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http://dx.doi.org/10.5012/bkcs.2008.29.2.427

The Strategy to Fabricate the MTiO3(M = Sr, Ba) Thin Films by Laser Ablation  

Im, T.M. (Department of Chemistry, Wonkwang University)
Park, J.Y. (Department of Chemistry, Wonkwang University)
Kim, H.J. (Department of Chemistry, Wonkwang University)
Choi, H.K. (Department of Chemistry, Wonkwang University)
Jung, K.W. (Department of Chemistry, Wonkwang University)
Jung, D. (Department of Chemistry, Wonkwang University)
Publication Information
Abstract
BaTiO3 and SrTiO3 thin films were fabricated on Pt/Ti/SiO2/Si substrate by the pulsed laser deposition process. The dependence of the deposited film quality upon the partial oxygen pressure during the deposition process was importantly examined. Regardless of the oxygen pressure, the as-deposited films were not fully crystallized. However, the film deposited at low oxygen pressure became well crystallized after the annealing process. It was concluded, therefore, that the partial oxygen pressure is reduced as low as possible during the deposition process and then anneal the as-deposited samples at ambient pressure to fabricate the well crystallized SrTiO3 and BaTiO3 films by laser ablation.
Keywords
Thin film; Laser ablation; Ferroelectrics; Crystallization
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