• 한국전자파학회논문지
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• 제20권11호
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• pp.1121-1129
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• 2009

본 논문에서는 펄스형 시추공 레이더 시스템에 사용되는 UWB 모듈인 펄스 발생기와 광대역 가변 이득 저잡음 증폭기를 설계 및 제작하고, 기존의 시스템과 비교하여 성능을 분석하였다. 공동을 포함하는 지하 매질의 최대 경로 손실을 구하여 시스템 버짓과 규격을 결정하였다. 펄스 발생기는 40 kHz의 펄스 반복율과 5 ns 미만의 펄스폭을 가지고 피크 레벨이 +73 dBm으로 제작되었다. 광대역 저잡음 증폭기는 주파수 20 MHz에서 200 MHz 범위 내에서 3.77 dB의 잡음 지수와 100 dB의 가변 이득 범위를 가지게끔 설계되었다. 실제 시험장에서 기존 시스템과 비교한 결과, 제작된 시스템은 탐사가 되지 않는 영역도 낮은 잡음 지수를 갖는 저잡음 증폭기에 의해서 탐사가 가능하였다.

• 동력기계공학회지
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• 제13권6호
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• pp.57-62
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• 2009

Unsteady flows in a semi-induction system was investigated to verify their characteristics. A semi-induction system was designed and made to verify the Sow characteristics in an intake system. To attain an intact wave of an intake pulse, a single semi-intake system was adopted as a test rig. The system consists of an intake pipe and a rotary valve as a pulse generator, and a variable volume Helmholtz resonator. The variable volume Helmholtz resonator was mounted in the intake pipe to enhance a breathing capacity and engine performance. The phase and amplitude of the pulsating flow in an unsteady flow system were found to affect the charging capacity significantly. The behavior of pressure wave, their phase and amplitude were investigated in various regions. Some of the results obtained from experiments were described.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 추계학술대회 논문집 전기기기 및 에너지변환시스템부문
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• pp.139-142
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• 2006

This paper describes a new method using random modulated strategies for switched reluctance machines. The proposed method is combined random turn-on, turn-off angle technique and random pulse width modulation technique. The purpose of this proposed method is to decrease harmonic spectrum, and thus reduce the emitted acoustical noise. A random generator is generated by linear congruential generator (LCG) using random pulse position (RPP) scheme. Simulation results show that the harmonic intensity of proposed method is better than that of conventional method.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권11호
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• pp.512-515
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• 2003

This paper is to investigate how partial discharge pulse signal can flow in 6.6㎸ motor stator windings. Pulse propagation is experimentally analyzed in stator windings using a variety of frequency-domain techniques. The experiments were performed on two stator windings in the laboratory. Spectrum analyzer(9KHz to 3㎓) with tracking generator(100kHz to 3㎓) was used. Sweep time of the tracking generator was looms. The frequency spectrum of the response signal was detected by active FET probe(1㎓). The active FET probe has a flat amplitude response up to 1㎓ without high frequency attenuation. The stator winding acts as a low-pass filter below 600KHz, the high-frequency components being highly declined. The resonance peaks show about 1.1MHz and 2MHz in low frequency of No. 1 and No. 2 stator windings, respectively. This low-frequency range indicates that attenuation is low. The peaks of partial discharge magnitude show about 900MHz, 1.6MHz in No. 1 stator winding and about 800KHz, 1.4MHz in No. 2 stator winding.

• 대한의용생체공학회:의공학회지
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• 제17권2호
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• pp.173-178
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• 1996

The objective of this paper is to investigate the effect of AC field on the protoplast of plant cells. The results of investigation will be the basis for the development of etectric cell fusion device. For the experiment, we made the electrode and AC and DC pulse generator and observed the behavior of the protoplasts through the inverted microscope which is connected to the monitor and video recorder by the CCD camera. As a result, the numbers of rotating, moving and destructed protoplasts and viability of the protoplasts have close relation to the amplitude of AC field, while the rotation rate is closely related to the frequency of AC pulse.

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권3호
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• pp.417-422
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• 2015

A 6.5 - 8.5 GHz CMOS UWB transmitter is implemented using $0.18{\mu}m$ CMOS technology. The transmitter is mainly composed of switched LC VCO and digital pulse generator (DPG). Using RF switch and DPG, the uniform power and sidelobe rejection are achieved irrespective of the carrier frequency. The measured UWB carrier frequency range is 7 ~ 8 GHz and the pulse width is tunable from 1 to 2 ns. The measured energy efficiency per pulse is 2.1 % and the power consumption is 0.6 mW at 10 Mbps without the buffer amplifier. The chip core size is $0.72mm^2$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.233-236
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• 1997

An investigation has been made of the various plasma chemistry reactions that occur in the corona discharge of an electrostatic precipitator operating in a typical flue gas. As the results of investigation, sulphur dioxide is removed principally by reactions with OH radicals to produce sulphuric acid, while nitrogen oxides are removed principally by reduction via the N radical to molecular nitrogen. If electrostatic precipitator\ulcorner used for flue gases are operated with positive voltages instead of negative dc voltages, there are significant reductions in the emission of the undesirable gases SO$_2$, NO, and NO$_2$. Thus, in this paper we design the bidirectional pulse generator for removal of flue gas, where the pulse width is more than 50[nsec] and the maximum output voltage is more than 100[kVl.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• 한국통신학회:학술대회논문집
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• 한국통신학회 2006년도 하계종합학술발표회 논문 초록집
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• pp.704-704
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• 2006

• 전력전자학회:학술대회논문집
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• 전력전자학회 2007년도 추계학술대회 논문집
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• pp.43-46
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• 2007

In this paper, a novel new pulse power generator based on IGBT stacks is proposed for pulse power application. Proposed scheme consists of series connected 9 power stages to generate maximum 60kV output pulse and one series resonant power inverter to charge DC capacitor voltage. Each power stages are configured as 8 series connected power cells and each power cell generates up to 850VDC pulse. Finally pulse output voltage is applied using total 72 series connected IGBTs. The synchronization of gating signal is important for series operation of IGBTs. For gating signal synchronization, full bridge inverter and pulse transformer generates on-off signals of IGBT gating and specially designed gate power circuit was used. Proposed scheme has lots of advantages such as long lifecyle, compact size, flat topped pulse forming, small weight, protection for arc, high efficiency and flexibility to generate various kinds of pulse output.