• Title/Summary/Keyword: Plating conditions

Search Result 239, Processing Time 0.022 seconds

Analysis of cyanide free electroless Au plating solution by capillary elecrophoresis (캐피라리 전기 영동법에 의한 비시안 무전해 Au 도금액의 분석)

  • Han, Jaeho;Kim, DongHyun
    • Journal of the Korean institute of surface engineering
    • /
    • v.55 no.2
    • /
    • pp.120-132
    • /
    • 2022
  • In the non-cyanide-based electroless Au plating solution using thiomalic acid as a complexing agent and aminoethanethiol as a reducing agent, analysis of each component constituting the plating solution is essential for the analysis of the reaction mechanism. And component analysis in the plating solution is important for monitoring component changes in the plating process and optimizing the management method. Capillary Electrophoresis (CE) method is rapid, sensitive and quantitative and could be readily applied to analysis of Aun+ ion, complexing agent and reducing agent in electroless Au plating solution. In this study, the capillary electrophoresis method was used to analyze each component in the electroless Au plating solution in order to elucidate the complex bonding form and the plating mechanism of the non-cyanide-based electroless Au plating bath. The purpose of this study was to establish data for optimizing the monitoring and management method of plating solution components to improve the uniformity of precipitation and stability. As a result, it was confirmed that the analysis of thiomalic acid as a complexing agent and Aun+ ions and the analysis of aminoethanethiol as a reducing agent were possible by capillary electrophoresis. In the newly developed non-cyanide-based electroless Au plating solution, it was confirmed that Aun+ ions exist in the form of Au+ having a charge of +1, and that thiomalic acid and Au+ are combined in a molar ratio of 2 : 1. In addition, it was confirmed that aminoethanethiol can form a complex by combining with Au+ ions depending on conditions as well as acting as a reducing agent.

Development of New Electroplating Alloy (Au-Cu) for Increasing the Durability of PCB Commutator in Vibration Motor (진동모터용 PCB 정류자의 내구성 향상을 위한 신 합금도금 (Au-Cu) 개발)

  • Kim, Young-Tae;Lee, Sung-Jae;Park, Sung-Jun
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.26 no.6
    • /
    • pp.114-121
    • /
    • 2009
  • Mobile phone is a representative personal communication tool among wireless communication devices. Recently, with the miniaturization and light-weight trend of mobile phone, the vibration motor has been replaced by coin type. The required performances of coin type vibration motor needed by user are long life, higher vibration, and thin thickness. Also the most important factor determines the performance of vibration motor is long-term reliability, which is mainly related to PCB plating technique for commutator. In this study, three types of fault were categorized to analyze the cause for malfunction of vibration motor. And, hardness and surface morphology on plating surface are also investigated to optimize the plating method and plating conditions. As a result, new plating method and conditions were proposed to increase the durability of PCB commutator.

Coagulation of the Metal-Plating Wastewater using Coal Fly Ash (비산회를 이용한 도금폐수의 응집처리)

  • 연익준;김광렬
    • Journal of environmental and Sanitary engineering
    • /
    • v.17 no.3
    • /
    • pp.37-45
    • /
    • 2002
  • The Purpose of this study is to reduce environmental problems caused by landfill of bituminous coal fly ash emitted from the power plant and to reuse it. First of all, we experimented that Al and Si elements were extracted from fly ash and investigated that extracted Al and Si elements night use a coagulant. The extraction was carried out under various conditions ; concentration of the extraction solution, calcination temperature and calcination time. As the results, it was found that the optimum conditions of the extraction of Al and Si elements from fly ash were as follows, concentration of NaOH was 5N for both of them, calcination temperature was $700^{\circ}C$ and $600^{\circ}C$ and calcination time was 1hr and 1.5hr, respectively The extracted solution was used as a coagulant to treat the diluted metal-plating solutions which contained Pb and Cu, respectively. As the result of treatment on the diluted Pb-plating solution with 315NTU, the removal efficiency of turbidity was more than 90%, and the removal efficiency of Pb was about 80%. As for treatment of the non-turbid diluted Cu-plating solution, the removal efficiency of Cu was about 98%.

Electroless Ni Plating of Monodisperse Polymer Particles (단분산 가교 고분자 미립자의 무전해 니켈도금 연구)

  • Kim, Dong-Ok;Shon, Won-Il;Jin, Jeong-Hee;Oh, Seok-Heon
    • Polymer(Korea)
    • /
    • v.31 no.3
    • /
    • pp.184-188
    • /
    • 2007
  • Monodisperse PMMA/HDDA polymer particles were coated via electroless Ni plating using sodium hypophosphite as a reducing agent in an acidic environment. In this study, the effects of 1) the pretreatment conditions, 2) the plating temperature, 3) the plating pH, and 4) the initial pH, control of plating bath on the variation of plating rate, surface state of plated particles and plating reproducibility were investigated. It was observed that every pretreatment steps, especially conditioning and acceleration step, were very important for obtaining uniform Ni plating and the plating rate was increased with the increase of plating temperature and pH. Moreover, the initial pH control of plating bath was critical for the plating reproducibility.

Development of Ni/Cr Plating Process for LRE Thrust Chamber (액체로켓엔진 연소기용 니켈/크롬 코팅의 공정 개발)

  • Cho, Hwang-Rae;Bang, Jeong-Suk;Rhee, Byung-Ho;Lee, Kwang-Jin;Lim, Byoung-Jik;Han, Yeoung-Min;Choi, Hwan-Seok
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • 2009.11a
    • /
    • pp.603-607
    • /
    • 2009
  • A Ni/Cr plating process has been developed for applying to inner wall of liquid rocket engine(LRE) thrust chamber. Ni plating conditions were selected through thermal shock test and endurance verification of the plating layers was performed through hot firing test of a subscale thrust chamber with Ni/Cr plating. Test results showed that a crack or separation of the plating layers was not found. Judging from the results, Ni/Cr plating could be applied to LRE thrust chamber as a substitute of air plasma sprayed ceramic coating which is presently being used.

  • PDF

Selective Contact Hole Filling by electroless Ni Plating (무전해 Ni 도금에 의한 선택적 CONTACT HOLE 충전)

  • 우찬희;권용환;김영기;박종완;이원해
    • Journal of the Korean institute of surface engineering
    • /
    • v.25 no.4
    • /
    • pp.189-206
    • /
    • 1992
  • The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

  • PDF

Development of Copper Electro-Plating Technology on a Screen-Printed Conductive Pattern with Copper Paste

  • Eom, Yong-Sung;Son, Ji-Hye;Lee, Hak-Sun;Choi, Kwang-Seong;Bae, Hyun-Cheol;Choi, Jeong-Yeol;Oh, Tae-Sung;Moon, Jong-Tae
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.22 no.1
    • /
    • pp.51-54
    • /
    • 2015
  • An electro-plating technology on a cured isotropic conductive pattern with a hybrid Cu paste composed of resin matrix, copper, and solder powders has been developed. In a conventional technology, Ag paste was used to perform a conductive pattern on a PCB or silicon substrate. From previous research, the electrical conductive mechanism and principle of the hybrid Cu paste were concisely investigated. The isotropic conductive pattern on the PCB substrate was performed using screen-printing technology. The optimum electro-plating condition was experimentally determined by processing parameters such as the metal content of the hybrid Cu paste, applied current density, and time for the electroplating in the plating bath. The surfaces and cross-sections were observed using optical and SEM photographs. In conclusion, the optimized processing conditions for Cu electro-plating technology on the conductive pattern were a current density of $40mA/cm^2$ and a plating time of 20min on the hybrid Cu paste with a metal content of 44 vol.%. More details of the mechanical properties and processing conditions will be investigated in further research.

Effect of current density, temperature and electrolyte concentration on Composition of Zn-Ni Electrodeposits (Zn-Ni도금의 합금화에 미치는 전류밀도, 온도와 전해액농도의 영향)

  • Kang, Soo Young
    • Journal of the Korea Convergence Society
    • /
    • v.8 no.11
    • /
    • pp.307-312
    • /
    • 2017
  • In the industry, galvanizing using the principle of sacrificial anode is used Zn-Ni alloy plating was developed as one of the measures to increase the corrosion resistance rather than pure zinc plating. The alloy plating layer has a corrosion resistance of 4-5 times that of the pure zinc plating layer, so that it is applied to automotive parts requiring high corrosion resistance even though the plating cost is high. The amount of Zn-Ni alloy plating solution is a sulfuric acid bath, a chlorinated bath, an alkali bath, and an ammonia bath. Here, the influence of the electrolytic conditions on the composition of the alloy plating in the chloride bath was investigated. The results are explained by the cathode overvoltage and the diffusion coefficient. In general, as the overvoltage of the cathode increases, the concentration polarization becomes more important than the activation polarization. The concentration polarization is determined by element diffusion in the diffusion layer. That is, as the overvoltage of the cathode increases, the Zn content having a large diffusion coefficient increases.

Electroless Ni Plating on Pb-base Ceramics (Pb계 Ceramics 기지상의 무전해 Ni 도금)

  • 민봉기;유종수;최순돈;신현준
    • Journal of the Korean institute of surface engineering
    • /
    • v.32 no.4
    • /
    • pp.487-495
    • /
    • 1999
  • In order to form metallic electrodes on PZT (Pb (Zr, Ti)O$_3$) ceramics, plating conditions for optimal electroless Ni deposition were investigated. Pb in PZT is the major component to inhibit the electroless deposition, because it plays a active role of catalytic poison in plating solution. Adhesion of the electroless Ni deposits is measured by push-pull scale test and peel test. Results such as deposition ability, deposition rate, and thickness of deposits showed in terms of concentration of etchant, composition of catalyzing solution, and composition and pH of electroless bath solution.

  • PDF

Characteristic Analysis for Lead-wire Process -Focus on Electro-gilding Process by Temperature, Current Density, and Additions- (리드선의 제조공정 특성분석에 관한 연구 -온도, 전류밀도, 첨가제에 의한 전기 도금공정 중심으로-)

  • 이도경
    • Journal of Korean Society of Industrial and Systems Engineering
    • /
    • v.26 no.1
    • /
    • pp.1-6
    • /
    • 2003
  • In this paper, we proposed the optimal process conditions on the electro-gilding process. The responses are plating thickness and Sn proportion. The factors are temperature, current density, and addition. We minimized the total number of experiments based on the principle of dividing into small part. We grouped the factors using the plating process information which we already knew. We did Hull Cell test to find relationship between plating solution and electric effects, and applied ANOVA and RSM to estimate the optimal process conditions.