• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2018.10a
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• pp.35-38
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• 2018

This paper describes a low-power MPPT interface for DC-type energy harvesting sources. The proposed circuit consists of an MPPT controller, a bias generator, and a voltage detector. The MPPT controller consists of an MPG (MPPT Pulse Generator) with a schmitt trigger, a logic gate operating according to energy type (light, heat), and a sample/hold circuit. The bias generator is designed by employing a beta multiplier structure, and the voltage detector is implemented using a bulk-driven comparator and a two-stage buffer. The proposed circuit is designed with $0.35{\mu}m$ CMOS process. The simulation results show that the designed circuit consumes less than 100nA of current at an input voltage of less than 3V and the maximum power efficiency is 99.7%. The chip area of the designed circuit is $1151{\mu}m{\times}940{\mu}m$.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.155.2-155.2
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• 2013

Strain-relaxed SiGe layer on Si substrate has numerous potential applications for electronic and opto- electronic devices. SiGe layer must have a high degree of strain relaxation and a low dislocation density. Conventionally, strain-relaxed SiGe on Si has been manufactured using compositionally graded buffers, in which very thick SiGe buffers of several micrometers are grown on a Si substrate with Ge composition increasing from the Si substrate to the surface. In this study, a new plasma process, i.e., the combination of PIII&D and HiPIMS, was adopted to implant Ge ions into Si wafer for direct formation of SiGe layer on Si substrate. Due to the high peak power density applied the Ge sputtering target during HiPIMS operation, a large fraction of sputtered Ge atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed Ge plasma, the ion implantation of Ge ions can be successfully accomplished. The PIII&D system for Ge ion implantation on Si (100) substrate was equipped with 3'-magnetron sputtering guns with Ge and Si target, which were operated with a HiPIMS pulsed-DC power supply. The sample stage with Si substrate was pulse-biased using a separate hard-tube pulser. During the implantation operation, HiPIMS pulse and substrate's negative bias pulse were synchronized at the same frequency of 50 Hz. The pulse voltage applied to the Ge sputtering target was -1200 V and the pulse width was 80 usec. While operating the Ge sputtering gun in HiPIMS mode, a pulse bias of -50 kV was applied to the Si substrate. The pulse width was 50 usec with a 30 usec delay time with respect to the HiPIMS pulse. Ge ion implantation process was performed for 30 min. to achieve approximately 20 % of Ge concentration in Si substrate. Right after Ge ion implantation, ~50 nm thick Si capping layer was deposited to prevent oxidation during subsequent RTA process at $1000^{\circ}C$ in N2 environment. The Ge-implanted Si samples were analyzed using Auger electron spectroscopy, High-resolution X-ray diffractometer, Raman spectroscopy, and Transmission electron microscopy to investigate the depth distribution, the degree of strain relaxation, and the crystalline structure, respectively. The analysis results showed that a strain-relaxed SiGe layer of ~100 nm thickness could be effectively formed on Si substrate by direct Ge ion implantation using the newly-developed PIII&D process for non-gaseous elements.

• Journal of the Korean Institute of Telematics and Electronics
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• v.9 no.3
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• pp.1-8
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• 1972

The characteristics of tunnel diode pair circuit biased within the negative resistance region has also the voltage-control type negative resistance region, and the voltage at the center point of negative resistance region is described as the square-wave relaxation oscillation. In this paper, the period T, positive duration T1, negative duration T2 of the pulse are obatined from the characteristic curve T, positive duration T1, negative duration T2 of the pulse are obtained from the characteristic curve and observed actually, considring the fact that the pulse width and the period of square-wave at the center point of the negative resistance region is able to be controlle dby the blas volgate. Mereover, the relationship between T, T1 or T2 and circuit parameters is searched for and the Circuit parameters that satisfy the conditions of T1-T2 being proportional to the variation of bias voltage with Teonstant are determined. Thereafter, the bias voltage and the signal voltage are inserted serially to the PWM circuit and the characteristics of that circuit is analyzed.

• Nuclear Engineering and Technology
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• v.51 no.3
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• pp.731-737
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• 2019

In this study, a new measurement method based on voltage transients in CdZnTe detectors response to low energy photon irradiations is applied to measure the electron mobility (${\mu}_e$) and electron mobility-lifetime product $({\mu}{\tau})_e$ in a CdZnTe detector. In the proposed method, the pulse rise times are derived from low energy photon response to 59.5 keV($^{241}Am$), 88 keV($^{109}Cd$) and 122 keV($^{57}Co$) ${\gamma}-rays$ for the irradiation of the cathode surface at each detector for different bias voltages. The electron $({\mu}{\tau})_e$ product was then determined by measuring the variation in the photopeak amplitude as a function of bias voltage at a given photon energy using a pulse-height analyzer. The $({\mu}{\tau})_e$ values were found to be $(9.6{\pm}1.4){\times}10^{-3}cm^2V^{-1}$ for $1000mm^3$, $(8.4{\pm}1.6){\times}10^{-3}cm^2V^{-1}$ for $1687.5mm^3$ and $(7.6{\pm}1.1){\times}10^{-3}cm^2V^{-1}$ for $2250mm^3$ CdZnTe detectors. Those results were then compared with the literature $({\mu}{\tau})_e$ values for CdZnTe detectors. The present results indicate that, the electron mobility ${\mu}_e$ and electron $({\mu}{\tau})_e$ values in CdZnTe detectors can be measured easily by applying voltage transients response to low energy photons, utilizing a fast signal acquisition and data reduction and evaluation.

• Journal of Surface Science and Engineering
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• v.34 no.5
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• pp.414-420
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• 2001

A 30-kV plasma immersion ion implantation setup (P $I^3$) has been equipped with a self-developed 6'-magnetron to perform hard coatings with enhanced adhesion by P $I^3$D(P $I^3$ assisted deposition) process. Using ICP source with immersed Ti antenna and reactive magnetron sputtering of Ti target in $N_2$/Ar ambient gas mixture, the TiN films were prepared on Si substrates at different pulse bias and ion-to-atom arrival ratio ( $J_{i}$ $J_{Me}$ ). Prior to TiN film formation the nitrogen implantation was performed followed by deposition of Ti buffer layer under A $r^{+}$ irradiation. Films grown at $J_{i}$ $J_{Me}$ =0.003 and $V_{pulse}$=-20kV showed columnar grain morphology and (200) preferred orientation while those prepared at $J_{i}$ $J_{Me}$ =0.08 and $V_{pulse}$=-5 kV had dense and eqiaxed structure with (111) and (220) main peaks. X-ray diffraction patterns revealed some amount of $Ti_{x}$ $N_{y}$ in the films. The maximum microhardness of $H_{v}$ =35 GN/ $M^2$ was at the pulse bias of -5 kV. The P $I^3$D technique was applied to enhance wear properties of commercial tools of HSS (SKH51) and WC-Co alloy (P30). The specimens were 25-kV PII nitrogen implanted to the dose 4.10$^{17}$ c $m^{-2}$ and then coated with 4-$\mu\textrm{m}$ TiN film on $Ti_{x}$ $N_{y}$ buffer layer. Wear resistance was compared by measuring weight loss under sliding test (6-mm $Al_2$ $O_3$ counter ball, 500-gf applied load). After 30000 cycles at 500 rpm the untreated P30 specimen lost 3.10$^{-4}$ g, and HSS specimens lost 9.10$^{-4}$ g after 40000 cycles while quite zero losses were demonstrated by TiN coated specimens.s.

• Journal of Acupuncture Research
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• v.19 no.2
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• pp.149-163
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• 2002

Objective : We have studied literatures of Renying Qi mouth comparison pulse diagnosis theory and distinguished the excess, deficiency and quick-temper of pulse as the measurement parameter of Renying Qi mouth pulse diagnosis. Methods : We have acquired pulse signals of Renying Qi mouth by using diagnostic equipment of Renying Qi mouth pulsation and estimated reappearance of pulse signals. Results : 1. The measurement parameter of Renying Qi mouth pulse diagnosis distinguishes the excess, deficiency and quick-temper of pulse through relative comparison of Renying Qi mouth. 2. When we acquired the pulse singals of Renying Qi mouth by using diagnostic equipment, the property, measuring area, bias pressure, contact or adhesion state of the sensor are considered. 3. As getting the pulse signal of Renying Qi mouth, the sensor of a sound detective mode is effective. 4. The diagnostic equipment of Renying Qi mouth pulse is assessed as being significant reappearance.

• International Journal of Aeronautical and Space Sciences
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• v.3 no.2
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• pp.13-23
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• 2002

In this paper, we present a sliding mode control strategy for the re-orientation maneuver of rigid spacecraft containing rotating wheels. The wheels are considered as internal devices, and external inputs are employed for generation of control commands. The formulation is developed for a general case while particular example is applied to pitch bias momentum spacecraft with a single momentum wheel. The resultant control commands are used to take the gyroscopic effects into account which are caused by the rotating wheels. The controller designed demonstrates that the nutational motion of the pitch bias momentum spacecraft is effectively controlled. It is also assumed that the external control torque device is of on-off nature, and pulse width modulation technique is applied to construct proper control torque history.

• Journal of Power Electronics
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• v.16 no.3
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• pp.960-969
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• 2016

High-power three-level voltage-source converters are widely utilized in high-performance AC drive systems. In several ultra-power instances, the harmonics on the grid side should be reduced through multiple rectifications. A combined harmonic elimination method that includes a dual primary-side series-connected winding transformer and selective harmonic elimination pulse-width modulation is proposed to eliminate low-order current harmonics on the primary and secondary sides of transformers. Through an analysis of the harmonic influence caused by dead time and DC magnetic bias, a synthetic compensation control strategy is presented to minimize the grid-side harmonics in the dual primary side series-connected winding transformer application. Both simulation and experimental results demonstrate that the proposed control strategy can significantly reduce the converter input current harmonics and eliminates the DC magnetic bias in the transformer.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1205-1208
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• 1995

The optically-gated p-i-n diode switches have been fabricated with gold-compensated silicon. The turn-on and turn-off delay times and the rise and fall times were measured as a function of optical power level, bias, and pulse width. The turn-on characteristics shows a strong dependence an optical pulse power and a delay time(${\delta}{\iota}$) between two pulses, but a weak dependence on the width of optical pulse. Actually there is no turn-off delay in gold-doped p-i-n switches and the fall time is negligible.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2001.05a
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• pp.479-482
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• 2001

We have measured terahertz electromagnetic pulses when DC voltage from V up to 90V is applied to the transmitter chip excited by femto-second laser pulse. The femto-second excitation laser pulse was injected to transmitter chip. Finally, we are observed the amplitude of electromagnetic pulse and variation of spectrum. Consequently, the amplitude of spectrum was increased to high frequency according to increase of voltage. At that time, the signal-to-noise rate(SNR) is increased from 250:1 to 10, 000:1.