• Journal of the Korean institute of surface engineering
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• v.47 no.6
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• pp.362-367
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• 2014

We report the design, fabrication of a $Si_3N_4$ probe and calculation of its mechanical properties for DPN(dip pen nanolithography), which consists of dual tips. Concept of dual tip probe is to employ individual tips on probe as either an AFM tip for imaging or a writing tip for nano patterning. For this, the dual tip probe is fabricated using low residual stress $Si_3N_4$ material with LPCVD deposition and MEMS fabrication process. On the basis of FEM analysis we show that the functionality of dual tip probe for imaging is dependent on the dimensions of dual tip probe, and high ratio of widths of beam areas is preferred to minimize curvature variation on probe.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.552-555
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• 2004

The reliability issue of the probe tip/recording media interface is one of the most crucial concerns in the Atomic Force Microscope (AFM)-based recording technology. In this work, the tribological characteristics of the probe/media interface were investigated by performing wear tests using an AFM. The ranges of applied normal load and sliding velocity for the wear test were 10 to 50nN and 2 to 20$\mu$m/s respectively. The damage of the probe tip was quantitatively as well as qualitatively characterized by Field Emission Scanning Probe Microscope (FESEM) analysis and calculated based on Archard s wear equation. It was shown that the wear coefficient of the probe tip was in the order of 10$^{-4}$ ~ 10$^{-3}$ , and significant contamination at the end of the probe tip was observed. Thus in order to implement the AFM-based recording technology, tribological optimization of the probe/media interface must be achieved.

• KIEE International Transactions on Electrophysics and Applications
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• v.4C no.4
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• pp.149-154
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• 2004

This paper presents a silicon probe tip for vertical probe card application. The silicon probe tip was fabricated using MEMS technology such as porous silicon micromachining and deep- RIE (reactive ion etching). The thickness of the silicon epitaxial layers was 5 ${\mu}{\textrm}{m}$ and 7 ${\mu}{\textrm}{m}$, respectively. The width and length were 40 ${\mu}{\textrm}{m}$ and 600 ${\mu}{\textrm}{m}$, respectively. The probe structure was a multilayered structure and was composed of Au/Ni-Cr/Si$_3$N$_4$/n-epi layers. The height of the curled probe tip was measured as a function of the annealing temperature and time. Resistance characteristics of the probe tip were measured using a touchdown test.

• Journal of the Korean institute of surface engineering
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• v.45 no.2
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• pp.81-88
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• 2012

Probe tip, which should have not only superior electrical characteristics but also good abrasion resistance for numerous contacts with semiconductor pads to confirm their availability, is essential for MEMS probe card. To obtain good durability of probe tip, it needs thick and crack-free rhodium layer on the tip. However, when the rhodium thickness deposited by electroplating increased, unwanted cracks by high internal stress led to serious problem of MEMS probe tip. This article reported the method of thick Rh deposition with Au buffer layer on the probe tip to overcome the problem of high internal stress and studied mechanical and electrical properties of that. MEMS probe tip with double-Rh layer had good contact resistance and durability during long term touch downs.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.1718-1723
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• 2007

The Probe Card is a test component which is to classify the good semiconductor chips before the packaging. The yield of semiconductor product can be better from analysis of probe test information. Recently the technology of the probe card needs narrow width and large amount of probe tip. In this research, the probe tip based on the MEMS(micro electro mechanical system) technology was designed and fabricated to improve the reliability of the test and to meet 2-dimensional Array of tip. The mechanical and electrical properties of proposed tip were evaluated and it has over 100,000 of repetition times in the condition of 5gf, $20{\mu}m$ Over Drive.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.6 s.183
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• pp.166-173
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• 2006

In this study, a probe array has been developed for use in a data storage device that is based on scanning probe microscope (SPM) and MEMS technology. When recording data bits by poling the PZT thin layer and reading them by sensing its piezoresponse, commercial probes of which the tip heights are typically shorter than $3{\mu}m$ raise a problem due to the electrostatic forces occurring between the probe body and the bottom electrode of a medium. In order to reduce this undesirable effect, a poly-silicon probe with a high aspect-ratio tip was fabricated using a molding technique. Poly-silicon probes fabricated by the molding technique have several features. The tip can be protected during the subsequent fabrication processes and have a high aspect ratio. The tip radius can be as small as 15 nm because sharpening oxidation process is allowed. To drive the probe, electrostatic actuation mechanism was employed since the fabrication process and driving/sensing circuit is very simple. The natural frequency and DC sensitivity of a fabricated probe were measured to be 18.75 kHz and 16.7 nm/V, respectively. The step response characteristic was investigated as well. Overshoot behavior in the probe movement was hardly observed because of large squeeze film air damping forces. Therefore, the probe fabricated in this study is considered to be very useful in probe-based data storages since it can stably approach toward the medium and be more robust against external shock.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.4
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• pp.1210-1215
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• 2010

The probe card are test modules which are to classify the good semiconductor chips and thin film before the packaging process. In the rapid growth a technology of semiconductor, the number of pads per unit area is increasing and pad arrays are becoming irregular. Therefore, the technology of probe card needs narrow width and lots of probe tip. In this paper, the probe tip based on the MEMS(Micro Electro Mechanical System)technology was developed a new MEMS probe tip for vertical probe card applications. For the structural designs of probe tip were performed to mechanical characteristics and structural analysis using FEM(Finite Element Method). Also, the contact force of MEMS probe tip compared with FEM results and experimental results. Finally, the MEMS probe card was developed a fine pitch smaller than $50{\mu}m$.

• Proceedings of the KIEE Conference
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• 1995.11a
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• pp.555-557
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• 1995

In near field optics, optical fiber probe is smaller than the wavelength of light. This small probe makes it possible to overcome the diffraction limit due to wave property of light. In conventional optical systems, the image resolution is governed by wavelength. But in NSOM, it is determined by probe tip size and probe shape. Therefore probe tip size and shape are very important points in near field optics. In this paper, we will suggest the new fabrication methods of optical fiber probe and show that the probe tip size is sub-micrometer using SEM.

• KSBB Journal
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• v.21 no.5
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• pp.341-346
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• 2006

This study was carried out to establish the optimum condition for cell disruption with a sonificator in the detection of the gram negative bacteria, E. coli for the purpose of developing automatic fluorometer. The efficiency of sonification on the E. coli disruption was greatly dependent on the diameter of sonificator probe tip. The larger sonificator probe diameter showed greater disruption effect. Sonificator probe of 13 mm diameter was the most efficient one for E. coli when sonificated for 20 seconds. The efficiency of the E. coli disruption differed greatly according to the depth of sonificator probe tip sank in the sample solution. The shorter the distance between probe tip end and the bottom of the container, the higher the disruption efficiency. The detection limit of E. coli was $5{\times}10^5CFU/m{\ell}$ when sample was sonificated for 20 seconds with a sonificator probe of 13 mm diameter.

• Proceedings of the KSME Conference
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• 2003.11a
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• pp.845-850
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• 2003

Unsteady nature of a tip leakage vortex in an axial flow fan operating at a design and off-design operating conditions has been investigated by measuring the velocity fluctuation in a blade passage with a rotating hotwire probe sensor. Two hot-wire probe sensors rotating with the fan rotor were also introduced to obtain the cross-correlation coefficient between the two sensors located in the vortical flow as well as the fluctuating velocity. The results show that the vortical flow structure near the rotor tip can be clearly observed at the quasi-orthogonal planes to a tip leakage vortex. The leakage vortex is enlarged as the flow rate is decreased, thus resulting in the high blockage to main flow. The spectral peaks due to the fluctuating velocity near the rotor tip are mainly observed in the reverse flow region at higher flow rates than the peak pressure operating condition. However, no peak frequency presents near the rotor tip for near stall condition.