• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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• pp.600-602
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• 1995

Using the $O_2$ RIE process, 20{\mu}m$-height polyimide microstructures are fabricated. In LIGA-like process, metal microstructure can be formed by the electroplating using these polyimide microstructures as a plating mould. Reactive ion Etching technique using oxygen gas is used for the patterning of polyimide. The etching rate of the polyimide is increased with increased pressure and RF power. The anisotropic vertical sidewall can be obtained at low pressure, but the etched surface state is not so good yet. "Micrograss", which is formed during the RIE and disturbs uniform electroplating, can be removed effectively by the wet itching of the chromium sacrificial layer. More studies about the improvement of an etched surface state and the removal of microsgrass are needed.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.396-396
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• 2013

The resistive random access memory (ReRAM) has several advantages to apply next generation non-volatile memory device, because of fast switching time, long retentions, and large memory windows. The high mobility of monolayered graphene showed several possibilities for scale down and electrical property enhancement of memory device. In this study, the monolayered graphene grown by chemical vapor deposition was transferred to $SiO_2$ (100 nm)/Si substrate and glass by using PMMA coating method. For formation of metal-oxide nanoparticles, we used a chemical reaction between metal films and polyamic acid layer. The 50-nm thick BPDA-PDA polyamic acid layer was coated on the graphene layer. Through soft baking at $125^{\circ}C$ or 30 min, solvent in polyimide layer was removed. Then, 5-nm-thick indium layer was deposited by using thermal evaporator at room temperature. And then, the second polyimide layer was coated on the indium thin film. After remove solvent and open bottom graphene layer, the samples were annealed at $400^{\circ}C$ or 1 hr by using furnace in $N_2$ ambient. The average diameter and density of nanoparticle were depending on annealing temperature and times. During annealing process, the metal and oxygen ions combined to create $In_2O_3$ nanoparticle in the polyimide layer. The electrical properties of $In_2O_3$ nanoparticle ReRAM such as current-voltage curve, operation speed and retention discussed for applictions of transparent and flexible hybrid ReRAM device.

• 마이크로전자및패키징학회지
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• 제19권3호
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• pp.77-82
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• 2012

본 연구에서는 칩을 기판에 내장하기 위해 상용화된 CSR사의 bluetooth chip을 이용하여 표면의 솔더볼을 제거하고 PCB소재와 공정을 이용하는 embedded active PCB 공정에 관한 연구를 하였다. 솔더볼이 제거된 칩과 PCB는 구리 도금 공정으로 연결되었으나 열 충격시 표면처리를 하지 않았을 시 칩의 표면과 ABF 간의 de-lamination 현상이 발견되었고, 이를 해결하기 위해 칩의 polyimide passivation layer에 디스미어와 플라즈마 공정을 이용하여 조도 형성을 하는 연구를 진행하였다. SEM(Scanning Electron Microscope) 과 AFM(Atomic Force Micrometer)을 통하여 표면을 관찰하였고, XPS(X-ray Photoelectron Spectroscopy)를 이용하여 표면의 화학적 구조의 변화를 관찰하였다. 실험결과 플라즈마 처리 시 표면 조도형성이 되었으나 그 밀도가 조밀하지 못하였지만 디스미어 공정과 함께 처리하였을 시 조도의 조밀도가 높아 열 충격을 가하였을 시에도 칩의 polyimide layer와 ABF간의 de-lamination 현상이 발견되지 않았다.

• 폴리머
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• 제38권4호
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• pp.544-549
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• 2014

이중층 필름 구조로서 상부에 폴리실록산 층과 하부에 폴리이미드 층을 갖는 내열 점착 필름을 제조하였다. 이중층 필름제조 과정에서 폴리실록산이 용해된 tetrahydrofuran(THF) 용액이 폴리이미드 층 상부에 도포된 이후, 상온~$80^{\circ}C$ 온도범위에서 에이징(aging) 과정을 거쳐 두 층 사이에서 나노 상분리에 의한 도메인이 500 nm 두께의 중간층으로 형성되었고 이에 대한 모폴로지는 투과전자현미경을 통해 조사되었다. 이러한 중간층 형성을 통해 상부 폴리실록산은 균일하고 안정적 층을 형성함으로 재현성 있는 점착특성을 나타내었으며, $300^{\circ}C$ 처리에서도 8-13 g/inch의 점착성질을 나타내었다. 또한 이중층 폴리이미드/폴리실록산과 나노 도메인 중간층 구조를 갖는 필름은 안정된 단일 박막으로 얻어지며 $435^{\circ}C$의 높은 열분해 온도를 가지고, $300^{\circ}C$에서 점착특성이 유지되는 결과를 보여 마이크로일렉트로닉스의 공정 조건에 적합한 활용 가능성을 보였다.

• Elastomers and Composites
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• 제43권2호
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• pp.82-87
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• 2008

본 연구에서는 화학적 구조가 다른 2종의 dianhydride 단량체인 1,2,4,5-benzenetetracar boxylic dianhydride (PMDA)와 4,4'-(4,4'-isopropylidenediphenoxy)bis(phthalic anhydride) (BPADA) 및 2종의 diamine 단량체인 m-phenylenediamine (m-PDA)와 4,4'-oxydianiline (ODA)의 몰 비를 조절함으로써 9종의 폴리이미드를 합성하였다. 합성된 폴리이미드를 사용하여 casting method로 2층형 Flexible Copper Clad Laminate(FCCL)을 제조한 후, 열적 특성, 흡수율 및 접착력을 평가하였다. 제작된 폴리이미드의 유리전이온도$(T_g)$와 시료가 5 wt% 손실되는 분해 온도를 측정한 결과, m-PDA와 PMDA의 함량이 증가할수록 유리전이온도 및 시료가 5 wt% 손실되는 온도가 증가하였다. 폴리이미드의 흡수율은 ODA와 BPADA가 증가할수록 감소하였다. 이는 ODA와 BPADA의 상대적으로 긴 분자 구조 때문으로 판단된다. 박리 시험을 실시한 결과, ODA와 BPADA의 함량이 증가할수록 접착력이 증가하였다.

• Macromolecular Research
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• 제9권6호
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• pp.303-312
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• 2001

The fabrication of liquid crystal display (LCD) panels involves several thermal processes such as imidization of the alignment layer (AL) and annealing of the rubbed polyimide AL. The nature of these processes on the LC alignment, especially on the pretilt angle (Θ$\_$p/) has been systematically studied, employing various types of polyimide structures. The imidization effect depends on the nature of polyimid precursors; Θ$\^$p/ increases with the degree of the imidization for the main-chain type of ALs, due to the decrease in the surface polarity, but this relation is not applicable to the alkylated ones in which the steric effect at the AL surface by the aliphatic side chains is dominant. Annealing of the rubbed polyimide AL deteriorates its rubbing-induced molecular orientation and subsequently the overlying LC alignment, resulting in the decrease in Θ$\_$p/. Especially, annealing of the LC cell affects the LC-AL interaction as well as the AL orientation and thus its effect on LC alignment depends sensitively on the nature of LC-polyimide interface; aromatic moiety in the polyimide structure gives better thermal stability of LC alignment while fluorinated polyimide ALs induce the less stable alignment.

• 한국표면공학회지
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• 제38권2호
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• pp.49-54
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• 2005

Flexible copper clad laminates (FCCL) fabricated by sputtering has advantages in fine pitch etching and dimensional accuracy than previous casting or laminating type FCCL, But its lower adhesion is inevitable technical challenge to solve for commercializing it. Chromium (Cr) which strongly reacts with O moiety was used as tie-coating layer in order to improve low adhesion between copper (Cu) and polyimide (PI). Sputtering raw polyimide (SRPI) and casting raw polyimide (CRPI) were used as substrates at this research. PI was pretreated by plasma before sputtering, and each sample was varied with RF power and Cr thickness on sputtering. Peel strength of the FCCL on SRPI was higher than that on CRPI. Adhesion had maximum value when 10 nm of Cr was deposited on SRPI by RF power of 50 W. It seems to be by the formation of Cu-Cr-O solid solution at the metal-PI interface.

• 한국표면공학회지
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• 제29권5호
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• pp.379-385
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• 1996

Adhesion of Cu/Cr and Cu/$Cu_xCr_{1-x}$ thin films onto polyimide substrates has been studied. For an adhesion layer, Cr or Cu-Cr alloy films were deposited onto polyimide using DC magnetron sputtering machine. Then Cu was sputter-deposited and finally, Cu was electroplated. Adhesion was evaluated using $90^{\circ}C$ peel test or T-peel test. Plastic deformation of the peeled metal layer was qualitatively measured using XRD technique. It is confirmed that high interfacial fracture energy and large plastic deformation are important to enhance the peel adhesion strength. High peel strength is obtained when the interface is strongly bonded. More ductile film has higher peel strength. In Cu-Cr alloy films, opposite effects of the Cr addition in the alloy film on the peel strength are operative: a beneficial effect of strong interfacial bonding and a negative effect of smaller plastic deformation.

• 한국재료학회지
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• 제15권7호
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• pp.458-464
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• 2005

In microelectronics packaging, the reliability of the metal/polymer interfaces is an important issue because the adhesion strength between dissimilar materials is often inherently poor. The modification of polymer surfaces by ion beam irradiation and rf plasma is commonly used to enhance the adhesion strength of the interface. T-peel strengths were measured using a Cu/polyimide system under varying $N_2^+$ ion beam irradiation conditions for pretreatment. The measured T-peel strength showed reversed camel back shape regarding the fixed metal-layer thickness, which was quite different from the results of the 90° peel test. The elementary analysis suggests that the variation of the T-peel strength is a combined outcome of the plastic bending work of the metal and polymer strips. The results indicate that the peel strength increases with $N_2^+$ ion beam irradiation energy at the fixed metal-layer thickness.

• 한국재료학회지
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• 제15권1호
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• pp.42-46
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• 2005

In microelectronics packaging, the reliability of the metal/polymer interfaces is an important issue because the adhesion strength between dissimilar materials is often inherently poor. The modification of polymer sufaces by ion beam irradiation and rf plasma are commonly used to enhance the adhesion strength of the interface. T-peel strengths were measured using a Cu/polyimide system under varying $Ar^+$ ion beam irradiation pretreatment conditions. The measured T-peel strength showed reversed camel back shape regarding the fixed metal-layer thickness, which was quite different from the results of the $90^{\circ}$ peel test. The elementary analysis suggests that the variation of the T-peel strength is a combined outcome of the plastic bending work of the metal and polymer strips. The results indicate that the peel strength increases with $Ar^+$ ion beam irradiation energy at the fixed metal-layer thickness.