replacements for ECD were investigated. A Pulsed-discharge detector (PDD) for ECD was tested and the analytical results of PDD (ECD mode), ${\mu}ECD$, and nitrogen-phosphorus detector (NPD) were compared for 107 pesticides including organochroline, organophosphorus, pyrethroids etc. The number of pesticides identified at the lowest limit of detection (LOD) was 36, 29, and 2 for PDD, ${\mu}ECD$, and NPD, respectively. The remaining pesticides showed same response to PDD and ${\mu}ECD$. The GC-PDD analysis of pesticides spiked into representative agricultural products (brown rice, spinach, and mandarin oranges) also showed good and/or equivalent recoveries using $GC-{\mu}ECD$.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.1981-1983
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• 2000

In this paper, the arc resistance of INPIStron is presented. It is need to the design of Pulsed power system and simulation on the circuit of pulsed power system with INPIStron switch. It is also possible to use this parameter to the part of discharge characteristics of Xenon lamp and the device with electrical discharge.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05a
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• pp.172-175
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• 2002

The technique of induced discharge by a pulsed CO2 laser is being applied to control electrical discharge path, material processing, triggered lightning for protecting the power equipments. In this paper, we have investigated about the characteristics of the induced discharge at atmospheric conditions by using a plasma channel, which is produced when a pulsed CO2 laser radiation is focused by a focusing mirror as a trigger source. A plasma channel produced by laser radiation has an effect on decreasing the threshold voltage and inducing the discharge in both needle electrodes. We have confirmed a delay time between a produced plasma channel and an electrical discharge after laser radiation. We provided the decreased voltage lower than the natural discharge voltage between electrode type of needles and was induced the discharge by forming a plasma channel between them. In this research we could understand the time delay of induced discharge by laser radiation, and the characteristics of the discharge cause by the decrease in the threshold voltage, and the polarity effect by changes of plasma channel positions between two electrodes.

• Proceedings of the Korea Air Pollution Research Association Conference
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• 2001.11a
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• pp.417-418
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• 2001

석탄의 연소과정에서 필연적으로 발생하는 황(SOx) 및 질소산화물(NOx)을 제거하기 위한 방법중 하나인 동시처리기술중 PCD(pulsed corona discharge) 반응기의 반응조건은 첨가제의 성분 및 성상에 따라 다양하게 바뀌며 황 및 질소 산화물 제거반응에 큰 영향을 미친다(Akira M., 1995). 따라서 PCD 반응기에 유입되는 가스는 발전소 배기가스 조건을 적용한 상태에서 주입하는 첨가제의 종류 및 양을 변화시켜, 각종 첨가제의 주입이 탈황, 탈질 반응에 미치는 상승효과를 조사하였고 PCD 반응기에서 첨가제의 반응 현상을 규명코자 하였다(송영훈, 1997). (중략)

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.59.2-59.2
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• 2015

Modification of film structure and properties in inductively-coupled plasma (ICP) assisted dc and pulsed dc sputtering has been reported by Oya and Kusano [1] and by Sakamoto, Kusano, and Matsuda [2], showing drastic changes in films structure and properties by the ICP assistance in particular to the pulsed dc discharge. Although mechanisms involved in the modification has been reported to be the increase in energy transferred to the substrate, details of effects of low-energy ion bombardment on the modification and origin of an anomalous increase in the ion quantity by the ICP assistance to the pulsed dc discharge have not been discussed. In this presentation, mechanisms involved in film structure and property modification in ICP assisted dc and pulsed dc sputtering, in which a number of low-energy ions are formed, will be discussed based on ion energy distribution as well as effectiveness of energy transfer to the substrate by low energy particles [3]. The results discussed in this presentation will emphasize the fact that the energetic particles playing an important role in the film structure modification are those to be deposited, but not those of inert gas, when their energies range in less than 100 eV in the pressure range of magnetron sputtering.