• Title/Summary/Keyword: Pt thin-film

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Influence of Substrate Temperature of SCT Thin Film by RF Sputtering Method (RF 스퍼터링법에 의한 SCT 박막의 기판온도 영향)

  • Kim Jin-Sa;Oh Yong-Cheol;Cho Choon-Nam;Lee Dong-Gyu;Shin Cheol-Gi;Kim Chung-Hyeok
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.10
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    • pp.505-509
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    • 2004
  • The (Sr/sub 0.9/Ca/sub 0.1/)TiO₃(SCT) thin films are deposited on Pt-coated electrode(Pt/TiN/SiO₂/Si) using RF sputtering method at various substrate temperature. The optimum conditions of RF power and Ar/O₂ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin film was about 18.75[Å/min]. The crystallinity of SCT thin films were increased with increase of substrate temperature in the temperature range of 100~500[℃]. The dielectric constant of SCT thin films were increased with the increase of substrate temperature, and changed almost linearly in temperature ranges of -80~+90[℃]. The current-voltage characteristics of SCT thin films showed the increasing leakage current as the substrate temperature increases.

Structural Properties of SCT Thin Film with Deposition and Annealing Temperature (증착 및 열처리온도에 따른 SCT 박막의 구조적인 특성)

  • Kim, Jin-Sa
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.41-45
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    • 2007
  • The (SrCa)$TiO_3$(SCT) thin films were deposited on Pt-coated electrode(Pt/TiN/$SiO_2$/Si) using RF sputtering method according to the deposition condition. The crystallinity of SCT thin films were increased with increase of deposition temperature in the temperature range of $100{\sim}500[^{\circ}C]$. The optimum conditions of RF power and Ar/$O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about $18.75[{\AA}/min]$ at the optimum condition. The composition of SCT thin films deposited on Si substrate is close to stoichiometry (1.081 in A/B ratio). The maximum dielectric constant of SCT thin film was obtained by annealing at $600[^{\circ}C]$.

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Microstructure and Structural Properties of SCT Thin Film (SCT 박막의 미세구조 및 구조적인 특성)

  • Kim, Jin-Sa;Oh, Yong-Cheol
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.12
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    • pp.576-580
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    • 2006
  • The $(Sr_{0.85}Ca_{0.15})TiO_3(SCT)$ thin films were deposited on Pt-coated electrode $(Pt/TiN/SiO_2/Si)$ using RF sputtering method according to the deposition condition. The crystallinity of SCT thin films were increased with increase of deposition temperature in the temperature range of $100{\sim}500[^{\circ}C]$. The optimum conditions of RF power and $Ar/O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about $18.75[{\AA}/min]$ at the optimum condition. The composition of SCT thin films deposited on Si substrate is close to stoichiometry (1.102 in A/B ratio). The maximum dielectric constant of SCT thin film as obtained by annealing at $600^{\circ}C$.

Fabrication and Post-Annealing Effects of Ferroelectric $Sr_xBi_yTa_2O_{9+\alpha}$(SBT) Thin Films by MOD Process (MOD법에 의한 강유전성 $Sr_xBi_yTa_2O_{9+\alpha}$(SBT) 박막의 제조 및 후열처리 효과에 관한 연구)

  • 정병직;신동석;윤희성;김병호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.3
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    • pp.229-236
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    • 1998
  • Ferroelectric $Sr_xBi_yTa_2O_{9+\alpha}$/(0.7$\leqSr\leq1.0,\; 2.0\leqBi\leq2.6)$ solutions were prepared by MOD (Metalorganic Deposition) process. These solutions were made into thin films with thickness ranging from 1500~2000${\AA}$ by spin coating. The phase transformation of the SBT thin films by variation of annealing temperature and annealing time were observed using high temperature XRD and SEM. The crystallization and grain growth of SBT thin film were accomplished at $800^{\circ}C$ for 30 minutes after deposition of Pt top electrode by sputtering to prevent electrical breakdown. Ferroelectric properties of the SBT thin films were measured in the range of $\pm$3V\; and\; \pm5V$. The specimen with composition ratio of Sr/Bi/Ta (0.8/2.4/2.0) has the excellent ferroelectric properties ; $2P_r = 10.5,\; 13.2\muC/cm^2 \;at\; \pm3V\; and\; \pm5V$ respectively. Observing the post annealed Pt/SBT/Pt interface by SEM, it was found that Pt electrode sputtered on to the SBT thin film penetrated into the hollow on the SBT thin film, thus decreasing the effective insulation thickness. The effective insulation thickness recovered by post annealing, and this was confirmed by leakage current density measurement.

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Ferroelectric Thin Film as a substitute for Non-volatile Memory (비휘발성 메모리용 대체 강유전체 박막)

  • 김창영;장승우;우동찬;남효덕;이희영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.509-512
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    • 1999
  • Ferroelectric Sr$_2$(Nb, Ta)$_2$O$_{7}$(SNTO), La$_2$Ti$_2$O$_{7}$(LTO) thin films were prepared by sol-gel processes. SNTO, LTO thin films were spin-coated on Pt/TiO$_2$/SiO$_2$/Si(100). Pt/Ti/SiO$_2$/Si(100). PT/ZrO$_2$/SiO$_2$/Si(100) substrates. After multiple coating, dried thin films were heat-treated for decomposition of residual organics and crystallization. Dielectric and other relevant electrical properties were measured and the results showed a little possibility in ferroelectric gate random access memory devices.ces.

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The electrical properties of SBT thin films according to various post-annealing of Pt bottom electrode (Pt 하부전극 후열처리 온도에 따른 SBT 박막의 전기적 특성평가)

  • Cha, Won-Hyo;Yoon, Ji-Eon;Lee, Chul-Su;Hwang, Dong-Hyun;Son, Young-Gook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.202-203
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    • 2007
  • Ferroelectric SBT($SrBi_2Ta_2O_9$) thin films were deposited on Pt/Ti/$SiO_2$/Si substrate using R.F. magnetron sputtering method. The ferroelectric and electric characteristics were investigated with various post-annealing of Pt at $200{\sim}600^{\circ}C$. Compared with SBT thin film which had not post-annealed, the electrical properties and crystallizations of the SBT thin films were relatively improved by the post-annealing of Pt bottom electrode. The crystallization were characterized by X-ray diffraction (XRD). The electrical properties characteristics were observed by HP 4192A and precision LC.

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ZnO thin film Gas sensors for detection of TMA gas with Pt/Ti thin film heater (Pt/Ti 발열체가 내장된 TMA 가스 측정용 ZnO 박막 가스 센서)

  • 류지열;박성현;최혁환;권태하
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.6
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    • pp.127-135
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    • 1996
  • To increase the sensitivity and the selectivity of the sensors to TMA gas, the composition ratio and the growth conditions of the ZnO films are studied. Annealing of the ZnO films in the various time ranges and temperatures in the oxygen is carried out to enhance the stbility of the electrical resistance. Pt/Ti heater deposited on backside of the substrates in used to control the operating temperature of th esensor. The ZnO thin film sensors doped to 4.0 wt% $Al_{2}$O$_{3}$ 1.0wt.% TiO$_{2}$ and 0.2wt.% V$_{2}$O$_{5}$ exhibited a high sensitivity and an excellent selectivity for TMA gas. The sensors made with the thin films annealed at 700$^{\circ}$C for 60 minutes in the oxygen atmosphere had a good stability and linearity. The heater deposited in the ratio of 1 to 1 (Pt:Ti) had a good heating properties. The sensors fabricated using above conditions showed a good response to the actual gases of a mackerel at a step of deterioration after death.

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