• Proceedings of the Korean Vacuum Society Conference
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• 1997.07a
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• pp.146-147
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• 1997

• Journal of the Semiconductor & Display Technology
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• v.3 no.1
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• pp.27-30
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• 2004

In this work, the variation of the sidewall profile of a thick photoresist on the wavelength and proximity gap was investigated. PMER P-LA900PM, DNQ (DiazoNaphthoQuinone) novolac type photoresist, is used for experiments. The calculated results agreed well with the experimental results.

• Korean Journal of Optics and Photonics
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• v.13 no.2
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• pp.117-122
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• 2002

Some 10$\times$10 micro-lens arrays of a period of 300 ${\mu}{\textrm}{m}$, a thickness of 17 ${\mu}{\textrm}{m}$, and a focal length of 2.2 mm are fabricated by exposing a thick layer of photoresist through a grayscale mask via UV proximity printing. The grayscale mask is fabricated in a holographic film by reducing (6.6X) a high-resolution black-and-white film where a grayscale patters of a micro-lens array designed by a computer has been written using a film recorder. The proposed method has the advantage of a low fabrication cost, a fill-factor of almost 100% and the ease of realizing an aspheric lens.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.15.1-15.1
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• 2009

Nano transfer printing and micro contact printing is well known printing method based on soft lithography which uses conformal soft elastomer with designed surface relief structures. Here I introduce another class of novel 3D nanofabrication technique by using the same elastomer but in a different manner. The approach, which we refer to as proximity field nanopatterning, uses the surface-reliefed elastomers as phase masks to pattern thick layers of transparent, photosensitive materials. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.

• 제어로봇시스템학회:학술대회논문집
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• 1991.10b
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• pp.1961-1965
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• 1991

This paper deals with an automatic and precision alignment technique for proximity printing in x-ray lithography, using two pairs of moire gratings, with moire signals from each pair being 180.deg. out of phase with each other. We constructed an automatic and precision alignment experimental system which could measure both transmitted moire signals and reflected moire signals at the same time. The automatic alignment was achieved using transmitted moire signals and also reflected moire signals as a control signal for a stage driver. The alignment position of the system was monitored not only by a control signal but also by a non-control signal. The effect of transmitted and reflected moire signals upon alignment accuracy was discussed. We concluded that the technique using diffracted moire signals is a viable automatic and precision alignment technique.

• Journal of the Semiconductor & Display Technology
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• v.15 no.3
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• pp.1-5
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• 2016

In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.

• Fashion & Textile Research Journal
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• v.22 no.6
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• pp.834-843
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• 2020

This study develops 1/2 dress forms for draping. This study investigated the production status of domestic and foreign products in order to model their shape using CLO 3D. In addition, it developed torso-type and torso-crotch-type products that allowed for draping using a 3D printer. This study analyzed shape and size compared to developed ones after referring to the Size Korea 7th Survey data as well as seven domestic and foreign company websites. The results are follows. First, an investigation of the production status of the products for the size of most of the domestic ones (except K-4) indicated that the waist circumference was slimmer than Size Korea. Bust, waist, and hip circumferences ranged from 42.0 cm, 32.0 cm, and 45.0 cm - 49.0 cm, respectively, in Chinese products; 42.0 cm - 43.0 cm, 30.5 cm - 31.5 cm, and 46.0 cm - 46.5 cm in Japanese products; 43.0 cm, 35.0cm, and 46.5 cm in American products (Japanese body shape applied). Second, an avatar was produced on a 3D software with the average size of 20-24year-old women, and its file modified as a dress form for 3D printing with PLA filament to produce dress forms for draping, workable with pins, using quilting cotton and cotton cloth. Third, the comparisons of the form and flattening between the developed dress forms and the selling ones indicated that flattening was bigger in the waist part of the former than the latter. The waist is produced too slim in the existing dress forms; therefore, it is necessary to correct the waist circumference. Unlike existing dress forms, the developed ones were produced in proximity to the average size of 20-24 year-old women in the Size Korea 7th Survey.

• Korean Journal of Optics and Photonics
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• v.12 no.3
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• pp.190-199
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• 2001

In this paper, we have researched the depth of focus (DOF) and cutoff intensity of the $0.1{\mu}m$rule dense line'||'&'||'space pattern according to the various off-axis illumination (OAl) conditions in the optical system of 0.65 NA using ArF excimer laser (193 nm). We have also studied the variation of the DOF and cutoff intensity according to the sub-resolution pattern (hammer head type) size for optical proximity correction (OPC) applied to the capacitor pattern and the various OAl conditions in the same optical system. As a result, it is revealed that the cross type quadrupole or annular illumination is preferred to the conventional X type quadrupole for printing the $0.1{\mu}m$ rule dense pattern. Also, we can investigate the optimal illumination condition and the size of ope sub-resolution pattern to keep a consistent DGF and cutoff intensity trends.