Effects of Thermal Imidization and Annealing on Liquid Crystal Alignment ever Rubbed Polyimide Layers: Change in the Pretilt Angle

  • Paek, Sang-Hyon (Materials Research Center for Information Displays, Institut of Natural Sciences, Kyung Hee University)
  • Published : 2001.12.01

Abstract

The fabrication of liquid crystal display (LCD) panels involves several thermal processes such as imidization of the alignment layer (AL) and annealing of the rubbed polyimide AL. The nature of these processes on the LC alignment, especially on the pretilt angle (Θ$\_$p/) has been systematically studied, employing various types of polyimide structures. The imidization effect depends on the nature of polyimid precursors; Θ$\^$p/ increases with the degree of the imidization for the main-chain type of ALs, due to the decrease in the surface polarity, but this relation is not applicable to the alkylated ones in which the steric effect at the AL surface by the aliphatic side chains is dominant. Annealing of the rubbed polyimide AL deteriorates its rubbing-induced molecular orientation and subsequently the overlying LC alignment, resulting in the decrease in Θ$\_$p/. Especially, annealing of the LC cell affects the LC-AL interaction as well as the AL orientation and thus its effect on LC alignment depends sensitively on the nature of LC-polyimide interface; aromatic moiety in the polyimide structure gives better thermal stability of LC alignment while fluorinated polyimide ALs induce the less stable alignment.

Keywords

References

  1. World Scientific v.1 Liquid Crystals: Applications and Uses T. Scheffer;J. Nehring
  2. J. SID v.2 N.A.J.M. van Aerle
  3. Korea Polym. J. v.8 B.H. Ahn;D.W. Lee;J.K. Lee;S.S. Hong;G.D. Lee
  4. Korea Polym. J. v.7 M. Ree;T.J. Shin;Y. H. Park;H. Lee;T. Chang
  5. Appl. Phys. Lett. v.67 A. Lien;R.A. John;M. Angelopoulous;K.-W. Lee;H. Takano;A. Takenaka
  6. Digest v.23 Y. Koike;T. Yamada;K. Okamoto;M. Ohashi;I. Tomita;M. Okabe
  7. Jpn. J. Appl. Phys. v.32 C. Nozaki;N. Imamura;Y. Sano
  8. Proc. Japan Display 1992 M. Niskikawa;T. Miyamoto;S. Kawamura;Y. Tsuda;N. Bessho
  9. Proc. Japan Display 1992 B.O. Myrovold;H. Yokokura;T. Iwakabe;K. Kondo;S. Oh-hara
  10. Jpn. J. Appl. Phys. v.34 D.-S. Seo.;K. Araya;N. Yoshida;M. Nishikawa;Y. Yabe;S. Kobayashi
  11. Korea Polym. J. v.8 D. H. Choi;J.H. Kim;K.J. Cho
  12. Liq. Cryst. v.18 B.O. Myrvold;K. Kondo
  13. Liq. Cryst. v.20 V.N. Raja;D.S.S. Rao;S.W.Kang;J.C. Lee;S. S. Lee;A.H. Jin
  14. Jpn. J. Appl. Phys. v.33 D.-S. Seo;N. Yoshida;S. Kobayashi;M. Nishikawa;Y. Yabe
  15. Jpn. J. Appl. Phys. v.35 K. Shirota;M. Yaginuma;T. Sakai;K. Ishigawa;H. Takezoe;A. Fukuda
  16. Phys. Rev. v.A46 M. Barmentlo;R.W.J. Hollering;N.A.J.M. van Aerle
  17. Phys. Rev. Lett. v.73 X. Zhuang;L. Marrucci;Y.R. Shen
  18. Mol. Cryst. Liq. Cryst. v.132 M.E. Becher;R.A. Kilian;B.B. Kosmowski;D.A. Mlynski
  19. Liq. Cryst. v.19 D.-S. Seo;S. Kobayashi;M. Nishikawa;Y. Yabe
  20. Appl. Phys. Lett. v.61 D.-S. Seo;S. Kobayashi;A. Mochizuki
  21. J. SID v.3 K.-Y. Han;T. Uchida
  22. Proc. Euro Display v.93 N.A.J.M. van Aerle;M. Bamentlo;R.J. W. Hollering
  23. Displays. v.17 A. Mosley;B.M. Niclolas;P.A. Gass
  24. SID 87 Digest v.18 P.A. Gass;A. Mosley;B.M. Nicholas;J.T. Brown;C.P. Edwards;D.G. McDo-nnell
  25. Liq. Cryst. v.19 D.-S. Seo;S. Kobayashi;M. Nishikawa;Y. Yabe
  26. In the region of weak rubbing, the pretilt angle(${\Theat}_p$) quickly increases with the rubbing strength, due to increase of the area fraction of the AL surface modified by rubbing. But, LC alignment induced by weak rubbing. But, LC alignment induced by weak rubbing has poor thermal stability and/or alignment defects. In applications, strong rubbing especially high-force fubbling is thus applied on the AL to produce thermally stable, defect-free alignment. In this rubbing regime, ${\Theat}_p$ only changes slightly with rubbing strength and consistent ${\Theat}_p$ is thus generated for a given AL.
  27. J. Appl. Phys. v.48 T.J. Scheffer;J. Nehring
  28. Polyimides F.W. Harris;D. Wilson(Eds.);H.D. Stenzenberger(Eds.);P.M. Hergenrother(Eds.)
  29. SID 96 Digest v.27 K.-W. Lee;S.-H. Paek;A. Lien;C.J. Durning;H. Fukuro
  30. Jpn. J. Appl. Phys. v.36 K.-W. Lee;A. Lien;J. H. Stathis;S.-H. Paek
  31. Macromolecules v.29 K.-W. Lee;S.-H. Paek;A. Lien;C.J. Durning;H. Fukuro
  32. Jpn. J. Appl. Phys. v.38 I. Hirosawa;T. Matsushita;H. Miyairi;S. Saito
  33. J. Polym. Sci.: Polym. Phys. Ed. v.30 K. Okamoto;N. Tanihara;H. Watanabe;K. Tanaka;H. Kita;A. Nakamura;Y. Kusuki;K. Nakagawa
  34. Polyimides: Fundamentals and Applications M. Langsam;M.K. Ghosh(Eds.);K.L. Mittal(Eds.)