• 제목/요약/키워드: Pulsed Laser deposition

검색결과 639건 처리시간 0.026초

Thin Film Deposition of Tb3Al5O12:Ce by Pulsed Laser Ablation and Effects of Low-temperature Post-annealing

  • Kim, Kang Min;Chung, Jun Ho;Ryu, Jeong Ho
    • Journal of the Optical Society of Korea
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    • 제16권1호
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    • pp.76-79
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    • 2012
  • $Tb_3Al_5O_{12}:Ce$ (TAG:Ce) thin films were successfully deposited by a pulsed laser ablation method on a quartz substrate, and low-temperature post-annealing effects on luminescent properties were investigated in detail. TAG:Ce thin films were analyzed by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and photoluminescence spectroscopy. The as-deposited films were amorphous, and post-annealing above $700^{\circ}C$ was required for crystallization. The post-annealed TAG:Ce thin films showed strong and broad emission bands around 542 nm and excitations at 451 nm, which all corresponded to transitions between the 4f ground level to the $5d^1$ excited levels of Ce ion.

Electrochemical Characteristics of HA Film on the Ti Alloy Using Pulsed Laser Deposition

  • Jeong, Yong-Hoon;Shin, Seung-Pyo;Chung, Chae-Heon;Kim, Sang-Sub;Choe, Han-Cheol
    • 대한금속재료학회지
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    • 제50권5호
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    • pp.395-400
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    • 2012
  • In this study, we have investigated the surface morphology of hydroxyapatite (HA) coated Ti alloy surface using pulsed laser plating. The HA (tooth ash) films were grown by pulsed KrF excimer laser, film surfaces were analyzed for topology, chemical composition, crystal structure and electrochemical behavior. The Ti-6Al-4V alloy showed ${\alpha}$ and ${\beta}$ phase, Cp-Ti showed ${\alpha}$ phase and the HA coated surface showed HA and Ti alloy peaks. The HA coating layer was formed with $1-2{\mu}m$ droplets and grain-like particles, particles which were smaller than the HA target particle, and the composition of the HA coatings were composed of Ca and P. From the electrochemical test, the pitting potential (1580 mV) of HA coated Ti-6Al-4V alloy was higher than those of Cp-Ti (1060 mV) and HA coated Cp-Ti (1350 mV). The HA coated samples showed a lower current density than non-HA coated samples, whereas, the polarization resistance of HA coated samples showed a high value compared to non-HA coated samples.

평면배향된 a-축 수직 $YBa_2Cu_3O_{7-x}$ 고온초전도 박막의 제작 (Fabrication of the in-plane Aligned a-Axis Oriented $YBa_2Cu_3O_{7-x}$ Thin Films)

  • 성건용;서정대
    • 한국세라믹학회지
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    • 제33권3호
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    • pp.313-320
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    • 1996
  • We have fabricated an in-plane aligned a-axis oriented YBa2Cu3O7-x (a-YBCO) thin film on a LaSrGaO4(100) substrate with a PrBa2Cu3O7-x(PBCO) template layer by two step plused laser deposition using 308 nm XeCl excimer laser. A YBCO layer and PBCO layer grown at low temperatures were used as template layers. We have investigated the effect of the deposition temperature of template layers on the superconducting and struc-tural properties of in-plane aligned a-YBCO thin films. An optimal deposition temperature of the PBCO template layers was 630. In-plane aligned a-YBCO thin films showed an anisotropy ratio in resistivity of 11.5 and a zero resistance temperature of 88 K.

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The Strategy to Fabricate the MTiO3(M = Sr, Ba) Thin Films by Laser Ablation

  • Im, T.M.;Park, J.Y.;Kim, H.J.;Choi, H.K.;Jung, K.W.;Jung, D.
    • Bulletin of the Korean Chemical Society
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    • 제29권2호
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    • pp.427-430
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    • 2008
  • BaTiO3 and SrTiO3 thin films were fabricated on Pt/Ti/SiO2/Si substrate by the pulsed laser deposition process. The dependence of the deposited film quality upon the partial oxygen pressure during the deposition process was importantly examined. Regardless of the oxygen pressure, the as-deposited films were not fully crystallized. However, the film deposited at low oxygen pressure became well crystallized after the annealing process. It was concluded, therefore, that the partial oxygen pressure is reduced as low as possible during the deposition process and then anneal the as-deposited samples at ambient pressure to fabricate the well crystallized SrTiO3 and BaTiO3 films by laser ablation.

Pulsed Laser Deposition을 이용하여 GZO/Glass 기판상에 성장시킨 염료감응형 태양전지용 $TiO_2$ Blocking Layer의 특성 연구

  • 여인형;김지홍;노지형;김재원;도강민;신주홍;조슬기;박재호;문병무
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.259-259
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    • 2011
  • 염료감응형 태양전지(Dye-Sensitized Solar Cells:DSSC)는 환경 친화적이며, 저가의 공정에 대한 가능성으로 기존의 고가의 결정질 실리콘 태양전지의 경제적인 대안으로 각광을 받고 있다. 최근 염료감응형 태양전지는 투명 전도성 산화막(Transparent Conducting Oxide : TCO)으로 사용되는 Fluorine Tin Oxide (FTO)가 증착된 유리기판 위에 주로 제작된다. FTO는 낮은 비저항과 가시광선 영역에서 높은 투과도를 가지는 우수한 전기-광학적 특성을 갖지만, 비교적 공정이 까다로운 Chemical Vapor Deposition (CVD)법으로 제조하며, 전체 공정비용의 60%를 차지하는 높은 생산단가로 인해 현재 FTO를 대체할 재료개발 연구가 활발히 진행되고 있다. 그 중 ZnO (Zinc Oxide)는 우수한 전기-광학적 특성과 비교적 저렴한 가격으로 새로운 TCO로써 주목받고 있다. ZnO는 넓은 energy band gap (3.4 [eV])의 육방정계 울자이트(hexagonal wurtzite) 결정 구조를 가지는II-VI족 n형 반도체 물질이며, III족 금속원소인 Al, Ga 및 In 등의 불순물을 첨가하면 TCO로서 우수한 전기-광학적 특성과 안정성을 나타낸다. 이들 물질중 $Zn^{2+}$ (0.060 nm)의 이온반경과 유사한 $Ga^{2+}$0.062 nm) 이온이 ZnO의 격자반경을 최소화 시킬 수 있다는 장점으로 최근 주목 받고 있다. 하지만 Ga-doped ZnO (GZO)의 경우 DSC에 사용되는 루테늄 계열의 산성 염료 하에 장시간 두면 표면이 파괴되는 문제가 발생하며, $TiO_2$ paste를 Printing 후 열처리하는 과정에서도 박막의 파괴가 발생할 수 있다. 이를 방지하기 위해 $TiO_2$ Blocking Layer를 GZO 투명전극 위에 증착하였다. 또한, $TiO_2$ Blocking Layer를 적용한 GZO 박막을 전면전극으로 이용하여 DSC를 제작하여 효율을 확인하였다. 2wt%의 $Ga_2O_3$가 도핑된 ZnO 박막은 20mTorr 400$^{\circ}C$에서 Pulsed Laser Deposition (PLD)에 의해 성장되었고, $TiO_2$박막은 Ti 금속을 타겟으로 이용하여 30mTorr 400$^{\circ}C$에서 증착되었다. Scanning electron microscopy (FE-SEM)을 이용한 박막 분석 결과 $TiO_2$가 증착된 GZO 박막의 경우 표면 파괴가 일어나지 않았다. Solar Simulator을 이용하여 I-V특성 측정결과 상용 FTO를 사용한 DSC 수준의 효율을 나타내었다. 이에 따라 Pulsed Laser Deposition을 이용해 제작된 GZO 기판은 $TiO_2$ Blocking Layer를 이용하여 표면 파괴를 방지할 수 있었으며, 이는 향후 염료감응형 태양전지의 투명전극에 적용 가능 할 것으로 판단된다.

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Amorphous Silicon Carbon Nitride Films Grown by the Pulsed Laser Deposition of a SiC-$Si_3N_4$ Mixed Target

  • Park, Nae-Man;Kim, Sang-Hyeob;Sung, Gun-Yong
    • ETRI Journal
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    • 제26권3호
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    • pp.257-261
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    • 2004
  • We grew amorphous SiCN films by pulsed laser deposition using mixed targets. The targets were fabricated by compacting a mixture of SiC and $SiC-{Si_3}{N_4}$ powders. We controlled the film stoichiometry by varying the mixing ratio of the target and the target-to-substrate distance. The mixing ratio of the target had a dominant effect on the film composition. We consider the structures of the SiCN films deposited using 30~70 wt.% SiC in the target to be an intermediate phase of SiC and $SiN_x$. This provides the possibility of growing homogeneous SiCN films with a mixed target at a moderate target-to-substrate distance.

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Niobium과 Cobalt를 첨가한 Multiferroic BiFeO3 박막의 유전 특성 및 자성 특성 (Dielectric and Magnetic Properties of Niobium and Cobalt Co-substituted Multiferroic BiFeO3 Thin Films)

  • 전윤기;홍성현
    • 한국세라믹학회지
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    • 제45권9호
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    • pp.556-560
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    • 2008
  • The effects of Nb and Co ion substitution on the dielectric and magnetic properties of the multiferroic $BiFeO_3$ thin films have been investigated. Heteroepitaxial $BiFeO_3$ thin films were deposited by Pulsed Laser Deposition method. Nb substitution decreased the leakage current by 6 orders of magnitude and Co substituted $BiFeO_3$ thin films showed an enhanced magnetization, 2 times larger than that of un-substituted $BiFeO_3$. Through the co-substitution of Co and Nb, $BiFeO_3$ thin films with a low leakage current and an enhanced magnetization could be obtained.

Dielectric barrier discharge 플라즈마 펄스 레이져 증착법을 통해 성장한 nitrogen 도핑 된 산화아연 박막의 광학적 특성 (Optical properties of nitrogen doped ZnO thin films grown by dielectric barrier discharge plasma-assisted pulsed laser deposition)

  • 이득희;김상식;이상렬
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1256_1257
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    • 2009
  • We have grown, for the first time to our knowledge, N-doped ZnO thin films on sapphire substrate by employing novel dielectric barrier discharge in pulsed laser deposition (DBD-PLD). DBD guarantees an effective way for massive in-situ generation of N-plasma under the conventional PLD process condition. Low-temperature photoluminescence spectra of the N-doped ZnO film provided near band-edge emission after thermal annealing process. The emission peak was resolved by Gaussian fitting to find a dominant acceptor-bound exciton peak ($A^0X$) that indicates the successful p-type doping of ZnO with N.

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펄스 레이저 증착법에 의해 제작된 ZnO-Si-ZnO 다층 박막의 특성 분석 (Characteristics analysis of ZnO-Si-ZnO multi-layer thin films by pulsed laser deposition)

  • 강홍성;강정석;심은섭;방성식;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.1057-1059
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    • 2002
  • ZnO-Si-ZnO multi-layer thin films have been deposited by pulsed laser deposition (PLD). And then, the films have been annealed at $300^{\circ}C$ in oxygen ambient pressure. Electrical properties of the films were improved slightly than ZnO thin film without Si layer. Also, the optical and structural properties changed by Si layer in ZnO thin film. The optical and structural properties of Si-doped ZnO thin films were characterized by PL(Photoluminescence) and XRD(X-ray diffraction method) respectively. Electrical properties were measured by van der Pauw Hall measurements.

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Investigation on the Flow Field Characteristics of a Highly Underexpanded Pulsed Plasma Jet

  • Kim, Jong-Uk;Kim, Youn J.
    • Journal of Mechanical Science and Technology
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    • 제15권12호
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    • pp.1691-1698
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    • 2001
  • In recent years, significant progress has been made in modeling turbulence behavior in plasma and its effect on transport. It has also been made in diagnostics for turbulence measurement; however, there is still a large gap between theoretical model and experimental measurements. Visualization of turbulence can improve the connection to theory and validation of the theoretical model. One method to visualize the flow structures in plasma is a laser Schlieren imaging technique. We have recently applied this technique and investigated the characteristics of a highly underexpanded pulsed plasma jet originating from an electrothermal capillary source. Measurements include temporally resolved laser Schlieren imaging of a precursor blast wave. Analysis on the trajectory of the precursor blast wave shows that it does not follow the scaling expected for a strong shock resulting from the instantaneous deposition of energy at a point. However, the shock velocity does scale as the square root of the deposited energy, in accordance with the point deposition approximation.

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