• Korean Journal of Materials Research
• /
• v.17 no.11
• /
• pp.593-600
• /
• 2007

Aluminum was anodized in a $H_2SO_4$ solution, and titanium (IV) oxide ($TiO_2$) was electrodeposited into nanopores of anodic porous alumina in a mixed solution of $TiOSO_4$ and $(COOH)_2$. The photocatalytic activity of the prepared film was analyzed for photodegradation of methylene blue aqueous solution. Consequently, we found it was possible to electrodeposit $TiO_2$ onto anodic porous alumina, and synthesized it into the nanopores by hydrolysis of a titanium complex ion under AC 8-9 V when film thickness was about $15-20{\mu}m$. The photocatalytic activity of $TiO_2$-loaded anodic porous alumina ($TiO_2/Al_2O_3$) at an impressed voltage of 9 V was the highest in every condition, being about 12 times as high as sol-gel $TiO_2$ on anodic porous alumina. The results revealed that anodic porous alumina is effective as a substrate for photocatalytic film and that high-activity $TiO_2$ film can be prepared at low cost.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.16 no.9
• /
• pp.801-806
• /
• 2003

In recent years, there has been large interest in the fabrication of the self organized nanoscale structures since not only their potential utilization in electronic, optoelectronic, and magnetic devices but also their fundamental interest such as uniformity and regularization. An attractive candidate of these materials is anodic porous alumina film(Al$_2$O$_3$) which is formed by the anodization of aluminum in an appropriate acid solution. In this study to fabricate the porous alumina film with very uniform and nearly parallel pores the anodization was carried out under constant voltage mode in 0.3M oxalic acid as an electrolyte. The hexagonally ordered arrays with a few $\mu\textrm{m}$ in size two-dimensional polycrystalline structure were obtained of which pore densities were 1.1${\times}$10$\^$10//$\textrm{cm}^2$.

• Journal of the Korean Vacuum Society
• /
• v.15 no.5
• /
• pp.518-526
• /
• 2006

Nanoporous alumina film was fabricated by anodization of an aluminum sheet. Highly ordered nanowellstructured and nanonets-tructured metal films were fabricated by vacuum evaporation of several metals(Al, Sn, and Co) using the anodic nanoporous alumina film as a template. In this experiment, an anodic porous alumina film with the cell size of 100 nm and the pore diameter of 60 nm was used. The resistance heating method was adopted for evaporating a desired metal, and vapor deposition was carried out under the base pressure of torr. It was founded that whether the structure fabricated by vacuum evaporation is nanowell or nanonet is dependent on the amount of deposited material. When an anodic porous alumina film with the cell size of 100 nm and the pore diameter of 60 nm was used, a nanowell-structured film was fabricated when a sufficient amount of metal was suppled to cover the surface pores. On the other hand, nanonet-structured film was fabricated bellow a half the amount of metal required for nanowell-structured film.

• Bulletin of the Korean Chemical Society
• /
• v.27 no.8
• /
• pp.1159-1163
• /
• 2006

Aluminum nanotube has been fabricated by a physical vapor deposition/atmospheric pressure injection using an anodic porous alumina film as a template. The pore external-, and inside diameters and the length of the aluminum nanotubes fabricated by this method are 60 nm, 35 nm and 2 $\mu$m, respectively. The structure of the fabricated aluminum nanotubes was examined by a kind of chemical treatment as extraction of copper on the cross-sectional area of these aluminum tubes in a mixed solution of $CuCl_2$ and HCl by difference of ionization tendency between aluminum and copper. The composition of the aluminum nanotube was identified by the two dimensional Hybrid Plasma Equipment Model (HPEM) employing the inductively coupled plasma.

• Journal of the Korean Magnetics Society
• /
• v.22 no.1
• /
• pp.6-10
• /
• 2012

We have observed the change in the film resistance of thin nickel film up to 13 nm, which is deposited on a porous anodic alumina substrate, prepared by two-step anodization technique under phosphoric acid. The resulting film grows as a porous film, following the pore structure on the surface of the alumina substrate, and the value of the resistance lies above $150k{\Omega}$ within the range of thickness studied here, decreasing very slowly with the film thickness. The observed resistance value is much higher than the reported value of a uniform film at the same thickness. Since the observed value of the surface coverage with the pores is smaller than the critical value, expected from the percolation theory, the pore structure limits the formation of conduction channel across the film. In addition, by comparing to the typical model of thickness-dependent resistivity, we expect that the scattering at the pore edge further increases the film resistance.

• Journal of the Korean institute of surface engineering
• /
• v.43 no.5
• /
• pp.248-254
• /
• 2010

Porous $Al_2O_3$ film can be utilized as template for fabrication of nano-structured materials. Porous anodic alumina layer as template was prepared by anodization of aluminum in oxalic acid, and the pore diameter and barrier-type alumina layer can be controlled for proper anodizing parameter by widening process in $H_3PO_4$ solution. The $SiO_2$ nanodot and Ni nanowire was fabricated using anodic alumina template and their characteristics were investigated using SEM and TEM with EDS. Especially the growth mechanism of $SiO_2$ nanodot in alumina membrane compared with thinning of the alumina barrier layer during anodization was also investigated.

• Journal of Powder Materials
• /
• v.22 no.6
• /
• pp.438-442
• /
• 2015

Porous thick film of alumina which is fabricated by freeze tape casting using a camphene-camphor-acrylate vehicle. Alumina slurry is mixed above the melting point of the camphene-camphor solvent. Upon cooling, the camphene-camphor crystallizes from the solution as particle-free dendrites, with the $Al_2O_3$ powder and acrylate liquid in the interdendritic spaces. Subsequently, the acrylate liquid is solidified by photopolymerization to offer mechanical properties for handling. The microstructure of the porous alumina film is characterized for systems with different cooling rate around the melting temperature of camphor-camphene. The structure of the dendritic porosity is compared as a function of ratio of camphene-camphor solvent and acrylate content, and $Al_2O_3$ powder volume fraction in acrylate in terms of the dendrite arm width.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2010.06a
• /
• pp.268-268
• /
• 2010

AC anodizing on aluminum foil was investigated by the variation of AC voltage and frequency. The voltage and frequency were applied in the range of approximately 40~200V, 0~400Hz. The porous alumina film was formed and the growth rate of oxide film is increased with frequency. The structural property was analyzed by SEM and XRD. SEM results show the approximate relation between frequency, voltage and growth rate. The AC voltage effect on the structural modulation of porous alumina indicates that AC anodizing is useful for the application to nanocapacitor material.

• Journal of the Korean Ceramic Society
• /
• v.31 no.8
• /
• pp.927-933
• /
• 1994

Alumina composite membranes were prepared by chemical vapor deposition (CVD) using aluminum-tri-isopropoxide as a precursor. Porous alumina supports were used in deposition, which were in disk shape with mean pore diameter of 0.1 ${\mu}{\textrm}{m}$ and prepared by slip-coasting process. film deposition morphology on porous support was simulated through depositing alumina film on polycrystalline silicon pattern, and its step coverage observed by SEM showed one deviated from uniform step coverage. N2 permeability through composite membranes and the pressure dependence decreased as the deposition time increased. Initially, the N2 permeability of the top layer was tend to decrease rapidly, and then the degree of decrease in N2 permeability was tend to diminish with deposition time. The N2 permeability increased with heat treatment temperature and the crack was generated in top layer at 100$0^{\circ}C$.

• Journal of the Korean Magnetics Society
• /
• v.23 no.4
• /
• pp.126-129
• /
• 2013

We have fabricated an ordered Ni nanodot structure using an alumina mask prepared via 2-step anodization technique under phosphoric acid. We have formed a porous structure with average pore size of 279 nm on $2{\mu}m$ thick alumina film and the thermal deposition of thin Ni film though the mask led to the formation of ordered Ni nanodot structure with an average dot size of 293 nm, following the pore structure on the mask. We further investigated the magnetic properties of the nanodot structure by measuring the hysteresis curve at room temperature. When compared to the magnetic properties of a continuous Ni film, we observed the decrease in the squareness and the increase in coercivity along the magnetization easy axis, due to the isolated nanodot structure. Our study suggests that the ordered nanodot structure can be easiy fabricated with thin film deposition technique using anodized alumina mask as a mask.