• Title/Summary/Keyword: Pt/$TiO_2$

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Fabrication and Experiment of Piezoelectric Micro Cantilever Applicable to Thrombolysis (혈전분해 응용을 위한 압전형 마이크로 외팔보의 제작 및 실험)

  • Baek, Kun-Hoon;Seo, Young-Tai;Bang, Yong-Seung;Kim, Jong-Man;Kim, Sung-Hyun;Kim, Yong-Kweon
    • Proceedings of the KIEE Conference
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    • 2007.11a
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    • pp.152-153
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    • 2007
  • This paper describes a resonant driving piezoelectric micro cantilever practicable to ultrasound thrombolysis device for the treatment of ischemic stroke. The proposed piezoelectric cantilever was designed to be a unimorph structure of Si/$SiO_2$/Ti/Pt/PZT/Pt, and fabricated by top-down sequence etching process. The red blood cell (RBC) lysis experiment was carried out to confirm the usability of the proposed cantilever. Total 87.76 % of RBCs were ruptured using the ultrasound generated by up-down actuations of the fabricated cantilever with AC voltage having the frequency of 19.36 Hz and the magnitude of $30V_{p-p}$.

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Effects of Two-Step Annealing Process on the Pulsed Laser Ablated Lead Zirconate Titanate Thin Films

  • Rhie, Dong-Hee
    • KIEE International Transactions on Electrophysics and Applications
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    • v.3C no.2
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    • pp.43-47
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    • 2003
  • Lead zirconate titanate (PZT) thin films were fabricated by the pulsed laser ablation deposition (PLAD) method onto Pt/Ti/SiO$_2$/Si substrates. Crystalline phases as well as preferred orientations in PZT films were investigated by X-ray diffraction analysis (XRD). The well-crystallized perovskite phase and the (101) preferred orientation were obtained by two-step annealing at the conditions of $650^{\circ}C$, 1 hour. It was found that the temperature for the pulsed laser ablated PZT films annealed via a two-step annealing process can be reduced 20$0^{\circ}C$ compared to that of the conventional three-step annealing temperature profile for enhancing the transformation of the perovskite phase. The remanent polarization and the coercive field of this film were about 20 $\mu$C/$\textrm{cm}^2$ and 46 kV/cm, while the dielectric constant and loss values measured at 1 KHz were approximately 860 and 0.04, respectively. The interesting phenomena of this film, such as vertical shift in hysteresis curve, are also discussed.

Studies on the Time Dependent Electrical Conductivity of Rutile Single Crystal (Rutile 단결정의 전기전도도 시간의존성 연구)

  • 김병국;박순자
    • Journal of the Korean Ceramic Society
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    • v.26 no.1
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    • pp.1-6
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    • 1989
  • The phenomena that the electrical conductivity of rutile single crystal changes with time were investigated along the a and c crystallographic axes, at 85$0^{\circ}C$ and Po2 in the range of 1~10-18.5atm. The D.C. conductivity decreased with and saturated some value after ca. 100 hours. But the A.C. conductivity showed no time dependence in the whole Po2 range. These experimental results suggest that the time dependence of D.C. conductivity of rutile single crystal is due to space charge polarization effect; the electrode was Pt which is complete electronic conductor, while the sample was TiO2 which is mixed conductor.

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Methods to Improve Light Harvesting Efficiency in Dye-Sensitized Solar Cells

  • Park, Nam-Gyu
    • Journal of Electrochemical Science and Technology
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    • v.1 no.2
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    • pp.69-74
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    • 2010
  • Methodologies to improve photovoltaic performance of dye-sensitized solar cell (DSSC) are reviewed. DSSC is usually composed of a dye-adsorbed $TiO_2$ photoanode, a tri-iodide/iodide redox electrolyte and a Pt counter electrode. Among the photovoltaic parameters of short-circuit photocurrent density, open-circuit voltage and fill factor, short-circuit photocurrent density is the collective measure of light harvesting, charge separation and charge collection efficiencies. Internal quantum efficiency is known to reach almost 100%, which indicates that charge separation occurs without loss by recombination. Thus, light harvesting efficiency plays an important role in improvement of photocurrent. In this paper, technologies to improve light harvesting efficiency, including surface area improvement by nano-dispersion, size-dependent light scattering efficiency, bi-functional nano material, panchromatic absorption by selective positioning of three different dyes and transparent conductive oxide (TCO)-less DSSC, are introduced.

Ferroelectirc Properties of Sm-doped PZT Thin films (Sm이 첨가된 PZT 박막의 강유전 특성)

  • 손영훈;김경태;김창일;이병기;장의구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.2
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    • pp.178-183
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    • 2004
  • PBT thin film was known to be a representative for the FeRAM devices because of its good ferroelectric proporties and the ease in fabricating the thin film. However, there have been several problems such as polarization fatigue and leakage current in memory devices with a PZT thin film. In this study, Sm-dolled PZT thin films were fabricated by the so1-gel method, and their ferroelectric and dielectric proportrics were compared as a function of Sm content. We investigated the effect of the Sm dopant on structural and electrical properties of PZT film. Sm-doped PZT thin films on the Pt/Ti/SiO$_2$/Si substrates have been prepared by a sol-gel method. The remanent polarization and coercive field decreased with increasing the concentration of Sm. The dielectric constant and dielectric loss decreased with Increasing Sm content. Sm-doped PZT thin films showed improved fatigue characteristics compared to the undoped PZT thin film.

The Fabrication of Ferroelectric PZT thin films by Sol-Gel Processing (졸-겔법에 의한 강유전성 PZT 박막의 제작)

  • Lee, B.S.;Chung, M.Y.;You, D.H.;Kim, Y.U.;Lee, S.H.;Lee, N.H.;Ji, S.H.;Park, S.H.;Lee, D.C.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.93-96
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    • 2002
  • In this study, PZT thin films were fabricated using sol-gel processing onto Si/$SiO_2$/Ti/Pt substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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A study on the Improvement of Ferroeletric Characteristics of PZT thin film for FRAM Device (FRAM 소자용 PZT박막의 강유전특성에 관한 연구)

  • Lee, B.S;Chung, M.Y.;Shin, P.K.;Lee, D.C.;Lee, S.H.;Kim, J.S.
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.1881-1883
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    • 2005
  • In this study, PZT thin films were fabricated using sol-gel Processing onto $Si/SiO_2/Ti/Pt$ substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}\;A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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A study on the PZT thin films for Non-volatile Memory (비휘발성 메모리용 강유전체 박막에 관한 연구)

  • Lee, B.S.;Park, J.K.;Kim, Y.W.;Park, K.S.;Kim, S.H.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1562-1564
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    • 2003
  • In this study, PZT thin films were fabricated using sol-gel processing onto Si/$SiO_2$/Ti/Pt substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C,\;650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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Ferroelectric Properties $\textrm{SrBi}_{2}\textrm{Ta}_{2}\textrm{O}_{9}$ Thin Films Deposited by RF Magnetron Sputtering Technique (RF magnetron sputtering법에 의해 제조된 $\textrm{SrBi}_{2}\textrm{Ta}_{2}\textrm{O}_{9}$박막의 강유전 특성에 관한 연구)

  • Park, Sang-Sik;Yang, Cheol-Hun;Yun, Sun-Gil
    • Korean Journal of Materials Research
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    • v.7 no.6
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    • pp.505-509
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    • 1997
  • FRAM(Ferroelectric Random Access memory)에의 응용을 위해 rf magnetron sputtering법을 이용하여 SrB $i_{2}$T $a_{2}$ $O_{9}$(SBT)박막을 증착하였다. 사용된 기판은 Pt/Ti/Si $o_{2}$Si이었으며 50$0^{\circ}C$에서 증착한 후 80$0^{\circ}C$의 산소 분위기 하에서 1시간 동안 열처리하였다. 증착시 증착 압력을 변화시켜 가면서 이에 따른 특성의 변화를 고찰하였다. 박막내의 Bi와 Sr의 부족을 보상하기 위해 20mole%의 Bi $O_{2}$와 30mole%의 SrC $O_{3}$를 과잉으로 넣어 타겟을 제조후 사용하였고 박막들의 두께는 300nm의 두께를 가지며 증착압력에 따라 다른 미세 구조르 보였다. 10mtorr에서 증착한 박막의 조성은 S $r_{0.6}$B $i_{3.8}$Ta/ sub 2.0/ $O_{9.0}$이었다. 이 SBT 박막의 잔류 분극(2 $P_{r}$)과 보전계(2 $E_{c}$)값은 각각 인가 전압 5V에서 18.5 $\mu%C/$\textrm{cm}^2$과 150kV/cm이었고, signal/noise비는 3V에서 4.6을 나타내었다. 5V의 bipolar pulse하에서 $10^{10}$cycle까지 피로 현상이 나타나지 않았으며, 누설 전류 밀도는 133kV/cm에서 약 1x$10^{-7A}$$\textrm{cm}^2$의 값을 보였다.을 보였다.

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RF 스퍼터링법을 이용한 리튬이차전지용 Li[Li0.2Mn0.54Co0.13Ni0.13]O2 양극박막의 제조 및 전기적 특성

  • Im, Hae-Na;Gong, U-Yeon;Yun, Seok-Jin;Choe, Ji-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.413-413
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    • 2011
  • 최근 전기, 전자, 반도체 산업의 발전으로 전 고상 박막리튬전지는 초소형, 초경량의 마이크로 소자의 구현을 위한 고밀도 에너지원으로 각광받고 있다. 현재 양극박막은 대부분LCO(LiCoO2)계열이 이용되고 있으나, 코발트는 높은 가격과 인체 유해성 뿐만 아니라 상대적으로 낮은 용량(~140 mAh/g)등의 단점을 갖고 있어 향후 보다 고용량의 양극박막이 요구된다. 3원계 양극활물질 LiMO2(M=Co,Ni,Mn,etc.)은 우수한 충방전 효율 과 열적 안정성 뿐 아니라 277mAh/g의 높은 이론용량을 갖고 있어 고용량 양극박막으로의 적용시 고용량 박막이차전지 제작이 가능하다. 본 연구에서는 전 고상 박막 전지의 구현을 위하여 RF 스퍼터링법을 사용하여 Li[Li0.2Mn0.54Co0.13Ni0.13]O2 박막을 증착하였다. Li/MnCoNi의 몰 비율을 변화시켜 높은 전기화학적 특성을 갖는 분말을 합성하여 제조한 타겟으로 Pt/TiO2/SiO2/Si 기판위에 RF 스퍼터법을 이용하여 박막을 성장시켰다. 박막 증착 시 가스의 비율은 Ar:O2=3:1로 하고 증착 압력의 조절(0.005~0.02 torr)을 통하여 박막의 두께와 표면 특성을 조절하며 성장시켰다. 또한 박막을 다양한 온도에서($400{\sim}550^{\circ}C$) 열처리하여 결정화도와 전기화학적 특성을 측정하였다. 증착 된 박막의 구조적 특성은 X-ray diffraction(XRD) 과 scanning electron microscopy(SEM)로 관찰되었다. 박막의 전기화학적 특성 평가를 위하여 Cyclic voltammatry를 측정하여 가역성의 정도를 확인하고 WBC3000 battery cycler를 이용한 half-cell 테스트를 통하여 박막의 용량을 평가하였다.

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