• Transactions of the Korean Society of Mechanical Engineers B
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• v.36 no.10
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• pp.971-977
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• 2012

It is well known that the performance of a diesel injector is directly related to the power, emission, and fuel consumption of the diesel combustion engine. In this study, the injection response characteristics of CRDi injectors driven by a solenoid coil and a piezoceramic were investigated by using the AMESim simulation code. Some analytical parameters such as the fuel pressure and hole diameter were considered. From this study, it was shown that the piezo-driven injector had a faster response and had better control capability than the solenoid-driven injector. In addition, it was found that the piezo-driven injector can be utilized more effectively in a multiple injection scheme than a solenoid-driven injector.

• Journal of Energy Engineering
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• v.11 no.2
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• pp.90-98
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• 2002

The effects of swirl and combustion parameters on the performance and emission in a turbo-charged D.I. diesel engine of the displacement 9.4L were studied experimentally in this paper. Generally the swirl in the combustion process of diesel engine promotes mixing of the injection fuel and the intake air. It is a major factor to improve the engine performance because the fuel consumption and NO$_{x}$ is trade-off according to the high temperature and high pressure of combustion gas in a turbocharged D.I. diesel engine, it's necessary to thinking over the intake and exhaust system, the design of combustion bowl and so on. In order to choose a turbocharger of appropriate capacity. As a result of steady flow test, when the swirl ratio is increased, the mean flow coefficient is decreased, whereas the gulf factor is increased. Also, through engine test its can be expected to meet performance and emissions by optimizing the main parameter's; the swirl ratio is 2.43, injection timing is BTDC 13$^{\circ}$ CA, compression ratio is 16, combustion bowl is re-entrant 5$^{\circ}$, nozzle hole diameter is $\Phi$0.28*6, turbocharger is GT40 model which are compressor A/R 0.58 and turbine A/R 1.19.

• Journal of Korean Society of Environmental Engineers
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• v.22 no.11
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• pp.2067-2076
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• 2000

The experiments have been made to develop manganese-based sorbent(MT, MFT) for the removal of hydrogen sulfide from simulated hot coal gases. Manganese-based sorbents were tested in an ambient-pressure fixed-bed reactor to calculate H2S removal efficiency. and a three hole jet attrition tester to characterize the sorbent physical properties. According to the experimental results of attrition test. the attrition resistance of 5% bentonite containing sorbent was higher than that of 2% bentonite. The attrition resistances of both sorbents increased with induration temperature. Effects of sulfidation temperature. space velocity. and $H_2S$ concentrations on the $H_2S$ removal efficiency were investigated. Experimental results showed that $H_2S$ could be removed from 5,100ppmv to 20ppmv at $450^{\circ}C$, and to 30~65ppmv at $550{\sim}650^{\circ}C$ for both MT/MFT sorbents. As for the change of space velocity, the breakthrough time was decreased with space velocity.

• Journal of the Korean Society of Fisheries and Ocean Technology
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• v.32 no.4
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• pp.381-385
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• 1996

This paper described to experiment and analyze for the characteristic of underwater airbubble curtain which was generated by the air - bubble curtain generating unit consisted with air compressor (290l/min x 1.5Kw) and air tank(10kgf/$cm^2$) in order to provide foundation source for guiding fish schools. To layout the air - bubble curtain was made vinyl hoses( $cm^2$ emitting air - pressure, the wider hole interval of hose drilled the higher air - bubble curtain could be formed, and then the horizontal length of air - bubble curtain could be prolonged 45% according to be inclined vertical angle of air - bubble generating hose.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2011.11a
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• pp.540-543
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• 2011

This work is devoted to an experimental investigation on conceptual design of dual consecutive stage micro plasma thruster (${\mu}PT$). Optimization study on the thruster configuration has been performed for various electrode gap distances from 1 mm to 2 mm and the hole diameter from 0.3 mm to 2 mm depending on desired operating conditions and corresponding nozzle design requirement. The operation of ${\mu}PT$ at low pressure from $10^{-1}$ Torr to $10^{-4}$ Torr and at various argon flow rates ranging from 5 sccm to 300 sccm has been studied to understand the physic of plasma and the gas dynamics in details. The specific impulse can reach up to 3000-4000 seconds at low power consumptions from 1 to 5 W. Image of exhaust plume from ${\mu}PT$ will be provided and electrical characteristics is also mentioned in this paper.

• Electrical & Electronic Materials
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• v.9 no.8
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• pp.789-798
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• 1996

The double nitride layer Metal Nitride Oxide Semiconductor(MNOS) structures were fabricated by variating both gas ratio and nitride thickness, and by duplicating nitride deposited and one nitride layer MNOS structure to improve nonvolatile memory characteristics of MNOS structures by Low Pressure Chemical Vapor Deposition(LPCVD) method. The nonvolatile memory characteristics of write-in, erase, memory retention and degradation of Bias Temperature Stress(BTS) were investigated by the homemade automatic .DELTA. $V_{FB}$ measuring system. In the trap density double nitride layer structures were higher by 0.85*10$^{16}$ $m^{-2}$ than one nitride layer structure, and the AVFB with oxide field was linearly increased. However, one nitride layer structure was linearly increased and saturated above 9.07*10$^{8}$ V/m in oxide field. In the erase behavior, the hole injection from silicon instead of the trapped electron emission was observed, and also it was highly dependent upon the pulse amplitude and the pulse width. In the memory retentivity, double nitrite layer structures were superior to one nitride layer structure, and the decay rate of the trapped electron with increasing temperature was low. At increasing the number on BTS, the variance of AVFB of the double nitride layer structures was smaller than that of one nitride layer structure, and the trapped electron retention rate was high. In this paper, the double nitride layer structures were turned out to be useful in improving the nonvolatile memory characteristics.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.14-14
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• 2001

Nitride films such as TiN, CrN etc. deposited on glass by PVD processes have been developed for many industrial applications. These nitride films deposited on glass were widely used for not only decorative and optical coatings but also wear and corrosion resistance coatings employed as dies and molds made of glass for the example of lens forming molds. However, the major problem of nitride coatings on glass by PVD process is non-uniform film owing to pin-hole and micro crack. It is estimated that nonuniform coating is influenced by a different surface energy between metal nitrides and glass due to binding states. In this work, therefore, for the evaluation of nucleation and growth mechanism of nitride films on glass TiN and CrN film were synthesized on glass with various nitrogen partial pressure by unbalanced magnetron sputtering. Prior to deposition, for the examination of relationship between surface energy and film microstructure plasma pre-treatment process was carried out with various argon to hydrogen flow rate and substrate bias voltage, duty cycle and frequency by using pulsed DC power supply. Surface energy owing to the different plasma pre-treatment was calculated by the measurement of wetting angle and surface conditions of glass were investigated by X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscope(AFM). The microstructure change of nitride films on glass with increase of film thickness were analyzed by X-Ray Diffraction(XRD) and Scanning Electron Microscopy(SEM).

• Journal of the Korean Society of Propulsion Engineers
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• v.21 no.5
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• pp.19-28
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• 2017

Effects of cavitation and hydraulic flip in circular and elliptical nozzles on the flow characteristics have been studied. Spray tests were conducted using injectors with different ratios of an orifice length(L) to a diameter(d) and of a major axis diameter(a) to a minor axis diameter(b). With the increment of an injection pressure drop, discharge coefficients slightly decreased in cavitation flows, and those suddenly dropped and were almost constant in hydraulic flip flows. For elliptical nozzles with L/b > 8 and L/a < 8, discharge coefficients and flow patterns showed different results from those in previous circular nozzles. When a flow in the elliptical nozzle was under steady condition, as the liquid column went downstream from the nozzle, its spray angle a little decreased in the plane of a major axis and increased in the plane of a minor axis.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.764-767
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• 2003

The characteristics of diesel spray have much effect on the engine performances such as power. fuel consumption rate and emissions. Therefore, the measurement of fuel spray characteristics is very important for the improvement of heat engine. The factors which control diesel spray characteristics are injection pressure, ambient temperature and density etc. Spray behaviors are visualized by using the high speed video camera and spray angle, spray penetration are measured. Experimental equations of spray penetration and spray angle were derived by using the experimental results. 1) Ambient temperature and density influence on the characteristics of diesel spray. 2) Experimental equation of spray penetration is expressed as follows 0＜t＜ $t_{b}$ ; $S_1$=11.628$\Delta$ $P^{0.485}$ $\rho$$_{a}$ $^{-0.478}$ $t^{1.337}$, $t_{b}$ ＜t; $S_2$=7.457$\Delta$ $P^{0.523}$ $\rho$$_{a}$ $^{-0.382}$ $t^{0.548}$ 3) Experimental equation of spray Angie is expressed as follows $T_{a}$ =293K; Tan($\theta$/2)=059($\rho$$_{a}$ / $\rho$$_{f}$ )$^{0.437}$, $T_{a}$ =473K; Tan($\theta$/2)=0588($\rho$$_{a}$ / $\rho$$_{f}$ )$^{0.404}$_{f}$ )$^{0.404}$

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.79-79
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• 1999

The varous techniques for fabrication of si or metal tip as a field emission electron source have been reported due to great potential capabilities of flat panel display application. In this report, 240nm thermal oxide was initially grown at the p-type (100) (5-25 ohm-cm) 4 inch Si wafer and 310nm Si3N4 thin layer was deposited using low pressure chemical vapor deposition technique(LPCVD). The 2 micron size dot array was photolithographically patterned. The KOH anisotropic etching of the silicon substrate was utilized to provide V-groove formation. After formation of the V-groove shape, dry oxidation at 100$0^{\circ}C$ for 600 minutes was followed. In this procedure, the orientation dependent oxide growth was performed to have a etch-mask for dry etching. The thicknesses of the grown oxides on the (111) surface and on the (100) etch stop surface were found to be ~330nm and ~90nm, respectively. The reactive ion etching by 100 watt, 9 mtorr, 40 sccm Cl2 feed gas using inductively coupled plasma (ICP) system was performed in order to etch ~90nm SiO layer on the bottom of the etch stop and to etch the Si layer on the bottom. The 300 watt RF power was connected to the substrate in order to supply ~(-500)eV. The negative ion energy would enhance the directional anisotropic etching of the Cl2 RIE. After etching, remaining thickness of the oxide on the (111) was measured to be ~130nm by scanning electron microscopy.