• Title/Summary/Keyword: Plating conditions

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Solvent Sublation of Trace Noble Metals by Formation of Metal Complexes with 2-Mercaptobenzothiazole

  • Kim, Yeong Sang;Sin, Je Hyeok;Choe, Yun Seok;Lee, Won;Lee, Yong Il
    • Bulletin of the Korean Chemical Society
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    • v.22 no.1
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    • pp.19-24
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    • 2001
  • A solvent sublation has been studied for the determination of trace Au(III), Pt(IV) and Pd(II) in waste water with their complexes of 2-mercaptobenzothiazole (MBT). Experimental conditions such as the concentration of HCl, the amount of MBT as a ligand, the type and amount of surfactants, bubbling rate and time, and the type of organic solvent were optimized for the solvent sublation, i.e., 25.0 mL of 2.0 M HCl solution and 30mL of 0.4%(w/v) MBT ethanolic solution were added to a 1.0 L sample to form stable complexes. The addition of 4.0 mL of 1 ${\times}$$10^{-3}$ M CTAB (cetyltrimehtylammonium bromide) solution was needed for the effective flotation accomplished by bubbling nitrogen gas at the rate of 40.0 mL/min for 35 minutes. As a solvent, 20.0 mL of MIBK (methylisobuthylketone) was used to extract the floated complexes. The procedure was applied to three kinds of waste waters. Au(III) was determined as 0.68 ng/mL and 0.98 ng/mL respectively for final washed water of two plating industries in Banwol. Pd(II) and Pt(IV) were not detected in any of the three samples. The recovery, which was obtained with analyte-spiked samples, were 95-120%.

Properties Change of Electroplated Permalloy Thin Films by Organic Additives (유기첨가제에 의한 전기도금 퍼말로이 박막의 물성변화)

  • Bang, Won-Bae;Bae, Jong-Hak;Hong, Ki-Min;Chung, Jin-Seok;Ko, Young-Dong;Lee, Hee-Bok
    • Journal of the Korean Magnetics Society
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    • v.17 no.3
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    • pp.133-136
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    • 2007
  • We investigated the changes of the magnetic properties in electroplated Permalloy thin films by a few organic additives added to the plating electrolytes. Under identical electroplating conditions, the crystalline orientations and the surface roughness of the plated thin films were different from those prepared with a pure electrolyte. These property changes reduced the coercivity and increased the magnetoimpedance ratio (MIR) up to 20%.

Electrodeposition of Nano TiO2 Powder Dispersed Nickel Composite Coating (전기도금법을 이용한 나노 산화티타늄 니켈 복합도금에 관한 연구)

  • Park, So-Yeon;Lee, Jae-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.4
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    • pp.65-69
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    • 2012
  • Composite coating can be manufactured during the electroplating with the bath containing a suspension of particles: ceramic, polymer, nanopowders. Improvement of hardness, wear resistance, corrosion resistance and lubrication properties are well-known advantage of composite coating. In this study, nano $TiO_2$ powder dispersed Ni composite plating was investigated. The improvement of surface hardness and photo decomposition effects can be expected in this coating. Zeta potential was measured with pH. The effect of ultrasonication time and types of ultrasonicator were studied to minimize the agglomeration of $TiO_2$ nanopowders in the electrolyte. Optimum conditions for nano $TiO_2$ dispersed Ni composite coating were $40mA/cm^2$ of current density, pH 3.5, and $50^{\circ}C$. At these conditions, $TiO_2$ nanoparticles contents in the Ni deposit was 15-20 at.%.

Effects of Electrodeposition Conditions on Properties of Ni Thin Films Electrodeposited from Baths Fabricated by Dissolving Metal Ni Powders (금속 Ni 분말을 용해한 도금용액으로부터 전기도금 된 Ni 박막 특성에 미치는 도금조건의 영향)

  • Yoon, Pilgeun;Park, Keun-Yong;Uhm, Young Rang;Choi, Sun Ju;Park, Deok-Yong
    • Journal of the Korean institute of surface engineering
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    • v.48 no.3
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    • pp.73-81
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    • 2015
  • Chloride plating solution was fabricated by dissolving metal Ni powders in solution with HCl and deionized water. Effects of deposition conditions on the properties of Ni films electrodeposited from chloride baths were studied. Current efficiency of Ni films electrodeposited from the baths containing saccharin was decreased with increasing the current density. Residual stress of Ni thin films ware measured to be about 230 ~ 435 MPa in the range of current density of $10{\sim}25mA/cm^2$. Cathode current efficiency in baths without saccharin was initially increased with increasing pH, while it was decreased with increasing pH further. Cathode current efficiency in baths with saccharin (except at pH 2) exhibited less 10 ~ 20% than that in baths without saccharin. Residual stress of Ni films electrodeposited from baths without saccharin was measured to be 388 ~ 473 MPa in the range of pH 2 ~ pH 5 and then was increased to 551 MPa at pH 6. On the other hand, residual stress of Ni films electrodeposited from baths with saccharin was increased with increasing pH. Surface morphology was strongly affected by the change of current density, but slightly by solution pH and addition of saccharin.

Effect of Culture Media on Embryonic Cell Growth in Zebrafish, Danio rerio (배지에 따른 제브라피쉬(Danio rerio) 배아 유래세포의 성장 효과에 관한 연구)

  • Lee, Ki-Young;Kim, Jong-Yeon;Jo, Soo-Gun
    • Development and Reproduction
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    • v.12 no.1
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    • pp.51-56
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    • 2008
  • To optimize the cell culture conditions of zebrafish embryonic cells, we compared the efficiency of three types of medium, DMEM, K-NAC and D-NAC. In this study, we showed that the cells grown in K-NAC have better plating efficiency than DMEM, especially in the case of low cell seeding density. However, cells grew slower in K-NAC than those in DMEM in confluent cultures. The effect of 0.1% zebrafish embryo extracts was minimal. The presence of 1% trout serum in culture medium significantly increased the growth rate of cells(p<0.05). No difference was found at $2{\sim}3{\times}10^5$ cell seeding density(p<0.05). At $4{\sim}5{\times}10^5$ cell seeding density, cells grew better in DMEM than K-NAC (p<0.1). The results suggest that supplementation of NAC and A2P in Keratinocyte SFM may improves plating efficiency when cells are plated at low population. No difference was found for cell growth in either medium with 5%, 10% or 15% FBS supplemented (p<0.05). Cells culture in D-NAC grew significantly better than those in DMEM(p<0.05). Our results clearly showed that the use of NAC and A2P in the culture medium has a positive effect on cell growth regardless of the amount of FBS added.

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Plant regeneration from protoplasts-derived from embryogenic callus of Citrus (감귤 embryogenic callus 원형질체 배양에 의한 식물체 재분화)

  • An, Hyun-Joo;Lee, Dong-Hoon;Lee, Ji-Hyun;Choi, Young-Hun;Kang, Byoung-Cheorl;Park, Hyo-Guen
    • Journal of Plant Biotechnology
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    • v.35 no.1
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    • pp.81-86
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    • 2008
  • This study describes conditions for plant regeneration from protoplasts-derived from embryogenic callus of satsuma mandarin. Plants were generated via somatic embryogenesis. Protoplasts isolated directly from nucellar callus induced from immature ovule of satsuma mandarin cv. Okitsu (Citrus unshiu Marc.) were cultured in 0.6M $BH_3$ medium. Cell division and plating efficiency were affected by protoplast culture method. The liquid over solid method was the most effective for formation of microcalli. Most of microcalli grew rapidly and transferred onto embryoid formation medium. Optimum embryoid formation medium was MT medium containing 1.5 g/L malt extract, 0.146 M sucrose and the medium for plantlet regeneration was MS medium containing 0.09M sucrose, 1.0 mg/L $GA_3$. No differences were noticed in growth habits and leaf characters such as shape, thickness, and colour between protoplast-derived plants and nucellar seedlings. This plant regeneration system from protoplasts-derived from embryogenic callus provides an alternative way for producing new scion and rootstock cultivar from citrus species which can not be crossed.

Formation of a MnSixOy barrier with Cu-Mn alloy film deposited using PEALD

  • Moon, Dae-Yong;Hwang, Chang-Mook;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.229-229
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    • 2010
  • With the scaling down of ultra large integrated circuits (ULSI) to the sub-50 nm technology node, the need for an ultra-thin, continuous and conformal diffusion barrier and Cu seed layer is increasing. However, diffusion barrier and Cu seed layer formation with a physical vapor deposition (PVD) method has become difficult as the technology node is reduced to 30 nm and beyond. Recent work on self-forming barrier processes using PVD Cu alloys have attracted great attention due to the capability of conformal ultra-thin barrier formation using a simple technique. However, as in the case of the conventional barrier and Cu seed layer, PVD of the Cu alloy seed layer will eventually encounter the difficulty in conformal deposition in narrow line trenches and via holes. Atomic layer deposition (ALD) has been known for its good step coverage and precise thickness control, and is a candidate technique for the formation of a thin conformal barrier layer and Cu seed layer. Conformal Cu-Mn seed layers were deposited by plasma enhanced atomic layer deposition (PEALD) at low temperature ($120^{\circ}C$), and the Mn content in the Cu-Mn alloys were controlled form 0 to approximately 10 atomic percent with various Mn precursor feeding times. Resistivity of the Cu-Mn alloy films decreased by annealing due to out-diffusion of Mn atoms. Out-diffused Mn atoms were segregated to the surface of the film and interface between a Cu-Mn alloy and $SiO_2$, resulting in self-formed $MnO_x$ and $MnSi_xO_y$, respectively. No inter-diffusion was observed between Cu and $SiO_2$ after annealing at $500^{\circ}C$ for 12 h, indicating an excellent diffusion barrier property of the $MnSi_xO_y$. The adhesion between Cu and $SiO_2$ was enhanced by the formation of $MnSi_xO_y$. Continuous and conductive Cu-Mn seed layers were deposited with PEALD into 32 nm $SiO_2$ trench, enabling a low temperature process, and the trench was perfectly filled using electrochemical plating (ECD) under conventional conditions. Thus, it is the resultant self-forming barrier process with PEALD Cu-Mn alloy film as a seed layer for plating Cu that has further potential to meet the requirement of the smaller than 30 nm node.

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PREPARATION OF AMORPHOUS CARBON NITRIDE FILMS AND DLC FILMS BY SHIELDED ARC ION PLATING AND THEIR TRIBOLOGICAL PROPERTIES

  • Takai, Osamu
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2000.11a
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    • pp.3-4
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    • 2000
  • Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.

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Plant Regeneration from Hypocotyl-Derived Protoplasts of Brassica oleracea var. capitata (양배추 배축 원형질체로부터 식물체 재분화)

  • 이연희;조현석;서석철;김호일
    • Korean Journal of Plant Tissue Culture
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    • v.22 no.1
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    • pp.7-11
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    • 1995
  • Protoplasts were isolated from hypocotyl tissues of 5-day-old Brassica oleracea var capitata Green Challenger seedlings. Several media were used for protoplast culture and shoot regeneration. The shoot-regeneration rapacity of protoplast derived callus depended on the initial culture medium. Protoplasts were cultured in liquid medium (B5 medium supplemented with CaCl2, 2H2O 600mg/L, g1ucose 20g/L, D-mannito1 70g/L, NAA lmg/L, BA lmg/L, 2.4-D 0.25 mg/L)at 27$^{\circ}C$ under the dark After 5 to 10 days, cultlues were diluted with medium with a reduced osmotic stabilizer and then transferred to illuminated conditions. The culture medium was changed with the fresh medium at 7- to 10-day-intervals until the formation of microcallus. Hypocotyl protoplast-derived callus proliferated when transferred to MS medium supplemented with NAA lmg/L, BA 1mg/L and GA$_3$ 0.02mg/L. Upon transfer to MS basal medium without growth regulators, roots were produced. In an attempt to increase the regeneration frequency, 10g/L polyvinylpyrrolidone was added to the regeneration medium, but the shoot regeneration was mot improved. The regenerated whole plants were acclimated in a sterized soilless mixture(vermiculite 2;perlite 2;peat moss1) in a culture room.

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High frequency plant regeneration system for Nymphoides coreana via somatic embryogenesis from zygotic embryo-derived embryogenic cell suspension cultures

  • Oh, Myung-Jin;Na, Hye-Ryun;Choi, Hong-Keun;Liu, Jang Ryol;Kim, Suk-Weon
    • Plant Biotechnology Reports
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    • v.4 no.2
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    • pp.125-128
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    • 2010
  • Culture conditions were established for high frequency plant regeneration via somatic embryogenesis from cell suspension cultures of Nymphoides coreana. Zygotic embryos formed pale-yellow globular structures and calluses at a frequency of 85.6% when cultured on half-strength Murashige and Skoog (MS) medium supplemented with 0.3 $mg\;l^{-1}$ of 2,4-D. However, the frequency of pale-yellow globular structures and white callus formation decreased slightly with an increasing concentration of 2,4-D up to 10 $mg\;l^{-1}$ with the frequency rate falling to 16.7%. Cell suspension cultures were established from zygotic embryo-derived calluses using half-strength MS medium supplemented with 0.3 $mg\;l^{-1}$ of 2,4-D. Upon plating onto half-strength MS basal medium, over 92.3% of cell aggregates gave rise to numerous somatic embryos and developed into plantlets. Regenerated plantlets were successfully transplanted into potting soil and achieved full growth to an adult plant in a growth chamber. The high frequency plant regeneration system for Nymphoides coreana established in this study will be useful for genetic manipulation and cryopreservation of this species.