• Journal of Periodontal and Implant Science
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• 제25권3호
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• pp.614-622
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• 1995

Root caries is very frequently developed on exposed root surface after periodontal surgical treatment. In order to determine the anti-caries effect of Nd : YAG laser irradiation on periodontally exposed root surface, 40 mandibular molar teeth that had been extracted due to excessive periodontal destruction were used as the experimental teeth. All teeth were treated by the same procedure as conventional periodontal root treatment, ie thorough scaling, root planing and root conditioning with tetracycline HCl(100mg/ml, 5min.). Within middle one third of root, mesial half surface(20) or distal half surface(20) was randomly irradiated at various power of 1.0W, 2.0W, 3.0W and 4.0W for 60 seconds by non-contact(5mm) delivery of a pulsed Nd : YAG laser(EN.EL.EN060, Italy). The microhardness was measured by Vikers microhardness tester(Wilson, USA) at 2mm/second of jog speed under 100gm load. The difference of microhardness between irradiated side and non-irradiated side was statistically analyzed ANOVA and Duncan's method. Following results were obtained ; 1. The microhardness(Knoop hardness number) was significantly higher in laser irradiated surface than non-irradiated surface(p<0.05). 2. There was no significant difference in microhardness between experimental groups classified by different laser power(p>0.1). The results suggest that Nd : YAG laser irradiation on exposed root suface after periodontal therapy may inhibit the root caries development by enhancing surface microhardness.

• Journal of Welding and Joining
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• 제35권2호
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• pp.58-62
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• 2017

A319 aluminum alloy containing 6.5% Si and 3.5% Cu as major alloying elements has been widely used in machinery parts because of its excellent castability and crack resistance. However it needs more wear resistance to extend its usage to the severe wear environments. It has been known that hyper-eutectic Al-Si alloy having more than 12.6% Si contains pro-eutectic Si particles, which give better wear resistance and lubrication characteristics than hypo-eutectic Al-Si alloy like A319 alloy. In this study, it was tried to clad hyper-eutectic Al-Si alloy on the surface of A319 alloy. In the experiments, Al-36%Si alloy powder was mixed with organic binder to make a fluidic paste. The paste was screen-printed on the A319 alloy surface, melted by pulsed Nd:YAG laser and alloyed with the A319 base alloy. As experimental parameters, the average laser power was changed to 111 W, 202 W and 280 W. With increasing the average laser power, the melting depth was changed to $142{\mu}m$, $205{\mu}m$ and $245{\mu}m$, and the dilution rate to 67.2 %, 72.4 % and 75.7 %, and the Si content in the cladding layer to 16.2 %, 14.6 % and 13.7 %, respectively. The cross-section of the cladding layer showed very fine eutectic microstructure even though it was hyper-eutectic Al-Si alloy. This seems to be due to the rapid solidification of the melted spot by single laser pulse. The average hardness for the three cladding layers was HV175, which was much higher than HV96 of A319 base alloy. From the block-on-roll wear tests, A319 alloy had a wear loss of 5.8 mg, but the three cladding layers had an average wear loss of 3.5 mg, which meant that an increase of 40 % in wear resistance was obtained by laser cladding.

• 한국표면공학회지
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• 제49권1호
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• pp.40-45
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• 2016

Recently, $Bi_2Te_3$-based alloys are the best thermoelectric materials near to room temperature, so it has been researched to achieve increased figure of merit(ZT). Ternary compounds such as Bi-Te-Se and Bi-Sb-Te have higher thermoelectric property than binary compound Bi-Te and Sb-Te, respectively. Compared to DC plating method, pulsed electrodeposition is able to control parameters including average current density, and on/off pulse time etc. Thereby the morphology and properties of the films can be improved. In this study, we electrodeposited n-type ternary Cu-doped $Bi_2(Te-Se)_3$ thin film by modified pulse technique at room temperature. To further enhance thermoelectric properties of $Bi_2(Te-Se)_3$ thin film, we optimized Cu doping concentration in $Bi_2(Te-Se)_3$ thin film and correlated it to electrical and thermoelectric properties. Thus, the crystal, electrical, and thermoelectric properties of electrodeposited $Bi_2(Te-Se)_3$ thin film were characterized the XRD, SEM, EDS, Seebeck measurement, and Hall effect measurement, respectively. As a result, the thermoelectric properties of Cu-doped $Bi_2(Te-Se)_3$ thin films were observed that the Seebeck coefficient is $-101.2{\mu}V/K$ and the power factor is $1412.6{\mu}W/mK^2$ at 10 mg of Cu weight. The power factor of Cu-doped $Bi_2(Te-Se)_3$ thin film is 1.4 times higher than undoped $Bi_2(Te-Se)_3$ thin film.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2009년도 공동학술대회
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• pp.467-470
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• 2009

외부적으로 직렬 및 병렬로 접속된 50개의 DSSC로써 새로운 8 V DC 전원을 만들었다. 한 개의 DSSC는 $5.2{\times}2.6$ cm(유효면적 8 $cm^2$) 약 4.2%의 효율을 보이며, 전기화학적 임피던스 분석법 및 I-V 곡선으로 특성이 분석되었다. 또한 펄스형 Nd:YAG 레이저 빔을 활용하여 투명 도전층을 식각함으로써, 최종효율 약 45%를 달성하였다.

• 전력전자학회:학술대회논문집
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• 전력전자학회 1998년도 Proceedings ICPE 98 1998 International Conference on Power Electronics
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• pp.961-965
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• 1998

The rapid development of small-scale (1-10 MJ) Superconducting Magnetic Energy Storage Systems (SMES) can be explained by real perspective of practical implementation of these devices in electro power nets. However the serious problem of all high mechanically stressed superconducting coils-problem of training and degradation (decreasing) of operating current still exists. Moreover for SMES systems this problems is more dangerous because of pulsed origin of mechanical stresses-one of the major sources of local heat disturbances in superconducting coils. We investigated acoustic emission (AE) phenomenon on model and 0.5 MJ SMES coils taking into account close correlation of AE and local heat disturbances. Two-coils 0.5 MJ SMES system was developed, manufactured and tested at Russian Research Center in the frames of cooperation with Korean Electrical Engineering Company (KEPCO) [1]. The two-coil SMES operates with the stored energy transmitted between coils in the course of a single cycle with 2 seconds energy transfer time. Maximum operating current 1.55 kA corresponds to 0.5 MF in each coil. The Nb-Ti-based conductor was designed and used for SMES manufacturing. It represents transposed cable made of Nb-Ti strands in copper matrix, several cooper strands and several stainless steel strands. The coils are wound onto fiberglass cylindrical bobbins. To make AE event information more useful a real time instrumentation system was used. Two main measured and computer processed AE parameters were considered: the energy of AE events (E) and the accumulated energy of AE events (E ). Influence of current value in 0.5 MJ coils on E and E was studied. The sensors were installed onto the bobbin and the external surface of magnets. Three levels of initial current were examined: 600A, 1000A, 2450 A. An extraordinary strong dependence of the current level on E and E was observed. The specific features of AE from model coils, operated in sinusoidal vibration current changing mode were investigated. Three current frequency modes were examined: 0.012 Hz, 0.03 Hz and 0.12 Hz. In all modes maximum amplitude 1200 A was realized.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Progress in Superconductivity
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• 제6권1호
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• pp.74-78
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• 2004

YBCO coated conductor is one of the most promising materials as a new generations wire especially for practical power applications. In this work, $YBa_2$$Cu_3$$O_{7}$ -$\delta$/(YBCO) coated conductors (CC) were deposited by pulsed laser deposition (PLD) from buffer layers to superconducting layer on hi-axially textured metal tape. The oxide multilayer buffered substrate of architectures of $CeO_2$/$YSZ/Y_2$$O_3$ was fabricated by PLD at steady status. Then YBCO layer was deposited on RABiTS substrate by stationary and reel-to-reel (R2R) continuous process and we compared with deposition conditions of both processes. The degree of texture of each layer was investigated using X-ray diffraction including $\theta$-2$\theta$ scans, $\omega$-scans and $\Phi$-scans analysis. Their surface morphology was observed by scanning electron microscopy (SEM). The FWHM of the X-ray $\Phi$-scans and $\Phi$-scans indicated that YBCO and buffer layers closely replicate the in-plane and out-of-plane texture of metal tape. Critical current (Ic) at 77 K, self-field of 75.8 A/cm-width, critical temperature (Tc) of 85 K, and critical current density (Ic) of 3.7 MA/$\textrm{cm}^2$ were measured from coated conductor deposited by stationary process. And coated conductor deposited by R2R continuous process had Ic of 57.5 A/cm-width, Tc of 86.5 K and Jc of 2.0 MA/$\textrm{cm}^2$. The film also exhibits a homogeneous and dense surface morphology.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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• pp.3-3
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• 2009

In order to investigate the possibility of using mixed rare earth $(Nd_{1/3}Eu_{1/3}Gd_{1/3})Ba_2Cu_3O_{7-x}$ (NEG123) as the superconducting layer of the HTS coated conductor, the NEG123 thin film was deposited epitaxialy on LAO(100) single crystal and IBAD_YSZ metal templates by pulsed laser deposition. Systematic studies were carried out to investigate the influences of deposition parameters of PLD on the micro structure, texture and superconducting properties of NEG-123 coated conductor. Deposition at oxygen partial pressure of 600 mTorr was needed to routinely obtain high quality NEG123 films with $J_c$'s (77K) over 2 MA/$cm^2$ and Tc's over 90K (${\Delta}T{\sim}2\;K$). We verified from magnetization study that the NEG123 has an improved in-field Jc as the field increases at temperatures between 10 K and 77 K compared with Gd123. The $J_c$ (77K, self field) and the value of onset $T_c$ of NEG123 thin film on LAO substrate was $4.0MA/cm^2$ and 92K, respectively. This is the first report, to the best of our knowledge, of coated conductors with NEG123 film as the superconducting layer which have Ic and Jc over 40 A/cm-width and 1.6 MA/$cm^2$ at 77K, self field. This study shows the possibility of using NEG123 film as the superconducting layer of the HTS coated conductor which can be used in high magnetic field power electric devices.

• 한국자기학회지
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• 제11권1호
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• pp.21-25
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• 2001

Si 기판 위에 $\alpha$-Fe$_2$O$_3$ 박막을 pulsed laser deposition system으로 제조하여 결정학적 및 자기적 성질을 X선 회절 및 Mossbauer 분광법을 사용하여 연구하였다. 박막의 제조조건은 laser의 출력 5.128 W/$cm^2$, 산소의 압력 0.1 torr, 기판의 온도 30$0^{\circ}C$에서 가장 이상적이었으며 이를 공기 중 80$0^{\circ}C$에서 1일간 열처리하였다. 입자는 크기는 길이 200~300nm, 폭 70-150 nm정도의 타원체로 기판에 비스듬히 누운 형태를 취하고 있으며 결정은 육방정계 형태의 corundum 구조로서 결정상수는 a = 5.03 0.05 $\AA$, c = 13.73$\pm$0.05 $\AA$로 측정되었다. 원자의 스핀 방향은 감마선 방향(기판에 수직 방향)에 대하여 평균적으로 Morin 변환 이하에서는 38$^{\circ}$, 그 이상에서는 48$^{\circ}$의 각을 이루며 특정한 방향을 선호하고있는 것으로 나타났다. Morin 변환은 200 K에서 실온가지 넓은 온도 범위에서 일어나며, c-축에 대한 원자의 스핀 방향은 48$^{\circ}$에서 80$^{\circ}$정도의 변화만이 관측되었다.

• 공업화학
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• 제19권3호
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• pp.270-276
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• 2008

$TiO_2$의 가장 큰 특징은 광촉매적 특성을 들 수 있으나 순수한 $TiO_2$는 자외선 영역에서만 활성을 보이는 단점이 있다. 단점을 보완하고자 본 연구에서는 초고온, 고활성을 이용한 열플라즈마 공정으로 질소가 도핑된 $TiO_2$를 합성하여 $TiO_2$의 광촉매적 특성을 높이고자 하였다. 직류 플라즈마 제트를 이용하여 비금속이온인 질소와 반응 가스인 산소를 $TiCl_4$와 함께 플라즈마 반응기 안에서 반응시켜 질소가 도핑된 $TiO_2$ 나노 분말을 합성하였다. 합성 조건으로 질소의 유량을 변화하였다. 합성 변수에 따른 입자의 상조성, 크기를 분석하였고 아세트알데히드와 곰팡이를 광분해하는 실험을 통해 광촉매 활성을 살펴보았다. 한편 $TiO_2$의 분말 상태와 코팅된 상태의 광촉매 특성을 비교하고자 합성한 분말의 스핀 코팅과 PLD (Pulsed Laser Deposition)을 통해 $TiO_2$를 코팅하였다. 아세트알데히드 분해 실험의 결과 질소가 도핑된 $TiO_2$ 분말의 경우가 순수한 $TiO_2$ 분말에 비해 가시영역에서의 광촉매 활성이 두 배 이상 뛰어난 것을 확인하였으며, 곰팡이 분해 실험 결과 역시 질소가 도핑된 $TiO_2$ 분말에 곰팡이가 분해되는 것을 확인하였다. 분말과 필름을 제조하여 메틸렌블루 광분해 실험한 결과 분말의 경우 100% $TiO_2$입자가 메틸렌블루 분해에 이용되며, 반면 스핀 코팅의 경우 바인더의 함량 때문에 20~30%의 $TiO_2$만이 분해에 이용되기 때문에, 분말의 경우 초기 30 mL 메틸렌블루를 한번에 분해할 수 있었다.